US Patent No. 9,406,486

ELECTRON BEAM PLASMA SOURCE WITH SEGMENTED SUPPRESSION ELECTRODE FOR UNIFORM PLASMA GENERATION


Patent No. 9,406,486
Issue Date August 02, 2016
Title Electron Beam Plasma Source With Segmented Suppression Electrode For Uniform Plasma Generation
Inventorship Leonid Dorf, San Jose, CA (US)
Shahid Rauf, Pleasanton, CA (US)
Kenneth S. Collins, San Jose, CA (US)
Nipun Misra, San Jose, CA (US)
Kartik Ramaswamy, San Jose, CA (US)
James D. Carducci, Sunnyvale, CA (US)
Steven Lane, Porterville, CA (US)
Assignee APPLIED MATERIALS, INC., Santa Clara, CA (US)

Claim of US Patent No. 9,406,486

1. A plasma reactor for processing a workpiece, comprising:
a workpiece processing chamber;
an electron beam source chamber comprising an electron beam source enclosure having a beam opening communicating with said
workpiece processing chamber;

an extraction electrode between said beam opening and said workpiece processing chamber and an acceleration electrode between
said extraction electrode and said workpiece processing chamber and insulated from said extraction electrode;

a suppression electrode between said extraction electrode and said acceleration electrode, said suppression electrode comprising
plural segments insulated from one another, and respective bias sources coupled to respective ones of said plural segments.