US Patent No. 9,285,676

SELF-ASSEMBLABLE POLYMER AND METHOD FOR USE IN LITHOGRAPHY


Patent No. 9,285,676
Issue Date March 15, 2016
Title Self-assemblable Polymer And Method For Use In Lithography
Inventorship Aurelie Marie Andree Brizard, Eindhoven (NL)
Wilhelmus Sebastianus Marcus Maria Ketelaars, Eindhoven (NL)
Sander Frederik Wuister, Eindhoven (NL)
Roelof Koole, Eindhoven (NL)
Emiel Peeters, Eindhoven (NL)
Christianus Martinus Van Heesch, Eindhoven (NL)
Henri Marie Joseph Boots, Best (NL)
Thanh Trung Nguyen, Eindhoven (NL)
Assignee ASML NETHERLANDS B.V., Veldhoven (NL)

Claim of US Patent No. 9,285,676

1. A block copolymer comprising a first block of first monomer and a second block of second monomer, the copolymer adapted
to undergo a transition from a disordered state to an ordered state at a temperature less than TOD, the copolymer further comprising a bridging moiety comprising a functional group arranged to provide hydrogen bonding between
bridging moieties of adjacent first and second block copolymer molecules when in the ordered state and at a temperature in
excess of a glass transition temperature Tg for the copolymer.