US Patent No. 9,268,233

FORMING METHOD AND SUBSTRATE


Patent No. 9,268,233
Issue Date February 23, 2016
Title Forming Method And Substrate
Inventorship Koichiro Tsujita, Utsunomiya (JP)
Assignee CANON KABUSHIKI KAISHA, Tokyo (JP)

Claim of US Patent No. 9,268,233

1. A method of forming a detection mark from a line pattern formed on a substrate, comprising:
a first step of deciding a first region for forming the detection mark on the substrate, and a second region which surrounds
the first region and in which formation of the detection mark is forbidden; and

a second step of projecting, onto the substrate by a projection optical system, patterns including a first cut pattern for
partially cutting the line pattern in the first region to form a plurality of mark elements, and a removal pattern for removing
the line pattern in the second region, and forming the detection mark including the plurality of mark elements.