US Patent No. 9,222,172


Patent No. 9,222,172
Issue Date December 29, 2015
Title Surface Treated Aluminum Nitride Baffle
Inventorship Muhammad M. Rasheed, Fremont, CA (US)
Dmitry Lubomirsky, Cupertino, CA (US)
Assignee APPLIED MATERIALS, INC., Santa Clara, CA (US)

Claim of US Patent No. 9,222,172

1. A baffle for use in a semiconductor process chamber, comprising:
a body comprising aluminum nitride and a metal oxide binding agent, a center stem and an outer annulus coupled to and extending
radially outwards from a lower portion of the center stem, wherein a ratio of aluminum nitride to the metal oxide binding
agent on a surface of the body is greater than or equal to the ratio within the body;

a gas inlet disposed in an upper portion of the center stem; and
a plurality of gas outlets disposed in a lower portion of the center stem and fluidly coupled to the gas inlet.