US Patent No. 9,217,916

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD


Patent No. 9,217,916
Issue Date December 22, 2015
Title Lithographic Apparatus And Device Manufacturing Method
Inventorship Paul Christiaan Hinnen, Veldhoven (NL)
Marcus Adrianus Van De Kerkhof, Helmond (NL)
Reiner Maria Jungblut, Taipei (TW)
Assignee ASML Netherlands B.V., Veldhoven (NL)

Claim of US Patent No. 9,217,916

1. A lithographic system, comprising:
a monitored lithographic projection apparatus arranged to project a patterned beam of radiation onto a substrate;
a metrology apparatus arranged to measure values representative of a plurality of features of a pattern transferred onto the
substrate including values of at least one CD-profile parameter and at least one further feature profile parameter which is
indicative of a machine setting of the monitored lithographic projection apparatus; and

a matching system comprising,
a storage system configured to store a reference CD-profile parameter value representative of the CD-profile parameter and
a reference feature profile value representative of the one further feature profile parameter,

a comparison system configured to compare the measured and reference values of the one further feature profile parameter,
and

a lithographic parameter determination system configured to determine a corrected set of machine settings for use by the monitored
lithographic apparatus dependent on the differences between the measured and reference values of the one further feature profile
parameter and between the measured and reference values of the CD-profile parameter.