US Patent No. 9,052,605

ILLUMINATION SYSTEM FOR LITHOGRAPHIC APPARATUS WITH CONTROL SYSTEM TO EFFECT AN ADJUSTMENT OF AN IMAGING PARAMETER


Patent No. 9,052,605
Issue Date June 09, 2015
Title Illumination System For Lithographic Apparatus With Control System To Effect An Adjustment Of An Imaging Parameter
Inventorship Koen Van Ingen Schenau, Veldhoven (NL)
Jan Bernard Plechelmus Van Schoot, Eindhoven (NL)
Gosse Charles De Vries, Veldhoven (NL)
Assignee ASML NETHERLANDS B.V., Veldhoven (NL)

Claim of US Patent No. 9,052,605

1. An illumination system for a lithographic apparatus arranged to project a pattern from a patterning device onto a substrate,
the illumination system configured to condition a radiation beam and direct the radiation beam onto the patterning device,
the illumination system comprising:
a first reflective component and a second reflective component, the first reflective component being arranged to direct radiation
of the radiation beam onto the second reflective component, the first reflective component comprising a plurality of movable
reflective elements, each movable reflective element being moveable between at least a first position and a second position
so as to change an illumination mode, and the second reflective component being associated with a pupil plane of the patterning
device; and

a control system arranged to set the plurality of moveable reflective elements to respective desired positions in order to
effect a desired illumination mode selected from a set of predetermined illumination modes and further arranged to set at
least one of the moveable reflective elements to a corrective position, different than its desired position, to effect a correction
of a proximity effect in the pattern.