US Patent No. 11,071,210

ANISOTROPIC ETCHING USING HIGHLY BRANCHED POLYMERS


Patent No. 11,071,210
Issue Date July 20, 2021
Title Anisotropic Etching Using Highly Branched Polymers
Inventorship Jolanta Klocek, Leoben (AT)
Thomas Krivec, Zeltweg (AT)
Assignee

Claim of US Patent No. 11,071,210


1. An etching composition for etching an electrically conductive layer structure for forming a conductor track, the etching composition comprising:an etchant;
a highly branched non-linear compound, wherein the highly branched non-linear compound comprises at least one of an amine functional group and/or a thiol functional group;
an etching inhibitor; and
optionally a solvent,
wherein the highly branched non-linear compound is less permeable for the etching inhibitor than for the etchant.