US Patent No. 11,071,191

EXTREME ULTRAVIOLET RADIATION SOURCE AND CLEANING METHOD THEREOF


Patent No. 11,071,191
Issue Date July 20, 2021
Title Extreme Ultraviolet Radiation Source And Cleaning Method Thereof
Inventorship Chi Yang, Taichung (TW)
Sheng-Ta Lin, Miaoli County (TW)
Shang-Chieh Chien, New Taipei (TW)
Li-Jui Chen, Hsinchu (TW)
Po-Chung Cheng, Zhongpu Shiang (TW)
Assignee TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD, Hsinchu (TW)

Claim of US Patent No. 11,071,191


1. An extreme ultraviolet radiation source, comprising:a vessel configured to produce extreme ultraviolet light therein, wherein the vessel has a gas supply from which a cleaning gas is supplied into the vessel and a gas outlet from which the cleaning gas exits the vessel;
a vacuum pump coupled to the gas outlet; and
a gas scrubber disposed within the vessel, arranged such that the cleaning gas leaves the vessel through the gas outlet after flowing through the gas scrubber;
wherein the gas scrubber has a plurality of ribs and a plurality of gas passages to allow the cleaning gas to flow through, wherein the ribs form the gas passages therebetween, and sizes of the gas passages vary according to a distance between each of the gas passages and the gas outlet.