1. A plasma processing method performed in a plasma processing apparatus,wherein the plasma processing apparatus comprises:
a cooling plate;
an upper electrode;
an electrostatic chuck provided between the cooling plate and the upper electrode and configured to attract the upper electrode;
a power supply configured to apply a voltage to the electrostatic chuck; and
a power supply controller configured to control an absolute value of the voltage applied to the electrostatic chuck from the power supply, and
wherein the plasma processing method comprises:
controlling the power supply such that the absolute value is increased based on a degree of consumption of the upper electrode.