US Patent No. 10,990,025

PATTERNING DEVICE COOLING APPARATUS


Patent No. 10,990,025
Issue Date April 27, 2021
Title Patterning Device Cooling Apparatus
Inventorship Laurentius Johannes Adrianus Van Bokhoven, Veldhoven (NL)
Ruud Hendrikus Martinus Johannes Bloks, Helmond (NL)
Marinus Jan Remie, Eindhoven (NL)
Johan Gertrudis Cornelis Kunnen, Weert (NL)
Assignee ASML NETHERLANDS B.V., Veldhoven (NL)

Claim of US Patent No. 10,990,025

1. A patterning apparatus for a lithographic apparatus, the patterning apparatus comprising:a patterning device support structure configured to support a patterning device;
a patterning device conditioning system comprising:
at least one first gas outlet configured to provide a gas flow over a surface of the patterning device, and
at least one second gas outlet configured to provide a gas flow over a part of a surface of the patterning device support structure not supporting the patterning device such that the gas flow from the at least one second gas outlet primarily does not flow over the surface of the patterning device but instead contacts the surface of the patterning device support structure not supporting the patterning device; and
a control system configured to, based on a parameter relating to the patterning device or patterning device support structure, control a value of a gas parameter for gas exiting the at least one first gas outlet to be a different value than that a value of that gas parameter for gas exiting the at least one second gas outlet or control a value of a gas parameter for gas exiting the at least one second gas outlet to be a different value than a value of that gas parameter for gas exiting the at least one first gas outlet.