US Patent No. 10,925,143
LASER APPARATUS AND EUV LIGHT GENERATING SYSTEM
| Patent No. | 10,925,143 |
|---|---|
| Issue Date | February 16, 2021 |
| Title | Laser Apparatus And Euv Light Generating System |
| Inventorship | Katsuhiko Wakana, Oyama (JP) |
| Assignee | Gigaphoton Inc., Tochigi (JP) |
Claim of US Patent No. 10,925,143
1. A laser apparatus comprising:an optical element disposed on a laser beam axis;
an actuator configured to displace the optical element to displace the laser beam axis;
a driving amount monitor configured to monitor a driving amount of the actuator;
an optical axis monitor disposed along the laser beam axis and configured to monitor the laser beam axis; and
a control unit configured to control the actuator based on a monitoring result of the optical axis monitor, and determine abnormality of the optical element based on a monitoring result of the driving amount monitor.
an actuator configured to displace the optical element to displace the laser beam axis;
a driving amount monitor configured to monitor a driving amount of the actuator;
an optical axis monitor disposed along the laser beam axis and configured to monitor the laser beam axis; and
a control unit configured to control the actuator based on a monitoring result of the optical axis monitor, and determine abnormality of the optical element based on a monitoring result of the driving amount monitor.