US Patent No. 10,921,710

RESIST COMPOSITION AND PATTERN FORMING PROCESS


Patent No. 10,921,710
Issue Date February 16, 2021
Title Resist Composition And Pattern Forming Process
Inventorship Teppei Adachi, Joetsu (JP)
Ryosuke Taniguchi, Joetsu (JP)
Kazuhiro Katayama, Joetsu (JP)
Assignee SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP)

Claim of US Patent No. 10,921,710

1. A resist composition comprising:(A) a base resin consisting of recurring units having the formula (1) shown below and recurring units having an acid labile group having the formula (2) shown below, and optionally at least one recurring unit selected from the group consisting of recurring units having the formulae (3) to (5) shown below,
(B) a photoacid generator consisting of a compound having the formula (B-2) shown below, and
(C) a solvent,
wherein RA is hydrogen or methyl, R1 is a C1-C10 straight, branched or cyclic divalent hydrocarbon group in which at least one carbon atom may be substituted by an ether or carbonyl moiety,wherein RA is as defined above and X is an acid labile group,wherein RA is hydrogen or methyl, R3 and R4 are each independently hydrogen or hydroxyl, Y is a substituent group containing a lactone structure different from formula (1) or a substituent group containing a sultone structure, Z is hydrogen, a C1-C15 fluorinated hydrocarbon group, or a C1-C15 fluoroalcohol-containing substituent group,wherein A2 is hydrogen or trifluoromethyl, R22, R23, and R24 are each independently hydrogen or a C1-C20 straight, branched or cyclic monovalent hydrocarbon group which may contain a heteroatom, p and q are each independently an integer of 0 to 5, r is an integer of 0 to 4, L is a single bond, ether group, or a C1-C20 straight, branched or cyclic divalent hydrocarbon group which may contain a heteroatom,wherein the recurring units having formula (4) is selected from the group consisting of the following formulae: