US Patent No. 10,772,181

PLASMA GENERATION DEVICE


Patent No. 10,772,181
Issue Date September 08, 2020
Title Plasma Generation Device
Inventorship Wataru Kusaka, Okazaki (JP)
Assignee FUJI CORPORATION, Chiryu (JP)

Claim of US Patent No. 10,772,181

1. A plasma generation device comprising:an electric power supply device configured to supply electric power to multiple electrodes arranged in a reaction chamber;
a processing gas supply device configured to supply a processing gas to the reaction chamber;
a heated gas ejecting device including a heating-use gas supply device configured to supply a heating-use gas, and a heater configured to heat gas supplied by the heating-use gas supply device, and configured to eject heated gas that was heated by the heater towards a processing body that is a target for application by a plasma generated in the reaction chamber by the electric power supply device; and
a control device configured to control operation of the electric power supply device, the heated gas ejecting device, and the processing gas supply device, wherein
the control device is configured to control the operation of the electric power supply device, the heated gas ejecting device, and the processing gas supply device to stop supply of electric power to the electrodes and to stop the heater but continue supply of the processing gas to the reaction chamber and continue supply of the heating-use gas based on a stop instruction, and restart supply of electric power to the electrodes and restart the heater based on a resume instruction.