1. A system for generating extreme ultraviolet light, the system comprising:a master oscillator configured to output a laser beam pulse, the laser beam pulse having a waveform including a first portion and a second portion following the first portion;
an optical element positioned in a beam path of the laser beam pulse, the optical element configured to transform the waveform of the laser beam pulse to a second waveform, the second waveform including a pedestal and a peak, the pedestal being formed by transformation of the first portion to the pedestal by the optical element, and the peak being the second portion;
an amplifier including a gain medium, the amplifier configured to amplify the pedestal and the peak to form an amplified pedestal and an amplified peak; and
the amplified pedestal and the amplified peak containing sufficient energy to turn a target material into a plasma that emits EUV light.