1. A method of manufacturing a display device comprising:forming a first conductive layer on a substrate;
forming a second conductive layer on the first conductive layer;
forming a first photoresist pattern on a gate transmission member forming area and a second photoresist pattern on a pixel electrode pattern forming area on the second conductive layer, the second photoresist pattern having a thickness greater than a thickness of the first photoresist pattern;
removing the first and second conductive layers using the first and second photoresist patterns as masks, to thereby form a gate transmission member and a pixel electrode pattern each comprising a first conductive layer pattern and a second conductive layer pattern;
removing the first photoresist pattern to thereby form a residual pattern of the second photoresist pattern on the pixel electrode pattern;
forming an etch stop layer on the gate transmission member and the residual pattern;
removing the residual pattern to thereby form an etch stop layer pattern through which the second conductive layer pattern of the pixel electrode pattern is exposed; and
removing the second conductive layer pattern of the pixel electrode pattern using the etch stop layer pattern as a mask, to thereby form a pixel electrode.