US Patent No. 10,342,108

METROLOGY METHODS, RADIATION SOURCE, METROLOGY APPARATUS AND DEVICE MANUFACTURING METHOD


Patent No. 10,342,108
Issue Date July 02, 2019
Title Metrology Methods, Radiation Source, Metrology Apparatus And Device Manufacturing Method
Inventorship Alexey Olegovich Polyakov, Veldhoven (NL)
Richard Quintanilha, Eindhoven (NL)
Vadim Yevgenyevich Banine, Deurne (NL)
Coen Adrianus Verschuren, Eindhoven (NL)
Assignee ASML Netherlands B.V., Veldhoven (NL)

Claim of US Patent No. 10,342,108

1. A method of measuring a property of a periodic structure, the method comprising:generating a beam of radiation by inverse Compton scattering;
directing the beam at the periodic structure;
detecting radiation reflected and diffracted by the periodic structure; and
determining the property of the periodic structure based on at least a property of the detected radiation,
wherein the radiation beam has a wavelength between 0.1 to 125 nm.