US Patent No. 10,219,373

SELECTIVE DEPOSITION OF THIN FILM DIELECTRICS USING SURFACE BLOCKING CHEMISTRY


Patent No. 10,219,373
Issue Date February 26, 2019
Title Selective Deposition Of Thin Film Dielectrics Using Surface Blocking Chemistry
Inventorship David Thompson, San Jose, CA (US)
Mark Saly, Santa Clara, CA (US)
Bhaskar Jyoti Bhuyan, San Jose, CA (US)
Assignee Applied Materials, Inc., Santa Clara, CA (US)

Claim of US Patent No. 10,219,373

1. A method of depositing a film, the method comprising:exposing a substrate to a silylamide to react with a hydroxyl-terminated first substrate surface to form a silyl ether-terminated surface, the substrate having a hydrogen-terminated second substrate surface, one or more of the first surface and the second surface comprising a dielectric; and
forming a film on the second surface selectively over the first surface by exposing the substrate to one or more deposition gases.