US Patent No. 10,189,947

COMPOSITION OF ANTI-REFLECTIVE HARDMASK


Patent No. 10,189,947
Issue Date January 29, 2019
Title Composition Of Anti-reflective Hardmask
Inventorship Sang Jun Choi, Seoul (KR)

Claim of US Patent No. 10,189,947

1. An anti-reflective hardmask composition comprising:(a) a carbazole derivative polymer represented by the following Formula 1 or a polymer blend comprising the carbazole derivative polymer; and
(b) an organic solvent:

where R1 is hydrogen or an aromatic ring selected from the group consisting of the following substituents, R2 is an aromatic ring selected from the group consisting of the following substituents, and R1 and R2 may be the same or different:

where X is at least one selected from the following substituents:

where Z is an integer of 0 or 1,
m/(m+n) equals to a value in the range of between 0.1 and 0.8, and
a weight average molecular weight (Mw) of the polymer is between 1,000 and 30,000.