US Patent No. 10,169,522

METHODS AND SYSTEM FOR MODEL-BASED GENERIC MATCHING AND TUNING


Patent No. 10,169,522
Issue Date January 01, 2019
Title Methods And System For Model-based Generic Matching And Tuning
Inventorship Yu Cao, Saratoga, CA (US)
Hanying Feng, Fremont, CA (US)
Jun Ye, Palo Alto, CA (US)
Assignee ASML Netherlands B.V., Veldhoven (NL)

Claim of US Patent No. 10,169,522

1. A method of tuning a to-be-tuned lithographic process to a reference lithographic process, each of the reference and the to-be-tuned lithographic processes involving use of a lithographic apparatus to manufacture a pattern on or in a substrate, the method comprising:obtaining respective lithographic process models for both the reference lithographic process and the to-be-tuned lithographic process, the reference and to-be-tuned lithographic process models each comprise a plurality of mathematical terms and each model a physical characteristic of an aspect of the respective lithographic processes;
identifying a set of tunable parameters of the to-be-tuned lithographic process;
determining, by a hardware computer, one or more changes in the set of tunable parameters that cause responses of the reference and to-be-tuned lithographic process models to match, wherein the determining the one or more changes includes applying non-uniform weights to different mathematical terms in the reference and to-be-tuned lithographic process models; and
tuning the to-be-tuned lithographic process to the reference lithographic process by adjusting the model for the to-be-tuned lithographic process based on the determined one or more changes,
where an output of the adjusted model is configured (a) to (i) design, (ii) control, (iii) modify, or (iv) any combination selected from (i) to (iii), an aspect of a physical manufacturing step of the to-be-tuned lithographic process, or (b) to (v) design, (vi) control, (vii) modify, or (viii) any combination selected from (v) to (vii), an aspect of a physical object or apparatus to be used or manufactured in the to-be-tuned lithographic process, or (c) both (a) and (b).