US Patent No. 10,120,294

LITHOGRAPHY APPARATUS AND ARTICLE MANUFACTURING METHOD


Patent No. 10,120,294
Issue Date November 06, 2018
Title Lithography Apparatus And Article Manufacturing Method
Inventorship Takuro Tsujikawa, Utsunomiya (JP)
Assignee CANON KABUSHIKI KAISHA, Tokyo (JP)

Claim of US Patent No. 10,120,294

1. A lithography apparatus for forming a pattern on a substrate, the apparatus comprising:a stage configured to move while holding the substrate on which a mark is formed;
a scope configured to capture an image of the mark on the substrate, the scope including an image sensor having an image sensing region where a plurality of pixels are arranged in matrix, and an imaging optical system for adjusting magnification;
a processor configured to read data of an image of the mark formed in the image sensing region sequentially on a row basis and process the read data, and obtain a position of the mark formed on the substrate; and
a controller configured to position the substrate by moving the stage based on the position of the mark and form the pattern on the substrate,
wherein, for capturing an image of a first mark on a first substrate by the scope, the controller moves the stage holding the first substrate by a predetermined offset amount with respect to the image sensor so that, in the image sensing region, the image of the first mark is disposed closer to a row in the image sensing region, from which the processor starts reading the data, than an image of a second mark on a second substrate different from the first substrate when the scope has captured the image of the second mark,
wherein the predetermined offset amount is based on a position of the image of the second mark in the image sensing region formed for obtaining a position of the second mark on the second substrate, and
wherein the controller is configured to set the magnification to a first magnification for capturing the image of the first mark and the image of the second mark.