US Patent No. 10,117,317

SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT


Patent No. 10,117,317
Issue Date October 30, 2018
Title System And Method For Generating Extreme Ultraviolet Light
Inventorship Tsukasa Hori, Hiratsuka (JP)
Kouji Kakizaki, Hiratsuka (JP)
Tatsuya Yanagida, Hiratsuka (JP)
Osamu Wakabayashi, Hiratsuka (JP)
Hakaru Mizoguchi, Oyama (JP)
Assignee Gigaphoton Inc., Tochigi (JP)

Claim of US Patent No. 10,117,317

1. An extreme ultraviolet light generation system configured to irradiate a target with a first pulse laser beam and a second pulse laser beam to turn the target into plasma thereby generating extreme ultraviolet light, comprising:a chamber having at least one aperture configured to introduce the first pulse laser beam and the second pulse laser beam;
a target supply unit configured to supply the target to a predetermined region in the chamber;
a first laser apparatus configured to output the first pulse laser beam with which the target in the chamber is irradiated so as to make the target be diffused in a dome shape; and
a second laser apparatus configured to output the second pulse laser beam with which the target which has been irradiated with the first pulse laser beam is further irradiated.