US Patent No. 10,016,908

LIQUID NITROGEN JET STREAM PROCESSING OF SUBSTRATES


Patent No. 10,016,908
Issue Date July 10, 2018
Title Liquid Nitrogen Jet Stream Processing Of Substrates
Inventorship Alex Veis, Kadima (IL)
Assignee HP SCITEX LTD., Netanya (IL)

Claim of US Patent No. 10,016,908

1. A jet system comprising:a processing surface to support a fluid sensitive substrate;
a fluid container to receive liquid nitrogen;
a jet nozzle connected to the fluid container for directing a jet stream of the liquid nitrogen to the fluid sensitive substrate supported by the processing surface;
an arm to hold and move the jet nozzle at a distance from a surface of the fluid sensitive substrate;
a moveable member; and
an actuator to move the moveable member to modulate the jet stream directed by the jet nozzle, the actuator to move the moveable member to a first position relative to the jet nozzle to cut the fluid sensitive substrate, and the actuator to move the moveable member to a second position relative to the jet nozzle to partially distort the jet stream directed by the jet nozzle to score fold lines in the fluid sensitive substrate as the jet nozzle is moved relative to the fluid sensitive substrate while the moveable member is set to the second position, the second position different from the first position.