US Pat. No. 9,414,476

METHOD AND DEVICE FOR GENERATING OPTICAL RADIATION BY MEANS OF ELECTRICALLY OPERATED PULSED DISCHARGES

FRAUNHOFER-GESELLSCHAFT Z...

1. A method of generating optical radiation by means of electrically operated pulsed discharges, in which
igniting a plasma in a gaseous medium between at least two electrodes in a discharge space, said plasma emitting said radiation
that is to be generated,

producing said gaseous medium at least partly from a liquid material, which is applied to one or several surface(s) moving
in said discharge space and is at least partially evaporated by one or several pulsed energy beam(s),

applying at least two consecutive pulses of said pulsed energy beam(s) within a time interval of each electrical discharge
onto said surface(s) to evaporate said liquid material, and

controlling a time delay between said at least two consecutive pulses and/or a pulse energy of said at least two consecutive
pulses such that a position of an emission center of said plasma is held constant during a time period covering a multiplicity
of said electrical discharges.

US Pat. No. 9,516,731

POWER SUPPLY FOR A DISCHARGE PRODUCED PLASMA EUV SOURCE

ASML NETHERLANDS B.V., V...

1. A power supply for providing power to a lithography illumination source, the power supply comprising:
a voltage source configured to provide the power;
a transmission line configured to transmit the power from the voltage source; and
a RF termination provided on an input end of the transmission line or an output end of the transmission line, the RF termination
being configured to terminate the transmission line to reduce reflection of RF energy at the end of the transmission line.

US Pat. No. 9,480,136

EXTREME UV RADIATION LIGHT SOURCE DEVICE

USHIO DENKI KABUSHIKI KAI...

1. An extreme ultraviolet light source device comprising:
a disc-like rotating element;
a rotation unit configured to cause the rotating element to rotate about a rotation center shaft, which is perpendicular to
a flat surface of the rotating element;

a cover-like structure configured to surround the rotating element with a gap;
a first reserving vessel disposed in the cover-like structure and configured to reserve a liquid high temperature plasma raw
material, with part of the rotating element being immersed in the high temperature plasma raw material reserved in the first
reserving vessel;

a raw material supplying mechanism configured to apply the liquid high temperature plasma raw material onto at least part
of the flat surface of the rotating element upon a rotating movement of the rotating element;

an energy beam providing device configured to irradiate the high temperature plasma raw material with an energy beam; and
a film thickness controlling mechanism provided in the cover-like structure, the film thickness controlling mechanism including
a U-shaped structure having a channel-like recess, the U-shaped structure being biased by an elastic body in a direction against
the flat surface of the rotating element such that two opposite sides of the U-shaped structure contact the flat surface of
the rotating element, a clearance between the rotating element and a bottom of the recess of the structure, which faces the
rotating element, being set such that the liquid high temperature plasma raw material applied on the rotating element has
a predetermined film thickness,

the cover-like structure of the raw material supplying mechanism having an opening in a certain part of the cover-like structure
such that the energy beam is directed to the flat surface of the rotating element, on which the high temperature plasma raw
material is applied, through the opening of the cover-like structure, and extreme ultraviolet light generated upon irradiation
of the energy beam is released from the opening of the cover-like structure,

the cover-like structure having a scattering preventing member disposed to oppose a direction of a centrifugal force acting
on the rotating element, which is caused to rotate by the rotation unit, and cover the rotating element,

wherein the energy beam is directed to one of two flat surfaces of the disc-like rotating element, which are perpendicular
to the rotation center shaft, and

an optical axis of the extreme ultraviolet light is decided based on a position where the high temperature plasma, which emits
the extreme ultraviolet light, is generated and a position where an extreme ultraviolet light condensing mirror is mounted,
or based on the position where the high temperature plasma is generated and an optical system used to test a mask, and the
optical axis of the extreme ultraviolet light is set such that the energy beam directed to the rotating element do not coincide
with a direction of the energy beam reflected by the rotating element.

US Pat. No. 9,448,169

LIGHT MEASURING APPARATUS, LIGHT MEASURING METHOD, FILTER MEMBER, AND METHOD OF MAKING FILTER MEMBER

Kyushu University, Nation...

1. A filter member comprising:
a dye dispersed unit, in which a first dye is dispersed, and configured to allow, at least, light having a predetermined wavelength
to pass therethrough, the first dye being operable to absorb that light which has a wavelength other than said predetermined
wavelength; and

a dye diffusion restricting member provided adjacent to the dye diffused unit and configured to restrict diffusion of the
first dye from the dye diffused unit.

US Pat. No. 9,402,317

ASHING APPARATUS

USHIO DENKI KABUSHIKI KAI...

1. An ashing apparatus comprising:
a treatment chamber configured to place an object to be treated therein;
a lamp chamber having an ultraviolet lamp, the ultraviolet lamp being configured to irradiate the object with an ultraviolet
beam, the treatment chamber and the lamp chamber being moved relative to each other and in parallel to a surface to be treated
of the object, the treatment chamber having a stage to support the object, a gas inlet opening formed in the stage to supply
a treatment gas into the treatment chamber in a direction perpendicular to the surface to be treated, and a gas outlet opening
formed in the stage to discharge the treatment gas from the treatment chamber in the direction perpendicular to the surface
to be treated; and

a window member configured to transmit the ultraviolet beam therethrough, and secured to the treatment chamber, the window
member being configured to partition the treatment chamber and the lamp chamber from each other, the lamp chamber and the
treatment chamber being moved relative to each other in parallel to a flowing direction of the treatment gas in the treatment
chamber while the treatment gas is flowing from the gas inlet opening to the gas outlet opening and the ultraviolet lamp is
emitting the ultraviolet beam.

US Pat. No. 9,421,647

METHOD OF MANUFACTURING MIRROR SHELLS OF A NESTED SHELLS GRAZING INCIDENCE MIRROR

USHIO DENKI KABUSHIKI KAI...

1. A method of manufacturing mirror shells of a nested shells grazing incidence mirror, in particular for EUV radiation and/or
X-rays, the method at least comprising the steps of
providing and machining a blank of a bulk material to form a mirror body of the shell, wherein said mirror body is formed
to have edges which are knife edge shaped

integrating and/or attaching mechanical structures in and/or to the mirror body during and/or after said step of machining
the blank, and

forming an optical surface on the mirror body including said mechanical structures by diamond turning.

US Pat. No. 9,050,633

TEMPLATE WASHING METHOD, PATTERN FORMING METHOD, PHOTOWASHING APPARATUS, AND NANOIMPRINT APPARATUS

Ushio Denki Kabushiki Kai...

1. A template washing method for photowashing a pattern surface of a template used in nanoimprint comprising
a vacuum-ultraviolet light irradiation process for irradiating vacuum-ultraviolet light onto the pattern surface of the template
under the state that the pattern surface of the template is exposed to an atmosphere of dry air.

US Pat. No. 9,511,574

METHOD AND APPARATUS FOR BONDING WORKPIECES TOGETHER

USHIO DENKI KABUSHIKI KAI...

4. An apparatus for bonding workpieces wherein a first workpiece made of resin and a second workpiece made of resin or glass
are bonded together, the apparatus comprising:
a first stage for holding the first workpiece, which is rotatable by 180 degrees about a shaft provided on one end thereof;
a second stage for holding the second workpiece;
a light irradiation unit for irradiating a surface of the first workpiece and a surface of the second workpiece with ultraviolet
light, wherein the light irradiation unit accommodates lamps;

a workpiece stacking mechanism for stacking in layers both the first and second workpieces by rotating the first stage by
180 degrees so that the light-irradiated surface of the first workpiece held on the first stage is brought into contact with
the light-irradiated surface of the second workpiece held on the second stage, wherein the surface of the first workpiece
is irradiated with the ultraviolet light before the first stage is rotated by 180 degrees;

a movement restricting mechanism for restricting at least a vertical movement of the first and second workpieces stacked in
layers;

a pressurizing mechanism for pressurizing the first and second workpieces stacked in layers in a state that the contact surfaces
thereof are pressurized;

a gap setting mechanism capable of setting a distance between a lower side of the lamps and the surface of the first workpiece
held on the first stage and the surface of the second workpiece held on the second stage, to 1 to 5 mm, wherein the first
stage and the second stage are adjusted independently of each other; and

a heating mechanism which is provided separately from the first and second stages and which, after the pressure being applied
is released, heats the first and second workpieces stacked in layers.

US Pat. No. 9,119,279

RADIATION SOURCE FOR GENERATING SHORT-WAVELENGTH RADIATION FROM PLASMA

USHIO Denki Kabushiki Kai...

1. A radiation source for generating short-wavelength radiation from plasma comprising:
a molten bath of a liquid metal being a source material;
at least one revolving element partially immersed in the source material to carry the source material into a plasma zone;
at least one laser directed to the plasma zone for exciting the source material and
a receptacle for collecting unused source material constructed as a catch trough having a trough opening below the plasma
zone and below the molten bath in a direction of a force of gravity, at least one inclined side wall for catching and concentrating
the unused source material in a deepest trough area of the catch trough;

at least one heating element attached to the catch trough for heating the unused source material to a temperature T above
a melting temperature TS of the source material; and

a control unit for controlling the temperature T in the catch trough with at least one temperature sensor attached to the
catch trough.

US Pat. No. 9,385,505

LASER LIGHT SOURCE APPARATUS, AND METHOD FOR CONTROLLING TEMPERATURE OF WAVELENGTH CONVERSION ELEMENT IN LASER LIGHT SOURCE APPARATUS

USHIO DENKI KABUSHIKI KAI...

1. A laser light source apparatus comprising:
a light source part having a semiconductor laser, a wavelength conversion element configured to convert a wavelength of a
laser beam emitted from the semiconductor laser, and an external resonator configured to select that laser beam which has
a prescribed wavelength from the laser beam released from the wavelength conversion element and reflect the selected laser
beam toward the semiconductor laser;

a power supply circuit configured to feed electric power to the semiconductor laser;
an element temperature detecting unit configured to detect temperature of the wavelength conversion element;
a heating unit configured to heat the wavelength conversion element;
a control part configured to control the power supply circuit;
a light source part temperature detecting unit configured to detect temperature of the light source part, the temperature
of the light source part not including the temperature of the wavelength conversion element;

an optimal temperature setting unit configured to, when the wavelength conversion element is irradiated with the laser beam,
configured to measure a plurality of light source part temperatures with the light source part temperature detecting unit,
configure to measure a plurality of wavelength conversion element temperature with the element temperature detecting unit
in connection with said plurality of light source part temperature, configured to select lowest light source part temperature
from said plurality of light source part temperatures, configured to find wavelength conversion element temperature corresponding
to the lowest light source part temperature, and configured to take the wavelength conversion element temperature corresponding
to the lowest light source part temperature as an optimal temperature of the wavelength conversion element; and

a temperature controller configured to control an amount of electric power to be supplied to the heating unit based on a difference
between the temperature of the wavelength conversion element detected by the element temperature detecting unit and the optimal
temperature such that the temperature of the wavelength conversion element becomes the optimal temperature.

US Pat. No. 9,245,731

LIGHT IRRADIATING APPARATUS

Ushio Denki Kabushiki Kai...

1. A light irradiating apparatus, comprising:
an excimer lamp including a high voltage side electrode and a low voltage side electrode;
a cooling mechanism configured to cool the high voltage side electrode using a cooling medium; and
a leak current discharge circuit,
wherein the cooling mechanism includes a passage and a conductor, the passage allowing the cooling medium to flow through,
and the conductor being in contact with the cooling medium, and

the conductor is electrically connected to the leak current discharge circuit.

US Pat. No. 9,433,068

DISCHARGE ELECTRODES FOR USE IN A LIGHT SOURCE DEVICE

USHIO DENKI KABUSHIKI KAI...

1. A pair of discharge electrodes for use in a light source device including a pulse electric power feeding unit configured
to feed a pulse electric power to the pair of discharge electrodes, material feeding units configured to feed a material for
light emission, onto the pair of discharge electrodes respectively, and an energy beam irradiation unit configured to irradiate
the material on a curved surface of each said discharge electrode with an energy beam to vaporize the material, each of the
material feeding units having a container to retain a melt of the material,
each said discharge electrode comprising at least one groove formed in each of two surfaces of each said discharge electrode,
said pair of discharge electrodes being spaced from each other, each said discharge electrode being configured to rotate,
and part of each said discharge electrode passing through the melt of the material retained in the associated container upon
rotation such that the material adheres to a first area of each said discharge electrode.

US Pat. No. 9,246,059

LED ELEMENT, AND PRODUCTION METHOD THEREFOR

USHIO DENKI KABUSHIKI KAI...

1. An LED element comprising:
a support substrate made of a conductor or a semiconductor;
a conductive layer formed on an upper layer of the support substrate;
an insulating layer formed so that a bottom surface thereof is in contact with a portion of an upper surface of the conductive
layer;

a first semiconductor layer made of a p-type nitride semiconductor formed so that a bottom surface thereof is in contact with
a portion of the upper surface of the conductive layer and a portion of an upper surface of the insulating layer;

a light-emitting layer made of a nitride semiconductor formed on an upper layer of the first semiconductor layer;
a second semiconductor layer made of an n-type nitride semiconductor formed on the upper layer of the light-emitting layer;
a transparent electrode formed on an entire upper surface of the second semiconductor layer; and
a power supply terminal formed so that a bottom surface thereof is in contact with a portion of an upper surface of the transparent
electrode, wherein

the second semiconductor layer in at least a region that is in contact with the transparent electrode is made of AlnGa1-nN (0

US Pat. No. 9,125,283

LIGHT SOURCE APPARATUS

USHIO DENKI KABUSHIKI KAI...

1. A light source apparatus comprising:
a lighting power source configured to feed electricity to an excimer lamp at which an IC tag is disposed;
an IC tag reading unit configured to read information from the IC tag disposed at the excimer lamp;
an optical sensor configured to measure illuminance of a light emitted from the excimer lamp that is lighting; and
a controller configured to control the lighting power source according to an output from the optical sensor to control the
illuminance of the light of the excimer lamp,

the lighting power source being configured to be shared among excimer lamps that have an equal lighting condition and different
emission wavelengths,

the controller being configured to store at least usable lamp information identifying an excimer lamp that is usable for the
light source apparatus, and a sensitivity correction value for correcting a sensitivity of the optical sensor that corresponds
to an emission wavelength of each usable excimer lamp,

the IC tag being configured to store at least lamp identifying information identifying an excimer lamp at which the IC tag
is disposed,

the controller being configured, when the light source apparatus is driven to cause the excimer lamp to light, to determine
whether the excimer lamp mounted on the light source apparatus is usable and capable of emitting a light at a desired emission
wavelength based on the lamp identifying information read from the IC tag by the IC tag reading unit and the usable lamp information
stored in the controller, and

the controller being configured, if the controller determines that the excimer lamp is usable and capable of emitting the
light at the desired emission wavelength, to allow the excimer lamp to normally light and correct the sensitivity of the optical
sensor with the sensitivity correction value.

US Pat. No. 9,354,472

POLARIZED LIGHT IRRADIATING APPARATUS AND METHOD OF IRRADIATING POLARIZED LIGHT FOR PHOTO ALIGNMENT

Ushio Denki Kabushiki Kai...

1. A polarized light irradiating apparatus for photo alignment comprising:
an irradiating unit configured to irradiate a preset irradiated area with polarized light;
a stage on which a substrate is placed; and
a stage movement mechanism configured to cause the substrate on the stage to be irradiated with the polarized light by moving
the stage to the irradiated area, wherein

the stage includes two of first and second stages;
the stage movement mechanism is configured to move the first stage from a first substrate mounting position set on one side
of the irradiated area to the irradiated area and to move the second stage from a second substrate mounting position set on
the other side of the irradiated area to the irradiated area,

the stage movement mechanism is configured to return the first stage to a first side after passage of the substrate on the
first stage through the irradiated area and to return the second stage to a second side after passage of the substrate on
the second stage through the irradiated area, and

a space larger than a length by which the substrate on the second stage passes through the irradiated area is secured between
the first stage positioned at the first substrate mounting position and the irradiated area, and a space larger than a length
by which the substrate on the first stage passes through the irradiated area is secured between the second stage positioned
at the second substrate mounting position and the irradiated area.

US Pat. No. 9,332,623

HIGH-VOLTAGE DISCHARGE LAMP ILLUMINATION DEVICE

USHIO DENKI KABUSHIKI KAI...

1. A high-voltage discharge lamp illumination device configured to supply an AC current to a high-voltage discharge lamp which
has a pair of electrodes arranged in an opposite manner in a discharge vessel with a predetermined gas sealed, the high-voltage
discharge lamp illumination device comprising:
a pulse generation part which generates pulse waves; and
a power supply part which receives a DC voltage and converts the DC voltage into the AC current in correspondence to a frequency
of the pulse waves so as to supply the AC current to the high-voltage discharge lamp, wherein

the pulse generation part repeats a cycle of outputting a first pulse wave over a first period, and thereafter outputting
a second pulse wave having a lower frequency than the first pulse wave over a second period shorter than the first period,
and

the pulse generation part returns to the cycle after outputting a third pulse wave having a frequency which is further lower
than the second pulse wave in place of the second pulse wave, at a predetermined timing, and

the third pulse wave is changed its frequency in response to the predetermined timing.

US Pat. No. 9,170,505

ARRANGEMENT FOR GENERATING EUV RADIATION

USHIO Denki Kabushiki Kai...

1. An arrangement for the generating of EUV radiation, comprising:
a plasma generation arrangement for generating a spatially definitely limited hot plasma having a transverse dimension d and
defining a location of a primary source illumination, the plasma generation arrangement located in a vacuum chamber;

the vacuum chamber having an optical axis and an output opening for defining a location of a homogeneously illuminated secondary
source for an exposure system located downstream from the output opening along the optical axis, the output opening having
a diameter D; and

at least one debris filter arranged between the plasma and the output opening,
wherein the plasma is formed as a volume emitter for direct illumination of the output opening without collector optics, the
transverse dimension d of the plasma being greater than the diameter D of the output opening, and

wherein the difference between d and D depends on a distance L between the plasma and the output opening, and on a numerical
aperture NA of the illumination system located downstream from the output opening along the optical axis.

US Pat. No. 9,826,617

EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE

USHIO DENKI KABUSHIKI KAI...

1. An extreme ultraviolet light source device configured to emit extreme ultraviolet light, comprising:
a first energy beam emitting unit configured to emit a first energy beam to a raw material, the raw material being able to
emit the extreme ultraviolet light;

a second energy beam emitting unit configured to emit a second energy beam to the raw material in an area, which is irradiated
with the first energy beam, after the first energy beam emitting unit emits the first energy beam to the raw material unit
and before effective extreme ultraviolet light is emitted from the raw material, thereby causing the raw material to emit
the extreme ultraviolet light;

an optical axis synthesizing unit configured to synthesize an optical axis of the first energy beam, which is emitted from
the first energy beam emitting unit, and an optical axis of the second energy beam, which is emitted from the second energy
beam emitting unit, to substantially a same axis;

a half wave plate located on an optical path of the second laser beam between the second energy beam emitting unit and the
optical axis synthesizing unit; and

a return light blocking unit configured to block return light of the first energy beam, which is emitted from the first energy
beam emitting unit, from arriving at a light exit of the second energy beam emitting unit,

the return light blocking unit being located between the second energy beam emitting unit and the half wave plate.

US Pat. No. 9,184,559

ELECTRON-BEAM-PUMPED LIGHT SOURCE

Ushio Denki Kabushiki Kai...

1. An electron-beam-pumped light source comprising:
an electron beam source; and
a semiconductor light-emitting device excited by an electron beam emitted from the electron beam source, wherein
the electron beam source includes a planar electron beam emitting portion and arranged in the periphery of the semiconductor
light-emitting device,

light exits from a surface which the electron beam from the electron beam source of the semiconductor light-emitting device
enters, and

the electron beam source is arranged so as to surround the semiconductor light-emitting device.

US Pat. No. 9,103,464

HOLDING CIRCUIT, ELECTROMAGNETIC VALVE, VALVE SELECTOR, AND FLOW CONTROLLER

Ushio Denki Kabushiki Kai...

1. A holding circuit comprising a solenoid and a first resistor which are serially connected, wherein the solenoid is driven
at a rated voltage and its drive state is held at a holding voltage lower than the rated voltage,
a first switching unit that is connected in series with the solenoid and the first resistor, and configured to switch between
a state where the solenoid is driven and the state where the solenoid is not driven;

a second switching unit that is connected in parallel with the first resistor, and configured to switch from an ON state to
an OFF state after a predetermined interval after the solenoid is driven at the rated voltage by the first switching unit;
and

a first capacitor that is connected in parallel with the first resistor, and configured to have a larger time constant than
that of the solenoid and to absorb back electromotive force at the solenoid by slowing down the change of voltage applied
to the solenoid from the rated voltage to the holding voltage after the second switching unit is switched to the OFF state,

wherein the second switching unit is a second capacitor which is a capacitor connected in parallel with the first capacitor;
capacity of the second capacitor C2 is larger than the capacity C of the first capacitor;

the first switching unit is a contactor configured to have three contacts of a first contact, a second contact and a third
contact;

the first contact is connected to the second capacitor;
the second contact is connected to a power source which applies the rated voltage;
the third contact is connected to the solenoid;
the contactor is configured to start to charge the second capacitor by connecting the first contact and the second contact;
the contactor is configured to form a closed circuit including the second capacitor and the solenoid and not including the
power source by connecting the first contact and the third contact; and

a discharge resistance other than the first resistor is connected between the third contact and the solenoid in the closed
circuit.

US Pat. No. 9,265,091

FILAMENT LAMP FOR HEATING

USHIO DENKI KABUSHIKI KAI...

1. A filament lamp for heating a disk-shaped workpiece in such a way that the filament lamp radiates light onto the disk-shaped
workpiece while the filament lamp and the disk-shaped workpiece rotate relative to each other, the filament lamp comprising:
an arc-shaped emitting part extending in a circumferential direction of the relative rotation; and
an auxiliary emitting part disposed inside a circle extending along the arc-shaped emitting part and extending from the arc-shaped
emitting part in a direction crossing the circle.

US Pat. No. 9,236,195

DYE-SENSITIZED SOLAR CELL

Ushio Denki Kabushiki Kai...

1. A dye-sensitized solar cell, comprising:
a tube-shaped vessel made of transparent glass,
a transparent conductive film at an inner surface of the tube-shaped vessel,
a photoelectrode formed of a semiconductor film to which a dye has been adsorbed,
a counter electrode provided in the tube-shaped vessel at a location spaced from the photoelectrode, and
an electrolytic solution is enclosed in the tube-shaped vessel,
wherein opposite ends of said tube-shaped vessel are tightly sealed by the glass of the tube-shaped vessel having been melted
and compressed in a direction orthogonal to a longitudinal axis of the tube-shaped vessel so as to have sealing portions made
of portions of the glass of which the tube-shaped vessel formed and which have a flat plate-shape extending along the direction
of the longitudinal axis of the tube-shaped vessel;

wherein a first external lead is connected electrically to said transparent conductive film and is led out from a first of
the sealing portions to the outside of the tube-shaped vessel; and

wherein a second external lead is connected electrically to said counter electrode and is led out from a second of the sealing
portions to the outside of the tube-shaped vessel,

wherein the transparent conductive film and the first external lead are connected electrically by means of a metal foil embedded
in the first of the sealing portions; and

wherein an internal lead is electrically connected to the counter electrode and the second external lead in the second of
the sealing portions by means of a metal foil that is embedded in the second of the sealing portions.

US Pat. No. 9,055,656

DISCHARGE LAMP OPERATING APPARATUS

Ushio Denki Kabushiki Kai...

1. A discharge lamp operating apparatus comprising:
a discharge lamp for discharging lights in a horizontal direction;
an operating circuit configured to supply power to the discharge lamp;
a voltage measuring unit configured to measure a voltage of power supplied to the discharge lamp;
a magnetic field applying unit configured to suppress a phenomenon of the arc curving on the upper side occurring in the discharge
lamp; and

a control unit configured to control the operating circuit and the magnetic field applying unit,wherein
the voltage measuring unit is configured to measure the voltage of power supplied to the discharge lamp repeatedly at a predetermined
sampling interval t during the operation of the discharge lamp,

the control unit calculates an average value VL1 of a group of the measured value of the voltage as a standard including a plurality of measured values of the voltage measured
within a predetermined time Ta; calculates an average value VL2 of a group of the measured value of the voltage for comparison including a plurality of measured values of the voltage measured
within the predetermined time Ta after a predetermined time Tb has elapsed from the measurement of the measured value of the
voltage measured at the beginning from the group of the measured value of the voltage as a standard; and drives the magnetic
field applying unit when the difference (VL2?VL1) between the average value VL1 of the group of the measured value of the voltage as a standard and the average value VL2 of the group of the measured value of the voltage for comparison exceeds a predetermined value.

US Pat. No. 9,355,833

EXCIMER LAMP

USHIO DENKI KABUSHIKI KAI...

1. An excimer lamp comprising:
an electric discharge vessel having an inner face;
an inner electrode disposed in the electric discharge vessel, the inner electrode having a coil shape;
an outer electrode disposed outside the electric discharge vessel, with an excimer light emitting gas being sealed in the
electric discharge vessel;

a fluorescent substance disposed on the inner face of the electric discharge vessel for converting ultraviolet light, which
is generated upon excimer discharge of said excimer light emitting gas between the inner electrode and the outer electrode,
to another ultraviolet light having a longer wavelength than said ultraviolet light;

a densely coil-wound portion formed in a predetermined part of the inner electrode; and
a getter attached to the densely coil-wound portion.

US Pat. No. 9,137,881

DISCHARGE LAMP LIGHTING APPARATUS

Ushio Denki Kabushiki Kai...

1. A discharge lamp lighting apparatus comprising:
a discharge lamp having a pair of electrodes formed of tungsten and having projections at distal ends thereof; and
a power supply apparatus configured to supply AC power to the discharge lamp to light the discharge lamp,wherein:
the power supply apparatus is switchable between a first lighting mode in which rated power is supplied to the discharge lamp
and a second lighting mode in which power lower than the rated power is supplied to the discharge lamp,

the power supply apparatus is configured to supply AC power having a power waveform in which a low-frequency component has
a frequency lower than a basic frequency component, the low-frequency component being in a range from 60 to 1000 Hz and being
cyclically inserted into the basic frequency component supplied to the discharge lamp, and

the power supply apparatus is configured to control power supplied to the discharge lamp with an average power change ratio
of 0.01 to 2.1 W/s in a mode switching period in which the mode is switched from the first lighting mode to the second lighting
mode.

US Pat. No. 9,484,710

SEMICONDUCTOR LASER DEVICE

Ushio Denki Kabushiki Kai...

1. A semiconductor laser device, comprising:
a plurality of semiconductor laser arrays each including a plurality of linearly-disposed light emitting elements;
collimating members each disposed in an optical path of a light beam array emitted from each of the semiconductor laser arrays;
a condenser lens provided, in common, for a plurality of collimated light beam arrays outputted from the respective collimating
members, and including a light incident surface on which a light incident row pattern is formed through entering of the collimated
light beam arrays, the light incident row pattern including a plurality of light incident regions arranged in a side-by-side
arrangement manner; and

an optical fiber including a substantially-circular-shaped light incident end surface where light from the condenser lens
enters, wherein

a condenser lens incident optical path length of at least one of the semiconductor laser arrays is different from a condenser
lens incident optical path length of any other one of the semiconductor laser arrays, the condenser lens incident optical
path length being defined as a length of an optical path from each of the semiconductor laser arrays to the condenser lens,

a collimated light beam array derived from one of the semiconductor laser arrays that corresponds to the largest condenser
lens incident optical path length is directed to a predetermined light incident region in the light incident surface of the
condenser lens, the predetermined light incident region being other than the outermost light incident region in the light
incident row pattern,

the condenser lens incident optical path lengths of the respective semiconductor laser arrays are different from each other,
and

a collimated light beam array derived from one of the semiconductor laser arrays that corresponds to a larger condenser lens
incident optical path length is directed to a more center-sided light incident region in the light incident row pattern, as
compared with a collimated light beam array derived from one of the semiconductor laser arrays that corresponds to a smaller
condenser lens incident optical path length.

US Pat. No. 9,202,659

ARRANGEMENT AND METHOD FOR COOLING A PLASMA-BASED RADIATION SOURCE

USHIO Denki Kabushiki Kai...

1. An arrangement for cooling a plasma-based radiation source having a revolving element, the arrangement comprising:
a primary cooling circuit comprising a first vessel for holding a metal coolant in which the revolving element is at least
partially immersed;

means for circulating the metal coolant in the first vessel;
means for maintaining a temperature of the metal coolant to a predetermined operating temperature above a melting point of
the metal coolant;

a secondary cooling circuit comprising:
a cooling liquid that evaporates at the operating temperature of the metal coolant;
a second vessel enclosing at least one cooling section of the first vessel;
at least one atomizing arrangement for the cooling liquid to spray defined wall regions of the at least one cooling section
with the cooling liquid depending on a temperature determined for the metal coolant;

a cooling unit for sucking evaporated cooling liquid out of the second vessel, for condensing and for returning the cooling
liquid under pressure to the at least one atomizing arrangement; and

a control unit for controlling the means for maintaining the temperature of the metal coolant, the control unit being configured
for differentiated cooling by controlling the at least one atomizing arrangement depending on the predetermined temperature
of the metal coolant and for selectively heating the metal coolant by controlling a heater when the determined temperature
falls below a minimum operating temperature of the metal coolant.

US Pat. No. 9,253,865

METHOD OF CALIBRATING A DPP-GENERATED EUV LIGHT SOURCE

USHIO Denki Kabushiki Kai...

1. A method for controlling a discharge plasma-based radiation source, the method comprising:
a) determining a calibration function (HV(EP)) corresponding to values of an input quantity and values of an operating parameter of the discharge plasma-based radiation
source by applying different values of the input quantity to the radiation source so that a reference value (ERef, URef) selected from the values of the operating parameter is brought about during a pulse of the radiation source;

b) acquiring a value of a test quantity at each pulse of the radiation source, wherein any quantity influencing the emitted
radiation dose can be selected as the test quantity;

c) deriving a statistical value from a defined quantity of values of the test quantity;
d) determining a deviation between the statistical value and the reference value (ERef, URef);

e) stabilizing a radiation dose emitted by the radiation source in a pulsed manner by comparing the deviation with a predefined
tolerance range, and proceeding according to the result:

e1) returning to step b) if the predefined tolerance range has not been exceeded, or
e2) returning to step a) for determining a new calibration function (HV(EP)) if the predefined tolerance range has been exceeded.

US Pat. No. 9,230,747

DYE-SENSITIZED TYPE SOLAR CELL

USHIO DENKI KABUSHIKI KAI...

1. A dye-sensitized solar cell comprising:
a collective electrode having a light-transmitting function, which is formed on an inner face of a tube-shaped vessel formed
of a transparent glass,

a photoelectrode, which is provided inside the collective electrode, which is electrically connected to the collective electrode
and, which is a semiconductor layer having a dye adsorbed thereon, and

a counter electrode, which is apart from and inside the photoelectrode;
first and second sealed portions, which are made of glass and formed into a flat shape at both ends of the tube-shaped vessel,
respectively;

a first external lead connected to the photoelectrode and a second external lead connected to the counter electrode;
wherein the first external lead is electrically connected to the photoelectrode through a first metal foil embedded in the
first sealed portion and a first internal lead connected to the first metal foil and the photoelectrode, and the first external
lead is drawn out of the first sealed portion,

the second external lead is electrically connected to the counter electrode through a second metal foil embedded in the second
sealed portion and a second internal lead connected to the second metal foil and the counter electrode, and the second external
lead is drawn out of the second sealed portion,

an electrolytic solutiones filled in the tube-shaped vessel,
the counter electrode also serves as a positive polarized electrode,
the counter electrode, a negative polarized electrode arranged apart therefrom inside of the counter electrode,
a separator arranged between the counter electrode and the negative polarized electrode, and the electrolytic solution filled
therein, serve as an electric double layer capacitor

a third metal foil embedded in the first sealed portion made of glass and connected to a third internal lead connected to
the negative polarized electrode and a third external lead connected to the negative polarized electrode through the third
metal foil.

US Pat. No. 9,153,428

DOUBLE-CAPPED SHORT ARC FLASH LAMP

Ushio Denki Kabushiki Kai...

1. A double-capped short arc flash lamp comprising:
an arc tube made of glass, and having a first end and a second end opposite the first end;
a pair of first and second main electrodes disposed in the arc tube;
a pair of first and second auxiliary electrodes disposed in the arc tube, the pair of auxiliary electrodes being used to trigger
discharge;

a first inner lead and a first outer lead associated with the first auxiliary electrode;
a second inner lead and a second outer lead associated with the second auxiliary electrode;
a first sealing tube provided at the first end of the arc tube;
a second sealing tube provided at the second end of the arc tube;
a first core wire extending from the first main electrode in the first sealing tube, and protruding out of the first sealing
tube, the first core wire being sealed to the first sealing tube;

a sealing glass tube partly received in the second sealing tube, the sealing glass tube being fused and joined to the second
sealing tube, the sealing glass tube having an outer surface and an axial direction;

a second core wire extending from the second main electrode in the sealing glass tube, and protruding out of the sealing glass
tube, the second core wire being sealed to the sealing glass tube;

a first groove formed in the outer surface of the sealing glass tube in a region where the sealing glass tube overlaps the
second sealing tube, the first groove extending in the axial direction of the sealing glass tube, the first groove being configured
to receive the first inner lead and the first outer lead;

a second groove formed in the outer surface of the sealing glass tube in the region where the sealing glass tube overlaps
the second sealing tube, the second groove extending in the axial direction of the sealing glass tube, the second groove being
configured to receive the second inner lead and the second outer lead, the second groove being formed at a different location
than the first groove;

a first metallic foil configured to electrically connect the first inner lead with the first outer lead; and
a second metallic foil configured to electrically connect the second inner lead with the second outer lead.

US Pat. No. 9,070,526

LIGHT SOURCE DEVICE, LIGHT IRRADIATING APPARATUS EQUIPPED WITH LIGHT SOURCE DEVICE, AND METHOD OF PATTERNING SELF-ASSEMBLED MONOLAYER USING LIGHT IRRADIATING APPARATUS

USHIO DENKI KABUSHIKI KAI...

1. A light source device configured to emit light including vacuum ultraviolet light comprising:
a flash lamp including an arc tube made from a vacuum ultraviolet light permeable material, and a pair of electrodes disposed
in the arc tube and facing each other, a distance between the pair of electrodes being equal to or smaller than 12.5 mm, with
a filler gas containing xenon gas being enclosed in the arc tube and a pressure of the filler gas being between 2 atm and
8 atm; and

an electricity feeding unit configured to feed the flash lamp with electricity,
time for a current fed from the electricity feeding unit to the flash lamp during emission of the flash lamp to reach a peak
value from start of discharge being equal to or less than 8 ?s, and the peak value of the current being equal to or greater
than 1500 A.

US Pat. No. 9,354,375

GRID POLARIZING ELEMENT AND APPARATUS FOR EMITTING POLARIZED UV LIGHT

USHIO DENKI KABUSHIKI KAI...

1. A non-reflection type grid polarizing element for selectively transmitting a first type of polarized light and absorbing
a second type of polarized light among incident light through the grid polarizing element to polarize the incident light,
comprising:
a flat transparent substrate having a flat surface; and
a plurality of linear portions, arranged like a stripe, on the flat surface of the transparent substrate, each of the plurality
of linear portions having a dominant layer made from titanium nitride or titanium oxynitride, the plurality of linear portions
containing no simple metal layers, the plurality of linear portions being configured to absorb said second type of polarized
light.

US Pat. No. 9,232,621

APPARATUS AND METHOD FOR ENERGY BEAM POSITION ALIGNMENT

USHIO DENKI KABUSHIKI KAI...

1. An apparatus for energy beam position alignment, said apparatus being configured to be used with a light source device
having a first energy beam radiation unit for emitting a first energy beam and a second energy beam radiation unit for emitting
a second energy beam, said light source device being adapted to irradiate a material of extreme ultraviolet radiation with
the first energy beam and to direct the second energy beam to or in the vicinity of a first position on the material, which
is irradiated with the first energy beam, thereby exciting the material, producing plasma and extracting extreme ultraviolet
light from the plasma, said apparatus configured to align a second position on the material, which is irradiated with the
second energy beam, with the first position, said apparatus comprising:
an optical unit configured to allow the first energy beam emitted from the first energy beam radiation unit to pass therethrough,
and to reflect the second energy beam emitted from the second energy beam radiation unit and direct the second energy beam
in a same direction as a travelling direction of the first energy beam;

a movable mirror configured to reflect the second energy beam and guide the second energy beam toward the optical unit;
a beam detecting unit configured to detect an incident position of an incident energy beam thereon; and
a branching unit configured to be movable and receive the first energy beam which has passed the optical unit and the second
energy beam which is reflected by the optical unit, said branching unit being configured to branch a first part of the received
first energy beam, and guide said first part of the received first energy beams toward said first position, while passing
a second part of the received first energy beam and guiding the second part of the received first energy toward the beam detecting
unit, said branching unit being configured to branch a third part of the received second energy beam and guide said third
part of the received second energy beam toward said second position while passing a fourth part of the received second energy
beam and guiding the fourth part of the received second energy beam toward the beam detecting unit,

said movable mirror being configured to be able to adjust an incident position of the second energy beam on the optical unit
upon adjustment of a first angle of said movable mirror,

said branching unit being configured to be able to adjust the first position of the first energy beam on the material and
the second position of the second energy beam on the material upon adjustment of a second angle of said branching unit.

US Pat. No. 9,405,168

METHOD OF FABRICATING WAVELENGTH CONVERSION DEVICE

USHIO DENKI KABUSHIKI KAI...

1. A method of fabricating a wavelength conversion device, the device being fabricated from a crystal substrate and having
a structure that is periodically polarization-reversed in the direction perpendicular to a thickness direction of the crystal
substrate formed from a ferroelectric crystal demonstrating a non-linear optical effect, the method comprising:
heating the crystal substrate; and
removing electricity on a surface of the crystal substrate when temperature of the crystal substrate being changing due to
the heating, the method further comprising:

forming an insulating layer on at least one plane of the crystal substrate;
forming a pattern with line-and-space of the insulating layer; and
periodically applying voltage to the crystal substrate using the formed pattern with line-and-space of the insulating layer,
wherein

the heating is carried out after the forming the insulating layer, and before or after the forming the pattern.

US Pat. No. 9,362,104

SHORT ARC TYPE DISCHARGE LAMP

Ushio Denki Kabushiki Kai...

1. A short arc discharge lamp, comprising:
a body including therein a reflection surface and having a front opening;
a cathode and an anode that are opposed to each other in discharge space, the discharge space being defined by the reflection
surface surrounding the discharge space;

a window member provided in front of the body and covering the front opening; and
a window supporting member including an inner ring section, an outer ring section, a coupling section, and a front edge section,
the inner ring section being configured to allow a circumferential side surface of the window member to be fixed thereto,
the outer ring section being larger in diameter than the inner ring section, the coupling section connecting the inner ring
section and the outer ring section together, and the front edge section including a front edge straight section and a front
end bent section integrally connecting the inner ring section and the front edge straight section together,

wherein the window member comprises an outer window surface defining a reference plane extending radially about a longitudinal
axis extending through the anode and cathode,

wherein the front edge straight section is rectangularly-shaped as viewed in cross-section and has an outer front edge straight
section surface and an inner front edge straight section surface disposed opposite the outer front edge straight section surface
to define a thickness therebetween,

wherein the inner front edge straight section surface is disposed adjacent to yet apart from the reference plane at a distance
d such that the inner front edge section is in indirect contact with the window member only the circumferential side surface
of the window member and not at the outer window surface,

wherein the distance d is greater than zero.

US Pat. No. 9,209,007

SHORT ARC DISCHARGE LAMP

Ushio Denki Kabushiki Kai...

1. A short arc discharge lamp, comprising:
a body that includes a reflection surface and a front opening, the reflection surface is curved in a concave shape and includes
a first reflection surface section and a second reflection surface section, the first reflection surface section has a shape
along a first quadric surface of revolution, the second reflection surface section has a shape along a second quadric surface
of revolution;

a window member that covers the front opening,
a discharge space that is defined by the reflection surface and the window member that surrounds the discharge space and where
inert gas is sealed;

a cathode and an anode that are opposed to each other being directly surrounded by the discharge space: wherein
the first reflection surface section has a first focal point at a first position between the cathode and the anode; and
the second reflection surface section is continuous from the first reflection surface section and has a second focal point
at a second position displaced toward front from the first focal point.

US Pat. No. 9,168,570

CLEANING PROCESSING DEVICE FOR BIOLOGICAL IMPLANT

USHIO DENKI KABUSHIKI KAI...

1. A cleaning processing device for a biological implant intended to clean the biological implant by radiating ultraviolet
rays to a surface of the biological implant and also causing ozone to come into contact with the surface thereof, the device
comprising:
a housing, the housing including:
a processing chamber for cleaning the biological implant,
an ozone-removing chamber disposed above the processing chamber, the ozone-removing chamber for removing the ozone from the
processing chamber, and

a partition wall for partitioning the processing chamber from the ozone-removing chamber, the partition wall being made of
metal;

a plurality of ultraviolet-ray radiating lamps facing each other, with the biological implant positioned therebetween, disposed
in the processing chamber of the housing to radiate the ultraviolet rays to the biological implant;

an ozone-removing filter portion disposed in the ozone-removing chamber; and
a fan for introducing atmospheric gas present in the processing chamber into the ozone-removing filter portion, the fan being
driven in response to a completion of a cleaning process for the biological implant,

wherein heat caused by light from the ultraviolet-ray radiating lamps is transferred through the partition wall to the ozone-removing
filter portion.

US Pat. No. 9,166,360

LASER LIGHT SOURCE APPARATUS

USHIO DENKI KABUSHIKI KAI...

1. A laser light source apparatus, comprising:
a semiconductor laser;
a wavelength conversion element which carries out wavelength conversion of laser light emitted from the semiconductor laser;
a heater which heats the wavelength conversion element;
an electric power supply circuit which supplies electric power to the semiconductor laser;
a heater electric power supply circuit which supplies electric power to the heater;
a temperature control unit which detects the temperature of the wavelength conversion element, controls the amount of electric
power supply to the heater, and controls the temperature of the wavelength conversion element to turn into target temperature,
and

a control unit which controls the heater electric power supply circuit and the electric power supply circuit which supplies
electric power to the semiconductor laser,

wherein the control unit is provided with a high temperature hang-up suppressing unit which suppresses a high temperature
hang-up state where the temperature of the wavelength conversion element cannot be controlled even if the amount of electric
power supply to the heater is reduced in a temperature region higher than the temperature at which the conversion efficiency
of the wavelength conversion element turns into the maximum, by decreasing electric power supply to the semiconductor laser
by a predetermined amount, when the high temperature hang-up state occurs.

US Pat. No. 9,330,897

MERCURY-FREE DISCHARGE LAMP

USHIO DENKI KABUSHIKI KAI...

1. A mercury-free discharge lamp comprising:
a luminous tube;
a pair of electrodes in the luminous tube such that the pair of electrodes face each other in the luminous tube;
a pair of thermal insulation films formed on an outer surface of the luminous tube around the pair of electrodes, respectively;
zinc sealed in the luminous tube;
halogen sealed in the luminous tube;
a noble gas sealed in the luminous tube; and
a metal sealed in the luminous tube, the metal having a lower ionization energy than zinc, a ratio of a molar density of the
metal to a molar density of zinc being 0.001 to 0.05.

US Pat. No. 9,248,474

GENERATION DEVICE, GENERATION METHOD, ANTIBODY CHIP, COMPUTER PROGRAM AND NON-TRANSITORY COMPUTER-READABLE MEDIUM

Ushio Denki Kabushiki Kai...

1. A generation device for generating an antibody chip by binding antibody to a cup, comprising:
the cup;
a buffer solution holder holding a buffer solution;
an antibody solution holder holding an antibody solution having the antibody;
an infusion holder configured to hold an infusion comprising the buffer solution and the antibody solution, the infusion holder
being connected to the buffer solution holder and the antibody solution holder without exposure of the buffer solution and
the antibody solution to air;

a solution adjuster that adjusts solution in the cup, the solution adjuster being connected to the infusion holder without
exposure of the infusion to air;

control unit that controls the infusion holder and the solution adjuster; and
a bond solution holder holding a bond solution for binding the antibody and the cup, the bond solution holder being connected
to the infusion holder without exposure of the bond solution to air,

wherein the solution adjuster includes an injector comprising an inlet from which the buffer solution and the antibody solution
are injected into the cup, and an ejector comprising an outlet out of which the buffer solution is ejected from the cup;

the infusion holder contains the antibody solution, the buffer solution, and the bond solution; wherein the buffer solution
isolates the bond solution from the antibody solution; and

the injector injects the bond solution, the buffer solution, and the antibody solution held by the infusion holder through
the inlet and into the cup.

US Pat. No. 9,238,220

METHOD FOR FORMING TITANIUM OXIDE FILM ON SURFACE OF MOLDED PRODUCT COMPOSED OF CYCLIC OLEFIN RESIN

Ushio Denki Kabushiki Kai...

1. A method for forming a titanium oxide film on a surface of a molded product composed of a cyclic olefin resin, comprising:
preparing a molded product that contains a cyclic olefin resin;
irradiating a surface of the molded product with a light that includes ultraviolet light of a wavelength of 340 nm or less;
oxygenating the surface of the molded product;
immersing the molded product in a mixed liquid of an aqueous solution of titanium chloride and a nitrite ion-containing aqueous
solution after irradiating and oxygenating the surface of the molded product.

US Pat. No. 9,455,586

METHOD FOR CONTROLLING AN EUV SOURCE

USHIO Denki Kabushiki Kai...

12. A device for triggering a resonant charging circuit in a device for generating short-wavelength radiation based on a pulsed
discharge plasma, the device for comprising:
at least one charging switch for charging a charging capacitor (C) of the resonant charging circuit and at least one discharging
switch for discharging the charging capacitor (C) of the resonant charging circuit;

a first input unit for entering input values formed by user-defined parameter values and by at least one user-predefined second
switching time (t2);

a first simulation unit for simulating at least one switching time (t21, t22, t23) and desired discharge voltages (Uwanted);

a first regression unit for determining and providing calculation data based on results of simulation of the first simulating
unit;

a first measurement value unit for providing real-time measurement values of the resonant charging circuit;
a first evaluation unit for calculating the at least one user-predefined second switching time (t2) and a firing time (t3) based on the calculation data of the first regression unit and the real-time measurement values;

a control unit for triggering the discharging switch of the resonant charging circuit; and
a mathematical modeling unit for determining a maximum achievable discharge voltage (Umax calculated) and a second switching time (t21max calculated) based on at least one result of the first simulation unit given by one switching time (t21, t22, t23) and desired discharge voltages (Uwanted).

US Pat. No. 9,431,232

SHORT ARC DISCHARGE LAMP

Ushio Denki Kabushiki Kai...

1. A short arc discharge lamp comprising:
an arc tube configured to enclose a light emitting gas;
a cathode disposed in the arc tube; and
an anode disposed in the arc tube such that the anode and the cathode face each other in the arc tube,
the cathode comprising an electron emitting section made from tungsten to which thorium is added, and an electrode body section
made from tungsten to which thorium is not added,

the electrode body section being provided with a recess portion at a front end side of the electrode body section, and
the electron emitting section having a circular truncated conical shape, a rear end side of the electron emitting section
being received in the recess portion and a front end side of the electron emitting section protruding from the recess portion,
wherein

the electrode body section is provided with an annular flat surface portion at an opening surface of the recess portion, and
a step is formed by the annular flat surface portion and the electron emitting section;
wherein a percentage of a width of the annular flat surface portion to a diameter of a cylindrical lateral surface portion
of the electron emitting section is set to 16% or more.

US Pat. No. 9,730,304

DISCHARGE LAMP LIGHTING APPARATUS

Ushio Denki Kabushiki Kai...

1. A discharge lamp lighting apparatus for supplying alternating current to a discharge lamp having a pair of electrodes arranged
to be opposite to each other within a discharge vessel in which a predetermined gas is sealed, the discharge lamp lighting
apparatus comprising:
a pulse generation part that generates pulse; and
a power supply part that transforms supplied DC voltage to DC applied voltage, converts the DC applied voltage into the alternating
current corresponding to a frequency of the pulse, and supplies the alternating current to the discharge lamp, wherein

the pulse generation part is structured to alternately output a first pulse and a second pulse that has a lower frequency
than the first pulse, set a frequency of the second pulse to a predetermined reference frequency when a value of the applied
voltage coincides with a predetermined reference value, set the frequency of the second pulse to a lower frequency than the
reference frequency when the value of the applied voltage exceeds the reference value, and set the frequency of the second
pulse to a frequency that is equal to or lower than the reference frequency when the value of the applied voltage falls below
the reference value.

US Pat. No. 9,509,967

LIGHT SOURCE DEVICE AND PROJECTOR

Ushio Denki Kabushiki Kai...

1. A light source device emitting radiation luminous fluxes (F, F?, F?, . . . ) in a plurality of wavelength bands to the
outside, and the light source device comprising:
a deterioration controllable monochromatic light source module (Up), which has:
light emitting elements (Y1, Y2, . . . ) each emitting light in a specific wavelength band and emits radiation luminous fluxes (F) from the light emitting
elements to the outside, further having drive circuits (P1, P2, . . . ) driving the light emitting elements (Y1, Y2, . . . );

a light emission control circuit (Mp) controlling the drive circuits (P1, P2, . . . ); and

light intensity detection means (A) detecting a light intensity of the radiation luminous flux (F) to generate a light intensity
detection signal (Se) and transmitting the light intensity detection signal (Se) to the light emission control circuit (Mp);

wherein the light emission control circuit (Mp) being configured to, in order to calculate, with respect to an absolute upper
limit Im specified by an output current Ix of each of the drive circuits (P1, P2, . . . ),

calculate an substantial upper limit Iu, that is a limit value that can be output at that time point, with respect to each
of the drive circuits (P1, P2, . . . ),

determine an operation coefficient hx of each of the drive circuits (P1, P2, . . . ) to be multiplied with the absolute upper limit Im, based on a deterioration coefficient dx representing a degree
of deterioration of each of the light emitting elements (Y1, Y2, . . . ) at that time point,

perform feedback control of the output current Ix of each of the drive circuits (P1, P2, . . . ) in a range where the output current Ix does not exceed the substantial upper limit Iu so that the light intensity
detection signal (Se) matches a light intensity target signal (Sp) which is a target value thereof and is input from the outside,
and

output the light intensity detection signal (Se) to the outside;
one or more monochromatic light source modules (Up?, Up?, . . . ), which have one or more light emitting elements to emit
the radiation luminous fluxes (F, F?, F?, . . . ) to the outside, output light intensity detection signals (Se?, Se?, . .
. ), generated by detecting the light intensities of the radiation luminous fluxes (F?, F?, . . . ), to the outside;

wherein each monochromatic light source module
performs feedback control by a light emitting element drive circuit so that the light intensity detection signal (Se?, Se?,
. . . ) matches a light intensity target signals (Sp?, Sp?, . . . ) which is a target value thereof and

is input from the outside, and is different from the deterioration controllable monochromatic light source module (Up); and
an integrating control circuit (Mu) which inputs the light intensity detecting signals (Se, Se?, Se?, . . . ) and, at the
same time, generates the light intensity target signals (Sp, Sp?, Sp?, . . . ) to output the light intensity target signals
(Sp, Sp?, Sp?, . . . );

wherein the integrating control circuit (Mu)
calculates a monochromatic light intensity sum ? by a sum of the light intensity detection signals from the monochromatic
light source modules belonging to the same wavelength band, among the light intensity detection signals (Se, Se?, Se?, . .
. ) and

determines the light intensity target signals (Sp, Sp?, Sp?, . . . ) so that a ratio of the monochromatic light intensity
sum ? to the monochromatic light source modules in different wavelength bands is a predetermined ratio.

US Pat. No. 9,496,244

LIGHT EMITTING MODULE AND LIGHT IRRADIATING APPARATUS

Ushio Denki Kabushiki Kai...

1. A light emitting module, comprising:
a substrate;
at least one light emitting element line including a plurality of light emitting elements that are arrayed on the substrate
in a first direction; and

at least one sealing lens sealing the at least one light emitting element line, and including a plurality of lens sections,
the lens sections each including a spherical light emission surface having a convex shape, and being provided corresponding
to the respective light emitting elements and continuous in the first direction, the lens sections include a first lens section
and a second lens section that correspond to a first light emitting element and a second light emitting element adjacent to
the first light emitting element respectively, the second lens section is adjacent to the first lens section,

the lens sections each satisfy the following expressions (1) and (2):
0.5Dp
0.7?(2?R×?/360)?1.7  (2)

wherein Dp is a pitch width of the light emitting elements in the first direction, R is a curvature radius of the light emission
surface of any of the lens sections, and ? is an angle in degree (°), in a cross section perpendicular to the substrate taken
along the first direction, of a virtual straight line to a central axis of the first light emitting element, the virtual straight
line connecting a contact point and a central point, the contact point is located where a first light emission surface of
the first lens section is brought into contact with a second light emission surface of the second lens section, and the central
point being located on the central axis of the first light emitting element at a center of a light emission surface of the
first light emitting element, the central axis is perpendicular to the first direction.

US Pat. No. 9,488,849

COHERENT LIGHT SOURCE DEVICE AND PROJECTOR

Ushio Denki Kabushiki Kai...

1. A coherent light source apparatus comprising:
a coherent light source;
a first optical system configured to project light derived from a first light emission region-to form a second light emission
region, the first light emission region being formed on basis of the coherent light source;

a light deflection section configured to deflect a bundle of rays in vicinity of the second light emission region, the bundle
of rays being related to formation of the second light emission region;

a second optical system provided downstream of the light deflection section; and
a light mixing section provided downstream of the second optical system, and configured to mix components of angles and positions
of rays incident on an incident end of the light mixing means,

the second optical system being configured to form, in distance, an image conjugate to the first light emission region, and
form, at the incident end, a third light emission region substantially conjugate to an exit pupil of the first optical system,
and

the light deflection section being configured to continue to perform an operation that causes a direction in which the bundle
of rays is deflected to be continuously changed, and thereby causing the third light emission region to move continuously
at the incident end.

US Pat. No. 9,437,778

SEMICONDUCTOR LIGHT-EMITTING ELEMENT AND METHOD FOR PRODUCING THE SAME

USHIO DENKI KABUSHIKI KAI...

1. A semiconductor light-emitting element comprising:
a substrate;
a semiconductor layer that is provided over the substrate and comprises a p-type semiconductor layer, a light-emitting layer,
and an n-type semiconductor layer;

a first electrode that is provided in contact with part of an upper surface of the semiconductor layer and comprises a current
supply part connected to a current supply line;

a second electrode that is provided in part of a region vertically below a region where the current supply part is not provided,
that is in contact with part of a bottom surface of the semiconductor layer, and that is made of a material that reflects
light emitted from the light-emitting layer;

a first current blocking layer that is provided in a region including a region vertically below the current supply part and
that is in contact with part of the bottom surface of the semiconductor layer,

wherein a contact resistance at an interface between the first current blocking layer and the semiconductor layer is higher
than that at an interface between the second electrode and the semiconductor layer; and

a second current blocking layer that is provided in a region including a region vertically below a region where the first
electrode is provided, that is located in a position farther from the current supply part than a place, in which the first
current blocking layer is provided, in a direction parallel to a surface of the substrate, and that is in contact with part
of the bottom surface of the semiconductor layer,

wherein a contact resistance at an interface between the second current blocking layer and the semiconductor layer is higher
than that at an interface between the second electrode and the semiconductor layer and is lower than that at an interface
between the first current blocking layer and the semiconductor layer.

US Pat. No. 9,581,392

ARRANGEMENT FOR COOLING A PLASMA-BASED RADIATION SOURCE WITH A METAL COOLING LIQUID AND METHOD FOR STARTING UP A COOLING ARRANGEMENT OF THIS TYPE

USHIO Denki Kabushiki Kai...

1. An arrangement for cooling a plasma-based radiation source with a metal cooling liquid comprising:
a revolving element to be cooled;
an immersion bath comprising the metal cooling liquid in which the revolving element is at least partially immersed;
a cooling circuit coupled to the immersion bath and comprising a reservoir for receiving a minimum volume of the metal cooling
liquid;

means for maintaining the metal cooling liquid above a melting temperature, and at least one temperature sensor for monitoring
a temperature of the metal cooling liquid; and

a pump unit for circulating the metal cooling liquid in the cooling circuit from the reservoir to the immersion bath, the
pump unit being arranged in a pipe portion connected to the reservoir in a conveying direction of the cooling circuit, the
pump unit comprising at least one pump in the pipe portion for conveying the metal cooling liquid through an external electromagnetic
field of the at least one pump, and in that a control unit is provided for controlling the at least one pump, the control
unit operating the at least one pump at least temporarily in a pumping direction opposite to the conveying direction of the
cooling circuit for generating a heating effect in the metal cooling liquid located in the pipe portion against a flow resistance
of the metal cooling liquid in the pipe portion affected by the external electromagnetic field.

US Pat. No. 9,589,783

METHOD FOR IMPROVING THE WETTABILITY OF A ROTATING ELECTRODE IN A GAS DISCHARGE LAMP

FRAUNHOFER-GESELLSCHAFT Z...

1. Method for forming a rotating electrode used with a liquid medium in a gas discharge lamp that generates EUV radiation
or soft X-rays, in which the liquid medium is applied to an edge surface of the rotating electrode, comprising:
pre-processing an edge surface of the electrode to form external microstructures on said edge surface, wherein pre-processing
said external microstructure has structural dimensions in the edge surface or in the edge surface and in side faces of the
electrode, at least one of said dimensions being a width, a length or a depth less than 300 ?m, said microstructures improving
a wettability of the edge surface for the liquid medium.

US Pat. No. 9,494,296

METHOD OF MANUFACTURING LIGHT EMITTING ELEMENT OF FLUORESCENT LIGHT SOURCE FORMING HIGHLY PRECISE PHOTONIC STRUCTURE IN FLUORESCENCE EMITTING SURFACE OF LIGHT EMITTING ELEMENT

USHIO DENKI KABUSHIKI KAI...

1. A method of manufacturing a light emitting element of a fluorescent light source, the light emitting element having a fluorescent
substrate and a photonic structure on a surface of the fluorescent substrate or a surface of a functional material layer,
the functional material layer being formed on the fluorescent substrate, the fluorescent substrate containing a fluorescent
material that is excited by an excitation beam, the method comprising:
forming a photosensitive material layer on the surface of the fluorescent substrate or the surface of the functional material
layer;

dividing a single beam emitted from a coherent light source into at least two branch beams;
causing the at least two branch beams to cross each other at a predetermined interference angle thereby generating a first
interference beam that has a first longitudinal direction;

applying an exposure process to the photosensitive material layer with the first interference beam;
producing a second interference beam from the at least two branch beams such that the second interference beam has a second
longitudinal direction, which crosses the first longitudinal direction of the first interference beam at a first predetermined
angle, the second interference beam having the predetermined interference angle;

applying the exposure process to the photosensitive material layer with the second interference beam after said applying an
exposure process to the photosensitive material layer with the first interference beam;

removing those areas of the photosensitive material layer which are irradiated with the first and second interference beams
or removing those areas of the photosensitive material layer which are not irradiated with the first and second interference
beams, after the exposure process with the first and second interference beams, thereby forming a first fine pattern in the
photosensitive material layer; and

applying an etching process to the fluorescent substrate or the functional material layer with the first fine pattern of the
photosensitive material layer, thereby creating the photonic structure on the surface of the fluorescent substrate or the
surface of the functional material layer.

US Pat. No. 9,159,545

EXCIMER LAMP

USHIO DENKI KABUSHIKI KAI...

1. An excimer lamp comprising a light-emitting tube containing an excimer emission gas sealed therein, wherein
a pair of electrodes extending in a direction of a tube axis of the light-emitting tube are provided inside the light-emitting
tube,

a cylindrical tube being made of a dielectric material and disposed inside the light-emitting tube so as to extend in the
direction of the tube axis of the light-emitting tube, the cylindrical tube having an inner cylindrical surface defining an
inner cylindrical hermitic space therein and an outer cylindrical surface,

one of the pair of electrodes is surrounded by the inner cylindrical surface and disposed in the inner cylindrical hermetic
space,

the other one of the pair of electrodes is in contact with the excimer emission gas and is disposed to helically wrap around
the outer cylindrical surface of the cylindrical tube and extend outwardly therefrom to the light-emitting tube, and

the pair of electrodes are electrically connected to respective conductive foils hermetically embedded in end portions of
the light-emitting tube.

US Pat. No. 9,578,726

DISCHARGE LAMP LIGHTING APPARATUS AND PROJECTOR

Ushio Denki Kabushiki Kai...

1. A discharge lamp lighting apparatus for lighting a discharge lamp in which an electric discharge medium, which contains
xenon, is enclosed in an electric discharge container, and a cathode electrode and anode electrode for main discharge are
arranged to face each other, the discharge lamp lighting apparatus comprising:
a starter that generates a high voltage at start-up time to produce dielectric breakdown in the electric discharge container
of the discharge lamp, and

a power supply circuit that supplies discharge current to the discharge lamp,
wherein the power supply circuit comprises an output current modulation circuit that is controllable by a modulation signal
to modulate a magnitude of the discharge current by superimposing a rectangle pulsed current onto the discharge current, the
discharge current continuously passes through the discharge lamp in at least a lighting steady state,

wherein the output current modulation circuit is configured to control a speed at which a magnitude of the discharge current
per square millimeter in a cross section of the cathode electrode decreases by an amount not greater than 3.0 A per millisecond.

US Pat. No. 9,572,240

LIGHT SOURCE APPARATUS

USHIO DENKI KABUSHIKI KAI...

1. A light source apparatus, comprising:
a vessel;
a debris trap configured to trap at least a part of debris from a plasma, the plasma emitting light and being generated in
the vessel;

a light condenser mirror arranged at a light emitting side of the debris trap; and
a shielding member arranged between the plasma and the debris trap, the shielding member having an aperture configured to
limit a solid angle of the light such that an irradiation area of the light emitted from the plasma becomes smaller than an
aperture of the debris trap at a side of the plasma,

the debris trap being provided with a driving mechanism configured to drive the debris trap such that a part of the debris
trap to which the debris adheres is deviated from a position of the debris trap facing the aperture.

US Pat. No. 9,683,936

LIGHT-INDUCED FLUORESCENT MEASURING DEVICE

USHIO DENKI KABUSHIKI KAI...

1. A light-induced fluorescence measuring device comprising:
a solid light source;
a sample holding member configured to hold a sample;
a fluorescence measuring unit configured to detect fluorescence emitted from the sample held by the sample holding member;
a fluorescence collecting optical system configured to collect the fluorescence emitted from the sample and optically guide
the fluorescence to the fluorescence measuring unit;

a first resin material in which the sample holding member and the fluorescence collecting optical system are embedded; and
a second resin material configured to enclose the first resin material,
the sample holding member being permeable to light emitted from the solid light source and the fluorescence radiated from
the sample, the light emitted from the solid light source being excitation light,

the first resin material being permeable to the excitation light emitted from the solid light source and light including the
fluorescence radiated from the sample, at least part of an optical path of the fluorescence collecting optical system for
optically guiding the fluorescence being filled with the first resin material, and the first resin material forming a housing
for holding the sample holding member and the fluorescence collecting optical system,

said second resin material containing a pigment that has a wavelength characteristic to absorb the excitation light, intrinsic
fluorescence generated upon irradiating the sample holding member with the excitation light, and Raman light generated from
the first resin material when the excitation light proceeds in the first resin material, and

an amount of the pigment to be contained being set to a value that completely absorbs light, which is generated in a space
including the optical path for the excitation light and the light including the fluorescence radiated from the sample and
which proceeds out of the optical path.

US Pat. No. 9,592,762

VEHICLE DRIVING ASSISTANCE APPARATUS

Ushio Denki Kabushiki Kai...

1. A vehicle driving assistance apparatus installed in a vehicle and configured to display a predetermined light pattern on
a road surface around an own vehicle to enable a driver of the own vehicle, a driver of another vehicle, a pedestrian, and
an environmental condition detector to recognize the displayed light pattern, the vehicle driving assistance apparatus comprising:
a coherent light source;
a road surface projection optical system configured to scan a light source beam to output a projection beam, and thereby project
the light pattern on the road surface around the own vehicle, the light source beam being light emitted from the coherent
light source;

a road surface wet information retention section configured to retain information indicating whether the road surface around
the own vehicle is wet; and

a control circuit configured to control the coherent light source and the road surface projection optical system, the control
circuit being configured to stop the output of the projection beam during a period in which the road surface wet information
retention section retains information indicating that the road surface around the own vehicle is wet, the projection beam
entering the road surface around the own vehicle at a shallow angle, and projecting the light pattern toward a road surface
near a boundary of a traveling lane where the own vehicle is traveling.

US Pat. No. 9,755,126

LIGHT SOURCE UNIT

Ushio Denki Kabushiki Kai...

1. A light source unit comprising:
a substrate;
a plurality of parallel strip-like wirings on the substrate;
a plurality of LED elements disposed on each said strip-like wiring, said LED elements soldered on a first one of the strip-like
wirings being electrically connected to a second adjacent one of the strip-like wirings by wires respectively, said plurality
of LED elements being arranged zigzag on the substrate as a whole; and

a plurality of damming grooves formed in each said strip-like wiring, at least one said damming groove being provided between
each two adjacent said LED elements on each said strip-like wiring such that a non-effusion region, into which no solder flows,
is formed between said each two adjacent LED elements, said wires being connected to the non-effusion regions.

US Pat. No. 9,686,846

EXTREME UV RADIATION LIGHT SOURCE DEVICE

USHIO DENKI KABUSHIKI KAI...

1. An extreme ultraviolet light source device comprising:
a disc-like rotating element having two side surfaces and an outer circumferential surface between said two side surfaces,
each of the two side surfaces being flat;

a rotation unit configured to cause the rotating element to rotate about a rotation center shaft, which is perpendicular to
one of the two side surfaces of the rotating element;

a cover-like structure configured to surround the rotating element with a gap;
a first reserving vessel disposed in the cover-like structure and configured to reserve a liquid high temperature plasma raw
material, with part of the rotating element being immersed in the high temperature plasma raw material reserved in the first
reserving vessel;

a raw material supplying mechanism configured to apply the liquid high temperature plasma raw material onto at least part
of said one of the two side surfaces of the rotating element upon a rotating movement of the rotating element;

an energy beam providing device configured to irradiate the high temperature plasma raw material with an energy beam; and
a film thickness controlling mechanism provided in the cover-like structure, the film thickness controlling mechanism including
a U-shaped structure, the U-shaped structure having two opposite sides and one connecting portion spanning the two opposite
sides to define a U shape, each of the two opposite sides having a free end face, the U-shaped structure being biased by an
elastic body in a direction against said one of the two side surfaces of the rotating element such that said free end faces
of the two opposite sides of the U-shaped structure contact said one of the two side surfaces of the rotating element, a clearance
between the rotating element and said one connecting portion of the U-shaped structure, which faces the rotating element,
being set such that the liquid high temperature plasma raw material applied on the rotating element has a predetermined film
thickness,

the cover-like structure having an opening to expose a portion of said one of the two side surfaces of the rotating element
and a portion of the outer circumferential surface of the rotating element such that the energy beam is directed to said one
of the two side surfaces of the rotating element, on which the high temperature plasma raw material is applied, through the
opening of the cover-like structure, and extreme ultraviolet light generated upon irradiation of the energy beam is released
from the opening of the cover-like structure,

the cover-like structure having a scattering preventing member extending in said opening of the cover-like structure, the
scattering preventing member having a bending surface to oppose a direction of a centrifugal force acting on the rotating
element, which is caused to rotate by the rotation unit, in said opening of the cover-like structure, the cover-like structure
and the scattering preventing member being configured, in combination, to cover entirety of the outer circumferential surface
of the rotating element.

US Pat. No. 9,615,069

LIGHT SOURCE UNIT AND PROJECTOR

Ushio Denki Kabushiki Kai...

1. A light source unit comprising:
a plurality of elemental light sources each including one or more light emitting elements and one or more drive circuits,
and each configured to emit output luminous flux to outside, the one or more drive circuits being provided corresponding to
the respective light emitting elements and each being configured to drive corresponding light emitting element, the output
luminous flux being configured of radiated light from the one or more light emitting elements;

a control circuit configured to control the drive circuits; and
a plurality of color band light characteristic measurement sections each configured to receive light of a quantity correlated
with light intensity of the output luminous flux to generate color band light characteristic measurement data, wherein

a plurality of the light emitting elements in the plurality of elemental light sources include a plurality of light emitting
elements different in wavelength band of emission wavelength from one another,

the plurality of color band light characteristic measurement sections are provided corresponding to a plurality of the wavelength
bands,

one or more of the plurality of color band light characteristic measurement sections include a first light intensity measurement
section and a second light intensity measurement section, the first light intensity measurement section having first spectral
sensitivity characteristics in a corresponding wavelength band and generating first light intensity measurement data as the
color band light characteristic measurement data, and the second light intensity measurement section having second spectral
sensitivity characteristics different in rate of sensitivity varying against wavelength varying from the first spectral sensitivity
characteristics and generating second light intensity measurement data as the color band light characteristic measurement
data,

the control circuit generates light intensity indicating values correlated with light intensity and wavelength deviation indicating
values correlated with deviation from normal wavelength, with use of local color band spectral sensitivity information, based
on the first light intensity measurement data and the second light intensity measurement data, the local color band spectral
sensitivity information including sensitivity value at the normal wavelength and the rate of sensitivity varying against wavelength
varying for each of the first and second spectral sensitivity characteristics, and

the control circuit generates color phase indicating values correlated with color of integrated light of the output luminous
flux and performs first feedback control on the drive circuits to allow a difference between the color phase indicating values
and target values to be small, with use of the wavelength deviation indicating values and local color band color matching
function information, the local color band color matching function information including function values of a color matching
function at the normal wavelength and rate of the color matching function output varying against wavelength varying.

US Pat. No. 9,581,885

LIGHT SOURCE APPARATUS AND PROJECTOR

USHIO DENKI KABUSHIKI KAI...

1. A light source apparatus comprising:
a light emitting element aggregate including two or more solid light emitting elements, and
an electric supply circuit for supplying electric power to the light emitting element aggregate,
wherein the light emitting element aggregate has a beam flux conversion optical system for making an light emitting area of
each of all the solid light emitting elements conjugate to one geometrical-optical output image,

wherein all the solid light emitting elements are in series connected to each other thereby forming a light emitting element
series connection circuit, and are fixed to a heat sink (Hg) so as to be electrically insulated to each other,

wherein the electric supply circuit has a converter circuit for stepping down an output voltage of a DC power supply connected
to an upstream side of the electric supply circuit, the output voltage generated by the converter circuit is applied to the
light emitting element series connection circuit, the converter circuit includes at least one switch element and a circuit
on a input side thereof and a circuit on an output side thereof are not electrically insulated from each other,

wherein the electric supply circuit further includes an output current detecting unit-which detects output current of the
converter circuit flowing through the light emitting element series connection circuit, and generates an output current signal,
an electric supply control circuit for controlling the converter circuit, and an interface circuit for receiving a modulation
amount specifying signal from a host circuit,

wherein the electric supply control circuit is configured to control a ratio of ON time to a switching cycle of the switch
element in a feedback manner so that a difference between a current value which is indicated by the output current signal
and a current value which is indicated by a target current signal inputted from the interface circuit may become small,

wherein the interface circuit has a data insulation transmission unit for generating analog quantity, which is electrically
insulated from the modulation amount specifying signal, and the interface circuit generates the target current signal for
the analog quantity correlated to the amount of modulation specified by the modulation amount specifying signal, through the
data insulation transmission unit,

wherein the solid light emitting elements are configured so as to be covered with an external enclosure made up of a metal
casing portion and a light transmission window portion,

wherein the solid light emitting elements, the heat sink, and a fixing member are arranged so that the heat sink and the fixing
member sandwich the metal casing portion, through a first insulating member and a second insulating member, from a light emitting
side thereof and an opposite side thereto, and

wherein the fixing member has elasticity, and the solid light emitting elements are fixed to the heat sink by fixing the fixing
member to the heat sink.

US Pat. No. 9,863,878

PHOTOMETRIC ANALYSIS METHOD AND PHOTOMETRIC ANALYSIS DEVICE USING MICROCHIP, MICROCHIP FOR PHOTOMETRIC ANALYSIS DEVICE, AND PROCESSING DEVICE FOR PHOTOMETRIC ANALYSIS

USHIO DENKI KABUSHIKI KAI...

1. An optical analyzing device comprising:
a processing device that includes a display unit for displaying an image, and a built-in control unit for carrying out operation
and calculation and controlling the image to be displayed on the display unit; and

a microchip having a passage to which a liquid containing a specimen is introduced, a light inlet through which a radiation
light is introduced into the microchip, a hole for receiving a driving light, a light-driven liquid conveying unit driven
by the driving light for conveying the liquid in the passage, and a light outlet from which an emission light emitted by the
specimen exits, the passage having a light radiation position at which the liquid is irradiated by the radiation light,

the control unit of the processing device being configured to cause the display unit to emit the radiation light for introducing
the radiation light into the light inlet from the display unit and for irradiating the liquid at the light radiation position
in the passage with the radiation light to cause the specimen contained in the liquid to emit the emission light the control
unit being configured to cause the display unit to emit the driving light for introducing the driving light into the hole
for driving the light-driven liquid conveying unit to convey the liquid to the light radiation position.

US Pat. No. 9,606,420

METHOD OF FABRICATING WAVELENGTH CONVERSION DEVICE

USHIO DENKI KABUSHIKI KAI...

1. A method of fabricating a wavelength conversion device, the device being fabricated from a crystal substrate and formed
from a ferroelectric crystal demonstrating a non-linear optical effect, the method comprising:
heating the crystal substrate;
suppressing a polarization reversal on a surface of the crystal substrate in which natural polarization occurs when temperature
of the crystal substrate being changing due to the heating; and

forming a structure that is periodically polarization-reversed in the direction perpendicular to a thickness direction of
the crystal substrate on the surface of the crystal substrate, wherein

the suppressing the polarization reversal is carried out by collecting, on the surface of the crystal substrate, ions having
a polarity different from a polarity on a region of the surface of the crystal substrate in which natural polarization occurs,
the surface being to be periodically polarization-reserved.

US Pat. No. 9,692,204

SEMICONDUCTOR LASER ELEMENT AND METHOD OF MAKING SEMICONDUCTOR LASER DEVICE

USHIO DENKI KABUSHIKI KAI...

1. A semiconductor laser element comprising:
a semiconductor chip, the semiconductor chip including:
a substrate having four side faces, a top face and a bottom face, with two side faces of the four side faces being inclined
side surfaces which face each other in a first direction, and another two side faces being vertical side surfaces which face
each other in a second direction, the second direction being perpendicular to the first direction, each said vertical side
surface having a parallelogram shape;

a semiconductor layer formed on one of the top and bottom faces of the substrate, the semiconductor layer having a multi-layer
structure including at least an active layer;

a first electrode formed on the other of the top and bottom faces of the substrate;
a second electrode formed on the semiconductor layer, one of the first electrode and the second electrode being joined to
a sub-mount when the semiconductor laser element is assembled in a laser device; and

a current constriction part formed in the semiconductor layer, the current constriction part being configured to cause a current
to concentrate and flow to a particular area of the active layer, a location of the current constriction part in the first
direction being offset from a center of one of the top and bottom faces of the chip, on which one of the first and second
electrodes to be joined to the sub-mount is formed, toward a center of the other of the top and bottom faces of the chip,
when viewed in the first direction.

US Pat. No. 10,143,075

DEVICE FOR EMITTING EXTREME ULTRAVIOLET LIGHT

USHIO DENKI KABUSHIKI KAI...

1. A light source device for emitting extreme ultraviolet light from plasma, comprising:a pair of disc-shaped rotatable discharge electrodes spaced from each other, each said disc-shaped rotatable discharge electrode having opposite circular surfaces and a circumferential surface lying between the opposite circular surfaces;
a power supply unit configured to supply the pair of discharge electrodes with pulsed power;
a pair of containers associated with the pair of discharge electrodes, respectively, each said container being configured to contain a high-temperature plasma raw material therein, the raw material being a liquid raw material;
a pair of raw material supply units associated with the pair of containers, respectively, each said raw material supply unit being configured to supply the high-temperature plasma raw material from the associated container onto the associated discharge electrode by allowing a portion of the associated discharge electrode to pass through the high-temperature plasma raw material in the associated container upon rotations of the discharge electrode concerned;
an energy beam irradiating unit configured to irradiate the high-temperature plasma raw material on the circumferential surface of one of said pair of discharge electrodes with an energy beam to vaporize the high-temperature plasma raw material such that electric discharge takes place between said pair of discharge electrodes to generate the plasma; and
a pair of film thickness regulating units associated with the pair of discharge electrodes, respectively, each said film thickness regulating unit being configured to regulate a thickness of the high-temperature plasma raw material on the circumferential surface of the associated discharge electrode to a predetermined film thickness, each said film thickness regulating unit including:
a film thickness regulating member that faces the circumferential surface of the associated discharge electrode with a predetermined gap;
a biasing member operable to bias the film thickness regulating member toward the circumferential surface of the associated discharge electrode; and
a control member operable to limit a movement of the film thickness regulating member biased by the biasing member in a biasing direction of the biasing member such that a gap between the circumferential surface of the associated discharge electrode and the film thickness regulating member becomes equal to or greater than a value corresponding to the predetermined film thickness,
wherein the control member and the biasing member are disposed on opposite sides of the film thickness regulating member, respectively.

US Pat. No. 9,696,253

MICROCHIP AND FILM FORMING METHOD FOR METAL THIN FILM OF MICROCHIP

USHIO DENKI KABUSHIKI KAI...

1. A method of forming a metal thin film in a microchip including a substrate made of glass on which the metal thin film is
formed, and a channel formed in a space including the metal thin film, the method comprising:
irradiating a surface of the substrate with light including vacuum ultraviolet light with a wavelength equal to or less than
200 nm under an ambient atmosphere containing oxygen and moisture;

immersing the substrate in titanium ion solution and forming a titanium oxide film having a rutile type structure and an anatase
type structure being mixed on a vacuum ultraviolet light irradiated face of the substrate; and

depositing the metal thin film on the surface of the substrate on which the titanium oxide film is formed.

US Pat. No. 9,954,138

LIGHT EMITTING ELEMENT

USHIO DENKI KABUSHIKI KAI...

1. A light emitting element comprising:a first semiconductor layer formed of an n-type nitride semiconductor;
a second semiconductor layer formed on top of the first semiconductor layer, and formed of quaternary mixed crystals of Alx1Gay1Inz1N (0 a heterostructure formed on top of the second semiconductor layer, and constituted of a laminate structure of a third semiconductor layer formed of Inx2Ga1-x2N (0 a fifth semiconductor layer formed on top of the heterostructure and formed of a p-type nitride semiconductor, wherein
the peak emission wavelength is greater than or equal to 362 nm and less than or equal to 395 nm, and
the first semiconductor layer, the second semiconductor layer, the heterostructure, and the fifth semiconductor layer are laminated in the c-axis direction.

US Pat. No. 9,874,330

LIGHT PROJECTION DEVICE AND HEAD LAMP FOR VEHICLE

USHIO DENKI KABUSHIKI KAI...

1. A light projection device comprising:
a light emitting element;
a power feeding circuit configured to drive the light emitting element;
a first optical system that has a first light radiation region formed by light from the light emitting element, and that forms
a second light radiation region by projecting light from the first light radiation region;

a dynamic light deflection unit configured to deflect a light beam involved in forming the second light radiation region in
the vicinity of the second light radiation region;

a second optical system disposed downstream from the dynamic light deflection unit, and configured to, upon receiving a deflected
light beam obtained by deflecting the light beam by the dynamic light deflection unit, project the deflected light beam to
form a third light radiation region; and

a deflection pattern generation unit disposed downstream from the second optical system and configured to deflect and output
each ray of the light beam incident to the deflection pattern generation unit so as to convert the incident light beam to
an exit light beam,

the deflection pattern generation unit being configured such that, when the deflection pattern generation unit deflects and
outputs said each ray of the light beam incident on a light incident portion of the deflection pattern generation unit, a
direction of deflection to be imparted is dependent on a position at which said each ray is incident on the light incident
portion,

the second optical system being configured to form, at a far side, an image conjugate to the first light radiation region
and form the third light radiation region within a partial region of the light incident portion, and the dynamic light deflection
unit being configured to continue with an operation of continuously changing the direction in which the light beam is deflected,
thereby continuously moving the third light radiation region on the light incident portion.

US Pat. No. 9,939,727

METHOD FOR MANUFACTURING PATTERNED OBJECT, PATTERNED OBJECT, AND LIGHT IRRADIATION APPARATUS

USHIO DENKI KABUSHIKI KAI...

1. A method for manufacturing a patterned object, comprising:irradiating a pattern forming substrate with light containing vacuum ultra violet light in an atmosphere containing oxygen via a mask on which a prescribed pattern is formed; and
manufacturing a patterned object in which a pattern is formed including a modified portion and non-modified portion on a light irradiation surface of the pattern forming substrate,
the vacuum ultra violet light being light having a continuous spectrum in a range where a wavelength ranges from 180 nm to 200 nm, and
the vacuum ultra violet light has one or more peaks in the continuous spectrum,
wherein an illuminance of the vacuum ultra violet light in the range where the wavelength ranges from 180 nm to 200 nm is equal to or greater than an illuminance in a range where the wavelength ranges from 160 nm to 180 nm.

US Pat. No. 9,859,131

DESMEAR TREATMENT DEVICE AND DESMEAR TREATMENT METHOD

Ushio Denki Kabushiki Kai...

1. A desmear treatment device for removing smear in a wiring board material including an insulating layer and a conductive
layer layered on each other and being provided with a via hole or a through-hole, the desmear treatment device comprising:
an ultraviolet light source including a xenon excimer lamp for emitting vacuum ultraviolet rays with a center wavelength of
172 nm; a light irradiation chamber in which the ultraviolet light source is housed; a treatment chamber having a treatment
space where a to-be-treated object is disposed; an ultraviolet transmitting window member for separating an inner space of
the light irradiation chamber from the treatment space of the treatment chamber; a treatment stage having a supply port and
discharge port formed at positions spaced apart from each other between which the to-be-treated object is disposed; and treatment
gas supply means for supplying a treatment gas into the treatment space, wherein

the treatment gas supply means includes a humidifying mechanism for causing a treatment gas, having an oxygen concentration
of not lower than 50% by volume and containing active species to be activated by the vacuum ultraviolet rays from the ultraviolet
light source, to contain moisture and supplies, into the treatment space, the treatment gas humidified by the humidifying
mechanism to have an absolute humidity by volume within a range of 10 to 70 g/m3, and

the desmear treatment device further comprises a dew-point instrument for measuring a dew-point temperature of the gas discharged
from the treatment space; and a control mechanism for calculating the absolute humidity by volume of the treatment gas on
the basis of the dew-point temperature measured by the dew-point instrument to control an amount of moisture to be contained
in the treatment gas.

US Pat. No. 9,748,087

SHORT ARC FLASH LAMP AND LIGHT SOURCE DEVICE

USHIO DENKI KABUSHIKI KAI...

1. A short arc type flash lamp of a double end type, comprising:
a glass bulb including:
an arc tube part having a substantially spherical shape;
a first seal tube part extending outward along the tube axis direction to be continuous from one end of the arc tube part;
and a second seal tube part extending outward along the tube axis direction to be continuous from the other end of the arc
tube part, the first and second seal tube parts each having a straight tube shape and a smaller outer diameter than the arc
tube part,

a pair of main electrodes being arranged facing each other inside the arc tube part, and a pair of starting auxiliary electrodes
being arranged inside the arc tube part;

a gap being provided in an inner circumference of the second seal tube part; and
a reduced diameter portion being formed on an outer peripheral surface of the second seal tube part corresponding to the gap
in a circumferential direction,

an electrode shaft of one of the main electrodes being sealed in the first seal tube part and led out air-tightly from the
first seal tube part, and an electrode shaft of the other of the main electrodes and leads for the starting auxiliary electrodes
respectively being sealed in the second seal tube part and led out from the second seal tube part,

an external trigger being disposed in the reduced diameter portion by winding a wire in the circumferential direction on the
outer peripheral surface of the second seal tube part, and

the external trigger triggering preliminary discharge that occurs in the gap of the second seal tube part between the external
trigger disposed in the reduced diameter portion of the second seal tube part and the electrode shaft of the other of the
main electrode sealed in the second seal tube part, the preliminary discharge occurring prior to a main discharge occurring
in the arc tube part.

US Pat. No. 9,869,903

POLARIZED LIGHT IRRADIATING APPARATUS AND METHOD OF IRRADIATING POLARIZED LIGHT FOR PHOTO ALIGNMENT

USHIO DENKI KABUSHIKI KAI...

1. A polarized light irradiating method for photo alignment using a polarized light irradiating apparatus, the apparatus comprising:
an irradiating unit configured to irradiate a polarized light onto a substrate at an irradiation area; a first stage and a
second stage, the substrate is configured to be placed on the first stage or the second stage; and a stage movement mechanism
configured to cause the substrate on the first or second stage to be irradiated with the polarized light by moving the first
or second stage to the irradiation area; wherein
the first stage and second stage each comprises a substrate aligner configured to align the substrate to a predetermined orientation
with respect to an axis of the polarized light;

the stage movement mechanism is configured to move the first stage from a first position at one side of the irradiation area
to the irradiation area where the substrate on the first stage is irradiated with the polarized light, and to return the first
stage to the first position after passage through the irradiation area;

the stage movement mechanism is configured to move the second stage from a second position at the other side of the irradiation
area to the irradiation area where the substrate on the second stage is irradiated with the polarized light, and to return
the second stage to the second position after passage of the second stage through the irradiation area;

a space larger than a length by which the substrate on the second stage passes through the irradiated area is secured between
the first stage positioned at the first position and the irradiated area, and a space larger than a length by which the substrate
on the first stage passes through the irradiated area is secured between the second stage positioned at the second position
and the irradiated area; wherein

the method comprising:
a first mounting step of mounting a first substrate onto the first stage at the first position;
a second mounting step of mounting a second substrate onto the second stage at the second position;
a first movement step comprising:
moving the first stage with the first substrate from the first position to the irradiation area; and
returning the first stage to the first position from the irradiation area after passage of the first substrate through the
irradiating area;

a second movement step comprising:
moving the second stage with the second substrate from the second position to the irradiation area; and
returning the second stage to the second position from the irradiation area after passage of the second substrate through
the irradiating area;

a first collecting step of collecting the first substrate from the first stage at the first position;
a second collecting step of collecting the second substrate from the second stage at the second position; wherein
a time zone of the first collecting step and the first mounting step and a time zone of the second movement step overlap partially
or entirely; and

a time zone of the second collecting step and the second mounting step and a time zone of the first movement step overlap
partially or entirely.

US Pat. No. 9,756,711

DISCHARGE LAMP LIGHTING APPARATUS

Ushio Denki Kabushiki Kai...

1. A discharge lamp lighting apparatus, comprising:
a discharge lamp in which a pair of electrodes each having a protrusion at a tip end thereof are arranged to face each other
at an interval equal to or less than 2.0 mm in an arc tube, the arc tube enclosing mercury and halogen of 0.20 mg/mm3 or more; and

a power supply device configured to supply an alternating current to the discharge lamp,
the power supply device being configured to drive in a switchable manner between a regular lighting mode, in which the discharge
lamp is being lit with a basic frequency selected within a range of 60 Hz to 1,000 Hz, and a low electric power lighting mode,
in which the discharge lamp is being lit with an electric power value within a range of 25 to 80% with respect to a rated
power consumption of the discharge lamp, and

the power supply device being configured to control a power supply to the discharge lamp such that, in the low electric power
lighting mode, after a secondary protrusion forming process in which a secondary protrusion forming alternating current having
a frequency equal to or greater than the basic frequency in the regular lighting mode is supplied while lowering an electric
power of the lamp, the frequency being selected within a range of 200 to 2,000 Hz,

the low electric power lighting mode transitioning to a secondary protrusion maintaining process in which a secondary protrusion
maintaining high frequency current having a frequency higher than the basic frequency in the regular lighting mode, the frequency
being selected within a range of 100 Hz to 1,500 Hz, and a secondary protrusion maintaining low frequency current having a
frequency lower than the frequency of the secondary protrusion maintaining high frequency current is alternately supplied
as a secondary protrusion maintaining alternating current, wherein,

during the secondary protrusion forming process, a secondary protrusion forming alternating current is supplied in which a
boost current is superposed onto a regular lamp current with the selected frequency at a predetermined temporal interval,
wherein

a superposing ratio or a temporal interval of the boost current varies depending on any of a lamp electric power, a lamp voltage,
a lamp current, and combined parameter thereof, wherein,

when the superposing ratio of the boost current is varied, the superposing ratio is varied towards a target superposing ratio
in a stepwise manner.

US Pat. No. 9,720,301

LASER LIGHT SOURCE APPARATUS AND TEMPERATURE CONTROL METHOD OF WAVELENGTH CONVERSION ELEMENT IN LASER LIGHT SOURCE APPARATUS

USHIO DENKI KABUSHIKI KAI...

1. A laser light source apparatus comprising:
a semiconductor laser;
a lighting circuit, which lights the semiconductor laser;
a wavelength conversion element which carries out wavelength conversion of laser light emitted from the semiconductor laser;
a detection unit which detects the temperature of the wavelength conversion element;
a heating unit which heats the wavelength conversion element;
a control unit which controls the lighting circuit and the heating unit,wherein the control unit has a temperature control unit which controls the amount of electric supply to the heating unit based
on a difference between temperature detected by the detection unit and a setting temperature, and which performs control so
that the temperature of the wavelength conversion element turns into the setting temperature;
an optimal temperature setting unit which, without using an output from the wavelength conversion element, obtains an optimal
setting temperature at which the amount of electric power supplied to the heating unit turns into a local maximum, based on
the amount of electric power supplied to the heating unit at each setting temperature measured while changing the setting
temperature when the wavelength conversion element is irradiated with laser light,

wherein the control unit controls the lighting circuit and the heating unit so that the temperature of the wavelength conversion
element turns into the optimal setting temperature.

US Pat. No. 9,599,812

FOIL TRAP AND LIGHT SOURCE DEVICE USING SUCH FOIL TRAP

USHIO DENKI KABUSHIKI KAI...

1. A rotational type foil trap arranged adjacent to a plasma that emits light, for allowing the light to transmit but trapping
a debris from the plasma, comprising:
a rotation axis;
a rotary mechanism configured to rotate the rotation axis;
a plurality of foils radially extending from a main shaft, the plurality of foils being supported by a center support arranged
on the main shaft and configured to be capable of being rotated by the rotary mechanism coupled to the center support with
the center support being the rotation axis; and

a plurality of grooves on a side face of the center support, each of the grooves being filled with a brazing material,
one end of each of the foils being inserted into each of the grooves to be joined to the each of the grooves of the center
support,

the center support and each of the foils being fixed by brazing, and
the brazing material having a brazing temperature less than recrystallization temperature of a material of the center support
and the foils.

US Pat. No. 9,581,863

POLARIZED LIGHT IRRADIATING APPARATUS AND METHOD OF IRRADIATING POLARIZED LIGHT FOR PHOTO ALIGNMENT

Ushio Denki Kabushiki Kai...

1. A display manufacturing method, comprising:
moving a first substrate and a second substrate by a stage movement mechanism; and
implementing a first irradiation and a second irradiation of the first substrate by at least one irradiating unit and a first
irradiation and a second irradiation of the second substrate by the at least one irradiating unit when the stage movement
mechanism drives the first and second substrates to pass through the irradiating unit,

wherein when the first irradiations of the first and second substrates are implemented, the moving directions of the first
and second substrates are opposite, or when the second irradiations of the first and second substrates are implemented, the
moving directions of the first and second substrates are opposite.

US Pat. No. 10,061,197

LIGHT IRRADIATION DEVICE AND METHOD FOR PATTERNING SELF ASSEMBLED MONOLAYER

USHIO DENKI KABUSHIKI KAI...

1. A light irradiation device comprising:a mask arranged to be apart from a workpiece on which a self-assembled monolayer is formed, the mask having a prescribed pattern being formed on the mask;
a light source for irradiating the workpiece with light containing vacuum ultra violet light through the mask; and
a gas introduction unit having an inlet port and an outlet port for introducing gas containing oxygen between the mask and the workpiece so as to form a gas layer containing oxygen between the mask and the workpiece,
the light containing the vacuum ultra violet light being pulsed light and having a duty ratio of light emission equal to or greater than 0.00001 and equal to or less than 0.01.

US Pat. No. 10,031,407

LIGHT SOURCE UNIT AND PROJECTOR

USHIO DENKI KABUSHIKI KAI...

1. A light source unit comprising:a plurality of elemental light sources each including a light emitting element and a drive circuit, the light emitting element is configured to emit a light of a predetermined wavelength band, the drive circuit is configured to drive the light emitting element;
a control circuit configured to control the drive circuit; and
a luminous flux characteristic measurement section configured to receive an R-color output luminous flux, a G-color output luminous flux, and a B-color output luminous flux each of which is configured of radiated light from the light emitting element, the luminous flux characteristic measurement section is configured to measure the received output luminous fluxes and to generate luminous flux chromaticity-intensity correlation data correlated with light chromaticity coordinates and light intensity, wherein the R-color output luminous flux, the G-color output luminous flux and the B-color output luminous flux being radiated to outside through optical paths different from one another while being separated from one another,
wherein the G-color output luminous flux includes a main component light output from a G-color light emitting element,
the R-color output luminous flux is generated by mixing a main component light output from an R-color light emitting element and an additional light output from a first G-color light emitting element that is independent of the G-color light emitting element,
the B-color output luminous flux is generated by mixing a main component light output from a B-color light emitting element and an additional light output from a second G-color light emitting element that is independent of the G-color light emitting element,
the control circuit is configured to intermittently acquire the luminous flux chromaticity-intensity correlation data for each of the R-color output luminous flux, the G-color output luminous flux, and the B-color output luminous flux,
the control circuit is configured to generate a single-color color-phase indicating value correlated with at least one of color chromaticity coordinates of an output luminous flux generated by mixing with the additional light, based on the luminous flux chromaticity-intensity correlation data,
the control circuit is configured to determine a ratio of intensity of the additional light to intensity of the main component light to allow the single-color color phase indicating value to become equal to a target value of the single-color color phase indicating value, and generates an integrated color-phase indicating value, for an output luminous flux generated by mixing with the additional light, correlated with chromaticity coordinates of integrated light of the R-color output luminous flux, the G-color output luminous flux, and the B-color output luminous flux, based on the luminous flux chromaticity-intensity correlation data, and
the control circuit is configured to perform feedback control on the drive circuits for each of the R-color output luminous flux, the G-color output luminous flux, and the B-color output luminous flux to allow a difference between the integrated color-phase indicating value and a target value of the integrated color-phase indicating value to be small.

US Pat. No. 9,989,237

LIGHT SOURCE DEVICE

USHIO DENKI KABUSHIKI KAI...

1. A light source device comprising:a light emitting element adapted to emit exciting light;
a fluorescent element having a phosphor and adapted to convert at least a portion of the exciting light emitted from the light emitting element into fluorescence and to reflect the fluorescence; and
a common cooling member adapted to cool the light emitting element and the fluorescent element, wherein
the cooling member includes a first cooling surface coupled to the light emitting element for cooling the light emitting element, and a second cooling surface coupled to the fluorescent element for cooling the fluorescent element,
the first cooling surface and the second cooling surface are placed in parallel with each other and are placed in such a way as to be oriented in the same direction,
the light source device comprises:
at least one condenser lens adapted to condense reflected light having been reflected by the fluorescent element, such that the reflected light is incident on a first surface, and the reflected light is emitted from a second surface; and
a lens holding member which is adapted to hold the condenser lens and is coupled to the second cooling surface for cooling the condenser lens,
the condenser lens is adapted to condense the exciting light emitted from the light emitting element, such that the exciting light is incident on the second surface, and the exciting light is emitted from the first surface toward the fluorescent element, and
the lens holding member encloses the fluorescent element, in cooperation with the condenser lens and the second cooling surface.

US Pat. No. 9,921,350

GRID POLARIZATION ELEMENT, AND OPTICAL ALIGNMENT DEVICE

USHIO DENKI KABUSHIKI KAI...

1. An absorption-type grid polarization element comprising a transparent substrate and a stripe-like grid disposed on the
transparent substrate, the grid including a plurality of linear parts made from materials that absorb light, each said linear
part being configured to absorb first polarized light among incident light, which has a polarization axis directed in a particular
direction, more than second polarized light, which has a polarization axis directed in a direction other than said particular
direction, to achieve polarization,
each said linear part having a first layer, which is made from a first material having its absorption peak at a first wavelength,
and a second layer, which is made from a second material having its absorption peak at a second wavelength, the second wavelength
being different from the first wavelength,

the transparent substrate being made from silica glass,
the second layer being a layer formed on the transparent substrate, and the second material being an amorphous silicon,
the first layer being a layer formed on the second layer, and the first material being an amorphous titanium oxide, and
an extinction ratio obtained by a combination of the first layer and the second layer being equal to or greater than 1×102 in a wavelength region between 250 nm, inclusive, and 390 nm, inclusive.

US Pat. No. 9,818,907

LED ELEMENT

Ushio Denki Kabushiki Kai...

1. An LED element, comprising:
a first semiconductor layer constituted of an n-type nitride semiconductor;
a current-diffusion layer formed on the first semiconductor layer;
an active layer formed on the current-diffusion layer and constituted of a nitride semiconductor; and
a second semiconductor layer formed on the active layer and constituted of a p-type nitride semiconductor, wherein
the current-diffusion layer has a hetero-structure having a third semiconductor layer constituted of InxGa1-xN (0 less.

US Pat. No. 9,749,603

PROJECTOR LIGHT SOURCE UNIT HAVING INTENSITY CONTROLLER

USHIO DENKI KABUSHIKI KAI...

1. A light source unit comprising:
a plurality of elemental light sources each including one or more light emitting elements, one or more drive circuits, a focusing
optical system, and an optical fiber, the light source unit being configured to integrate radiated light from exit ends of
the respective optical fibers and to output one output luminous flux, the one or more drive circuits being provided corresponding
to the respective light emitting elements and being configured to selectively operate in a driving state that allows a specified
current to flow through the corresponding light emitting element or in a non-driving state that allows the current not to
flow through the corresponding light emitting element, the focusing optical system being configured to focus lights emitted
from the one or more light emitting elements, and the optical fiber being configured to receive a light focused by the focusing
optical system at an incident end of the optical fiber, and the optical fiber being configured to guide the light and radiate
the light from the exit end;

an optical sensor configured to be irradiated with at least a part of the output luminous flux;
a light quantity measurement circuit configured to generate a light quantity measurement data correlated with a light quantity
of the output luminous flux, based on a quantity of incident light to the optical sensor; and

a control circuit configured to control the drive circuits based on the light quantity measurement data, to perform a sequence
that sequentially acquires the light quantity measurement data by sequentially selecting one of the plurality of elemental
light sources, putting at least one of the one or more drive circuits included in the selected elemental light source into
a first state, and putting the plurality of drive circuits other than the at least one drive circuits into a second state,
and to detect abnormality based on a measurement data set formed of a plurality of pieces of the acquired light quantity measurement
data,

wherein the first state being one of the driving state and the non-driving state, and the second state being the other of
the driving state and the non-driving state,

wherein
the plurality of light emitting elements being configured to emit lights different in wavelength band from one another,
the optical sensor includes a plurality of optical sensors provided corresponding to the wavelength bands,
each of the optical sensors includes a spectral filter that allows light of the corresponding wavelength band to selectively
pass through the spectral filter,

the light quantity measurement data includes a plurality of pieces of light quantity measurement data correlated with light
quantity of each of the wavelength bands in the output luminous flux, and

the control circuit being configured to acquire at least light quantity measurement data corresponding to a light emission
wavelength band of the light emitting element supplied with the specified current, out of the plurality of pieces of light
quantity measurement data.

US Pat. No. 10,139,055

FLUORESCENCE LIGHT SOURCE DEVICE WITH PERIODIC STRUCTURE HAVING AN ASPECT RATIO OF 0.5 TO 0.9 AND METHOD FOR PRODUCING THE SAME

Ushio Denki Kabushiki Kai...

1. A fluorescence light source device comprising a fluorescence member that is formed from a phosphor composed of single crystal or polycrystal and excited by excitation light, whereinthe fluorescence member has a surface provided with a periodic structure layer made of a high refractive index material having a refractive index of not less than a refractive index of the fluorescence member, the periodic structure layer has a surface with a periodic structure having a periodic array of conical or truncated projections and formed by an etching process, and the periodic structure has an aspect ratio, which is a ratio of a height of the projections to a pitch, within a range of 0.5 to 0.9,
the projections that constitute the periodic structure in the periodic structure layer are formed on a thin film part that covers the surface of the fluorescence member, with the thickness of the thin film part being not more than 0.4 ?m,
the fluorescence member has a back surface, opposite side of the surface with the periodic structure layer, the back surface provided with a light reflection film, and
the surface roughness Ra of the back surface is not more than 100 nm.

US Pat. No. 9,977,043

METHOD OF SUPPLYING REAGENT TO MICROCHIP, MICROCHIP, AND DEVICE FOR SUPPLYING REAGENT TO MICROCHIP

USHIO DENKI KABUSHIKI KAI...

1. A system comprising a microchip and a reagent supplying apparatus for supplying a reagent to the microchip,the microchip comprising:
a channel, which is a space having a reagent placement area therein;
an inlet and an outlet which serve as openings of the channel; and
a self-repairing sealing member that airtightly closes the inlet and the outlet of the channel;
the reagent supplying apparatus comprising:
a fluid releasing unit that releases the reagent to the channel of the microchip and a fluid recovering unit that recovers the reagent released from the fluid releasing unit from the channel of the microchip; and
a fluid releasing unit drive mechanism and a fluid recovering unit drive mechanism that independently move the fluid releasing unit and the fluid recovering unit up and down relatively with respect to each other to cause the fluid releasing unit and the fluid recovering unit to penetrate the self-repairing sealing member and to be removed from the channel of the microchip, respectively,
each of the fluid releasing unit and the fluid recovering unit including a hollow cylindrical member, a free end of each said hollow cylindrical member being closed, the free end of each said hollow cylindrical member being shaped like a needle, and an opening formed in a cylindrical side wall of each said hollow cylindrical member to communicate with an inner hollow of each said hollow cylindrical member,
each of the fluid releasing unit drive mechanism and the fluid recovering unit drive mechanism relatively positions the fluid releasing unit and the fluid recovering unit, respectively, such that a position of a lower end of the opening of the fluid recovering unit is situated above a position of an upper end of the opening of the fluid releasing unit in the channel of the microchip during the reagent being supplied, and
each of the fluid releasing unit and the fluid recovering unit is engaged within the channel of the microchip at different depths of the channel,
wherein the opening of the fluid releasing unit faces the opening of the fluid recovering unit.

US Pat. No. 9,842,967

NITRIDE SEMICONDUCTOR LIGHT EMITTING ELEMENT

USHIO DENKI KABUSHIKI KAI...

1. A nitride semiconductor light emitting element having a light emitting layer between an n-type nitride semiconductor layer
and a p-type nitride semiconductor layer, wherein
the n-type nitride semiconductor layer contains AlnGa1?nN (0 semiconductor layer is less than or equal to 1×1017/cm3; and

an intensity rate of an emission intensity of a yellow visible light wavelength to an emission intensity of the major emission
wavelength is less than or equal to 0.1%.

US Pat. No. 9,766,503

POLARIZED LIGHT IRRADIATING APPARATUS AND METHOD OF IRRADIATING POLARIZED LIGHT FOR PHOTO ALIGNMENT

USHIO DENKI KABUSHIKI KAI...

1. A polarized light irradiating method for photo alignment using a polarized light irradiating apparatus, the apparatus comprising:
an irradiating unit configured to irradiate polarized light onto a substrate at an irradiation area;
a first stage and a second stage, the substrate is configured to be placed on the first stage or the second stage; and
a stage movement mechanism configured to cause the substrate on the first or second stage to be irradiated with the polarized
light by moving the first or second stage to the irradiation area; wherein

the stage movement mechanism is configured to move the first stage from a first position at one side of the irradiation area
to the irradiation area and to move the second stage from a second position at the other side of the irradiation area to the
irradiation area; and

the stage movement mechanism is configured to return the first stage to the first position after passage through the irradiation
area and to return the second stage to the second position after passage of the second stage through the irradiation area;
wherein

the method comprising:
a first movement step and a second movement step;
the first movement step comprising:
a step (a) of moving the first stage from the first position to the irradiation area; and
a step (b) of returning the first stage to the first position from the irradiation area;
the second movement step comprising:
a step (c) of moving the second stage from the second position to the irradiation area, the step (c) follows after beginning
of the step (b); and

a step (d) of returning the second stage to the second position from the irradiation area;
wherein the step (a) follows after beginning of the step (d).

US Pat. No. 9,692,206

EXTERNAL RESONATOR TYPE LASER DEVICE

USHIO DENKI KABUSHIKI KAI...

1. An external resonator type laser device comprising:
an optical element that forms an external resonator with a semiconductor device by selecting and reflecting light of a specific
wavelength range from light outputted from the semiconductor device;

a supporting member formed of a material having a larger coefficient of linear expansion than that of the optical element;
and

a first mount interposed between the optical element and the supporting member, formed of a material having a coefficient
of linear expansion closer to that of the optical element compared with that of the supporting member, wherein

the optical element is adhered to the first mount, and
the first mount is adhered to the supporting member by an adhesive having a Shore hardness of less than or equal to 65.

US Pat. No. 9,616,469

LIGHT PROJECTION DEVICE

USHIO DENKI KABUSHIKI KAI...

1. A light irradiation device comprising:
a workpiece support configured to support a workpiece thereon;
an ultraviolet lamp configured to irradiate a target surface of the workpiece with a vacuum ultraviolet beam;
a light transmitting window member disposed between the workpiece and the ultraviolet lamp, and configured to transmit the
vacuum ultraviolet beam, which is emitted from the ultraviolet lamp, therethrough, with a gap defined between the target surface
of the workpiece and the light transmitting window member being equal to or smaller than 1 mm;

a gas feeding unit configured to feed a processing gas into the gap in one direction along the target surface; and
a gas shielding member disposed on the workpiece support in a region in which the workpiece is not present, the gas shielding
member extending in a feeding direction of the processing gas and being arranged such that a side face of the gas shielding
member in a longitudinal direction contacts a side face of the workpiece supported by the workpiece support with respect to
the feeding direction of the processing gas, and

a height of the gas shielding member being equal to a distance between the workpiece support and the light transmitting window
member.

US Pat. No. 9,728,394

EXCIMER DISCHARGE LAMP

USHIO DENKI KABUSHIKI KAI...

1. An excimer discharge lamp, comprising:
an arc tube for enclosing a luminous gas inside and having a sealing portion formed contiguous to, via a reduced diameter
portion, one end of a tube shaped luminous portion; and

an outer electrode of a net shape arranged on an outer peripheral surface of the arc tube, and
one end of the outer electrode being fixed via an outer electrode fixing member provided on an outer surface of the sealing
portion.

US Pat. No. 9,633,829

DISCHARGE LAMP

USHIO DENKI KABUSHIKI KAI...

1. A discharge lamp comprising a cathode and an anode facing each other in a luminous tube,
the cathode including a main body part and a front end part joined to a front end of the main body part,
the main body part and the front end part being made from a high melting point metal material not including thorium,
a first emitter being contained in the front end part,
a sintered compact material being buried in a hermetically sealed space formed in at least one of the main body part and the
front end part, the sintered compact material containing a second emitter (excluding thorium) at a concentration higher than
that of the first emitter contained in the front end part, and

a front end of the sintered compact material being brought into contact with the front end part.

US Pat. No. 9,557,042

LED ILLUMINATION SYSTEM HAVING A PLURALITY OF ALTERABLE LIGHT SOURCE ELEMENTS

USHIO DENKI KABUSHIKI KAI...

1. An illumination system comprising:
an LED circuit assembly having an illumination base, said illumination base including:
a pair of common lines; and
a plurality of branching lines extending between the pair of common lines respectively, the plurality of branching lines being
parallel to each other, each of the plurality of branching lines being formed by a same number of sockets connected in series,
said plurality of sockets being divided into a first group of sockets and a second group of sockets;

a plurality of light source elements, each said light source element having a first plug portion to be received in one of
said sockets in said first group and also having an LED lamp a part of the LED circuit assembly; the first plug portion is
received in said one of said sockets in said first group; and

a plurality of resistor elements, each said resistor element having a second plug portion to be received in one of said sockets
in said second group and also having a resistor a part of the LED circuit assembly; the second plug portion is received in
said one of said sockets in said second group.

US Pat. No. 9,798,059

GRID POLARIZING ELEMENT

USHIO DENKI KABUSHIKI KAI...

1. A grid polarizing element that is capable of polarizing ultraviolet light, comprising:
a transparent substrate;
a grid layer provided on the transparent substrate; and
a gas blocking layer that covers the grid layer,
the grid layer having a plurality of linear portions and shaped like a stripe,
each of the linear portions being made from a material that can be deteriorated when the material is in contact with an oxidization
gas which is generated by ultraviolet light,

the gas blocking layer being configured to block the oxidization gas, the gas blocking layer closing spacing between the linear
portions,

the gas blocking layer being transparent at a wavelength of light to be polarized, and the gas blocking layer including a
plurality of first layers formed on said plurality of linear portions, respectively, such that one first layer is formed on
one linear portion, and a second layer formed on the plurality of first layers, the second layer having a denser structure
than each said first layer, the second layer being made from a same material as each said first layer, each said first layer
having a first refractive index, said second layer having a second refractive index, the second refractive index being greater
than the first refractive index.

US Pat. No. 10,047,919

FLUORESCENT LIGHT SOURCE DEVICE, AND METHOD FOR MANUFACTURING SAME

USHIO DENKI KABUSHIKI KAI...

1. A fluorescent light source device comprising:a wavelength conversion member formed of a phosphor, the phosphor being excited by excitation light;
the wavelength conversion member including:
a fluorescent member containing the phosphor; and
a photonic structure part formed on the fluorescent member, the photonic structure part having a surface that serves as a fluorescent light emitting surface of the wavelength conversion member, and the photonic structure part having an inorganic compound layer, and the inorganic compound layer having a columnar structure that extends in a direction away from the fluorescent member, the photonic structure part having a sole refractive index.

US Pat. No. 9,983,480

METHOD OF MANUFACTURING A STRUCTURE ON A SUBSTRATE

USHIO DENKI KABUSHIKI KAI...

1. A method comprising:dividing a single beam emitted from a coherent light source into at least two branch beams;
causing the at least two branch beams to cross each other at a predetermined interference angle thereby generating an interference pattern;
selecting a plurality of exposure areas based on a target exposure area of a substrate such that when said plurality of exposure areas overlap each other in a predetermined stepwise manner, said plurality of exposure areas become the target exposure area;
placing a light blocking member, which has a light transmitting portion having a predetermined shape, above the substrate with a predetermined gap;
irradiating the first of said plurality of exposure areas with the interference pattern such that the first of said plurality of exposure areas is irradiated with the interference pattern which passes through the light transmitting portion of the light blocking member to form a fine pattern and such that neighboring areas of the first of said plurality of exposure areas in a first direction are irradiated with only one of the at least two branch beams, the first direction being a direction perpendicular to an extending direction of interference fringes in each said exposure area;
conveying the substrate in a stepwise manner such that the second and subsequent of said plurality of exposure areas overlap each other in the predetermined stepwise manner upon repeating said irradiating;
causing a line-to-line pitch of the interference fringes in one of said plurality of exposure areas to align with the line-to-line pitch of the interference fringes in a next one of said plurality of exposure areas upon repeating said irradiating and said conveying;
determining how many times said irradiating and said conveying are repeated in order to achieve that variations in a line width of a fine pattern, which is formed on the substrate by the interference fringes upon repeating said irradiating and said conveying, become equal to or smaller than an allowable value; and
repeating said irradiating and said conveying said determined times such that said plurality of exposure areas overlap each other in the predetermined stepwise manner in the first direction, and the line-to-line pitch of the interference fringes in one exposure area aligns with the line-to-line pitches of the interference fringes in subsequent exposure areas,
wherein the repeating the irradiating and the conveying the determined times is carried out such that a plurality of irradiance distributions are produced, and
wherein each of the plurality of irradiance distributions has a Gaussian distribution.

US Pat. No. 9,909,722

FLUORESCENCE-EMITTING LIGHT SOURCE UNIT

USHIO DENKI KABUSHIKI KAI...

1. A fluorescence-emitting light source unit, comprising:
a wavelength conversion member including a light receiving surface and a phosphor, the light receiving surface being configured
to receive excitation light, and the phosphor being configured to convert the excitation light received by the light receiving
surface into fluorescence and emit the fluorescence so that the light receiving surface serves as a fluorescence emitting
surface; wherein

the wavelength conversion member comprises a back surface opposite to the light receiving surface, a light reflection film
is provided on the back surface;

the light receiving surface includes a cyclic structure, the cyclic structure having projections, the projections being cyclically
arrayed, each of the projections having a substantially cone shape;

an aspect ratio is about 0.2 or greater and is about 0.8 or smaller, the aspect ratio being a ratio of a height of any of
the projections to a pitch of the array of the projections;

the height is about 500 nm or less; and
the pitch of the array is of a size that falls within a range in which diffraction of the fluorescence emitted from the phosphor
occurs.

US Pat. No. 9,994,045

LIGHT IRRADIATION APPARATUS INCLUDING A LIGHT SHIELD

Ushio Denki Kabushiki Kai...

1. A light irradiation apparatus comprising, with three mutually orthogonal directions as an x direction, a y direction and a z direction:a long light source unit in which a plurality of light emitting elements are disposed in a state of being arranged in the x direction along a plane extending in the x direction and the y direction; and
a cylindrical lens that has an elongated shape extending in the x direction along the light source unit, a longitudinal peripheral surface of the cylindrical lens including a light reception surface for receiving light from the light source unit and a light-exiting surface for allowing the received light to exit therethrough, wherein
the light source unit is disposed so that a light source reference plane extending in the z direction through a center of a light emission surface of each of the light emitting elements is positioned a spaced distance in the y direction from a lens reference plane extending in the x direction and extending in the z direction through a center axis of the cylindrical lens, the light source reference plane oriented to being parallel to the lens reference plane, and
a direction of light from the light-exiting surface of the cylindrical lens that travels directly from the light reception surface to the light-exiting surface of the cylindrical lens is tilted in a direction away from the light source reference plane that is also a direction opposite to a direction from the lens reference plane to the light source reference plane.

US Pat. No. 10,021,359

DISCHARGE LAMP LIGHTING DEVICE, LIGHT SOURCE DEVICE, AND IMAGE FORMATION DEVICE

USHIO DENKI KABUSHIKI KAI...

1. A discharge lamp lighting device for supplying alternating current to a discharge lamp having a pair of electrodes arranged to be opposite to each other within a discharge vessel in which a predetermined gas is sealed, the discharge lamp lighting device comprising:a power supply control part to which a video synchronized signal is input from an external portion; and
a power supply part which converts supplied DC voltage into the alternating current based on a control signal output from the power supply control part, and supplies the alternating current to the discharge lamp, wherein
the power supply control part includes:
a segment signal generation part which generates a segment signal indicating a plurality of segment periods obtained by dividing a specific period indicated by the video synchronized signal;
a peak value control part which generates a first control signal in correspondence to a peak value of the alternating current for every segment period, and outputs the first control signal to the power supply part; and
a frequency control part which generates a second control signal indicating a timing for reversing a polarity of the alternating current based on the segment signal, and outputs the second control signal to the power supply part,
the specific period has the plurality of segment periods indicating different values of integral corresponding to a product of a length of the segment period and the peak value set in the segment period, and
the peak value control part sets a specific segment period, which indicates the value of integral is most deviated from an average value of values of integral within the specific period, to another segment period than a final segment period positioned at a final end of the specific period, among the plurality of segment periods belonging to the specific period.

US Pat. No. 9,989,215

FLUORESCENCE LIGHT SOURCE APPARATUS

Ushio Denki Kabushiki Kai...

1. A fluorescence light source apparatus comprising: a fluorescent plate that emits fluorescence under excitation light and has a front surface serving as an excitation light incident surface; a reflection layer that is disposed on a back surface side of the fluorescent plate; and a heat dissipation substrate, whereina sealing layer covering a back surface and a peripheral side surface of the reflection layer is provided in close contact with a peripheral area of the back surface of the fluorescent plate via an adhesion layer, and
a diffusion prevention layer formed by nickel plating is provided on the heat dissipation substrate via a bonding member layer.

US Pat. No. 10,138,162

METHOD AND DEVICE FOR BONDING WORKPIECES EACH PRODUCED FROM GLASS SUBSTRATE OR QUARTZ SUBSTRATE

USHIO DENKI KABUSHIKI KAI...

1. A workpiece bonding method for bonding an optically polished surface of a first workpiece and an optically polished surface of a second workpiece to each other, the first and second workpieces being a glass substrate and another glass substrate, a glass substrate and a quartz substrate, or a quartz substrate and another quartz substrate, at least one of two surfaces of the first workpiece being optically polished, and at least one of two surfaces of the second workpieces being optically polished, said workpiece bonding method comprising:preparing the first workpiece that has no inorganic impurities on the optically polished surface thereof;
preparing the second workpiece that has no inorganic impurities on the optically polished surface thereof;
irradiating the optically polished surface of the first workpiece and the optically polished surface of the second workpiece with vacuum ultraviolet light;
placing and fixing the first workpiece and the second workpiece, after said irradiating, onto a cleaning stage such that the optically polished surfaces of the first workpiece and the second workpiece each face away from the cleaning stage;
while the second workpiece remains fixed on the cleaning stage, moving the first workpiece over the second workpiece and turning over the first workpiece such that the optically polished surface of the first workpiece faces the optically polished surface of the second workpiece;
laminating the first workpiece on the second workpiece such that the optically polished surface of the first workpiece and the optically polished surface of the second workpiece contact each other;
placing the laminated first and second workpieces on a heating stage such that a lower surface of the second workpiece contacts an upper surface of the heating stage;
heating the heating stage, with the second workpiece being placed on the heating stage and the first workpiece being laminated on the second workpiece such that the second workpiece is directly heated by the heated heating stage;
using the heated heating stage as a sole heating unit for heating the first and second workpieces;
measuring a temperature of the upper surface of the heating stage;
controlling the temperature of the upper surface of the heating stage, based on the measured temperature of the upper surface of the heating stage, such that the temperatures of the first and second workpieces rise to a temperature equal to or greater than 200 degrees C.; and
maintaining the temperature of the upper surface of the heating stage until the first and second workpieces are bonded to each other.

US Pat. No. 10,050,412

SEMICONDUCTOR LASER ELEMENT AND SEMICONDUCTOR LASER DEVICE

USHIO DENKI KABUSHIKI KAI...

1. A semiconductor laser element, comprising:a substrate;
semiconductor layers being multi-layered, formed on the substrate and configured to include at least an active layer; and
a reflective film constituted with the substrate and the semiconductor layers and provided on at least one of end faces of a resonator,
the reflective film including:
an L1 layer arranged at a first position counting from the one of the end faces of the resonator and having a refractive index of n1; and
a periodic structure configured by layering, on the L1 layer, a plurality of pairs of an L2N layer and an L2N+1 layer, the L2N layer being arranged at a 2N-th position (where N is a positive integer) counting from the one of the end faces of the resonator and having a refractive index of n2, the L2N+1 layer being arranged at a 2N+1-th position (where N is a positive integer) counting from the one of the end faces of the resonator and having a refractive index of n3, where n2 the L1 layer having a linear expansion coefficient within ±30% with respect to a linear expansion coefficient of the substrate and being made of a film having an optical film thickness thinner than ?/4, and
an L2 layer arranged at a second position counting from the one of the end faces of the resonator being made of a film having an optical film thickness thinner than ?/4.

US Pat. No. 10,191,362

LIGHT SOURCE UNIT AND PROJECTOR

USHIO DENKI KABUSHIKI KAI...

1. A light source unit, comprising:a plurality of elemental light sources each including light emitting elements and drive circuits, the light emitting elements that emit light of an emission wavelength including a plurality of different wavelength bands, and the drive circuits respectively driving the light emitting elements;
an integrated control circuit that controls the drive circuits; and
band optical characteristic acquisition sections that receive light of an amount correlated with a total light amount of output luminous fluxes, acquire light emitting intensity indicating values correlated with light intensity for the respective different wavelength bands and acquire wavelength deviation indicating values correlated with deviation from a reference wavelength for one or more of the different wavelength bands, the output luminous fluxes being collection of light beams emitted from light emitting elements,
wherein the integrated control circuit at least intermittently acquires band optical characteristic acquisition data and generate the light emitting intensity indicating values and the wavelength deviation indicating values, the band optical characteristic acquisition data being generated by the band optical characteristic acquisition sections,
the integrated control circuit holds light emitting intensity indicating value target variation information, the light emitting intensity indicating value target variation information being used to reduce difference between color phase indicating values correlated with the integrated light color of the output luminous fluxes and target color phase indicating values by feedback control of the drive circuits, the feedback control being performed to reduce difference between the light emitting intensity indicating values and target light emitting intensity indicating values for the respective different wavelength bands, and the light emitting intensity indicating value target variation information being used for determination of variation of the light emitting intensity indicating values with respect to the target light emitting intensity indicating values for the respective different wavelength bands matched to each of assumed appearance modes of the wavelength deviation indicating values, and
the integrated control circuit determines the variation of the light emitting intensity indicating values for the respective different wavelength bands, in accordance with the light emitting intensity indicating value target variation information belonging to one appearance mode assumed on a basis of an actual mode of the generated wavelength deviation indicating values, out of the appearance modes of the wavelength deviation indicating values.

US Pat. No. 10,208,900

FLUORESCENCE LIGHT SOURCE DEVICE WITH WAVELENGTH CONVERSION MEMBER WITH PARTICULAR RATIO BETWEEN LIGHT TRANSMISSION PERCENTAGE AND LIGHT REFLECTION PERCENTAGE

Ushio Denki Kabushiki Kai...

1. A fluorescence light source device comprising a wavelength conversion member for emitting fluorescence by excitation laser light, whereinthe wavelength conversion member has an excitation light receiving surface including a periodic structure having a periodic array of conical or truncated projections with an aspect ratio, which is a ratio of a height of the projection to a pitch in the periodic structure, of not lower than 0.2,
the wavelength conversion member is formed from a phosphor composed of a polycrystal, and contains a micro-scatterer with a refractive index of not lower than 1.0 for scattering the excitation laser light and fluorescence emitted from the phosphor, and a ratio (T/R) between a light transmission percentage T [%] in the wavelength conversion member and a light reflection percentage R [%] in the wavelength conversion member is 1 to 20.

US Pat. No. 10,207,926

OZONE GENERATOR

Ushio Denki Kabushiki Kai...

1. An ozone generator comprising:source gas supply means for supplying a source gas containing oxygen into a gas flow channel forming member; and an ultraviolet light source for emitting ultraviolet light, the ultraviolet light source being disposed in the gas flow channel forming member, the ozone generator irradiating the source gas with the ultraviolet light from the ultraviolet light source to cause the oxygen in the source gas to absorb the ultraviolet light and thereby generate ozone, wherein
the gas flow channel forming member has a gas feed port at one end and a gas discharge port at the other end, and forming a gas flow channel through which the source gas from the source gas supply means flows,
the ultraviolet light source comprises an excimer lamp for emitting ultraviolet light with a wavelength of not more than 200 nm and irradiates the source gas flowing through the gas flow channel with the ultraviolet light, and
a flow rate of the source gas in a region where the ultraviolet light source is disposed in the gas flow channel is not lower than 0.1 m/s.

US Pat. No. 10,209,503

FLUORESCENCE MICROSCOPE LIGHT SOURCE APPARATUS AND FLUORESCENCE MICROSCOPE

Ushio Denki Kabushiki Kai...

1. A fluorescence microscope light source apparatus to be installed in a fluorescence microscope which includes an illumination light bandpass filter and in which a sample is illuminated with light with a wavelength of 500 to 550 nm having transmitted through the illumination light bandpass filter, the fluorescence microscope light source apparatus comprising:a laser diode configured to emit blue light as excitation light;
a phosphor configured to convert the excitation light emitted by the laser diode into illumination fluorescence with a wavelength region of 500 to 550 nm;
an optical system configured to extract the illumination fluorescence emitted by the phosphor;
a first condenser lens configured to condense the excitation light onto the phosphor;
a light guide body having one end face on which the illumination fluorescence is incident and the other end face from which the illumination fluorescence exits;
a second condenser lens configured to condense the illumination fluorescence onto the one end face of the light guide body; and
a band-elimination filter configured to block or attenuate light, out of the illumination fluorescence, in a wavelength region including a transmission maximum wavelength and including no transmission minimum wavelength in the illumination light bandpass filter, the band-elimination filter being provided on a light path of the illumination fluorescence.

US Pat. No. 10,203,071

REFLECTION TYPE FLUORESCENCE LIGHT SOURCE APPARATUS

Ushio Denki Kabushiki Kai...

1. A reflection type fluorescence light source apparatus comprising:a fluorescent plate formed of a sintered body made of a mixture of a phosphor for emitting fluorescence under excitation light and a metal oxide and has a front surface serving as an excitation light incident surface;
a reflection stack that includes a reflection layer disposed on a back surface side of the fluorescent plate; and
a heat dissipation substrate, wherein
a sealing structure of the reflection stack is formed by the fluorescent plate, a sealing layer covering a back surface and a peripheral side surface of the reflection layer, and an adhesion layer that bonds the sealing layer to the reflection stack and the fluorescent plate,
the reflection layer is made of a silver reflection film, and
a metal oxide multilayer film, forming an enhanced reflection portion, is provided between the reflection layer and the fluorescent plate in close contact with the back surface of the fluorescent plate.

US Pat. No. 10,148,062

LASER LIGHT SOURCE DEVICE

USHIO DENKI KABUSHIKI KAI...

1. A laser light source device comprising:a semiconductor laser element;
a heat transfer portion having thermal conductivity and connected to the semiconductor laser element;
a cooler connected to the heat transfer portion on a side different from the semiconductor laser element;
a control object temperature measurement section that measures a control object temperature as the temperature of the heat transfer portion or the cooler;
an environmental temperature measurement section that measures an environmental temperature of the laser light source device; and
a controller that controls the cooler,
wherein
the controller is configured to control the cooler such that the control object temperature approaches a predetermined target temperature set according to the environmental temperature, and
the target temperature set when the environmental temperature is lower than a specific temperature is lower than the target temperature set when the environmental temperature is higher than the specific temperature.

US Pat. No. 10,101,652

EXPOSURE METHOD, METHOD OF FABRICATING PERIODIC MICROSTRUCTURE, METHOD OF FABRICATING GRID POLARIZING ELEMENT AND EXPOSURE APPARATUS

USHIO DENKI KABUSHIKI KAI...

1. An exposure method, comprising:generating interfering light by crossing, at a predetermined angle, two or more light beams branched from output light from a coherent light source;
arranging a light shielding member having a light transmissive part of a substantially rectangular shape above a substrate;
irradiating the substrate with the interfering light through the light shielding member to shape, into the substantially rectangular shape, an interfering light irradiation region and to cause, at both sides of the interfering light irradiation region, non-interfering light irradiation regions to be generated, the interfering light irradiation region being a region on the substrate on which the interfering light is irradiated per one shot and interference fringes are formed, each of the non-interfering light irradiation regions being a region where only one of the two or more light beams is incident and the interference fringes are not formed;
conveying, in a stepwise manner, the substrate in a conveying direction; and
repeating said irradiating and said conveying so as to form a plurality of said interfering light irradiation regions each having the non-interfering light irradiation regions at the both sides thereof in the conveying direction; wherein
the substrate is conveyed such that one of said plurality of said interfering light irradiation regions is positioned without overlapping next one of said plurality of said interfering light irradiation regions and one of the non-interfering light irradiation regions is positioned with overlapping next one of the non-interfering light irradiation regions so as to separate said plurality of said interfering light irradiation regions solely by the overlapped non-interfering light irradiation regions in the conveying direction, and
each of said plurality of interfering light irradiation regions has a Gaussian distribution.