US Pat. No. 9,063,173

IRIDIUM ALLOY EXCELLENT IN HARDNESS, WORKABILITY AND ANTI-CONTAMINATION PROPERTIES

Tanaka Kikinzoku Kogyo K....

1. An iridium alloy suitable for a wire rod for probe pins, said alloy consisting of zirconium as an additive element, aluminum
and/or copper as a further additive element, and the balance iridium, wherein the additive element concentration of zirconium
is 100 to 500 ppm, and the total additive element concentration of aluminum and/or copper is 10 to 500 ppm.

US Pat. No. 9,585,250

CONDUCTIVE PASTE AND CERAMIC SUBSTRATE MANUFACTURED USING THE SAME

TDK Corporation, Tokyo (...

1. A conductive paste to be printed on a low-temperature fired ceramic green sheet layered product for forming a surface conductor
by constrained firing, the conductive paste comprising 60 to 95 mass % of an Ag powder as the content in a paste composition,
0.5 to 5 mass % of a borosilicate based glass powder relative to the Ag powder, the remainder being a platinum group metal
additive and an organic vehicle,
wherein the platinum group metal additive contains at least two metals of Ru and Rh, and the content of Ru and the content
of Rh in the platinum group metal additive are 0.05 to 5 mass % of Ru and 0.001 to 0.1 mass % of Rh respectively in terms
of metal components relative to the mass of the Ag powder.

US Pat. No. 9,447,495

CHEMICAL VAPOR DEPOSITION RAW MATERIAL CONTAINING ORGANIC NICKEL COMPOUND, AND CHEMICAL VAPOR DEPOSITION METHOD USING THE CHEMICAL VAPOR DEPOSITION RAW MATERIAL

Tanaka Kikinzoku Kogyo K....

1. A chemical vapor deposition method for forming a nickel thin-film or a nickel compound thin-film on a substrate comprising
the steps of: evaporating a raw material containing an organic nickel compound to produce a raw material gas; and heating
the raw material gas while the raw material gas is introduced to a surface of the substrate, wherein the chemical vapor deposition
raw material comprises an organic nickel compound in which a cyclopentadienyl group (Cp) or a derivative thereof is coordinated
to nickel and a cycloalkenyl group having one allyl group or a derivative (X) thereof is coordinated to a carbon skeleton
of cycloalkyl, having a following formula:

wherein, X is a cycloalkenyl group having one allyl group in the carbon skeleton of cycloalkyl, R1 to R5 independently is
CnH2n+1, n being 0 to 6, and n is an integer.

US Pat. No. 9,284,249

METHOD FOR EXTRACTING ASYMMETRIC ?-DIKETONE COMPOUND FROM ?-DIKETONE COMPOUND

Tanaka Kikinzoku Kogyo K....

1. A method of extracting an asymmetric ?-diketone compound of Chemical Formula 1 from a ?-diketone compound comprising at
least either a symmetric ?-diketone compound of Chemical Formula 2 or a symmetric ?-diketone compound of Chemical Formula
3, said symmetric ?-diketone compound being mixed in the asymmetric ?-diketone compound, the method comprising the steps of:
(A): adjusting a pH of a mixed solution of the ?-diketone compound and water 11.5 or more and dissolving the ?-diketone compound
into water to form a ?-diketone compound solution;

(B): subsequently adjusting the pH of the ?-diketone compound solution 9.5 or less and recovering the asymmetric ?-diketone
compound of Chemical Formula 1 separated from the ?-diketone compound solution; and

at least either of:
(a): setting the upper limit of the pH of the mixed solution to 12.5 to form a ?-diketone compound solution in the step (A)
and bringing the ?-diketone compound solution into contact with a hydrophobic solvent to thus transfer the symmetric ?-diketone
compound of Chemical Formula 3 into the hydrophobic solvent; or

(b): setting the lower limit of the pH of the ?-diketone compound solution to 8.0 in the step (B) and separating and recovering
the asymmetric ?-diketone compound of Chemical Formula 1 separated from the ?-diketone compound solution:


(in each chemical formula, R1 and R2, which are substituents, are alkyl groups, and have a relationship of the number of carbon atoms in R1

US Pat. No. 9,358,612

FEPT-BASED SPUTTERING TARGET

TANAKA KIKINZOKU KOGYO K....

1. An FePt-based sputtering target comprising Fe, Pt, a metal oxide, and further comprising one or more kinds of metal elements
other than Fe and Pt,
wherein the FePt-based sputtering target has a structure in which an FePt-based alloy phase and a metal oxide phase containing
unavoidable impurities are mutually dispersed, the FePt-based alloy phase containing Pt in an amount of 40 at % or more and
less than 60 at % and the one or more kinds of metal elements other than Fe and Pt in an amount of more than 0 at % and 20
at % or less with the balance being Fe and unavoidable impurities and with a total amount of Pt and the one or more kinds
of metal elements being 60 at % or less,

the metal oxide is contained in an amount of 20 vol % or more and 40 vol % or less based on a total amount of the target,
and

the metal oxide phase has an average size of 0.4 ?m or less as determined by an intercept method.
US Pat. No. 9,375,811

ACTIVE METAL BRAZING MATERIAL

TANAKA KIKINZOKU KOGYO K....

1. An active metal brazing material comprising a Ag—Cu—Ti—Sn alloy including 20 to 40% by weight of Cu, 1.0 to 3.0% by weight
of Ti, 1.2 to 6.0% by weight of Sn and the balance being Ag, the active metal brazing material having a metallographic structure
including a Sn—Ti intermetallic compound and a Sn—Ti—Cu intermetallic compound, and optionally a Cu—Ti intermetallic compound,
dispersed in a Ag—Cu alloy matrix, wherein the weight ratio Sn/Ti between Ti and Sn is 1.2 or more but 5.0 or less, and the
particle sizes of the intermetallic compounds are all 20 ?m or less.

US Pat. No. 9,360,431

BLUE-COLORED GOLD NANOPARTICLES FOR IMMUNOLOGICAL MEASUREMENT, PROCESS FOR PRODUCTION OF SAME, AND MEASUREMENT METHOD USING SAME

Tanaka Kikinzoku Kogyo K....

1. A plurality of blue-colored gold nanoparticles having an average particle nucleus size of from 20 to 60 nm, an average
particle size of from 60 to 120 nm, four or more protrusions per nucleus, and a protrusion length of from 5 to 50 nm.
US Pat. No. 9,228,255

FEPT-C-BASED SPUTTERING TARGET AND PROCESS FOR PRODUCING THE SAME

TANAKA KIKINZOKU KOGYO K....

1. A process for producing an FePt—C-based sputtering target, comprising:
adding C powder containing unavoidable impurities to FePt-based alloy powder containing Pt in an amount of 40 at % or more
and 60 at % or less with the balance being Fe and unavoidable impurities;

mixing the C powder and the FePt-based alloy powder in an atmosphere containing oxygen to produce a powder mixture; and then
molding the produced powder mixture while the powder mixture is heated under pressure.

US Pat. No. 9,382,616

CHEMICAL VAPOR DEPOSITION RAW MATERIAL COMPRISING ORGANOPLATINUM COMPOUND, AND CHEMICAL VAPOR DEPOSITION METHOD USING THE CHEMICAL VAPOR DEPOSITION RAW MATERIAL

TANAKA KIKINZOKU KOGYO K....

1. A chemical vapor deposition raw material for producing a platinum thin film or a platinum compound thin film by a chemical
vapor deposition method, wherein the chemical vapor deposition raw material comprises an organoplatinum compound having cyclooctadiene
which is not substituted by an alkyl group, and alkyl anions coordinated to divalent platinum, the organoplatinum compound
being represented by the following formula: [Formula 1]
wherein R1 is a methyl group and R2 is a propyl group.

US Pat. No. 9,314,845

PROCESS FOR PRODUCING FEPT-BASED SPUTTERING TARGET

TANAKA KIKINZOKU KOGYO K....

1. A process for producing an FePt-based sputtering target, comprising:
adding C powder containing unavoidable impurities and metal oxide powder containing unavoidable impurities to FePt-based alloy
powder containing Pt in an amount of 40 at % or more and 60 at % or less with the balance being Fe and unavoidable impurities
so that the C powder and the metal oxide powder are contained to satisfy:

0 10??<40; and
20??+??40,
where ? and ? represent contents of the C powder and the metal oxide powder by vol %, respectively, based on a total amount
of the FePt-based alloy powder, the C powder, and the metal oxide powder, followed by mixing the FePt-based alloy powder,
the C powder, and the metal oxide powder to produce a powder mixture; and

molding the produced powder mixture while the powder mixture is heated under pressure.
US Pat. No. 9,556,212

CHEMICAL DEPOSITION RAW MATERIAL FORMED OF RUTHENIUM COMPLEX AND METHOD FOR PRODUCING THE SAME, AND CHEMICAL DEPOSITION METHOD

Tanaka Kikinzoku Kogyo K....

1. A raw material for producing a ruthenium thin film or a ruthenium compound thin film by a chemical deposition method, and
comprising a ruthenium complex,
wherein the ruthenium complex is represented by the following formula, in which carbonyl groups and a fluoroalkyl derivative
of a polyene are coordinated to ruthenium:

(nR-L)Ru(CO)3
wherein L is a polyene having a carbon number of from 4 to 8 and 2 to 4 double bonds, wherein the polyene L has n (n?1) pieces
of substituents R, wherein the substituents Rs are each a fluoroalkyl group having a carbon number of from 1 to 6 and a fluorine
number of from 1 to 13, and in the case when the polyene L has two or more (n?2) of the substituents Rs, the carbon numbers
and the fluorine numbers of the substituents Rs may be different in the same molecule.

US Pat. No. 9,394,446

METHOD FOR RECOVERING RU COMPLEX DYE FROM USED DYE SOLUTION

Tanaka Kikinzoku Kogyo K....

1. A method for recovering Ru complex dye from a used dye solution containing a polypyridine Ru complex as a Ru complex, the
used dye solution having been discharged from a step of manufacturing a dye-sensitized solar cell, the method comprising the
steps of:
(a): filtering the used dye solution to separate and remove solid content; and
(b): bringing a separating solvent comprising an ether-based solvent indicated by a chemical formula CxH(2x+1)—O-CyH(2y+1) (x=1 to 4 and y=1 to 4, with the proviso that x+y?4) or an alkane-based solvent indicated by a chemical formula CxH(2x+2) (x=5 to 7) into contact with the used dye solution to separate the Ru complex dye.

US Pat. No. 9,290,841

ORGANORUTHENIUM COMPOUND FOR CHEMICAL VAPOR DEPOSITION RAW MATERIAL AND PRODUCTION METHOD FOR THE ORGANORUTHENIUM COMPOUND

TANAKA KIKINZOKU KOGYO K....

1. An organoruthenium compound for a chemical vapor deposition raw material, comprising dodecacarbonyl triruthenium represented
by the following chemical formula,

wherein the concentration of iron is 1 ppm or less.

US Pat. No. 9,447,494

PHYSICAL VAPOR DEPOSITION APPARATUS AND PHYSICAL VAPOR DEPOSITION METHOD

TANAKA KIKINZOKU KOGYO K....

1. A physical vapor deposition method, including:
heating and evaporating an evaporation source material in a predetermined gas atmosphere or an air atmosphere in an evaporation
chamber by an arc heating part for evaporating the evaporation source material and producing fine particles from evaporated
atoms;

stirring a powder having a particle size of not more than several tens of micrometers in a vessel of a powder supply by causing
the vessel to vibrate at not more than 1200 rpm; and

transporting the fine particles and placing the fine particles on a first supersonic gas stream created by a first supersonic
nozzle, transporting the powder from the powder supply source and placing the powder on a second supersonic gas stream created
by a second supersonic nozzle different from the first supersonic nozzle, to mix the fine particles and the powder, and depositing
the mixed fine particles and powder on a substrate for film formation by physical vapor deposition to form a film on the substrate
containing the mixed fine particles and the powder in the film forming chamber.

US Pat. No. 9,353,448

ELECTROLYTIC ELECTRODE, ANODE FOR ELECTROLYTIC PRODUCTION OF OZONE, ANODE FOR ELECTROLYTIC PRODUCTION OF PERSULFURIC ACID AND ANODE FOR ELECTROLYTIC OXIDATION OF CHROMIUM

Tanaka Kikinzoku Kogyo K....

1. An electrolytic electrode, comprising:
an electrode surface layer formed by a high-temperature heat treatment under a low oxygen partial pressure of 100 Pa or less,
wherein the electrode surface layer includes a valve metal oxide film,

an electrode sub-surface layer, positioned beneath the electrode surface layer, which includes a valve metal and a noble metal
excluding silver (Ag), wherein the noble metal is precipitated and dispersed in a crystal grain boundary of the valve metal,
wherein

a region of down to 30 ?m in a vertical depth direction from the electrode surface comprises crystal grains arranged in an
elongated orientation in a vertical cross-section from the electrode surface, and

a region of down to 10 ?m in the vertical depth direction from the electrode surface contains 5 at % or less of the noble
metal dispersed in the crystal grain boundary of the valve metal.

US Pat. No. 9,095,901

FEPT-BASED SPUTTERING TARGET

TANAKA KIKINZOKU KOGYO K....

1. An FePt-based sputtering target comprising Fe, Pt, C, and a metal oxide,
wherein the FePt-based sputtering target has a structure in which an FePt-based alloy phase, a C phase containing unavoidable
impurities, and a metal oxide phase containing unavoidable impurities are mutually dispersed, the FePt-based alloy phase containing
Pt in an amount of 40 at % or more and 60 at % or less with the balance being Fe and unavoidable impurities, and

wherein C is contained in an amount of more than 0 vol % and 20 vol % or less based on a total amount of the target, the metal
oxide is contained in an amount of 10 vol % or more and less than 40 vol % based on the total amount of the target, and a
total content of C and the metal oxide is 20 vol % or more and 40 vol % or less based on the total amount of the target.

US Pat. No. 9,605,334

HIGHLY HEAT-RESISTANT AND HIGH-STRENGTH RH-BASED ALLOY AND METHOD FOR MANUFACTURING THE SAME

TANAKA KIKINZOKU KOGYO K....

1. A heat-resistant material comprising a Rh-based alloy, wherein the Rh-based alloy consists of Rh, Al, and W, wherein Al
is present in an amount of 0.2 to 15.0 mass % and W is present in an amount from 15.0 to 45.0 mass %; and a ?? phase (Rh3(Al, W)) having an L12 structure dispersed as an essential strengthening phase in a matrix.

US Pat. No. 9,435,024

TARGET FOR MAGNETRON SPUTTERING

TANAKA KIKINZOKU KOGYO K....

1. A target for magnetron sputtering, comprising metal Co, metal Cr, and an oxide with an atomic ratio of the metal Cr to
the total of the metal Co and the metal Cr being more than 0 at % and less than 25 at %,
wherein the target comprises:
a non-magnetic metal phase containing metal Co and metal Cr with an atomic ratio of the metal Cr to the total of the metal
Co and the metal Cr being 25 at % or more and less than 100 at % and with an atomic ratio of the metal Co to the total of
the metal Co and the other metals being more than 0 at % and 45 at % or less; and

a magnetic metal phase containing metal Co;
wherein a volume ratio of the oxide to the non-magnetic metal phase is more than 0 and 1.2 or less;
wherein the non-magnetic metal phase and the oxide are mutually dispersed to form a matrix phase, and
wherein the magnetic metal phase is dispersed in the matrix phase.

US Pat. No. 9,607,922

SEMICONDUCTOR DEVICE AND HEAT-DISSIPATING MECHANISM

TANAKA KIKINZOKU KOGYO K....

1. A semiconductor device comprising:
a heat-generating semiconductor package made of ceramic material or resin housing a heat-generating semiconductor substrate
incorporated with an integrated circuit or wirings;

a silver thin film manufactured from nano-silver particles and formed by a coating method in a closely adhering manner on
one surface of the semiconductor package; and

a silicon oxidation film having a film thickness of 1 nm or more formed at an adhesion interface between the semiconductor
package and the silver thin film.

US Pat. No. 9,604,317

AU—GA—IN BRAZING MATERIAL

TANAKA KIKINZOKU KOGYO K....

1. A sealing method comprising brazing components with a brazing material, which brazing material comprises a Au—Ga—In ternary
alloy, wherein weight concentrations of the elements lie within a region of a polygon with a point A (Au: 90%, Ga: 10%, In:
0%), a point B (Au: 70%, Ga: 30%, In: 0%), a point C (Au: 60%, Ga: 0%, In: 40%) and a point D (Au: 80%, Ga: 0%, In: 20%) as
vertexes, excluding lines on which In and Ga become 0%, in a Au—Ga—In ternary phase diagram.

US Pat. No. 9,601,888

BRUSH TYPE CONTACT MATERIAL AND MANUFACTURING METHOD FOR THE SAME

TANAKA KIKINZOKU KOGYO K....

1. A brush type contact material, comprising one or more curved metal pawls for coming into contact with objects to be contacted,
wherein each metal pawl has a contact end having a contact point;
wherein a cross section normal to the length of each metal pawl is of substantially constant width and thickness along the
length of the metal pawl;

wherein each metal pawl is concave on a back side from the contact point and convex on a front side from the contact point;
wherein the contact end of each pawl has a curvature in a thickness direction, including a curvature radius R1 on the front side from the contact point and a curvature radius R2 on the back side from the contact point such that the curvatures R1 and R2 are on opposing sides of the contact point; and

wherein R1?R2, and R1/R2 is 3.0 or less.

US Pat. No. 9,314,846

PROCESS FOR PRODUCING FEPT-BASED SPUTTERING TARGET

TANAKA KIKINZOKU KOGYO K....

1. A process for producing an FePt-based sputtering target, comprising:
adding metal oxide powder containing unavoidable impurities to FePt-based alloy powder containing Pt in an amount of 40 at
% or more and less than 60 at % and one or more kinds of metal elements other than Fe and Pt in an amount of more than 0 at
% and 20 at % or less with the balance being Fe and unavoidable impurities and with a total amount of Pt and the one or more
kinds of metal elements being 60 at % or less so that the metal oxide powder accounts for 20 vol % or more and 40 vol % or
less of a total amount of the FePt-based alloy powder and the metal oxide powder, followed by mixing the FePt-based alloy
powder and the metal oxide powder to produce a powder mixture; and

molding the produced powder mixture while the powder mixture is heated under pressure.

US Pat. No. 9,115,418

METHOD OF RECOVERING PLATINUM GROUP ELEMENTS

TANAKA KIKINZOKU KOGYO K....

1. A method of recovering platinum group elements, comprising:
adding copper into a molten copper phase containing platinum group elements including at least rhodium, thereby
increasing a content of the rhodium in an upper phase of the molten copper phase; and
recovering the platinum group elements including the rhodium from the upper phase.

US Pat. No. 9,053,910

MAGNETRON SPUTTERING TARGET AND PROCESS FOR PRODUCING THE SAME

TANAKA KIKINZOKU KOGYO K....

1. A magnetron sputtering target containing a ferromagnetic metal element, the magnetron sputtering target comprising:
a magnetic phase containing the ferromagnetic metal element comprising a Co—Cr alloy containing Co in an amount of 85 at %
or more;

two non-magnetic phases comprising a first non-magnetic phase of a Co—Cr—Pt alloy containing Co in an amount of greater than
0 at % to not more than 73 at %, and a second non-magnetic phase of a Co—Pt alloy containing Co in an amount of greater than
0 at % to not more than 12 at %; and

an oxide phase;
wherein the magnetic phase, first non-magnetic phase, and second non-magnetic phase are dispersed from each other and separated
from each other by the oxide phase so as not to come into contact with each other.

US Pat. No. 9,784,709

SENSOR ELECTRODE, MANUFACTURING METHOD THEREOF, AND METAL PASTE FOR ELECTRODE FORMATION

TANAKA KIKINZOKU KOGYO K....

1. A metal paste for forming a gas sensor electrode, in which (1) a conductive particle having a core/shell structure comprising
a core particle made of Pt or Pt alloy and a shell made of ceramic covering at least a portion of the core particle, and (2)
ceramic powder, are dispersed in a solvent,
wherein the conductive particle is a particle of which average particle diameter is 90 to 500 nm, and the core particle is
covered with ceramic of 0.5 to 3.0 mass % with respect to the mass of the conductive particle,

a content of the ceramic powder is 5 to 20 mass % with respect to a total mass of the conductive particle and the ceramic
powder,

a total content of a ceramic component in a metal paste is 6.0 to 22.0 mass % with respect to the total mass of the conductive
particle and the ceramic powder, and

further, a dispersion degree measured according to a line transect method based on a grind gauge is equal to or less than
15 ?m.

US Pat. No. 9,297,833

RHODIUM ALLOY HAVING EXCELLENT HARDNESS, PROCESSABILITY AND ANTIFOULING PROPERTIES AND SUITABLE FOR WIRE ROD FOR PROBE PINS

TANAKA KIKINZOKU KOGYO K....

1. A probe pin comprising a rhodium alloy, the rhodium alloy comprising: 30 to 150 parts per million of iron, 80 to 350 parts
per million of iridium, and 100 to 300 parts per million of platinum as additive elements, said parts being based on the parts
of rhodium in the rhodium alloy.
US Pat. No. 9,245,660

ELECTROCONDUCTIVE PARTICLE AND METAL PASTE, AND ELECTRODE

TANAKA KIKINZOKU KOGYO K....

1. An electroconductive particle for forming an electrode, comprising: a precious metal particle comprising Pt or a Pt alloy
and having an average particle diameter of 50 to 150 nm; a first ceramic particle comprising Al2O3 or ZrO2 dispersed in the interior of the precious metal particle and having an average particle diameter of 5 to 50 nm; and a second
ceramic particle comprising Al2O3 or ZrO2 bonded to an outer periphery of the precious metal particle and having an average particle diameter of 5 to 50 nm.

US Pat. No. 9,859,511

ORGANOIRIDIUM COMPLEX FOR ORGANIC ELECTROLUMINESCENT ELEMENTS

TANAKA KIKINZOKU KOGYO K....

1. An organoiridium complex for an organic electroluminescent element represented by Chemical Formula 1, wherein a C—N ligand
comprising two atomic groups (A1, A2), and a ?-diketone ligand in line symmetry having two tert-butyl-substituted phenyl groups are coordinated with an iridium
atom,

wherein R1, R2, and R3 are each a tert-butyl group or a hydrogen atom, and two of R1, R2, and R3 are a tert-butyl group, and each phenyl ring of the ?-diketone is substituted with the two tert-butyl groups, wherein the
two tert-butyl groups may bond each other to thereby form a saturated hydrocarbon ring, and wherein the ?-diketone ligand
is represented by any of the formula in Chemical Formula 2;


wherein A1 is an unsubstituted or substituted benzene ring or an unsubstituted or substituted 6-membered heteroaryl ring, wherein the
6-membered heteroaryl ring contains one N as a heteroatom, and A2 is an unsubstituted or substituted 6-membered heteroaryl ring which contains one N as a heteroatom.

US Pat. No. 9,805,936

METHOD FOR PRODUCING NICKEL THIN FILM ON A SI SUBSTRATE BY CHEMICAL VAPOR DEPOSITION METHOD, AND METHOD FOR PRODUCING NI SILICIDE THIN FILM ON SI SUBSTRATE

TANAKA KIKINZOKU KOGYO K....

1. A method for producing a nickel thin film on a Si substrate by a chemical vapor deposition method, comprising the steps
of:
using a hydrocarbon-type nickel complex represented by a following formula Chem.1 as a raw material compound, which is a nickel
complex in which only two ligands, namely a cyclopentadienyl group (Cp) or a derivative of the cyclopentadienyl group (Cp)
and an alkenyl group or a derivative of the alkenyl group represented by a formula Chem.2, which is cyclobutenyl, cyclopentenyl,
cyclohexenyl, cycloheptenyl, cyclooctenyl, cyclononenyl, or derivatives thereof, are coordinated to nickel and an element
other than carbon and hydrogen is not contained in the structure; using hydrogen as a reaction gas, and further using a film
formation pressure of 1 to 150 torr and a film formation temperature of 80 to 250° C. as film formation conditions


(In the formula, X represents a chain or cyclic alkenyl group having 3 to 9 carbon atoms or a derivative of the alkenyl group.
R1 to R5 which are substituent groups of the cyclopentadienyl group represent CnH2n+1, and n represents an integer of 0 to 6)


US Pat. No. 9,266,916

PRODUCTION METHOD FOR DODECACARBONYL TRIRUTHENIUM

Tanaka Kikinzoku Kogyo K....

1. A method for producing dodecacarbonyl triruthenium having the following Formula, the method comprising a process of carbonylating
ruthenium chloride with carbon monoxide,
wherein an amine is added to a reaction system at 0.8 molar equivalent or more with respect to chlorine of the ruthenium chloride
and the carbonylation is conducted at a reaction temperature of 50 to 100° C. and a reaction pressure of 0.2 to 0.9 MPa


US Pat. No. 9,242,433

TEXTURED SUBSTRATE FOR EPITAXIAL FILM FORMATION, AND METHOD FOR MANUFACTURING THE SAME

TANAKA KIKINZOKU KOGYO K....

1. A textured substrate for epitaxial film formation comprising a textured metal layer at least on one side, wherein the textured
metal layer comprises a copper layer having a cube texture and a nickel layer having a thickness of 100 to 20000 nm formed
on the copper layer; the nickel layer has a nickel oxide layer formed on a surface thereof, having a thickness of 1 to 30
nm, and comprising a nickel oxide; the nickel layer further comprises a palladium-containing region formed of palladium-containing
nickel at an interface with the nickel oxide layer.
US Pat. No. 9,863,945

IMMUNOCHROMATOGRAPHY DETECTION METHOD

TANAKA KIKINZOKU KOGYO K....

1. An immunochromatography detection method comprising:
a step of adding an analyte dilution solution containing an analyte into a sample addition part;
a step of recognizing a detection target by a labeling substance modified with gold nanoparticles, which is dry-retained at
a labeling substance retaining part;

a step of developing a composite of the labeling substance and the detection target as a mobile phase; and
a step of detecting the detection target in the developed mobile phase at a detection part,
wherein the labeling substance is protected with polyethylene glycol having one or more mercapto groups and/or a derivative
of the polyethylene glycol having one or more mercapto groups, the polyethylene glycol having one or more mercapto groups
and/or the derivative of the polyethylene glycol having one or more mercapto groups, having a molecular weight of 1,000 to
30,000, wherein the concentration of the polyethylene glycol having one or more mercapto groups and/or the derivative of the
polyethylene glycol having one or more mercapto groups in the labeling substance solution is from 0.0001 to 0.05% by mass,
and wherein the protected labeling substance solution is subsequently dry-retained together with arginine and casein at the
labeling substance retaining part.

US Pat. No. 9,499,411

DEVICE FOR PRODUCING AND METHOD FOR PRODUCING DODECACARBONYL TRIRUTHENIUM

Tanaka Kikinzoku Kogyo K....

1. A method for producing an organoruthenium compound for a chemical vapor deposition raw material containing dodecacarbonyl
triruthenium (DCR) represented by a following formula, comprising the step of:

purifying DCR by separating impurity elements from crude DCR by a sublimation method, wherein the purification step further
comprising: supplying CO gas from the bottom of a sintered filter with filtering accuracy of 5 to 30 ?m to crude DCR which
is disposed above the sintered filter; heating and sublimating the crude DCR in an atmosphere having a carbon monoxide concentration
of 30 to 100%; and then cooling the crude DCR to precipitate DCR.

US Pat. No. 9,806,500

TAPE MATERIAL HAVING CLAD STRUCTURE FOR MANUFACTURING IGNITION PLUG ELECTRODE

TANAKA KIKINZOKU KOGYO K....

1. A tape material for manufacturing an ignition plug electrode, the tape material being used for forming electrode chips,
in which a base metal layer and a precious metal layer are cladded, on a bonded region set on an electrode base material of
an ignition plug, the electrode chips being continuously connected, wherein the tape material being in the form of a long
tape in which the base metal layer that is in contact with the bonded region is cladded with the precious metal layer that
is in contact with the base metal layer, the base metal layer of the tape material has a width substantially equal to one
of the longitudinal width, lateral width and diameter of the bonded region, and at least one projection is formed on a surface
of the base metal layer on the bonded region side in the cross-section shape of the tape material, the projection being in
the form of a line.

US Pat. No. 9,793,499

ORGANIC IRIDIUM COMPLEX FOR ORGANIC ELECTROLUMINESCENT ELEMENT

TANAKA KIKINZOKU KOGYO K....

1. An organic iridium complex for an organic electroluminescent element represented by the following Formula
wherein R1, R2, and R3 are each a tert-butyl group or a hydrogen atom, and the ?-diketone ligand has at least one tert-butyl group; they may bond
each other to thereby form a saturated hydrocarbon ring when the ?-diketone ligand has two tert-butyl groups; A is a substituent
having a heterocyclic ring which is either a 5-membered ring or a 6-membered ring and containing nitrogen; the heterocyclic
ring of A is optionally fused to a benzene ring and may include sulfur atom (S) or oxygen atom (O) as a hetero atom other
than nitrogen (N); X is a hetero atom.

US Pat. No. 9,782,750

ACTIVATED CARBON FOR NOBLE METAL ADSORPTION, NOBLE METAL ADSORPTION FILTER, AND METHOD FOR RECOVERING NOBLE METALS

KURARAY CO., LTD., Kuras...

1. A method for recovering a noble metal from an aqueous solution comprising the noble metal, the method comprising:
adsorbing the noble metal on a filter, the filter comprising:
an activated carbon in a proportion of not less than 20% by mass; and
a binder;
wherein:
the activated carbon adsorbs a noble metal from an aqueous solution comprising the noble metal;
the activated carbon has a difference in absolute value of not more than 18 mV between a zeta-potential in a 10 mmol/L aqueous
solution of sodium tetraborate and a zeta-potential in a 0.01 mmol/L aqueous solution of sodium tetraborate; and

the activated carbon has a total pore volume of pores with a pore radius of not more than 1 nm of 150 to 500 mm3/g.

US Pat. No. 9,758,680

METAL PASTE FOR GAS SENSOR ELECTRODE FORMATION

TANAKA KIKINZOKU KOGYO K....

1. A metal paste for forming a gas sensor electrode, the metal paste consisting of a dispersion of:
a) a conductive particle consisting of Pt or a Pt alloy,
b) a ceramic powder consisting of zirconia or stabilized zirconia, or any of zirconia and stabilized zirconia and one or more
oxides of La, Ce, Pr, Nd, Sm, and Hf in a solvent,

c) an inorganic oxide particle containing alumina, and
d) an insoluble particle that is insoluble in the solvent, wherein the insoluble particle is one or more selected from the
group consisting of acryl, polyethylene, polyethylene terephthalate, polycarbonate, fluorine resin, and theobromine,

wherein 0.5 to 3.0 mass % of the inorganic oxide particle and 1.0 to 5.0 mass % of the insoluble particle are dispersed based
on mass of solid content of the conductive particle, the ceramic powder, the inorganic oxide particle, and the insoluble particle
to form the gas sensor electrode.

US Pat. No. 9,700,685

NEBULIZER MESH AND PRODUCTION METHOD THEREOF

TANAKA KIKINZOKU KOGYO K....

1. A nebulizer mesh which is used, in a nebulizer for atomizing and nebulizing liquid, for atomizing the liquid, comprising
a plurality of through holes,
wherein each of the through holes forms a cylindrical space portion on one surface side of the nebulizer mesh, and forms a
mortar shape opening on the other surface side, the content of platinum contained in a material constituting the nebulizer
mesh is 50% by mass or more and a thickness of the nebulizer mesh is 10-30 ?m, the cylindrical space portion has a height
from 0.5 ?m to 10 ?m and a diameter from 2 ?m to 4 ?m, and said mortar shape comprises a convex shape.

US Pat. No. 9,108,997

METHOD FOR RECYCLING ORGANIC RUTHENIUM COMPOUND FOR CHEMICAL VAPOR DEPOSITION

TANAKA KIKINZOKU KOGYO K....

1. A method for recycling an organic ruthenium compound for chemical vapor deposition by extracting an unreacted organic ruthenium
compound from a used raw material which has undergone a thin film formation process, wherein the used raw material comprises
any of the organic ruthenium compounds having the following chemical formulae, Chemical Formula 1, Chemical Formula 2, Chemical
Formula 3, and the method comprising the following steps (a) to (c), wherein order of the steps (a) to (c) is arbitrary and
the step (a) and the step (b) may be carried out simultaneously:
(a) a modification step in which the used raw material and a hydrogenation catalyst are brought into contact with each other
in a hydrogen atmosphere, thereby hydrogenating an oxidized organic ruthenium compound in the used raw material;

(b) an adsorption step in which the used raw material and an adsorbent are brought into contact with each other, thereby removing
impurities in the used raw material; and

(c) a restoration step in which the used raw material is heated at a temperature that is not lower than ?100° C. and not higher
than ?10° C. with respect to the decomposition temperature of the organic ruthenium compound for eight hours or more, thereby
adjusting a ratio of isomers of the organic ruthenium compound in the used raw material;
wherein Chemical Formula 1 is
wherein the substituent R is a linear chain or branched chain alkyl group;Chemical Formula 2 is
wherein the substituent R is a linear chain or branched chain alkyl group; andChemical Formula 3 is
wherein the substituent R is a linear chain or branched chain alkyl group.

US Pat. No. 9,666,382

SILVER AND COPPER ALLOYED RIVET CONTACT

TANAKA KIKINZOKU KOGYO K....

1. A rivet contact comprising a head portion and a foot portion having a smaller width than the head portion, wherein
the head portion has a contact material layer having at least a top comprising an Ag-based contact material,
a rest of the head portion and the foot portion comprise a base material containing Cu or a Cu alloy, and
a barrier layer comprising an Ag alloy is provided at a junction interface between the contact material layer and the base
material.

US Pat. No. 9,863,943

METHOD OF DETECTING PORK IN PROCESSED FOOD AND DETECTION KIT THEREFOR

TANAKA KIKINZOKU KOGYO K....

1. A method for detecting the presence of pork in a heat-processed food comprising
obtaining one or more immunizing antigens from raw fillet pork by preparing a slurry of minced raw fillet pork and removing
proteins other than the one or more immunizing antigens from the slurry of minced raw fillet pork by precipitation and centrifugation,
and then purifying the one or more immunizing antigens using a cation-exchange column to obtain the one or more immunizing
antigens being proteins having molecular weights showing color development at approximately 50 kD in an ion-exchange purified
fraction of an extract extracted from the raw fillet pork when analyzed by Coomassie staining of sodium dodecyl sulfate-polyacrylamide
gel electrophoresis, wherein the raw fillet pork is not heat treated,

immunizing an animal with the one or more immunizing antigens,
obtaining one or more polyclonal antibodies from the animal that was immunized with the one or more immunizing antigens,
detecting the presence of pork in the heat-processed food by using the one or more polyclonal antibodies as detection antibodies
to detect the presence of one or more porcine proteins contained in heat-treated pork having a molecular weight of approximately
23 kD, wherein proteins other than porcine proteins are not detected,

wherein the pork in the heat-processed food is heated to 100° C. or higher.

US Pat. No. 9,783,429

METHOD FOR PURIFYING DODECACARBONYL TRIRUTHENIUM

TANAKA KIKINZOKU KOGYO K....

1. A method for purifying dodecacarbonyl triruthenium (DCR), for purifying, by a recrystallization method, an organic ruthenium
compound including DCR represented by a following formula as a raw material for chemical vapor deposition:

the method comprises a recrystallization step of purifying DCR by a recrystallization method,
the recrystallization step includes a dissolution stage of dissolving DCR in a solvent, a precipitation stage of precipitating
DCR from the solvent, and a recovery stage of recovering the precipitated DCR, wherein

at least the dissolution stage is performed with a dissolved oxygen concentration in the solvent being 0.2 mg/L or less.

US Pat. No. 9,502,224

MAGNETRON SPUTTERING TARGET AND METHOD FOR MANUFACTURING THE SAME

TANAKA KIKINZOKU KOGYO K....

1. A magnetron sputtering target having a ferromagnetic metal element, the magnetron sputtering target including a sintered
body that comprises:
a magnetic phase containing the ferromagnetic metal element;
a plurality of non-magnetic phases that each contain the ferromagnetic metal element and that are different in constituent
elements or a content ratio of constituent elements; and

an oxide phase,
wherein an average size of at least one of the plurality of non-magnetic phases, which is interspersed with the oxide phase,
is smaller than an average size of the magnetic phase.

US Pat. No. 9,674,953

FINE SILVER PARTICLE INK, FINE SILVER PARTICLE SINTERED BODY, AND METHOD FOR PRODUCING FINE SILVER PARTICLE INK

TANAKA KIKINZOKU KOGYO K....

1. A method for producing a silver particle ink, the method comprising:
a first step of kneading silver oxalate and N,N-dimethyl-1,3-diaminopropane;
a second step of kneading the kneading product obtained in the first step with hexylamine, dodecylamine and oleic acid, and
thereby forming a silver complex;

a third step of heating and stirring the silver complex, and thereby producing fine silver particles; and
a dispersion step of dispersing the fine silver particles obtained in the third step in a solvent to form an ink, wherein
the silver oxalate is wetted with 30 to 200 wt % of a solvent in advance.

US Pat. No. 9,565,776

METHOD FOR TREATING SUBSTRATE THAT SUPPORT CATALYST PARTICLES FOR PLATING PROCESSING

Tanaka Kikinzoku Kogyo K....

1. A method for treating a substrate, the method including bringing a substrate into contact with a colloidal solution containing
metal particles in order to support the metal particles that serve as a catalyst for forming a plating layer on the substrate,
wherein the colloidal solution contains metal particles formed of Pd and having a particle size of 0.6 nm to 4.0 nm and a
face-to-face dimension of a plane 111 of 2.254 Å or more but 2.388 Å or less.

US Pat. No. 9,561,952

HERMETIC-SEALING PACKAGE MEMBER, PRODUCTION METHOD THEREFOR, AND HERMETICALLY-SEALED PACKAGE PRODUCTION METHOD USING THIS HERMETIC-SEALING PACKAGE MEMBER

TANAKA KIKINZOKU KOGYO K....

1. A hermetic-sealing package member comprising a substrate and at least one frame-like sealing material for defining a sealing
region formed on the substrate, wherein
the sealing material is formed of a sintered body obtained by sintering of at least one metal powder selected from gold, silver,
palladium, or platinum having a purity of 99.9 wt % or greater and an average particle size of 0.005 ?m to 1.0 ?m, and

the sealing material is formed such that a shape of an arbitrary cross-section toward an outside from the sealing region includes
a base portion having a certain height and at least one mountain portion protruding from the base portion, and a length of
an upper end of the sealing material is shorter than a length of a lower end.

US Pat. No. 9,851,237

CONTACT MATERIAL SUITABLE FOR SLIDER FOR FUEL SENDER, AND SLIDER FOR FUEL SENDER

TANAKA KIKINZOKU KOGYO K....

1. A slider for a fuel sender, said slider being capable of moving on a conductor in conjunction with a float capable of moving
in accordance with a liquid level, said slider comprising a contact material which comprises 10 to 25 mass % of nickel and
a balance being palladium, which contact material has been formed by melt casting.
US Pat. No. 9,668,343

PHOTOCURABLE ELECTROCONDUCTIVE INK COMPOSITION

TANAKA KIKINZOKU KOGYO K....

1. A photocurable electroconductive ink composition comprising:
(A) an oligomer of urethane acrylates,
(B) three types of acrylates comprising (a) at least one monofunctional acrylate, (b) at least one difunctional acrylate,
and (c) at least one trifunctional acrylate and/or at least one tetrafunctional acrylate,

(C) an electroconductive filler,
(D) two or more types of photopolymerization initiators selected from 1-hydroxycyclohexyl phenyl ketone, bis(2,4,6-trimethylbenzoyl)-phenylphosphine
oxide, 2-methyl-1-(4-methylthiophenyl)-2-morpholinopropan-1-one, benzophenone and 2,4-diethylthioxanthone, and

(E) a polymeric dispersing agent having a main chain skeleton which is a polyether skeleton, a polyurethane skeleton, a polyacrylate
skeleton, a polyester skeleton, a polyamide skeleton, polyimide skeleton, or polyurea skeleton, wherein

the amount of acrylates (B) is from 10 to 16% by mass, based on the total mass of photocurable electroconductive ink composition,
the amount of the electroconductive filler (C) to be mixed is from 77 to 85% by mass based on the total mass of the photocurable
electroconductive ink composition, and

80% by mass or more of the electroconductive filler (C) is a scaly, foil-like or flakey silver powder having a particle size
corresponding to a particle size distribution at 50% of more than 5 ?m.

US Pat. No. 10,053,479

RAW MATERIAL AND PRODUCTION METHOD FOR CYCLOMETALATED IRIDIUM COMPLEX

TANAKA KIKINZOKU KOGYO K....

1. A method for producing a cyclometalated iridium complex, comprising the step of reacting a raw material for a cyclometalated iridium complex including an organic iridium material and one or more aromatic heterocyclic bidentate ligand of Chemical Formula 2 in a solvent having a boiling point at normal pressure of 160° C. to 300° C., wherein the reaction temperature is 100° C. to 300° C., thereby producing a facial isomer of any one of triscyclometalated iridium complex of Chemical Formula 3, in which three aromatic heterocyclic bidentate ligands are coordinated to the iridium atom,wherein the raw material comprises an organic iridium material which is a tris(?-diketonato)iridium(III) represented by Chemical Formula 1, in which an asymmetric ?-diketone is coordinated to iridium,


wherein in Chemical Formula 1, O represents an oxygen atom; Ra and Rb are each an alkyl group of C1-5, and Ra and Rb are not the same; either Ra or Rb is a methyl group; and Rc is a hydrogen atom, and wherein in Chemical Formula 2, R1 to R48 each represent a hydrogen atom, an alkyl group, an aryl group, or a halogen atom; and * indicates a site of bonding to iridium.

US Pat. No. 9,901,985

METHOD FOR MANUFACTURING SILVER PARTICLES

TANAKA KIKINZOKU KOGYO K....

1. A method for producing silver particles by use of a thermally-decomposable silver-amine complex as a precursor and heating
of a reaction system containing the precursor, comprising:
a process (a): mixing a thermally-decomposable silver compound with an amine to produce a silver-amine complex as a precursor,
and to form a reaction system comprising the precursor;

a process (b): adding an organic compound, which has an amide as a skeleton, represented by a following formula to the reaction
system


(R is hydrogen, hydrocarbon, an amino group, or a combination thereof; R? and R? are hydrogen or hydrocarbon);
a process (c): setting the water content in the reaction system, wherein the reaction system comprises water and the water
content in the reaction system is set at is 20 to 100 parts by weight relative to 100 parts by weight of the silver compound;
and

a process (d): heating the reaction system, whereby the produced silver particles have diameters such that the ratio of standard
deviation of the particle diameters to the average particle diameter is about 0.3 or less.

US Pat. No. 9,982,155

PHOTOCURABLE ELECTROCONDUCTIVE INK COMPOSITION

TANAKA KIKINZOKU KOGYO K....

1. A photocurable electroconductive ink composition for screen printing, the composition comprising:(A) an electroconductive filler;
(B) a photopolymerizable resin precursor consisting of an oligomer of urethane acrylate, monofunctional acrylate and polyfunctional acrylate;
(C) an alkyd resin;
(D) two or more photopolymerization initiators; and
(E) a polymer dispersant,
a. wherein the content of the electroconductive filler (A) is 70 to 90 mass % relative to the total mass of the photocurable electroconductive ink composition, and more than 50 mass % of the electroconductive filler is silver powder in a scale-like, foil-like or flake-like form having a particle diameter at 50% particle size distribution of 0.3 to 3.0 ?m,
b. the content of the photopolymerizable resin precursor (B) is 10 to 24 mass % relative to the total mass of the photocurable electroconductive ink composition, and the content of the oligomer of urethane acrylate is 5 mass % or less relative to the total mass of the photocurable electroconductive ink composition, and
c. the content of the alkyd resin (C) is 1 to 10 mass % relative to the total mass of the photocurable electroconductive ink composition.

US Pat. No. 10,137,496

METAL WIRE ROD COMPOSED OF IRIDIUM OR IRIDIUM ALLOY

TANAKA KIKINZOKU KOGYO K....

1. A metal wire rod composed of iridium or an iridium alloy, wherein the number of crystal grains on all cross-sections parallel to the longitudinal direction is 2 to 20 per 0.25 mm2, wherein the wire rod has a Vickers hardness of 200 Hv or more and less than 400 Hv.
US Pat. No. 10,047,415

METALLIC WIRE ROD COMPRISING IRIDIUM-CONTAINING ALLOY

Tanaka Kikinzoku Kogyo K....

1. A metallic wire rod comprising iridium or an iridium-containing alloy, wherein the wire rod has a diameter of less than 12 mm, which wire rod comprises a central area and an outer periphery, wherein the outer periphery has a biaxial crystal orientation and wherein the outer periphery has an abundance ratio of crystal textures of 50% or more across the diameter of the wire rod, and which outer periphery has a crystallographic orientation which is oriented in the <100> direction.

US Pat. No. 10,103,077

SEALING CAP FOR ELECTRONIC COMPONENT

TANAKA KIKINZOKU KOGYO K....

1. An electronic component cap for producing a package having a sealed region by being bonded to a base, whereinthe cap has a brazing material-fused surface to which a brazing material is fused and a sealing surface corresponding to the sealed region,
the brazing material-fused surface has a non-flat work surface formed by plastic working, and
a ratio (Sc/Sf) of a surface area (Sc) of the brazing material-fused surface per unit area to a surface area (Sf) of the sealing surface per unit area satisfies 1

US Pat. No. 9,889,261

NEBULIZER MESH AND PRODUCTION METHOD THEREOF

Tanaka Kikinzoku Kogyo K....

1. A method for producing a nebulizer mesh which is used, in a nebulizer for atomizing and nebulizing liquid, for atomizing
the liquid, and has plural through holes, comprising:
a first step of forming a first resist pattern in a predetermined shape on a matrix; a second step of subsequently forming
a second resist pattern in a cylindrical shape on the first resist pattern; a third step of performing metal plating and forming
through holes of the nebulizer mesh, after the second step; and a fourth step of removing the matrix and the first and second
resist patterns,

wherein each of the through holes formed by the third step forms a cylindrical space portion on one surface side of the nebulizer
mesh and forms an opening opened in a mortar shape on the other surface side, and

the shape of the cylindrical space portion of the through hole is determined by the shape of the second resist pattern formed
in the second step.

US Pat. No. 9,928,996

MAGNETRON SPUTTERING TARGET AND PROCESS FOR PRODUCING THE SAME

TANAKA KIKINZOKU KOGYO K....

1. A process for producing a magnetron sputtering target, the process comprising the steps of:forming a magnetic powder mixture by mixing and dispersing an oxide powder and a magnetic metal powder, the magnetic metal powder containing a ferromagnetic metal element;
forming a plurality of non-magnetic powder mixtures by separately mixing and dispersing an oxide powder and each of a corresponding plurality of non-magnetic metal powders, each of the plurality of non-magnetic metal powders containing the ferromagnetic metal element, each of the plurality of non-magnetic metal powders containing a different constituent element from each other or containing constituent elements at different ratios from each other; and
mixing and dispersing the magnetic powder mixture and the plurality of non-magnetic powder mixtures to obtain a powder mixture for pressure sintering.
US Pat. No. 9,905,859

CATALYST FOR SOLID POLYMER FUEL CELL AND METHOD FOR MANUFACTURING THE SAME

TANAKA KIKINZOKU KOGYO K....

1. A catalyst for solid polymer fuel cell having catalyst particles comprising platinum, cobalt and magnesium supported on
a carbon powder carrier, wherein a composition ratio (molar ratio) among platinum, cobalt and magnesium in the catalyst particles
is Pt:Co:Mg=1:0.4 to 0.5:0.00070 to 0.00095, the catalyst particles having an X-ray diffraction pattern comprising a highest
peak around 2?=41.0°-41.5°.

US Pat. No. 10,153,072

TEXTURED SUBSTRATE FOR FORMING EPITAXIAL FILM AND METHOD FOR PRODUCING THE SAME

TANAKA KIKINZOKU KOGYO K....

1. A textured substrate for forming an epitaxial film, comprising a textured metal layer on at least one surface of the textured substrate, whereinthe textured metal layer comprises a copper layer having a cube texture,
the textured metal layer has, on a surface of the layer, palladium added in an amount of 10 to 300 ng/mm2 per unit area, and
a hydrogen content of the surface of the textured metal layer is 700 to 2000 ppm.

US Pat. No. 10,106,691

METAL PASTE FOR GAS SENSOR ELECTRODE FORMATION

TANAKA KIKINZOKU KOGYO K....

1. A metal paste for forming a gas sensor electrode, the metal paste consisting of a dispersion of:a) a conductive particle consisting of Pt or a Pt alloy,
b) a ceramic powder consisting of zirconia or stabilized zirconia, or any of zirconia and stabilized zirconia and one or more oxides of La, Ce, Pr, Nd, Sm, and Hf in a solvent,
c) an inorganic oxide particle consisting of alumina, and
d) an insoluble particle that is insoluble in the solvent, wherein the insoluble particle is one or more selected from the group consisting of graphite and diamond powder,
wherein 0.5 to 3.0 mass % of the inorganic oxide particle and 1.0 to 15.0 mass % of the insoluble particle are dispersed based on mass of solid content of the conductive particle, the ceramic powder, the inorganic oxide particle, and the insoluble particle to form the gas sensor electrode.
US Pat. No. 9,952,207

IMMUNOCHROMATOGRAPHY REAGENT COMPRISING A NONIONIC SURFACTANT, BICINE, AND CASEIN, AND MEASUREMENT METHOD USING THE SAME

TANAKA KIKINZOKU KOGYO K....

1. An immunochromatographic detection system comprising:an immunochromatography reagent composition that makes contact with a specimen,
wherein the immunochromatography reagent composition comprises a nonionic surfactant from 0.01 to 10 weight %, an N,N-bis(2-hydroxyethyl)glycine buffer from 10 to 200 mM, and casein from 0.01 to 20 weight %; a chromatographic medium; and
a labelling substance.

US Pat. No. 9,960,431

CATALYST FOR SOLID POLYMER FUEL CELL AND METHOD FOR MANUFACTURING THE SAME

TANAKA KIKINZOKU KOGYO K....

1. A catalyst for solid polymer fuel cell having catalyst particles comprising platinum, cobalt and manganese supported on a carbon powder carrier, whereina composition ratio (molar ratio) among platinum, cobalt and manganese in the catalyst particles is Pt:Co:Mn=1:0.06 to 0.39:0.04 to 0.33,
a peak intensity ratio of a Co—Mn alloy appearing in the vicinity of 2?=27° is 0.15 or less with respect to a main peak appearing in the vicinity of 2?=40° in X-ray diffraction analysis of the catalyst particles, and
a fluorine compound having a C—F bond is supported at least on a surface of the catalyst particles,
wherein a peak ratio of a CoPt3 alloy and a peak ratio of a MnPt3 alloy appearing in the vicinity of 2?=32° are each 0.13 or more with respect to a main peak appearing in the vicinity of 2?=40° in X-ray diffraction analysis of the catalyst particles.

US Pat. No. 10,081,855

HEAT-RESISTANT NI-BASE ALLOY AND METHOD OF PRODUCING THE SAME

TANAKA KIKINZOKU KOGYO K....

1. A heat-resistant Ni-base alloy comprising a Ni—Ir—Al—W alloy having essential additive elements of Ir, Al, and W added to Ni, wherein the heat-resistant Ni-base alloy contains Ir: 5.0 to 45.0 mass %, Al: 1.0 to 8.0 mass %, and W: 5.0 to 20.0 mass %, the balance being Ni, anda ?? phase having an L12 structure precipitates and disperses in a matrix as an essential strengthening phase.

US Pat. No. 10,125,158

METHOD FOR MANUFACTURING IRIDIUM COMPLEX

TANAKA KIKINZOKU KOGYO K....

1. A method for manufacturing tris(?-diketonato)iridium shown by Chem 2 in which a ?-diketone is coordinated to iridium, by reacting the ?-diketone shown by Chem 1 with an iridium compound which is any one of iridium nitrate (III, IV), iridium chloride (III, IV), and ammonium hexachloroiridate (III, IV), whereinan activation treatment including (a) an alkali treatment and (b) an acid treatment described below is applied to the iridium compound to activate the iridium compound, and to subsequently react the ?-diketone,
(a) an alkali treatment: a treatment of adding alkali to a solution of the iridium compound to raise pH of the solution to a more alkaline side than that before the alkali addition and to not less than 10, and
(b) an acid treatment: a treatment of adding acid to the solution subjected to the alkali treatment to lower pH of the solution to a more acidic side than that before the acid addition and to make the pH difference between solutions before and after the acid addition be not less than 0.1 and not more than 10,

wherein each of Ra and Rb is a hydrocarbon group or substituents in which a hydrogen atom in a hydrocarbon group is substituted by a halogen atom, Ra and Rb may be different substituents, or identical substituents, Rc is a substituent composed of any of a hydrogen atom, a halogen atom and a hydrocarbon group; and

wherein Ra, Rb, and Rc have the same meaning as in Chem 1.

US Pat. No. 10,125,015

PACKAGE PRODUCTION METHOD AND PACKAGE PRODUCED BY THE METHOD

TANAKA KIKINZOKU KOGYO K....

1. A package production method, comprising the step of superposing a pair of substrates on each other, and bonding the substrates to each other to hermetically seal the inside of a sealing region surrounded by a sealing material, the sealing material being formed on at least one of the substrates, whereinthe sealing material is formed of a sintered body obtained by sintering a metal powder of at least one selected from gold, silver, palladium and platinum, the metal powder having a purity of 99.9% by weight or more and an average particle size of 0.005 ?m to 1.0 ?m,
at least one core material having a width smaller than the width of the sealing material in a cross-sectional shape, and protruding from the periphery is formed on the substrate,
the core material compresses the sealing material when the pair of substrates are bonded to each other,
A bulk-like metal film including any metal selected from gold, silver, palladium, platinum, titanium, chromium, copper, tungsten, nickel and an alloy of these metals is formed on a surface of the substrate, andthe bulk-like metal film including any metal selected from gold, silver, palladium, platinum, titanium, chromium, copper, tungsten, nickel and an alloy of these metals is formed on a top surface of the core material.
US Pat. No. 10,094,012

NI-IR-BASED HEAT-RESISTANT ALLOY AND PROCESS FOR PRODUCING SAME

TANAKA KIKINZOKU KOGYO K....

1. A NiIr-base heat-resistant alloy comprisinga Ni—Ir—Al—W-base alloy which contains Ir: 5.0 to 50.0 mass %, Al: 1.0 to 8.0 mass %, W: 5.0 to 20.0 mass %, and the balance being Ni, and
a ?? phase as an essential strengthening phase having an L12 structure precipitated and dispersed in a matrix, wherein
a ratio (Y/X) of a peak intensity (Y) of (201) plane of the Ir3W phase observed in the range of 2?=48° to 50° to a peak intensity (X) of (111) plane of the ?? phase observed in the range of 2?=43° to 45° in X-ray diffraction analysis is 0.5 or less.

US Pat. No. 10,131,987

RAW MATERIAL FOR CHEMICAL DEPOSITION INCLUDING ORGANORUTHENIUM COMPOUND, AND CHEMICAL DEPOSITION METHOD USING THE RAW MATERIAL FOR CHEMICAL DEPOSITION

TANAKA KIKINZOKU KOGYO K....

1. A raw material for chemical deposition, for producing a ruthenium thin film or a ruthenium compound thin film by a chemical deposition method,the raw material for chemical deposition comprising an organoruthenium compound represented by the following formula, in which a derivative of a cyclohexadienyl group and a derivative of a pentadienyl group are coordinated to ruthenium, the organoruthenium compound having a decomposition temperature of 210° C. or more and 240° C. or less:

wherein the derivative of a cyclohexadienyl group is such that, out of the substituents R1 to R7, two to four substituents are each a hydrogen atom, and the remaining substituents are each a methyl group or an ethyl group, with the proviso that the substituents R6 and R7 are each a methyl group or an ethyl group, and
the derivative of a pentadienyl group is dimethylpentadienyl wherein, out of the substituents R8 to R12, R8, R10, and R12 are each a hydrogen atom, and the substituents R9 and R11 are each a methyl group.
US Pat. No. 9,368,805

CATALYST FOR POLYMER ELECTROLYTE FUEL CELL AND METHOD FOR PRODUCING THE SAME

TANAKA KIKINZOKU KOGYO K....

1. A catalyst for a polymer electrolyte fuel cell comprising catalyst particles made of platinum supported on a carbon powder
carrier, wherein the carbon powder carrier comprises 0.81 to 3.0 mmol/g, based on the weight of the carrier, of a hydrophilic
group bonded thereto; and the platinum particles have an average particle size of 3.5 to 8.0 nm and the platinum specific
surface area based on CO adsorption of 40 to 100 m2/g, wherein the hydrophilic group comprises a lactone group and at least one of a hydroxyl group and a carboxyl group.

US Pat. No. 10,186,404

FEPT—C-BASED SPUTTERING TARGET AND METHOD FOR MANUFACTURING SAME

TANAKA KIKINZOKU KOGYO K....

1. An FePt—C-based sputtering target containing Fe, Pt, and C, whereinthe FePt—C-based sputtering target has a structure in which primary particles of C that contain unavoidable impurities are dispersed in an FePt-based alloy phase containing 33 at % or more and 60 at % or less of Pt with the balance being Fe and unavoidable impurities, the primary particles of C being dispersed so as not to be in contact with each other.

US Pat. No. 10,176,958

ELECTRODE MATERIAL FOR THERMAL-FUSE MOVABLE ELECTRODE

TANAKA KIKINZOKU KOGYO K....

1. An electrode material constituting a movable electrode of a thermal fuse, comprising:a five-layer clad structure comprising
a core material layer comprising Cu,
an intermediate layer comprising an Ag—Cu-based alloy formed on the both sides of the core material layer, and
a surface layer comprising an Ag—CuO-based oxide-dispersed strengthened alloy formed on each intermediate layer,
wherein the Ag—Cu-based alloy as an intermediate layer does not have a dispersion layer,
the ratio of the thickness of the intermediate layer to the thickness of the surface layer is 0.2 or more and 1.0 or less, and
the thickness of the surface layer comprising an Ag—CuO-based oxide-dispersed strengthened alloy is 15 ?m or more.
US Pat. No. 10,256,113

TRANSFER SUBSTRATE FOR FORMING METAL WIRING AND METHOD FOR FORMING METAL WIRING WITH THE TRANSFER SUBSTRATE

TANAKA KIKINZOKU KOGYO K....

1. A metal wiring formation method comprising:(a) providing a transfer substrate for transferring a metal wiring material to a transfer target, said transfer substrate comprising:
a substrate;
at least one metal wiring material formed on the substrate;
at least one coating layer formed on a surface of the metal wiring material; and
an underlying metal film formed between the substrate and the metal wiring material, wherein the metal wiring material comprises a composition formed by sintering one or more kinds of metal powder having a purity of 99.9 wt % or more and an average particle size of 0.01 ?m to 1.0 ?m selected from gold powder, silver powder, platinum powder, palladium powder and copper powder;
the coating layer comprises one or more of any metal of gold, silver, platinum, palladium, ruthenium, rhodium, iridium, chromium, titanium, tungsten, tantalum, nickel, copper and zirconium or an alloy thereof;
the coating layer comprises a metal or an alloy having a different composition from the composition of the metal wiring material and has a total thickness of 1 ?m or less; and
the underlying metal film comprises one or more of any metal of gold, silver, platinum, palladium, ruthenium, rhodium, iridium, chromium, titanium, tungsten, tantalum, nickel, copper and zirconium or an alloy thereof;
(b) stacking the transfer substrate so as to be opposite to a transfer target;
(c) heating the transfer substrate and the transfer target; and
(d) pressing the transfer substrate to join and transfer the metal wiring material to the transfer target, wherein a heating temperature of the transfer substrate is set to 80 to 200° C.; and a heating temperature of the transfer target is set to 80 to 300° C.,
wherein a pressure at the time of pressing the transfer substrate is set to 0.1 to 1.5 times the yield strength of the metal wiring material.

US Pat. No. 10,246,770

SILICIDE ALLOY FILM FOR SEMICONDUCTOR DEVICE ELECTRODE, AND PRODUCTION METHOD FOR SILICIDE ALLOY FILM

TANAKA KIKINZOKU KOGYO K....

1. A silicide alloy film that is formed on a substrate containing Si: comprising, a metal M1 having a work function of 4.6 eV or more and 5.7 eV or less, a metal M2 having a work function of 4.0 eV or less, and Si having a work function of 4.3 eV or more and 4.9 eV or less; and in a relationship of the peak intensity (X) of a diffraction peak of a mixed crystal (M1xM2ySi) including the metal M1, the metal M2 and Si, the peak intensity (Y) of a diffraction peak of a silicide (M1aSi) of the metal M1 and the peak intensity (Z) of a diffraction peak of a silicide (M2bSi) of the metal M2, which are observed by X-ray diffraction analysis, the ratio ((Y+Z)/X) of the sum of Y and Z to X is 0.1 or less, wherein M1 is Pt and M2 is Hf.
US Pat. No. 10,234,456

IMMUNOCHROMATOGRAPHY DEVICE FOR DETECTING RSV

TANAKA KIKINZOKU KOGYO K....

1. An immunochromatography device comprising a chromatography medium having a determination region on which at least one antibody that specifically binds to an F protein of RSV and at least one antibody that specifically binds to an N protein of RSV are jointly immobilized.

US Pat. No. 10,266,730

THERMALLY AND ELECTRICALLY CONDUCTIVE ADHESIVE COMPOSITION

TANAKA KIKINZOKU KOGYO K....

3. The thermally and electrically conductive adhesive composition according to claim 2, wherein the submicron fine silver powder used in the electrically conductive filler (A) is coated with a coating agent, a surface of the coating agent comprising carboxylic acid.

US Pat. No. 10,378,086

SLIDING CONTACT MATERIAL AND METHOD FOR MANUFACTURING SAME

TANAKA KIKINZOKU KOGYO K....

1. A sliding contact material, comprising:Cu of 6.0% by mass or more and 9.0% by mass or less;
Ni of 0.1% by mass or more and 2.0% by mass or less;
an additive element M of 0.1% by mass or more and 0.8% by mass or less; and the balance being Ag and inevitable impurities, wherein: the additive element M is at least one element selected from the group consisting of Sm, La and Zr;
the sliding contact material has, as a material structure thereof, a material structure in which dispersion particles containing an intermetallic compound containing at least both of Ni and an additive element M are dispersed in an Ag alloy matrix; and a ratio of a Ni content (% by mass) and a content of an additive element M (% by mass) (KNi/KM) in the dispersion particles falls within a range below,
when an additive element M is Sm or La: 1.50 or more and 2.50 or less; when an additive element M is Zr: 1.80 or more and 2.80 or less.

US Pat. No. 10,485,112

CERAMIC CIRCUIT SUBSTRATE AND METHOD FOR PRODUCING CERAMIC CIRCUIT SUBSTRATE

TANAKA KIKINZOKU KOGYO K....

1. A ceramic circuit substrate comprising:a ceramic substrate;
a copper circuit made of a copper-based material bonded, via a first bonding layer, to a surface of the ceramic substrate; and
a copper heat sink made of the copper-based material bonded, via a second bonding layer, to the other surface of the ceramic substrate,
wherein the bonding layers each include a brazing material component comprising at least two or more kinds of metals together with Ag and Cu serving as essential components, at least one active metal, the active metal, in the bonding layers, having a content ranging, relative to a metallic element content in each of the whole bonding layers, from 0.5 mass % to 2.0 mass % inclusive, and the Cu, in each of the bonding layers, having a content ranging from 20 mass % to 40 mass % inclusive,
wherein the bonding layers each have a two-layer structure of:
a brazing material layer comprising the brazing material component but not the active metal, and
an active metal compound layer containing the active metal, the active metal compound layer being formed along a bonded interface between the ceramic substrate and the bonding layer, and
wherein, further, a ratio of a bonding area between the active metal compound layer and the ceramic substrate in a bonding area between each of the bonding layers and the ceramic substrate is 88% or more.

US Pat. No. 10,435,321

STIRRER FOR GLASS MANUFACTURE

TANAKA KIKINZOKU KOGYO K....

1. A stirrer for manufacturing glass, comprising a stirrer shaft and a plurality of rod-shaped stirrer blades penetrating through and fixed to the stirrer shaft, whereineach of the rod-shaped stirrer blade is a hollow cylindrical body comprising:
a cylinder obtained by seam welding of two opposing sides of a flat plate made of (i) strengthened platinum containing platinum as a matrix and metallic oxide dispersed in the plate or (ii) a strengthened platinum alloy containing a platinum alloy as a matrix and metallic oxide dispersed in the plate; and
a disk welded to an entire circumference of both ends of the cylinder and made from an identical material,
wherein each of the rod-shaped stirrer blades penetrates through the stirrer shaft so that a weld line due to the seam welding crosses a center axis of the stirrer shaft, and is fixed so that the end portions of the respective blades follow a spiral around the stirrer shaft,
the stirrer shaft having the rod-shaped stirrer blades welded at the root portion of each stirrer blade,
each of the rod-shaped stirrer blades has a core layer within the walls of the cylinder having the matrix and metallic oxide dispersed structure, wherein the core layer has not been thermally affected by welding.

US Pat. No. 10,466,237

METHOD FOR EXCLUDING PROZONE PHENOMENON IN IMMUNOLOGICAL MEASUREMENT REAGENT

TANAKA KIKINZOKU KOGYO K....

1. An immunochromatography device for detecting a detection target in an analyte, comprising a sample addition part, a labeling substance retaining part, a chromatography medium having a detection part, and an absorption part, wherein a nonionic and hydrophilic surfactant having an Hydrophile-Lipophile Balance (HLB) value of 13 to 18 is retained at least in the sample addition part, and a membrane having a fast flow speed is used for the chromatography medium, wherein the flow speed of the membrane is 75 sec/40 mm or less.

US Pat. No. 10,407,450

HETEROGENEOUS POLYNUCLEAR COMPLEX FOR USE IN THE CHEMICAL DEPOSITION OF COMPOSITE METAL OR METAL COMPOUND THIN FILMS

TANAKA KIKINZOKU KOGYO K....

1. A chemical deposition raw material for producing a composite metal thin film or a composite metal compound thin film by a chemical deposition method, comprising a heterogeneous polynuclear complex in which as ligands, at least a diimine (L) and a carbonyl are coordinated to a first transition metal (M1 ) and a second transition metal (M2) as central metals, the heterogeneous polynuclear complex being represented by the following formula:wherein M1 and M2 are different transition metals; x is an integer of 0 or more and 2 or less, y is an integer of 1 or more and 2 or less, and z is an integer of 1 or more and 10 or less; R1 to R4 are each one of a hydrogen atom and an alkyl group with a carbon number of 1 or more and 5 or less; and R5 is a hydrogen atom, a carbonyl, an alkyl group with a carbon number of 1 or more and 7 or less, an allyl group or an allyl derivative.

US Pat. No. 10,407,326

WASTE LIQUID TREATMENT DEVICE AND WASTE LIQUID TREATMENT METHOD

TANAKA KIKINZOKU KOGYO K....

1. A waste liquid treatment device for treating water that contains hydrogen peroxide and sulfuric acid, comprising:a housing,
an introduction port associated with the housing and that introduces the water that contains hydrogen peroxide and sulfuric acid into the housing,
a discharge port associated with the housing for discharging treated water, and
a plurality of channel-defining members that are disposed within the housing and each channel-defining member having a surface coated with a catalyst capable of decomposing hydrogen peroxide,
wherein the plurality of channel-defining members define, between the introduction port and the discharge port, a channel for the water, the channel having a turning in at least one position,
wherein the plurality of channel-defining members comprise:
one or more first channel-defining members attached to both a bottom of the housing and a first lateral side thereof and
one or more second channel-defining members attached to both the bottom of the housing and a second lateral side thereof, the second later side facing the first lateral side;
the one or more first channel-defining members and one or more second channel-defining members are alternately arranged between the introduction port and the discharge port to define the channel so that the water flows while turning back at at least two horizontally different positions, and
a distance between each of the catalysts that face with each other across the channel is the same as a distance between the first channel-defining member and the second channel-defining member that face each other across the channel.

US Pat. No. 10,465,283

ORGANOPLATINUM COMPOUND FOR USE IN THE CHEMICAL DEPOSITION OF PLATINUM COMPOUND THIN FILMS

TANAKA KIKINZOKU KOGYO K....

1. A raw material for chemical deposition for manufacturing a platinum thin film or a platinum compound thin film by a chemical deposition method, the raw material comprisingan organoplatinum compound in which an alkenyl amine and alkyl anions that are coordinated to a divalent platinum as shown by a formula below,
wherein n is 1 or more and 5 or less; each of R1 to R5 represents any one of a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an amino group, an imino group, a cyano group and an isocyano group, and each has a carbon number of not more than 4; and each of R6 and R7 represents an alkyl group having a carbon number of 1 or more and 3 or less.

US Pat. No. 10,454,113

CATALYST FOR SOLID POLYMER FUEL CELL AND METHOD FOR PRODUCING SAME

TANAKA KIKINZOKU KOGYO K....

1. A catalyst for a solid polymer fuel cell comprising:catalyst particles of platinum, cobalt and manganese; and
a carbon powder carrier supporting the catalyst particles, wherein
the catalyst particles were formed by subjecting the carbon powder carrier to a reduction treatment in a metal salt solution of platinum to form a platinum catalyst, and subjecting the platinum catalyst to metal salt solutions of cobalt and manganese either separately or as a mixture of metal salt solutions of cobalt and manganese,
a molar ratio of the platinum, cobalt and manganese of the catalyst particles is of Pt:Co:Mn=1:0.26 to 0.39:0.04 to 0.13, and
in an X-ray diffraction analysis of the catalyst particles, a peak intensity ratio of a Co—Mn alloy appearing around 2?=27° is 0.15 or less on the basis of a main peak appearing around 2?=40°,
wherein in an X-ray diffraction analysis of the catalyst particles, a peak ratio of a peak of a CoPt3 alloy and an MnPt3 alloy appearing around 2?=32° is 0.14 or more on the basis of a main peak appearing around 2?=40°.

US Pat. No. 10,441,943

CATALYST FOR HYDROGEN PEROXIDE DECOMPOSITION, PROCESS FOR PRODUCING THE SAME, AND METHOD FOR DECOMPOSING HYDROGEN PEROXIDE USING THE CATALYST

TANAKA KIKINZOKU KOGYO K....

1. A catalyst for hydrogen peroxide decomposition for use in decomposing hydrogen peroxide present in acid-containing water to be treated containing sulfuric acid in a concentration of 5% mass or more, comprising:a base;
a catalyst layer that is amorphous, comprises a platinum-group metal having catalytic function and a Group-6 element metal having catalytic function and is formed over the base; and
a corrosion-resisting interlayer consisting of platinum or gold that coats the base and is between the base and catalyst layer, the interlayer having a thickness of 0.1 to 10 ?m.

US Pat. No. 10,497,942

METHOD FOR MANUFACTURING CATALYST HAVING SUPPORTED CATALYST PARTICLES OF CORE/SHELL STRUCTURE

TANAKA KIKINZOKU KOGYO K....

1. A method of manufacturing a catalyst comprising a catalytic particle supported on a carrier, the carrier comprising electrically-conductive carbon powder or electrically-conductive ceramic powder, the catalytic particle having a core/shell structure comprising: a shell layer; and a core particle covered with the shell layer and comprising a metal other than platinum, the method comprising the steps of:subjecting said catalytic-particle-supported carrier to electrolysis in a copper-ion-containing electrolytic solution, thereby depositing copper on a surface of the core particle, as an electrolytic treating process; and
bringing a platinum compound solution into contact with the copper-deposited core particle to substitute the copper on the surface of the core particle with platinum, thereby forming a shell layer comprising platinum, as a substitution reaction process;
wherein the platinum compound solution in the substitution reaction process contains citric acid,
prior to the electrolytic treating process, an electrolytic apparatus is placed within a closed space where an oxygen concentration has been reduced before introduction of the electrolytic apparatus, and bubbling of inert gas is performed into the electrolytic solution for 4 hours or more and 48 hours or less, and
an amount of dissolved oxygen in the electrolytic solution in the electrolytic treating process is controlled to 1 ppm or lower.

US Pat. No. 10,490,376

RIVET-TYPE CONTACT AND METHOD FOR MANUFACTURING THE SAME

TANAKA KIKINZOKU KOGYO K....

1. A rivet-type contact comprising:a rivet having a head part and a leg part, wherein the head part and the leg part share a longitudinal axis;
the head part made of a contact material and having a height Y in the direction of the longitudinal axis and having a width, wherein the contact material comprises Ag or an Ag alloy; and
the leg part having a narrower width than that of the head part, the leg part deformed such that a diameter of the leg part becomes larger than that of a hole drilled in a base when the rivet is fixed to the base and comprises Cu or a Cu alloy, wherein when the rivet-type contact is fixed to the base,
the leg part has, in an end part of a side of the head part, a flange part having a larger width than that of the leg part and having a smaller width than that of the head part, the flange part preventing the contact material from coming into contact with the hole of the base,
the flange part is embedded in the head part to a depth X in the direction of the longitudinal axis, such that a lower end surface of a flange part and a lower end surface of a head part are approximately flat and coplanar, and
a ratio X/Y is between ? and 1/10, and
a length (l) between an endmost part of the flange part and a starting point of the leg part satisfies 0.5L?l?0.9L with respect to a length (L) between an endmost part of the head part and the starting point of the leg part.

US Pat. No. 10,486,235

METHOD FOR PRODUCING SILVER PARTICLES, AND SILVER PARTICLES PRODUCED BY THE METHOD

TANAKA KIKINZOKU KOGYO K....

1. A method for producing silver particles, comprising the steps of:mixing a thermally decomposable silver compound and an amine compound to produce a reaction system including a silver-amine complex as a precursor; and
heating the silver-amine complex at a heating temperature equal to or higher than the decomposition temperature of the silver-amine complex to precipitate silver particles,
wherein the silver particles have an average particle size of 70 to 200 nm and have a variation coefficient (CV) of the particle size of 50% or less as defined under Equation 1,
Variation coefficient CV(%)=(standard deviation/average particle size)×100  [Equation 1]
wherein silver carbonate is used as the silver compound,
wherein the amine compound is represented by the Chemical Formula 1:
H2N—R  [Chemical Formula 1]
wherein at least one end is a primary amino group, and
wherein R represents a substituent satisfying the condition (1) or (2):
(1) hydrocarbon group with a carbon number of not less than 5 and not more than 10, which has a linear structure, a branched structure or a cyclic structure, wherein R may, in part, contain oxygen, and R may, in part, contain a primary amino group, a secondary amino group or a tertiary amino group; and
(2) hydrocarbon group with a carbon number of 4, which has a linear structure, wherein R may, in part, contain oxygen, and R may, in part, contain a primary amino group or a secondary amino group, and
wherein the heating temperature is in the range of 65 to 160° C., and
wherein the step of heating the silver-amine complex comprises heating the silver-amine complex at a temperature elevation rate of 2.5 to 50° C./minute until the reaction system reaches the heating temperature, and after the heating temperature is reached, the reaction system is heated and held to precipitate the silver particles.