US Pat. No. 9,924,587

NEGATIVE ION-BASED NEUTRAL BEAM INJECTOR

TAE TECHNOLOGIES, INC., ...

1. A negative ion-based beam injector comprises
an ion source configured to produce a negative ion beam, wherein the ion source includes a plasma box, wherein internal walls
of the plasma box are maintainable at elevated temperatures of about 150-200° C.,

a pre-accelerator, and
a high energy accelerator interconnected to and spaced apart from the pre-accelerator and ion source.

US Pat. No. 9,893,226

CONVERSION OF HIGH-ENERGY PHOTONS INTO ELECTRICITY

TAE TECHNOLOGIES, INC., ...

1. A detector for detecting high energy photon emissions, comprising
a plurality of layers of a first material that absorbs high energy photons and emits electrons ejected from an atom in an
individual layer of the plurality of layers of the first material by a high energy photon absorbed in the individual layer
of the plurality of layers of the first material, each layer of the plurality of layers of the first material having a thickness
measured along the direction of the emitted electrons that is less than the length of the mean free path of the emitted electrons
in the first material, wherein the thickness of each layer of the plurality of layers of the first material measured along
the direction of propagation of a high energy photon is less than the length of a mean free path of the high energy photon
in the first material, wherein the wavelengths of the high energy photons are in the non-visible regime, and wherein a plurality
of layers of the plurality of layers of a first material encountered by a high energy photon along the direction of propagation
of the high energy photon having an aggregate thickness measured along the direction of propagation of a the high energy photon
that is greater than the length of a mean free path for the high energy photon in the first material, and

a plurality of layers of a second material that collects electrons emitted from the plurality of layers of the first material
and electrically coupled to the plurality of layers of the first material, each layer of the plurality of layers of the second
material having a thickness greater than the length of the mean free path in the second material of the electrons emitted
from the plurality of layers of the first material, wherein one or more layers of the plurality of layers of the second material
interposing adjacent layers of the plurality of layers of the first material, wherein the direction of propagation of the
high energy photons is substantially orthogonal to a normal vector to a boundary surface between adjacent layers of the plurality
of layers of the first and second material, and wherein the electrons emitted from the first material are emitted in a direction
perpendicular to the direction of propagation of the high energy photons.

US Pat. No. 10,049,774

SYSTEMS AND METHODS FOR FORMING AND MAINTAINING A HIGH PERFORMANCE FRC

TAE TECHNOLOGIES, INC., ...

1. A method for generating and maintaining a magnetic field with a field reversed configuration (FRC) within a confinement chamber of a system comprising:first and second diametrically opposed FRC formation sections coupled to the confinement chamber,
first and second divertors coupled to the first and second formation sections,
one or more of a plurality of plasma guns, one or more biasing electrodes and first and second mirror plugs, wherein the plurality of plasma guns includes first and second axial plasma guns operably coupled to the first and second divertors, the first and second formation sections and the confinement chamber, wherein the one or more biasing electrodes being positioned within one or more of the confinement chamber, the first and second formation sections, and the first and second divertors, and wherein the first and second mirror plugs being position between the first and second formation sections and the first and second divertors,
a gettering system coupled to the confinement chamber and the first and second divertors,
a plurality of neutral atom beam injectors coupled to the confinement chamber adjacent a midplane of the confinement chamber and oriented to inject neutral atom beams toward the mid-plane at an angle of about fifteen degrees (15°) to twenty-five degrees (25°) less than normal to a longitudinal axis of the confinement chamber, and
a magnetic system comprising a plurality of quasi-de coils positioned around the confinement chamber, the first and second formation sections, and the first and second divertors, first and second set of quasi-dc mirror coils positioned between the confinement chamber and the first and second formation sections;
the method comprising the steps of:
forming an FRC about a plasma in the confinement chamber, wherein the FRC plasma is in spaced relation with the wall of the confinement chamber, and
maintaining the FRC at or about a constant value without decay by injecting beams of fast neutral atoms from neutral beam injectors into the FRC plasma at an angle of about 15° to 25° less than normal to the longitudinal axis of the confinement chamber and towards the mid-plane of the confinement chamber.

US Pat. No. 10,193,298

HIGH GAIN OPTICALLY PUMPED FAR INFRARED LASER

TAE TECHNOLOGIES, INC., ...

1. A FIR laser comprisesa vacuum chamber,
a beam pump source coupled to the chamber,
a rear mirror with an off center hole,
a waveguide, wherein the rear mirror and waveguide are housed in the chamber,
a pump beam reflector coupled to the chamber opposite the rear mirror, and
an output coupler positioned external to the chamber, wherein the distance between the rear mirror and output coupler define the cavity length of the FIR laser.

US Pat. No. 10,398,016

NEGATIVE ION-BASED BEAM INJECTOR

TAE TECHNOLOGIES, INC., ...

1. A negative ion-based beam injector comprisesan ion source configured to produce a negative ion beam,
an accelerator spaced apart from the ion source, and
a transition zone interposing the ion source and the accelerator, the transition zone comprises a low energy beam transport line, wherein the low energy beam transport line includes bending magnets that deflect the beam orthogonally to the beam's direction of motion and focus the beam onto the axis of the accelerator.

US Pat. No. 10,375,814

PHOTON NEUTRALIZERS FOR NEUTRAL BEAM INJECTORS

TAE TECHNOLOGIES, INC., ...

1. A non-resonance photo-neutralizer for neutral beam injectors comprisingfirst and second mirrors having opposing mirror surfaces forming a photon trap, wherein the mirror surface of the first mirror is concave and the mirror surface of the second mirror is flat, wherein the first mirror comprises a mirror assembly including a central mirror and first and second outer mirrors coupled to the central mirror.

US Pat. No. 10,217,532

SYSTEMS AND METHODS FOR MERGING AND COMPRESSING COMPACT TORI

TAE TECHNOLOGIES, INC., ...

1. A system for merging and compressing compact tori plasma comprisinga compression chamber,
first and second formation sections, the first and second formation sections being diametrically opposed and comprising modularized formation and acceleration systems for generating first and second plasma compact tori and axially accelerating the compact tori and translating the compact tori towards a mid-plane of the compression chamber,
first and second compression sections coupled on a first end to an exit end of the first and second formation sections, the first and second compression sections being diametrically opposed and configured to adiabatically compress the compact tori as the compact tori traverse the first and second compression sections towards the mid-plane of the compression chamber,
first and second acceleration sections coupled on a first end to a second end of the first and second compression sections, the first and second acceleration sections being diametrically opposed and comprising modularized acceleration systems for axially accelerating the compact tori and translating the compact tori towards the mid-plane of the compression chamber, and
third and fourth compression sections coupled on a first end to a second end of the first and second acceleration sections and on a second end to first and second diametrically opposed ends of the compression chamber, the third and fourth compression sections being diametrically opposed and configured to adiabatically compress the compact tori as the compact tori traverse the third and fourth compression sections towards the mid-plane of the compression chamber.