US Pat. No. 9,056,499

IMAGE RECORDING APPARATUS

SCREEN HOLDINGS CO., LTD....

1. An image recording apparatus comprising:
a holding part having a holding surface for sucking and holding a sheet-shaped recording medium by negative pressure;
an ejection part for ejecting an ink droplet to the recording medium held on said holding surface; and
a moving part for moving said holding part relative to said ejection part, in a first direction extending along said holding
surface;

said ejection part including:
a housing having an opposing surface opposed to said holding surface;
an upstream ejection port and a downstream ejection port provided on said opposing surface and arranged at an interval in
said first direction; and

a central bypass passage opened in a region of said opposing surface of said housing between said upstream ejection port and
said downstream ejection port, wherein

a distance between said opposing surface and the recording medium held on said holding part is 0.5 mm or more and 2 mm or
less.

US Pat. No. 9,067,412

PRINTING APPARATUS AND METHOD OF CORRECTING STEP SHIFT THEREOF

SCREEN Holdings Co., Ltd....

1. A printing apparatus configured to perform printing to a print medium, the printing apparatus comprising:
a printer having at least two line heads spaced away in a transportation direction of the print medium, the line heads each
having a plurality of recording modules with a train of recording devices arranged linearly in a width direction of the print
medium;

a scanner configured to scan an image printed with the printer to obtain a scanned image;
a correcting-chart printing unit configured to cause a first line head of the printer to print a first correcting chart in
a first line head printing area, and cause a second line head to print a second correcting chart in a second line head printing
area, away from the first line head printing area in the transportation direction, said recording modules being arranged in
a width direction of the print medium so that line figures printed by the recording modules of the first line head, and line
figures printed by the recording modules of the second line head, that are printed at the same position in the transportation
direction, do not overlap each other;

a scanned image collecting unit configured to operate the scanner to read the first line head printing area and the second
line head printing area to collect a first scanned image and a second scanned image, respectively;

a correction-data calculating device configured to calculate correction data, the correction-data calculating device regarding
a line figure in the first scanned image formed with one of the plurality of recording modules as a reference line figure,
and determining a difference in the transportation direction between the reference line figure and a line figure formed with
the other recording module as a reference head difference, determining a difference in the transportation direction between
a first line figure and a second line figure of the second scanned image as an individual head difference, the first line
figure being formed with the first line head and the second line figure being formed with the second line head, and summing
up the reference head difference and the individual head difference to obtain a total for every recording module, the reference
head difference being regarded as the correction data in the transportation direction for every recording module in the first
line head, and the total being regarded as the correction data for every recording module in the second line head; and

an adjusting device configured to adjust a timing in accordance with the correction data upon printing with the printer.

US Pat. No. 9,083,911

NOZZLE SHADING METHOD, AND AN INKJET PRINTING APPARATUS USING SAME

SCREEN HOLDINGS CO., LTD....

1. A nozzle shading method applicable to nozzles of an inkjet printing apparatus, comprising:
a reading step for repeatedly reading charts for shading correction with a contact image sensor (CIS) type scanner with a
plurality of read conditions consisting of varied exposure amounts, while emitting light from light emitters, thereby to obtain
a plurality of image data with different read conditions;

a density value converting step for converting luminance values of the plurality of image data read with the plurality of
read conditions consisting of the varied exposure amounts into density values, respectively, based on a luminance value to
density value conversion table corresponding to each of the plurality of read conditions consisting of the varied exposure
amounts;

a correction table creating step for creating nozzle shading correction tables corresponding to all input tone values, based
on target density values for correction which are the plurality of density values converted and combined with density values
having a region where detection of the density values is saturated; and

a shading correcting step for carrying out shading correction based on the correction tables.

US Pat. No. 9,059,226

SUBSTRATE TREATMENT APPARATUS

SCREEN Holdings Co., Ltd....

1. A substrate treatment apparatus comprising:
a first substrate transport robot having a first hand which holds a substrate;
a second substrate transport robot having a second hand which holds the substrate; and
said first and second robots being accessible to a substrate transport passage;
said substrate transport passage being defined between or outside treatment units;
a hand cleaning unit which is accessible by the first hand of the first substrate transport robot and the second hand of the
second substrate transport robot, wherein the hand cleaning unit is configured and disposed in a position within said substrate
transfer passage for cleaning the first hand and the second hand, being disposed above or below a substrate transfer unit
within said substrate transfer passage at which the substrate is transferred between the first hand and the second hand.

US Pat. No. 9,364,873

SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS

SCREEN HOLDINGS CO., LTD....

1. A substrate treatment method comprising:
a higher temperature maintaining step of maintaining a substrate held by a substrate holding unit at a higher temperature
that is not lower than 250° C.; and

a phosphoric acid/suspension liquid supplying step of supplying a phosphoric acid aqueous solution and a silicon suspension
liquid to a front surface of the substrate held by the substrate holding unit.

US Pat. No. 9,440,461

PRINTING APPARATUS

RICOH COMPANY, LTD., Tok...

1. A printing apparatus performing printing to a print medium transported from a supplying section to a discharge section,
the printing apparatus comprising:
a printing apparatus body selectively composed of a plurality of transportation units, the transportation units having a transport
path with given slopes in side view of a transportation direction from the supplying section to the discharge section,

upon connection of the transportation units, a connection part between two of the transportation units containing a slope
change portion of the transport path,

when it is assumed that one of the plurality of transportation units adjacent to the supplying section is a first transportation
unit, the first transportation unit includes a slope that inclines upward from a side adjacent to the supplying section to
a side adjacent to the discharge section in side view of the transport path,

when it is assumed that one of the plurality of transportation units adjacent to the discharge section is a second transportation
unit, the second transportation unit includes a slope that inclines downward from the side adjacent to the supplying section
to the side adjacent to discharge section in side view of the transport path,

when it is assumed that one of the plurality of transportation units between the first transportation unit and the second
transportation unit is a third transportation unit, the third transportation unit includes an inclination changing device
to connect the first transportation unit and the second transportation unit which respectively have differently inclined slopes
from each other,

when the third transportation unit is connected between the first transportation unit and the second transportation unit,
a connection part between the third transportation unit and one of the transportation units connected to the third transportation
unit is the inclination change portion point and a vertex of the transport path, and

the inclination changing device allows change of inclination of the transport path from the supplying section to the discharge
section upward or downward in side view of the transportation direction from the supply section to the discharge section,

the inclination changing device includes:
a roller holding frame holding a plurality of transport rollers;
a pivot frame swinging the roller holding frame rightward and leftward when the transport path is seen in side view; and
a swing holding frame fixing the roller holding frame swung by the pivot frame at a given swinging attitude.

US Pat. No. 9,449,807

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SCREEN Holdings Co., Ltd....

1. A substrate processing apparatus for processing a substrate, comprising:
a chamber having a chamber body and a chamber cover and forming an internal space which is sealed by closing an upper opening
of said chamber body by said chamber cover;

a substrate holding part disposed in said internal space of said chamber, for holding a substrate horizontally;
a substrate rotating mechanism for rotating said substrate together with said substrate holding part about a central axis
oriented in a vertical direction;

a processing liquid discharge part for discharging a processing liquid supplied onto said substrate to the outside of said
chamber,

a plurality of lift pins arranged in a circumferential direction about said central axis and protruding downward from said
chamber cover; and

a lift pin moving mechanism for moving said plurality of lift pins in said vertical direction relative to said chamber cover,
wherein said substrate rotating mechanism comprises:
an annular rotor part disposed in said internal space of said chamber, to which said substrate holding part is attached; and
a stator part disposed around said rotor part outside said chamber, for generating a rotating force between itself and said
rotor part,

wherein respective tip portions of said plurality of lift pins are moved down from an escape position to a transfer position
by said lift pin moving mechanism, and said substrate is transferred between said plurality of lift pins and said substrate
holding part at said transfer position.

US Pat. No. 9,415,589

PRINTING APPARATUS AND METHOD FOR COLOR-CORRECTING PRINTING ON RECORDING MEDIUM

SCREEN Holdings Co., Ltd....

1. A printing apparatus with a printing unit performing printing onto a recording medium to be transported, the apparatus
comprising:
a transporting unit transporting the recording medium;
a transportation velocity detector detecting a transportation velocity of the recording medium;
a timing reference signal generator generating a timing reference signal of the printing by the printing unit in accordance
with transportation of the recording medium;

a printing correction data generator generating printing correction data in accordance with the transportation velocity and
the timing reference signal so as to correspond to a time-dependent variation of the timing reference signal generator; and

a printing corrector correcting the printing of the printing unit to the recording medium in accordance with the printing
correction data,

the timing reference signal generator comprising:
a roller contacting to the recording medium; and
an encoder connected to the roller, wherein
the timing reference signal is a detection signal of the encoder,
the time-dependent variation of the timing reference signal generator corresponds to a variation in perimeter of the roller
to which the encoder is connected, and

the printing correction data generator obtains the variation in perimeter of the roller to which the encoder is connected
in accordance with the transportation velocity and the timing reference signal, and generates the printing correction data
in accordance with the variation in perimeter of the roller to which the encoder is connected.

US Pat. No. 9,272,539

IMAGE FORMING APPARATUS USING A PRE-PROCESSING LIQUID AND A POST-PROCESSING LIQUID, AND AN IMAGE FORMING METHOD USING A PRE-PROCESSING LIQUID AND A POST-PROCESSING LIQUID

Ricoh Company, Ltd., Tok...

1. An image forming apparatus comprising:
an image forming unit configured to eject droplets from the image forming apparatus, and to form an image on a surface of
a printing medium;

a pre-processing unit configured to apply a pre-processing liquid to the surface of the printing medium before the image is
formed by the image forming unit; and

a post-processing unit configured to apply a post-processing liquid different from the pre-processing liquid to the surface
of the printing medium after the image is formed by the image forming unit,

wherein the pre-processing unit applies an amount of the pre-processing liquid which is determined based on a type of the
printing medium and the post-processing unit applies an amount of the post-processing liquid which is determined based on
the type of the printing medium,

wherein the application amount of the post-processing liquid is reduced when the application amount of the pre-processing
liquid is reduced, and

wherein the application amount of the post-processing liquid is raised when the application amount of the pre-processing liquid
is raised.

US Pat. No. 9,295,107

HEAT TREATMENT APPARATUS HEATING SUBSTRATE BY IRRADIATION WITH LIGHT

SCREEN Holdings Co., Ltd....

1. A heat treatment method of irradiating a substrate with light to heat the substrate, said heat treatment method comprising
the step of:
repeatedly applying a plurality of pulses to a gate of an insulated-gate bipolar transistor connected to a flash lamp, thereby,
emitting light from said flash lamo to perform light irradiation to the substrate, the surface temperature of said substrate
reaches a maximum temperature, and thereafter, maintaining said surface temperature at said maximum temperature for a certain
period of time.

US Pat. No. 9,455,134

SUBSTRATE PROCESSING METHOD

SCREEN Holdings Co., Ltd....

1. A substrate processing method comprising:
a water rinsing step of supplying a rinsing liquid that contains water to a substrate; followed by
a first solvent rinsing step of supplying a solvent to the substrate; followed by
a hydrophobizing step of hydrophobizing a surface of the substrate by supplying a vapor of a hydrophobizing agent to the substrate
including a pattern formed on the surface of the substrate;

wherein the solvent supplied to the substrate in the first solvent rinsing step is a solvent that is capable of dissolving
the rinsing liquid and the hydrophobizing agent and lower in surface tension than water;

a drying step of drying the substrate by vaporizing the hydrophobizing agent adhering to the substrate, after performing the
hydrophobizing step; and

a step of maintaining the substrate in a state of not contacting water from an end of the hydrophobizing step to an end of
the drying step.

US Pat. No. 9,355,872

SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD

SCREEN Holdings Co., Ltd....

1. A substrate treatment method, comprising
a substrate holding step of horizontally holding a substrate;
a substrate rotating step of rotating the substrate about a vertical rotational axis extending through a center portion of
an upper surface of the substrate;

a treatment liquid droplet supplying step of spraying droplets of a treatment liquid from a liquid droplet nozzle to a spouting
region on the upper surface of the substrate while the liquid droplet nozzle being moved such that the spouting region moves
between the center portion and a peripheral edge portion on the upper surface of the substrate, the spouting region having
a rectangular shape extending in a longitudinal direction;

a protective liquid nozzle moving step of moving a protective liquid nozzle while maintaining a positional relationship between
the liquid droplet nozzle and the protective liquid nozzle such that the protective liquid nozzle is arranged at an upstream
side of the liquid droplet nozzle with respect to a substrate rotation direction and that an angle formed between a spouting
direction of the protective liquid nozzle and the longitudinal direction of the spouting region is ranging from 25 degrees
to 35 degrees in plan view; and

a protective liquid supplying step of spouting a protective liquid from the protective liquid nozzle onto the upper surface
of the substrate during the nozzle moving step, thereby producing a flow of the protective liquid on the upper surface of
the substrate toward the spouting region along the upper surface of the substrate such that the droplets of the treatment
liquid impinge on the spouting region so as to cover the spouting region with a liquid film of the protective liquid film.

US Pat. No. 9,351,341

HEAT TREATMENT APPARATUS FOR HEATING SUBSTRATE BY IRRADIATING SUBSTRATE WITH FLASH OF LIGHT

SCREEN Holdings Co., Ltd....

1. A heat treatment apparatus for heating a substrate by irradiating the substrate with a flash of light, comprising:
a chamber for receiving a substrate therein;
a support part for supporting the substrate within said chamber;
a flash lamp for irradiating a first surface of the substrate supported by said support part with a flash of light; and
a restriction member provided on the first surface side of the substrate and for restricting the jumping of the substrate
from said support part when the flash irradiation is performed wherein

said first surface is a front surface on which a pattern is formed, and
said restriction member restricts a peripheral portion of the front surface of the substrate in which no pattern is formed,
and

wherein said restriction member is a concave lens having a concave surface configured such that a distance from the front
surface of the substrate decreases gradually from the center of the substrate toward the peripheral portion thereof.

US Pat. No. 9,097,910

IMAGING APPARATUS, DETECTING APPARATUS, AND IMAGING METHOD

SCREEN Holdings Co., Ltd....

1. An imaging apparatus for imaging a sample plate whose surface has a plurality of wells which are capable of holding a fluid,
comprising:
an illumination member which irradiates light from above the sample plate which is in a horizontal condition; and
an imager member which receives transmitted light which is transmitted to below the sample plate and captures an image which
includes at least one of the wells,

wherein the imager member includes an imaging element and an optical system which focuses the transmitted light upon the imaging
element, and a depth of field of the optical system is equal or smaller than 0.6 mm;

wherein the depth of field is defined by a following formula:
Dof=2sf2?F(f+s)/{f4??2F2(f+s)2}

where a symbol Dof denotes the depth of field, a symbol s denotes a distance between a principal point of the optical system
and a bottom surface of the well, a symbol f denotes a focal length of the optical system as measured on the imaging element
side, a symbol F denotes a F-number of the optical system, and a symbol ? denotes a pixel pitch of the imaging element.

US Pat. No. 9,340,028

LIQUID STORING DEVICE, LIQUID STORING METHOD AND INKJET RECORDING DEVICE

SCREEN HOLDINGS CO., LTD....

1. A liquid storing device comprising at least a tank for storing a liquid, a supply tube that supplies the liquid to the
tank, and a discharge tube that discharges the liquid stored in the tank,
the supply tube diverging at a branch part into an upper supply tube and a lower supply tube,
the branch part being formed by a main tube and a branch tube, and being also a T branch joint diverging in a direction substantially
orthogonal to the main tube,

the main tube being connected in fluid communication with the supply tube on an upstream side thereof, and being connected
in fluid communication with the lower supply tube on a downstream side thereof,

the branch tube being connected in fluid communication with the upper supply tube,
the upper supply tube having an upper supply port in the tank, the upper supply port positioned above a level of the liquid
stored in the tank, and

the lower supply tube having a lower supply port in the tank, the lower supply port positioned below the level of the liquid.

US Pat. No. 9,059,221

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SCREEN Holdings Co., Ltd....

1. A substrate processing method in which a substrate is held in a horizontal posture and rotated about a vertical axis, and
while a cleaning solution is being continuously discharged to a surface of the substrate from an outlet of a discharge nozzle,
the outlet of said discharge nozzle is scanned from a position opposed to a center of the substrate to a position opposed
to a circumferential edge of the substrate, so as to allow a dried region to form at the center of the substrate;
wherein after the outlet of said discharge nozzle has started to move from the position opposed to the center of the substrate
toward the circumferential edge of the substrate, and before drying at the center of the substrate is started, the movement
of the outlet of said discharge nozzle is once stopped, and after drying has started, by a centrifugal force causing the cleaning
solution, which the surface of the substrate is covered with, to flow in a region inside a circumference defined by the center
of the substrate as the center and by a distance to a position on the substrate surface opposed to the outlet of said discharge
nozzle as the radius, the outlet of said discharge nozzle is moved again toward the circumferential edge of the substrate,
whereby only one dried core, which will be a starting point when the dried region is formed on the substrate, is produced,
and then the dried region of which said dried core is the starting point is spread all over the surface of the substrate,
to dry the substrate; and

during the process of scanning the outlet of the discharge nozzle to the position opposed to the circumferential edge of the
substrate, the rotation speed of the substrate is decreased.

US Pat. No. 9,142,433

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SCREEN Holdings Co., Ltd....

1. A substrate processing apparatus for processing a substrate, comprising:
a substrate holding part for holding a substrate with a main surface thereof directed upward;
a processing liquid supply part for supplying a processing liquid onto said main surface of said substrate on which a device
has been formed in advance;

an anti-static liquid supply part for supplying an anti-static liquid having electrical resistivity higher than that of said
processing liquid onto said main surface of said substrate from an anti-static liquid nozzle positioned above said main surface
of said substrate;

a liquid removing part for removing a liquid from said main surface of said substrate; and
a control part configured to control said processing liquid supply part, said anti-static liquid supply part, and said liquid
removing part to supply said anti-static liquid onto said main surface of said substrate to thereby puddle entire said main
surface of said substrate with said anti-static liquid, and to then remove said anti-static liquid from said main surface
and further supply said processing liquid onto said main surface of said substrate to thereby perform a process.

US Pat. No. 9,449,825

HEAT TREATMENT APPARATUS FOR HEATING SUBSTRATE BY IRRADIATION WITH FLASHES OF LIGHT, AND HEAT TREATMENT METHOD

SCREEN Holdings Co., Ltd....

1. A heat treatment apparatus for heating a substrate having a pattern formed on a front surface thereof by irradiating said
substrate with flashes of light, said heat treatment apparatus comprising:
a chamber configured to receive a substrate;
a support member configured to support a substrate within said chamber;
a first flash lamp configured to irradiate a back surface of a substrate supported on said support member with flashes of
light, to thereby perform a supplementary heating on said substrate;

a second flash lamp configured to irradiate a front surface of said substrate having subjected to the supplementary heating
with flashes of light, to thereby heat said front surface to a predetermined target temperature; and

a halogen lamp configured to, before said first flash lamp starts the supplementary heating, preheat said substrate by irradiating
said back surface with light.

US Pat. No. 9,176,132

METHOD OF CALIBRATION

SCREEN Holdings Co., Ltd....

1. A method of calibration for improving the accuracy of the process of estimating the volume of a cell clump from an image
including the cell clump, comprising the steps of:
a) directing light from one of a first position lying over a cell clump held in a well having a bottom portion at least which
is pervious to light and a second position lying under said cell clump toward the other of the first and second positions
to receive said light at an imaging device disposed in the other of the first and second positions, thereby acquiring an image
including said cell clump;

b) measuring the optical density of said cell clump in the image acquired in said step a);
c) acquiring cross-section information about said cell clump held in said well to determine the vertical height of said cell
clump, based on said cross-section information; and

d) acquiring data representing a relationship between the optical density measured in said step b) and the height determined
in said step c),

wherein in said step c), pieces of cross-section information are acquired by acquiring a distribution of cells at each of
a plurality of cross-sections of said cell clump, and determining said vertical height of said cell clump at each position,
based on said pieces of cross-section information.

US Pat. No. 9,234,934

INSPECTING DEVICE AND INSPECTING METHOD

SCREEN HOLDINGS CO., LTD....

1. An inspecting device for inspecting a photo device comprising:
an irradiation part for irradiating said photo device with pulsed light;
a detection part having a detector for detecting an electric field intensity of an electromagnetic wave pulse depending on
irradiation with probe light emitted from a light source for said pulsed light;

a delay part for changing a time difference between a time that said electromagnetic wave pulse arrives at said detector and
a time that said probe light arrives at said detector, thereby delaying a timing for detecting said electromagnetic wave pulse
through said detector;

a temporal waveform restoration part for restoring a temporal waveform of said electromagnetic wave pulse based on said electric
field intensity of said electromagnetic wave pulse detected by said detector in said plurality of pieces of detection timing;

an electromagnetic wave pulse analysis part for detecting a negative peak of said electric field intensity in said temporal
waveform, and

a setting part for setting a detection timing for detecting said electromagnetic wave pulse radiated from said photo device
through said detector, based on the detection timing for detecting said negative peak in said temporal waveform.

US Pat. No. 9,238,362

INKJET PRINTING APPARATUS

RICOH COMPANY, LTD., Tok...

1. An inkjet printing apparatus for performing printing to a printing sheet through discharging ink droplets, the apparatus
comprising:
at least three inkjet heads configured to discharge the ink droplets to the printing sheet simultaneously in response to inputted
electric signals, and arranged orthogonal to a transport direction of the printing sheet;

at least three power supply circuits configured to supply drive voltage to the inkjet heads respectively; and
a change-over switch disposed between the inkjet heads and the power supply circuits and electrically connecting the power
supply circuits to the inkjet heads, respectively, and, when one of the power supply circuits breaks down, switching electrical
connection such that the drive voltage is allowed to be supplied to the inkjet heads by electrically connecting the power
supply circuits other than the breakdown power supply circuit to one of the inkjet heads corresponding to the breakdown power
supply circuit, wherein

when none of the power supply circuits breaks down, the change-over switch electrically connects the power supply circuits
and the inkjet heads in one-to-one manner, and when one of the power supply circuits breaks down, the change-over switch electrically
connects all the power supply circuits other than the breakdown power supply circuit to one of the inkjet heads corresponding
to the breakdown power supply circuit.

US Pat. No. 9,362,147

SUBSTRATE TREATMENT METHOD

SCREEN Holdings Co., Ltd....

1. A substrate treatment method comprising:
a substrate holding step of holding a substrate horizontally; and
a substrate covering step of covering an upper surface of the substrate with a gas-flow flowing from a center portion of the
upper surface of the substrate to a peripheral portion of the upper surface of the substrate along the upper surface of the
substrate in parallel with the substrate holding step by ejecting a gas from a gas ejection nozzle disposed adjacent the center
portion of the upper surface of the substrate, the gas ejection nozzle having a smaller diameter than the substrate; wherein

the substrate covering step includes:
a first gas supplying step of supplying a gas into a flow passage provided in the gas ejection nozzle;
a retaining step of retaining the gas supplied into the flow passage in a buffering space provided in the gas ejection nozzle
by supplying the gas supplied into the flow passage into the buffering space, the buffering space communicating with the flow
passage, the buffering space having a sectional area greater than a sectional area of the flow passage;

a center-ejecting step of ejecting the gas supplied into the buffering space from a center port provided in a lower surface
of the gas ejection nozzle toward the center portion of the upper surface of the substrate, the lower surface opposed to the
upper surface of the substrate, the center port communicating with the buffering space, the center port having an area greater
than the sectional area of the flow passage; and

the substrate being treated is one of a semiconductor wafer, a substrate for a liquid crystal display device, a substrate
for a plasma display device, a substrate for a Field Emission Display device, a substrate for an optical disk, a substrate
for a magnetic disk, a substrate for a magneto-optical disk, and a substrate for a photo mask.

US Pat. No. 9,248,666

DRYING APPARATUS AND PRINTING APPARATUS

RICOH COMPANY, LTD., Tok...

1. A drying apparatus for drying ink adhering to a print medium, the drying apparatus comprising:
a heater facing a transportation path where the print medium is transported;
a blowing source configured to blow air to the heater; and
a casing configured to enclose the heater, the casing comprising:
an inflow port into which the air from the blowing source flows; and
a blowing port configured to narrow and blow warm air heated with the heater to the transportation path outside the casing
in a direction along the transportation path;

an exhaust unit disposed outside the casing and configured to exhaust the warm air blown through the blowing port to the transportation
path;

a suction unit configured to supply air to the blowing source; and
a warm-air circulator configured to supply the warm air collected in the exhaust unit to the suction unit, the suction unit
comprising:

an outside-air suction port configured to suck outside air;
a warm-air suction port provided as the exhaust unit and the warm-air circulator on a path connecting the blowing source and
the outside-air suction port, and configured to suck the warm air blown to the transportation path;

a suction-blowing source provided on the path adjacent to the outside-air suction port rather than the warm-air suction port,
and configured to suck the outside air; and

a dry controller configured to change difference in quantity of air between the blowing source and the suction-blowing source,
wherein

the suction-blowing source is set to blow a smaller quantity of air than the blowing source.

US Pat. No. 9,292,730

APPARATUS FOR PHYSICS AND CHEMISTRY AND METHOD OF PROCESSING IMAGE

SCREEN Holdings Co., Ltd....

1. An apparatus for physics and chemistry which processes an image obtained by photographing cells, comprising:
an extraction part for extracting a plurality of objects from said image;
an adoption/non-adoption processing part for classifying said objects as adopted, as not adopted or as a third category in
accordance with a predetermined condition; and

a display part for displaying a result of said adoption/non-adoption process,
said display part including
a first switching part for switching between highlighting and unhighlighting of an object determined as adopted in said image,
a second switching part for switching between highlighting and unhighlighting of an object determined as not adopted in said
image, and

a third switching part for switching between highlighting and unhighlighting of an object determined as the third category
in said image,

said first switching part, said second switching part and said third switching part are configured for switching between highlighting
and unhighlighting of objects independently of each other.

US Pat. No. 9,124,842

IMAGE DATA GENERATION METHOD, IMAGE RECORDING METHOD, IMAGE DATA GENERATION APPARATUS, AND IMAGE RECORDING APPARATUS

SCREEN HOLDINGS CO., LTD....

1. An image data generation method of generating halftone image data through halftone processing performed on a multi-tone
color image that includes images of a plurality of color components, the method comprising:
a) performing halftone processing on each image of at least one color component among said plurality of color components to
generate single-color halftone image data regarding each of said at least one color component, said single-color halftone
image data indicating sizes of a plurality of dots that are respectively to be formed at a plurality of pixel positions that
are arranged in a matrix in a halftone image region;

b) obtaining a hue of each pixel that corresponds to each pixel position in said color image, and in a case where the hue
of said each pixel is within a first hue range, determining that a threshold dot size at said each pixel position for a target
color component is a predetermined reference threshold dot size, said target color component being included in said plurality
of color components and being one color component other than said at least one color component, and in a case where the hue
of said each pixel is within a second hue range in which coloration of said target color component is stronger than in said
first hue range, determining that said threshold dot size is a predetermined corrected threshold dot size that is larger than
said reference threshold dot size; and

c) performing halftone processing on an image of said target color component with reference to the single-color halftone image
data regarding said at least one color component to generate single-color halftone image data that indicates sizes of a plurality
of dots of said target color component that are respectively to be formed at said plurality of pixel positions in said halftone
image region,

said operation c) including:
c1) performing halftone processing on one pixel in the image of said target color component and provisionally determining
a size of a dot of said target color component that is to be formed at a pixel position corresponding to said one pixel;

c2) obtaining a total dot size that is a sum of a previous total dot size and a provisional dot size, said previous total
dot size being a sum of sizes of dots of said at least one color component that are to be formed at said pixel position, and
said provisional dot size being the size of the dot of said target color component that is provisionally determined in said
operation c1);

c3) comparing said total dot size with a threshold dot size at said pixel position, and in a case where said total dot size
is smaller than or equal to said threshold dot size, determining that the size of the dot of said target color component is
a size equal to said provisional dot size, and in a case where said total dot size is larger than said threshold dot size,
determining that the size of the dot of said target color component is a largest dot size that is within a range of a difference
between said threshold dot size and said previous total dot size;

c4) in a case where said total dot size is larger than said threshold dot size in said operation c3), changing a pixel value
of a group of neighboring pixels at one or more pixel positions that are located around said one pixel and at which the size
of the dot of said target color component has not yet been determined, on the basis of a pixel value of said one pixel and
a difference between said provisional dot size and the size of the dot of said target color component; and

c5) changing said one pixel to a next pixel in accordance with a predetermined processing order of said plurality of pixel
positions and repeating said operations c1) to c4).

US Pat. No. 9,061,529

PRINTING APPARATUS

SCREEN HOLDINGS CO., LTD....

1. A printing apparatus for performing printing to a print medium supplied from a roll of the print medium, comprising:
two or more units formed by dividing a printing apparatus body depending on functions;
an endless belt provided for each of the two or more units and disposed along a transportation path of the print medium;
a holding mechanism fixedly arranged on the endless belt for holding both ends of an attachment bar to which the print medium
is attached; and

an endless-belt driving mechanism for driving the endless belt, the two or more units delivering the attachment bar between
the units adjoining each other.

US Pat. No. 9,343,311

SUBSTRATE TREATMENT METHOD

SCREEN Holdings Co., Ltd....

1. A substrate treatment method for introducing a dopant into a surface of a silicon substrate, the method comprising:
a hydrogen annealing step of heating a substrate having an oxide film formed on a surface thereof in a hydrogen-containing
atmosphere with the oxide film remaining thereon to reduce said oxide film with hydrogen and hydrogen-terminate silicon at
an interface between said oxide film and said substrate; and

an introduction step of supplying a chemical solution containing a dopant to the surface of said substrate to introduce the
dopant into said surface after said hydrogen annealing step.

US Pat. No. 9,296,229

PRINTING APPARATUS AND PRINTING METHOD

SCREEN Holdings Co., Ltd....

1. A printing apparatus printing an image onto a web, the printing apparatus comprising:
a transport mechanism transporting the web;
a printing head printing the image onto the web to be transported;
a serpentine amount sensor detecting a serpentine amount caused by transportation of the web at a position where the printing
head is disposed or a position therearound;

a predicted waveform data generating unit generating predicted waveform data on the serpentine amount to be produced in the
following web in accordance with actually measured waveform data on the detected serpentine amount;

a shift amount determining unit determining a shift amount of a printing position of the image to be shifted in a width direction
of the web, intersecting a transportation direction of the web, in a direction in which the predicted serpentine amount is
decreased in accordance with the predicted waveform data; and

a correcting unit correcting the printing position of the image in accordance with the shift amount and applying a corrected
printing position to the printing head.

US Pat. No. 9,176,496

SUBSTRATE TREATING SYSTEM

SCREEN Holdings Co., Ltd....

1. A substrate treating system comprising:
a substrate treating apparatus having a substrate treating unit for carrying out predetermined treatments of substrates, a
load port with physical load ports for receiving pods for storing the substrates, the load port transferring the pods to and
from the substrate treating unit, and an internal buffer interposed between the substrate treating unit and the load port
for transferring the substrates to and from the substrate treating unit, transferring the pods to and from the load port,
and temporarily storing the pods in time of transfer;

a carrier transport system for transferring the pods to and from the load port; and
a host computer for communicating with the substrate treating apparatus and the carrier transport system, and instructing
the carrier transport system to transport the pods according to a situation of the substrate treating apparatus;

wherein the substrate treating apparatus includes a transport-related control unit arranged, when the load port is being used
by one of the pods and a vehicle of the carrier transport system approaches to transfer another of the pods to the load port,
to suspend a notice of transfer disapproval until completion of the use by the one of the pods.

US Pat. No. 9,079,407

INKJET APPARATUS AND METHOD OF COLLECTING MIST

SCREEN HOLDINGS CO., LTD....

1. An inkjet apparatus comprising:
a transport mechanism for transporting a strip-shaped base material in a direction of movement along the length thereof;
at least one jet head for jetting out ink droplets toward a recording surface of said base material;
a switching part for bending said base material in a direction opposite to said recording surface in a position downstream
in said direction of movement as viewed from said at least one jet head to switch said direction of movement from a first
direction to a second direction; and

a mist suction part for suctioning air containing mist of said ink from near said recording surface of said base material
passing over said switching part, said mist suction part including a suction opening at least part of which is positioned
on the extension of said first direction.

US Pat. No. 9,111,966

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SCREEN Holdings Co., Ltd....

1. A substrate processing apparatus comprising:
a substrate holder which holds a substrate having a pattern formed in a surface of the substrate in a predetermined positional
relationship with a reference indicator of the substrate;

a cleaner which abuts an adhesive member on the surface of the substrate which is held by the substrate holder and peels off
the adhesive member along the surface of the substrate in a peeling direction which is not at right angle to a direction of
the pattern, thereby cleaning the surface of the substrate;

a detection section which detects the reference indicator; and
a controller which executes at least one of change of the peeling direction of the adhesive member and rotation of the substrate
based upon a direction of the pattern at the time of detection of the reference indicator by the detection section, thereby
adjusting the angle of the peeling direction of the adhesive member with respect to the direction of the pattern.

US Pat. No. 9,242,468

LIQUID EJECTION APPARATUS

SCREEN HOLDINGS CO., LTD....

1. A liquid ejection apparatus comprising;
an ejecting part for ejecting a liquid toward a base material, said ejecting part and said base material moving relative to
each other in a predetermined movement direction; and

a cap part for receiving the liquid ejected from said ejecting part during maintenance,
said cap part including;
a liquid receiving part for receiving the liquid ejected from said ejecting part while facing said ejecting part during maintenance;
and

an exhaust part disposed laterally to said liquid receiving part and for evacuating a gas contained within said liquid receiving
part,

said liquid receiving part including:
a first liquid receiving chamber having an opening opposing a portion of said ejecting part;
a second liquid receiving chamber disposed further from said exhaust part than is said first liquid receiving chamber, separated
from said first liquid receiving chamber by a division wall, and having an opening opposing another portion of said ejecting
part; and

a flow path disposed without passing through said first liquid receiving chamber, and connecting said second liquid receiving
chamber and said exhaust part, and

said exhaust part including:
a first fan part connected to said first liquid receiving chamber and for evacuating a gas contained within said first liquid
receiving chamber; and

a second fan part connected to said second liquid receiving chamber through said flow path and for evacuating a gas contained
within said second liquid receiving chamber,

wherein a bottom surface of said first liquid receiving chamber and a bottom surface of said second liquid receiving chamber
are each an inclined surface that is inclined downward away from said exhaust part.

US Pat. No. 9,238,303

TRANSFER POSITION TEACHING METHOD, TRANSFER POSITION TEACHING APPARATUS AND SUBSTRATE PROCESSING APPARATUS

SCREEN Holdings Co., Ltd....

1. A transfer position teaching apparatus for teaching a transfer position of a substrate comprising:
a substrate transfer member;
a hand for transferring the substrate to the substrate transfer member;
a teaching substrate supported by the hand in place of the substrate to be transferred to the substrate transfer member; and
a detection member, placed at a position corresponding to the substrate transfer member to detect a position of an electrical
contact between the teaching substrate and the detection member,

wherein the substrate transfer member is a substrate-storing container for storing a plurality of substrates in a stacked
condition, and

wherein the detection member includes a pair of Y-direction contact members placed correspondingly to a width of an opening
of the substrate-storing container and an X-direction contact member placed correspondingly to a depth of an opening of the
substrate-storing container.

US Pat. No. 9,044,940

INKJET PRINTING APPARATUS

SCREEN HOLDINGS CO., LTD....

1. An inkjet printing apparatus for printing images on printing paper by discharging ink while moving inkjet heads and the
printing paper relative to each other, comprising:
an inkjet head holder for holding the inkjet heads to be movable by at least two shafts extending vertically;
a control device for operating at least two motors respectively coupled to the at least two shafts to move the inkjet head
holder vertically along the at least two shafts at least between a printing position, a standby position of the inkjet head
holder, and an origin position above the standby position;

a detecting device for detecting slits formed in at least two different sizes in each of slit disks rotatable by the at least
two motors, and outputting detection signals concerning synchronous rotations of the at least two motors and directions of
rotation of the at least two motors; and

a monitoring device for monitoring, during a vertical movement of the inkjet head holder caused by the control device, synchronous
rotations of the at least two motors by monitoring the signals outputted from the detecting device and counting the slits
of the slit disks, and corresponding directions of rotation of the at least two motors by monitoring orders in which the slits
of the slit disks appear, the monitoring device having at least two counters respectively for storing counts of the slits
of the slit disks provided for the at least two motors, respectively, and a comparator for comparing a difference between
the counts of the at least two counters and one of a first threshold value for a time of normal vertical movement and a second
threshold value for a time of return to the origin position after occurrence of an abnormality,

wherein the control device causes the comparator of the monitoring device to compare the difference between the counts of
the at least two counters and the first threshold value at the time of normal vertical movement, and

when the monitoring device has detected occurrence of an abnormality, the control device:
raises the inkjet head holder to the origin position while causing the comparator to compare the difference between the counts
of the at least two counters and the second threshold value, and

only when the inkjet head holder has been able to reach the origin position, lowers the inkjet head holder from the origin
position to the printing position.

US Pat. No. 9,214,331

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SCREEN Holdings Co., Ltd....

1. A substrate processing method, comprising:
a preparation step of preparing a solidification liquid to be supplied to a substrate in a supercooled liquid state;
a solidified material forming step of supplying the solidification liquid prepared in the preparation step to the substrate
via a space and forming a solidified material of the solidification liquid on the substrate; and

a removing step of removing the solidified material of the solidification liquid on the substrate, wherein
the solidification liquid is solidified by an external stimulus that is at least one of a landing impact of the solidification
liquid onto a surface of the substrate and applying vibration transmitted from the substrate; and

the solidified material forming step is for changing the thickness of the solidified material of the solidification liquid
on the substrate within the plane of the substrate by supplying a solidification liquid in a supercooled liquid state onto
the solidified material of the solidification liquid on the substrate.

US Pat. No. 9,050,634

SUBSTRATE PROCESSING APPARATUS

SCREEN Holdings Co., Ltd....

1. A substrate processing apparatus that performs processing to a substrate having a top surface and a back surface, comprising:
first and second processing regions, arranged adjacent to each other, for performing the processing to the substrate;
a storing and carrying in and out region, arranged adjacent to the first processing region, for storing the substrate and
carrying the substrate into and out of said first processing region;

a first interface provided between said storing and carrying in and out region and said first processing region; and
a second interface provided between said first processing region and said second processing region, wherein
said first processing region includes
a first processing section, and
a first transport device that has first and second hands provided one above another for holding substrates respectively, and
transports the substrate among said first interface, said first processing section and said second interface,

said second processing region includes
a second processing section, and
a second transport device that has third and fourth hands provided one above another for holding substrates respectively,
and transports the substrate between said second interface and said second processing section,

said storing and carrying in and out region includes
a container platform on which a storing container that stores the substrate is placed, and
a third transport device that transports the substrate between the storing container placed on said container platform and
said first interface,

said first processing section includes a plurality of back surface cleaning units that each clean the back surface of the
substrate,

said second processing section includes a plurality of top surface cleaning units that each clean the top surface of the substrate,
and

each of said first interface and said second interface includes
first and second substrate platforms arranged for temporarily receiving and transferring the substrate, and
a reversing device that reverses the top surface and the back surface of the substrate, the reversing device being configured
to simultaneously reverse two substrates, wherein

said first and second substrate platforms and said reversing device are provided one above the another so as to overlap each
other,

a difference in height between the first hand and the second hand is equal to a difference in height between said first substrate
platform and said second substrate platform, and a difference in height between the third hand and the fourth hand is equal
to the difference in height between said first substrate platform and said second substrate platform,

said first transport device is configured to be capable of transferring and receiving the substrate directly to and from said
first and second substrate platforms and said reversing device of each of said first and second interfaces, simultaneously
transferring and receiving two substrates to and from said first and second substrate platforms of each of said first and
second interfaces, and simultaneously transferring and receiving two substrates to and from said reversing device of each
of said first and second interfaces, and

said second transport device is configured to be capable of transferring and receiving the substrate directly to and from
said first and second substrate platforms and said reversing device of said second interface, simultaneously transferring
and receiving two substrates to and from said first and second substrate platforms of said second interface, and simultaneously
transferring and receiving two substrates to and from said reversing device of said second interface.

US Pat. No. 9,230,836

SUBSTRATE TREATMENT METHOD

SCREEN Holdings Co., Ltd....

1. A substrate treatment method for treating a substrate with a treatment liquid, the substrate treatment method comprising:
an initial preparation step of controlling a liquid surface level of a treatment liquid retained in a treatment vessel at
a first liquid surface level, and then causing a first circulation unit to circulate the treatment liquid from the treatment
vessel through a first circulation path while controlling a temperature of the treatment liquid by a temperature controller
disposed in the first circulation path, thereby divergently spouting in air in the treatment vessel the treatment liquid circulated
by the first circulation unit and temperature-controlled by the temperature controller from a first spouting portion located
above the first liquid surface level, the first liquid surface level being set lower than a lower portion of a substrate held
at a substrate treatment position for treatment with the treatment liquid in the treatment vessel so as to prevent the treatment
liquid retained in the treatment vessel from contacting the substrate held at the substrate treatment position;

a substrate loading step of loading the substrate into the treatment vessel from outside thereof and holding the substrate
at the substrate treatment position, after the initial preparation step;

a substrate treatment step of spouting the treatment liquid circulated by the first circulation unit and temperature-controlled
by the temperature controller from the first spouting portion located above the first liquid surface level toward the substrate
held at the substrate treatment position in air in the treatment vessel while controlling the temperature of the treatment
liquid by the temperature controller disposed in the first circulation path; and

the step of cleaning the treatment liquid by a filter disposed in the first circulation path through which the treatment liquid
is circulated by the first circulation unit.

US Pat. No. 9,190,300

METHOD OF CLEANING SUBSTRATE PROCESSING APPARATUS

SCREEN Holdings Co., Ltd....

1. A method of cleaning a substrate processing apparatus that performs substrate processing with a processing solution, the
method comprising the steps of: (a) causing a substrate holding element to rotate at a first number of revolutions, the substrate
holding element having a holding surface facing a lower surface of a substrate to be held on the substrate holding element,
and at the same time, supplying a cleaning solution from a cleaning solution supply nozzle onto said holding surface while
placing an upper end of a cup surrounding said substrate holding element below said substrate holding element, thereby cleaning
an outer upper surface of said cup with said cleaning solution scattered from said holding surface while said holding surface
is rotating; and (b) causing the substrate holding element to rotate at a second number of revolutions higher than said first
number of revolutions, and at the same time, supplying a cleaning solution from said cleaning solution supply nozzle onto
said holding surface, wherein in said steps (a) and (b), said cleaning solution is supplied from said cleaning solution supply
nozzle onto said holding surface when said holding surface does not hold said substrate, thereby cleaning an area outside
said cup and surrounding said cup with said cleaning solution scattered from said holding surface while said holding surface
is rotating, said area outside said cup including at least a part of a side wall of a chamber of said substrate processing
apparatus.

US Pat. No. 9,383,321

INSPECTION APPARATUS AND INSPECTION METHOD

SCREEN HOLDINGS CO., LTD....

1. An inspection apparatus for inspecting a photoelectric device, the inspection apparatus comprising:
an excitation light irradiation part for irradiating said photoelectric device with excitation light for causing said photoelectric
device to radiate a terahertz wave;

a detection part for detecting the terahertz wave radiated from said photoelectric device in response to irradiation with
said excitation light;

a temperature changing part for changing a temperature of said photoelectric device at a part irradiated with said excitation
light;

a storage part for storing temperature correlation information regarding a correlation between a temperature of said photoelectric
device and an intensity of said terahertz wave radiated from said photoelectric device in response to irradiation with said
excitation light,

wherein said temperature correlation information is obtained by changing the temperature of said photoelectric device by said
temperature changing part, and collecting intensities of said terahertz wave radiated from said photoelectric device at respective
temperatures; and

a correction part for correcting an intensity of said terahertz wave detected by said detection part based on a temperature
of said photoelectric device obtained by a temperature measuring part and said temperature correlation information.

US Pat. No. 9,318,365

SUBSTRATE PROCESSING APPARATUS

SCREEN Holdings Co., Ltd....

1. A substrate processing apparatus for processing a substrate comprising:
a spin chuck comprising a plurality of chuck pins each having an accommodating groove for accommodating a portion of peripheral
part of the substrate, holding the substrate at a hold position in a horizontal posture by pressing inner faces of the accommodating
grooves toward portions of peripheral part of the substrate;

a nozzle for ejecting process liquid toward the substrate held by the plurality of chuck pins;
a plurality of guide members, being disposed on the spin chuck, on or above the respective plurality of chuck pins, guiding
process liquid discharged from the substrate to a surrounding area of the substrate;

a spin motor for rotating the spin chuck along with the plurality of chuck pins and the plurality of guide members around
a substrate rotation axis that vertically passes through the substrate; and

a tubular cup, encircling the plurality of chuck pins and the guide members around the substrate rotation axis, receiving
process liquid discharged outwardly from the substrate held by the plurality of chuck pins;

wherein each of the plurality of guide member includes:
an inner-edge guide disposed at a position inward and above the accommodating groove; and
an outer-edge guide disposed at a position level with or below the inner-edge guide and outward the chuck pin.

US Pat. No. 9,327,918

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD FOR PERFORMING CLEANING PROCESS AND THE LIKE ON SUBSTRATE

SCREEN Holdings Co., Ltd....

1. A method of processing a substrate, comprising the steps of:
(a) taking an unprocessed substrate out of a cassette to pass the unprocessed substrate to a passing part by means of a transfer
robot while rotating the unprocessed substrate through 90 degrees about a second rotation axis extending in a horizontal direction;

(b) holding said unprocessed substrate received from said transfer robot in a standing attitude by means of said passing part;
(c) transferring said unprocessed substrate from said passing part to a main transport robot to transport said unprocessed
substrate to a processing part by means of said main transport robot while rotating said unprocessed substrate through 90
degrees about a first rotation axis extending in a horizontal direction;

(d) transferring a processed substrate from said processing part to said main transport robot to pass said processed substrate
to said passing part by means of said main transport robot while rotating said processed substrate through 90 degrees about
said first rotation axis;

(e) holding said processed substrate received from said main transport robot in a standing attitude by means of said passing
part; and

(f) transferring said processed substrate from said passing part to said transfer robot to transport said processed substrate
into a cassette by means of said transfer robot while rotating said processed substrate through 90 degrees about said second
rotation axis,

said steps (a) and (f) including the step of moving a second hand for gripping said substrate forwardly and backwardly in
a direction parallel to said second rotation axis by means of said transfer robot,

said steps (c) and (d) including the step of moving a first hand for gripping said substrate forwardly and backwardly in a
direction parallel to said first rotation axis by means of said main transport robot,

said steps (a) and (f) including the step of moving the substrate upwardly and downwardly in a vertical direction by means
of said transfer robot while maintaining the substrate in a standing attitude without pivoting,

said steps (c) and (d) include the step of moving the substrate upwardly and downwardly in a vertical direction by means of
said main transport robot while maintaining the substrate in a standing attitude without pivoting, wherein

said processing part includes a back surface cleaning processing unit for cleaning the back surface of a substrate; and
said transfer robot rotates said substrate received from said cassette through 90 degrees in said step (a) and said main transport
robot rotates said substrate received from said passing part through 90 degrees in said step (c) to invert and transport the
substrate to said back surface cleaning processing unit.

US Pat. No. 9,242,496

PRINTED MATERIAL, METHOD OF PRODUCING PRINTED MATERIAL, AND PRINTER

SCREEN HOLDINGS CO., LTD....

1. A method of producing a printed material, comprising the steps of:
forming a first image layer having undulation on a transparent base member in accordance with first image layer data;
generating intermediate layer data indicating an uneven thickness in conformity with said undulation, from said first image
layer data;

forming an intermediate layer on said first image layer in accordance with said intermediate layer data, said intermediate
layer having a surface which is flat; and

forming a second image layer on said intermediate layer in accordance with second image layer data, wherein
said first image layer, said intermediate layer, and said second image layer are formed by discharging droplets of curable
ink toward said transparent base member,

said first image layer data is data indicating an application amount of ink of each color at each position on said transparent
base member,

said intermediate layer data is generated by subtracting the total application amount of ink of the colors at said each position,
which is indicated by said first image layer data, from a preset value, and

said preset value is smaller than the maximum total application amount of ink at said each position.

US Pat. No. 9,224,226

IMAGE DISPLAY DEVICE FOR DIRECT DRAWING APPARATUS, AND RECORDING MEDIUM

Screen Holdings Co., Ltd....

1. An image display device for direct drawing apparatus for performing direct drawing of a predetermined pattern on a drawing
object by scanning with a drawing beam, comprising:
an acquisition part for acquiring design data in a vector format describing said pattern;
a specified drawing raster image processing (RIP) parameter setting part for setting a specified drawing RIP parameter to
be used for drawing RIP development of said design data;

a processing area setting part for setting a display object portion of said design data to be subjected to said drawing RIP
development as a processing area;

a display RIP development part for performing display RIP development of a portion of said design data, which corresponds
to said processing area, by using said specified drawing RIP parameter, to thereby obtain a specified image; and

a display part for visibly displaying said specified image,
wherein:
said display RIP development performed by said display RIP development part is a RIP development in which the amount of processed
data is smaller than that in said drawing RIP development for said direct drawing,

said display RIP development part performs RIP development of said portion corresponding to said processing area by using
said specified parameter, to thereby obtain said specified image and also performs RIP development of said portion corresponding
to said processing area by using a predetermined reference parameter, to thereby obtain a reference image, and

a display part visibly displays said specified image and said reference image, overlapping each other and displays a difference
between said specified image and said reference image, being visually distinguished from a common portion between said specified
image and said reference image.

US Pat. No. 9,195,140

DEVELOPING APPARATUS AND DEVELOPING METHOD

SCREEN Holdings Co., Ltd....

1. A developing method for developing a substrate, comprising the steps of:
developing the substrate by supplying a developer to the substrate;
rinsing the substrate by spinning the substrate while supplying a rinsing solution to the substrate;
drying the substrate by spinning the substrate, including the step of starting supply of an inert gas from a nozzle directed
substantially at right angles toward a point adjacent a spin center of the substrate in plan view, after finishing the rinsing
step and while a film of the rinsing liquid is present on the substrate; and

wherein, when the rinsing step ends, the drying step is started;
wherein, in said drying step, the supplied inert gas breaks the film of the rinsing liquid, and
said drying step continues supply of the inert gas until an end of a period allocated for said drying step;
said rinsing step replaces the developer with the rinsing liquid;
said developing step continues supply of the developer until an end of a period allocated for said developing step; and
said rinsing step starts supply of the rinsing liquid immediately after the supply of the developer ends.

US Pat. No. 9,189,716

GENERATING A THRESHOLD MATRIX TO BE COMPARED WITH AN ORIGINAL IMAGE FOR PERFORMING HALFTONING OF THE ORIGINAL IMAGE

SCREEN HOLDINGS CO., LTD....

1. A threshold matrix generation method of generating a threshold matrix to be compared with an original image of multi-gradation
in performing halftoning of said original image in an image recording apparatus which is capable of recording an image at
single speed and at N-fold speed where N is an integer not less than 2, comprising:
a) preparing a matrix space which is a set of matrix elements arranged both in a column direction which corresponds to a recording
direction in said image recording apparatus and in a row direction perpendicular to said column direction;

b) setting writing elements which are matrix elements corresponding to writing positions on a recording object so that one
writing element is positioned at intervals of (N?1) matrix elements in said column direction and one writing element is positioned
at intervals of (N?1) matrix elements or two writing elements are positioned at intervals of (2N?2) matrix elements in said
row direction in a whole of said matrix space and setting the other matrix elements as non-writing elements always evenly
in the whole area of said matrix space in said operation a) or after said operation a);

c) giving the first turn-on number to one writing element, being thereafter changed to a determined element, and then repeating
a process of specifying a writing element which is farthest away from all determined elements and giving a next turn-on number
to said writing element, being thereafter changed to a determined element, in consideration of repetitive application of said
threshold matrix in performing halftoning of an original image, to thereby allocate turn-on numbers to all writing elements;
and

d) obtaining a threshold matrix for N-fold speed by determining a threshold value of each writing element in accordance with
said turn-on numbers.

US Pat. No. 9,151,669

INSPECTING DEVICE AND INSPECTING METHOD

SCREEN HOLDINGS CO., LTD....

1. An inspecting device which takes a semiconductor device or a photo device as an inspecting target, the device comprising:
a light source for emitting pulsed light;
a scan part for obliquely irradiating an inspecting target with said pulsed light, while changing an optical path of said
pulsed light, to scan said inspecting target with said pulsed light;

a detection part for detecting an electromagnetic wave emitted non-coaxially with said pulsed light from said inspecting target
in accordance with the illumination with said pulsed light; and

an image generation part for generating an image indicating electric field intensity distribution of said inspecting target
based on an electric field intensity of an electromagnetic wave detected by said detection part,

wherein said image generation part decides a position on said image which corresponds to an acquisition point of an electromagnetic
wave intensity based on an incidence angle of said pulsed light on said inspecting target.

US Pat. No. 9,293,364

ELECTROLESS PLATING APPARATUS AND ELECTROLESS PLATING METHOD

Ebara Corporation, Tokyo...

1. An electroless plating apparatus comprising:
a pre-plating treatment module including a pre-plating treatment tank for carrying out a pre-plating treatment of a plurality
of substrates, a water-cleaning tank for cleaning with water the substrates after the pre-plating treatment, and a substrate
holder for supporting the lower sides of the substrates and transporting the substrates between the tanks;

a plating module including a plating tank for carrying out electroless plating of the substrates after the pre-plating treatment,
a water-cleaning tank for cleaning with water the substrates after the electroless plating, and a substrate holder for supporting
the lower sides of the substrates and transporting the substrates between the tanks; and

an inter-module substrate transport device for gripping the substrates from above and transporting the substrates between
the pre-plating treatment module and the plating module,

wherein the pre-plating treatment tank is provided with a pre-plating treatment solution circulation line having a temperature
control function for a pre-plating treatment solution, and

the plating tank is provided with a plating solution circulation line having a filter and a temperature control function for
a plating solution, the plating solution circulation line being connected to a flushing line for flushing an interior of the
plating solution circulation line and an interior of the plating tank.

US Pat. No. 9,437,456

HEAT TREATMENT APPARATUS EMITTING FLASH OF LIGHT

SCREEN Holdings Co., Ltd....

1. A heat treatment method irradiating a substrate with flashes of light from flash lamps to heat the substrate, comprising:
(a) a first irradiation step of irradiating said substrate with a flash of light of a first pulse, said first irradiation
step being started at a first time;

(b) a second irradiation step of irradiating said substrate with a flash of light of a second pulse having a length different
from said first pulse, said second irradiation step being started at a second time later than said first time; and

(c) Performing said second irradiation step such that at least a part of the irradiation of a flash of light of said second
irradiation step is superimposed on the irradiation of a flash of light of said first irradiation step.

US Pat. No. 9,238,244

DISCHARGE APPARATUS AND DISCHARGE METHOD

SCREEN Holdings Co., Ltd....

1. A discharge apparatus, comprising:
a nozzle which discharges a paste-like discharge material supplied from a supply part;
a feeder part which is provided on a flow path of the discharge material from the supply part to the nozzle and feeds the
discharge material in the flow path at a predetermined flow rate from the supply part side toward the nozzle side;

a plurality of pressurizers provided in parallel to each other on the flow path between the supply part and the feeder part
and each having a function of temporarily storing the discharge material supplied from the supply part in a storage space
and a function of pressurizing the discharge material stored in the storage space and feeding the discharge material under
pressure to the feeder part; and

a controller which causes at least one of the pressurizers to pressurize the discharge material in the flow path communicating
with the feeder part so that a predetermined positive pressure is applied to the discharge material in the flow path and causes
the discharge material to be supplied from the supply part to at least one of the pressurizers not pressurizing the discharge
material.

US Pat. No. 9,079,406

INKJET PRINTING APPARATUS AND NOZZLE-CLEANING METHOD THEREOF

Screen Holdings Co., Ltd....

1. An inkjet printing apparatus that performs printing while moving an inkjet head and a printing sheet relatively to each
other, comprising:
an inkjet head with a plurality of nozzles, the nozzles being arranged in a width direction of the printing sheet orthogonal
to a relative movement direction of the printing sheet and enabling to eject ink droplets of at least two sizes;

an ink-droplet detector configured to optically detect ink droplets ejected from each of the nozzles; and
a non-ejection recovering device configured to recover non-ejection of ink droplets from each of the nozzles; and
a controller configured to perform flushing that ejects the ink droplets of at least two sizes from each of the nozzles, to
operate the ink-droplet detector to perform an ejection test for detecting an ejection condition of each of the nozzles, and
to operate the non-ejection recovering device to perform cleaning in accordance with results of the ejection test,

the non-ejection recovering device having a function of cleaning each of the nozzles by purge that discharges the ink droplets,
and enables to perform weak purge as weak cleaning and strong purge as stronger cleaning than the weak purge,

the controller performing the ejection test of ejecting only the smaller ink droplets and thereafter ejecting only the larger
ink droplets relative to each of the nozzles prior to printing, and

the controller causing the non-ejection recovering device to perform the weak purge when the ink droplet detector detects
a non-ejection nozzle upon the ejection of only the smaller ink droplets, and causing the non-ejection recovering device to
perform the strong purge when the ink droplet detector detects a non-ejection nozzle upon the ejection of the larger droplets
thereafter through performing the ejection test.

US Pat. No. 9,082,725

PATTERN FORMING METHOD

SCREEN Holdings Co., Ltd....

1. A pattern forming method comprising the steps of:
alternately stacking at least two insulative films and at least two polysilicon films on a substrate to form a multilayer
film including the at least two insulative films and the at least two polysilicon films;

forming a hole extending through the at least two insulative films and the at least two polysilicon films in the multilayer
film; and

selectively etching the polysilicon films from a side wall of the hole through isotropic etching by feeding into the hole
an etching gas prepared by diluting a fluorine-containing halogen gas with an inert gas, such that a ratio ?/tA of a standard deviation ? of etching depths of the respective polysilicon films in a side wall of the hole after the selective
etching, with respect to an average tA of the etching depths, is in a range from 9% to 13%.

US Pat. No. 9,403,187

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SCREEN Holdings Co., Ltd....

1. A substrate processing method comprising:
a chemical liquid supplying step of supplying a chemical liquid having a first temperature to a major surface of a substrate;
a rinse liquid supplying step of supplying, after the chemical liquid supplying step, a rinse liquid having a second temperature
lower than the first temperature to the major surface of the substrate to rinse off a liquid remaining on the substrate;

a reaction liquid supplying step of supplying, after the chemical liquid supplying step and before the rinse liquid supplying
step, a reaction liquid, causing an exothermic reaction upon mixing with the chemical liquid and having a liquid temperature
lower than the first temperature and not less than the second temperature, to the major surface of the substrate in a state
where the chemical liquid supplied to the substrate in the chemical liquid supplying step remains on the substrate; and

a temperature decrease suppressing step of supplying, in parallel to the reaction liquid supplying step, a heating fluid having
a temperature lower than the first temperature and higher than the liquid temperature of the reaction liquid to the other
major surface of the substrate at an opposite side of the major surface of the substrate to which the chemical liquid is supplied
in the chemical liquid supplying step,

wherein the temperature decrease suppressing step is started after the discharge of the chemical liquid onto the substrate
in the chemical liquid supplying step is stopped.

US Pat. No. 9,156,294

IMAGE RECORDING APPARATUS AND BASE MATERIAL SUPPLY APPARATUS

SCREEN HOLDINGS CO., LTD....

1. An image recording apparatus comprising:
an unwinder that unwinds a sheet-like base material from a roll around which said base material is cylindrically wound;
a recorder that records an image onto a surface of said base material;
a take-up part that takes up said base material on which an image has been recorded by said recorder;
a first supporter that supports said base material that is being conveyed in a first direction away from said recorder after
having been unwound from said unwinder;

a surface modifying part that modifies the surface of said base material by energizing the surface of said base material that
has passed through said first supporter; and

a second supporter that supports said base material that is being conveyed in a second direction toward said recorder after
having passed through said surface modifying part,

wherein said second supporter is more distant from said unwinder than said first supporter is, and
said unwinder is disposed on at least one of a virtual line segment that connects said surface modifying part and said recorder
and a normal to the line segment.

US Pat. No. 9,050,635

SUBSTRATE PROCESSING APPARATUS

SCREEN Holdings Co., Ltd....

1. A substrate processing apparatus that performs processing to a substrate having a top surface and a back surface, comprising:
first and second processing regions, arranged adjacent to each other, for performing the processing to the substrate;
a storing and carrying in and out region, arranged adjacent to the first processing region, for storing and carrying the substrate
into and out of the first processing region;

a first interface provided between the storing and carrying in and out region and the first processing region; and
a second interface provided between the first processing region and the second processing region, wherein
the first processing region includes
a plurality of first processing sections, and
a first transport device that has first and second hands provided one above another for holding substrates respectively, and
transports the substrate among the first interface, the plurality of first processing sections and the second interface,

the second processing region includes
a plurality of second processing sections, and
a second transport device that has third and fourth hands provided one above another for holding substrates respectively,
and transports the substrate between the second interface and the plurality of second processing sections,

the storing and carrying in and out region includes
a container platform on which a storing container that stores the substrate is placed, and
a third transport device that transports the substrate between the storing container placed on the container platform and
the first interface,

the first interface includes first, second, third and fourth substrate platforms on which the substrates are placed, respectively,
wherein the first and second substrate platforms are provided one above another, the third and fourth substrate platforms
are provided one above another, and a difference in height between the first hand and the second hand is equal to a difference
in height between the first substrate platform and the second substrate platform and is equal to a difference in height between
the third substrate platform and the fourth substrate platform,

the second interface includes first and second reversing devices that each reverse the top surface and the back surface of
the substrate, each of the first and second reversing devices being configured to reverse two substrates simultaneously,

the first processing section includes a top surface cleaning processing section that cleans the top surface of the substrate,
the second processing section includes a back surface cleaning processing section that cleans the back surface of the substrate,
the first transport device is configured to transport the substrate among the first, second, third and fourth substrate platforms,
the first and second reversing devices and the plurality of first processing sections, and is configured to be capable of
receiving two substrates simultaneously from the first and second substrate platforms, placing two substrates simultaneously
on the third and fourth substrate platforms, transporting two substrates simultaneously to the first reversing device, and
receiving two substrates simultaneously from the second reversing device,

the second transport device is configured to transport the substrate among the first and second reversing devices and the
plurality of second processing sections, and is configured to be capable of receiving two substrates simultaneously from the
reversing device, and transporting two substrates simultaneously to the second reversing device, and

the third transport device is configured to transport the substrate among the storing container placed on the container platform
and the first, second, third and fourth substrate platforms, placing substrates on the first and second substrate platforms,
respectively, and receiving substrates from the third and fourth substrate platforms, respectively.

US Pat. No. 9,393,811

APPARATUS FOR AND METHOD OF RECORDING IMAGE

SCREEN HOLDINGS CO., LTD....

1. An image recording apparatus comprising:
a transport mechanism for transporting an elongated strip-shaped recording medium in a longitudinal direction thereof along
a predetermined transport path;

at least one recording head for recording an image on a surface of the recording medium in a recording position on said transport
path;

an upstream detector for detecting a widthwise position of the recording medium in a position upstream of said recording position
on said transport path;

a downstream detector for detecting the widthwise position of the recording medium in a position downstream of said recording
position on said transport path; and

a calculation part for calculating the widthwise position of the recording medium in said recording position, based on detection
results from said upstream detector and said downstream detector.

US Pat. No. 9,204,105

IMAGING APPARATUS AND IMAGING METHOD

SCREEN HOldings Co., Ltd....

1. An imaging apparatus, comprising:
a holder that holds a specimen holding plate substantially in a horizontal state, the specimen holding plate being formed
with a well capable of holding liquid;

a light illuminator that irradiates light from above the specimen holding plate held by the holder to a surface of a specimen
obtained by injecting fluid into the well;

a controller that controls a light quantity distribution of light to be incident on the surface of the specimen from the light
illuminator based on a luminance distribution preliminarily measured at the well with the fluid; and

an imager for obtaining an image of the specimen by imaging the specimen under light illumination at the light quantity distribution
set by the controller;

wherein the controller sets the light quantity distribution of the light to be incident on the surface of the specimen based
on a luminance distribution in a preliminary image obtained by imaging the well by the imager under a predetermined standard
light quantity distribution; and

wherein the controller sets a larger incident light quantity for a position with lower luminance in a background image obtained
by removing high frequency components higher than a predetermined spatial frequency from the preliminary image.

US Pat. No. 9,082,066

IMAGE PROCESSING DEVICE FOR GENERATING COATING DATA, AND PRINTING DEVICE USING THE SAME

SCREEN Holdings Co., Inc....

1. An image processing apparatus for generating coating data in accordance with inputted image data composed of color data,
the apparatus comprising:
a high-resolution rasterizing processor configured to rasterize the inputted image data with high resolution in accordance
with resolution of a printing head to generate at least one high-resolution raster image;

a low-resolution rasterizing processor configured to rasterize the inputted image data with lower resolution than the resolution
of the printing head to generate at least one low-resolution raster image;

a print-data generating section configured to generate print data depending on the printing head in accordance with the high-resolution
raster image; and

a coating-data generating section configured to generate coating data in accordance with the low-resolution raster image,
wherein

the low-resolution rasterizing processor generates the low-resolution raster image with the inputted image data as a monochrome
image.

US Pat. No. 9,180,687

FILTER MANUFACTURING APPARATUS AND FILTER MANUFACTURING METHOD

SCREEN HOLDINGS CO., LTD....

1. A filter manufacturing apparatus for manufacturing, by inkjet printing, filters arranged at intervals in a transport direction
of a printing medium and in a direction perpendicular to the transport direction, the apparatus comprising:
a printing cell setting unit for setting, based on a predetermined filter pitch and a head resolution, printing cells having
an equal number of dot areas in the direction perpendicular to the transport direction of the printing material;

a shift amount calculating unit for calculating shift amounts between the filter pitch and the printing cells in the direction
perpendicular to the transport direction of the printing medium;

a shift amount determining unit for determining whether shift amounts of the printing cells exceed a unit dot area; and
a printing cell complementing unit for complementing the shift amounts of the printing cells exceeding the unit dot area by
adjusting the number of dot areas included in the printing cells.

US Pat. No. 9,050,616

SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD

SCREEN Holdings Co., Ltd,...

1. A substrate treatment method comprising:
a holding/rotating step of causing a substrate holding/rotating unit to horizontally hold a substrate in a chamber and rotate
the substrate about a vertical rotation axis extending through the substrate;

a treatment liquid supplying step of, simultaneously with the holding/rotating step, spouting a treatment liquid from a treatment
liquid supplying unit toward a center portion of the substrate held by the substrate holding/rotating unit;

a temperature measuring step of, before the treatment liquid supplying step, causing a temperature measuring unit to measure
at least one of an internal air temperature of the chamber and a temperature of the treatment liquid to be spouted from the
treatment liquid supplying unit;

a target value setting step of, after the temperature measuring step, setting a target value of the internal air temperature
of the chamber or the temperature of the treatment liquid to be spouted from the treatment liquid supplying unit based on
a measurement value detected by the temperature measuring unit and also based on information stored in a storage device which
defines a relationship among the air temperature, the treatment liquid temperature, and a treatment uniformity value; and

a temperature controlling step of, before the treatment liquid supplying step, controlling a temperature adjusting unit so
that the internal air temperature of the chamber or the temperature of the treatment liquid to be spouted from the treatment
liquid supplying unit is adjusted closer to the target value.

US Pat. No. 9,180,550

HEAT TREATMENT APPARATUS FOR HEATING SUBSTRATE BY LIGHT IRRADIATION

SCREEN Holdings Co., Ltd....

1. A heat treatment apparatus for heating a substrate by irradiating said substrate with light, said heat treatment apparatus
comprising:
a chamber configured to receive a substrate;
a holding part configured to hold the substrate within said chamber;
a quartz window arranged at one end of said chamber;
a halogen lamp configured to irradiate one side of the substrate held on said holding part with light through said quartz
window;

a temperature detection part configured to receive an infrared ray emitted from the other side of the substrate held on said
holding part, and two-dimensionally detect the temperature of said the other side;

an infrared-transparent window arranged at the other end of said chamber and configured to allow an infrared ray in a wavelength
region detectable by said temperature detection part to transmit therethrough; and

a temperature correction part configured to, based on a result of the detection obtained by said temperature detection part,
heat a temperature drop region having a relatively low temperature among a region of the substrate held on said holding part.

US Pat. No. 9,436,087

SUBSTRATE PROCESSING APPARATUS WITH A CLEANING PROCESSING SECTION FOR CLEANING A CHEMICAL LIQUID PROCESSING SECTION

SCREEN Holdings Co., Ltd....

1. A substrate processing apparatus comprising:
a chemical liquid processing section in which a process is performed on a substrate by a chemical liquid;
a cleaning processing section in which a cleaning process is performed on the chemical liquid processing section; and
a controller configured to control the chemical liquid processing section and the cleaning processing section, wherein
the chemical liquid processing section includes
a chemical liquid storage configured to store the chemical liquid that includes a solvent,
a discharge nozzle configured to discharge the chemical liquid,
a first pipe for leading the chemical liquid stored in the chemical liquid storage to the discharge nozzle,
a supply device provided at the first pipe and configured to supply the chemical liquid stored in the chemical liquid storage
to the discharge nozzle through the first pipe,

a flow path opening/closing unit provided at a portion of the first pipe at a further downstream position than the supply
device and configured to be capable of opening and closing a flow path in the first pipe, and

a filter provided at a portion of the first pipe that is located at a further downstream position than the supply device and
at a further upstream position than the flow path opening/closing unit, wherein

the cleaning processing section includes
a second pipe for leading a cleaning liquid to the first pipe, the cleaning liquid including a component for cleaning away
solid matter,

a fourth pipe for leading to the first pipe a replacement solvent that includes a same component or a same type of component
as a solvent included in the chemical liquid stored in the chemical liquid storage so as not to affect a composition of the
chemical liquid, and

a switching unit configured to be capable of switching a flow path in the first, second and fourth pipes such that the chemical
liquid, the cleaning liquid and the replacement solvent are selectively led to a predetermined flow path range of the first
pipe and the cleaning liquid does not pass through the filter, and

the controller is configured to control the switching unit such that the replacement solvent is led to the flow path range
after the solid matter adhering to the flow path range is cleaned away by the cleaning liquid led to the flow path range,
so that the cleaning liquid in the flow path range is replaced with the replacement solvent, and the chemical liquid is led
to the flow path range after the replacement solvent is led to the flow path range.

US Pat. No. 9,103,870

INSPECTION APPARATUS AND INSPECTION METHOD

SCREEN HOLDINGS CO., LTD....

1. An inspection apparatus that inspects a photo device, the inspection apparatus comprising:
an irradiation part that irradiates said photo device with pulsed light emitted from a femtosecond laser;
a detecting part that detects an electromagnetic wave, which is generated from said photo device according to the irradiation
of said pulsed light;

a continuous light irradiation part that irradiates a portion, which is irradiated with said pulsed light in said photo device,
with continuous light; and

an irradiation condition changing part that changes an irradiation diameter of said continuous light.

US Pat. No. 9,450,536

INSPECTION APPARATUS AND INSPECTION METHOD

SCREEN HOLDINGS CO., LTD....

1. An inspection apparatus that inspects a photo device, the inspection apparatus comprising:
an irradiation part that emits a plurality of pieces of pulse light having different wavelengths to irradiate a photo device;
a setting part that sets said wavelengths of said plurality of pieces of pulse light with which said photo device is irradiated
by said irradiation part; and

a detection part that detects an electric field intensity of an electromagnetic wave emitted from said photo device in response
to said plurality of pieces of pulse light with which said photo device is irradiated by said irradiation part, wherein

said irradiation part irradiates said photo device with pulse light having a second wavelength different from a first wavelength
after a time ?t elapses since said photo device is irradiated with pulse light having said first wavelength, and

said time ?t is longer than a generation time for one pulse of said electromagnetic wave emitted by said pulse light.

US Pat. No. 9,156,269

LIQUID EJECTION APPARATUS

SCREEN HOLDINGS CO., LTD....

1. A liquid ejection apparatus comprising:
an ejecting part for ejecting a liquid toward a base material, said ejecting part and said base material moving relative to
each other in a predetermined movement direction; and

a cleaning mechanism for cleaning a lower surface of said ejecting part,
said ejecting part including:
an ejection head having a head lower surface in which a plurality of outlets for ejecting the liquid are arranged in an arrangement
direction that intersects said movement direction; and

a guiding part for fixing a position of said ejection head relative to said guiding part and having a guide lower surface
that is spaced from said head lower surface on each side in said movement direction,

said cleaning mechanism including:
a cleaning unit to be brought into contact with said head lower surface; and
a cleaning unit movement mechanism for moving said cleaning unit relative to said ejection head in a cleaning direction from
one side to the other side in said arrangement direction to allow said cleaning unit to clean said head lower surface, and

said cleaning unit including:
a base part;
a liquid holding part protruding above a central portion of said base part, said central portion facing said head lower surface,
and for holding a liquid in a gap between said head lower surface and said liquid holding part;

a wiping part fixed to said base part further to a rear side of said cleaning unit in said cleaning direction than said liquid
holding part and for wiping said head lower surface while in contact with said head lower surface; and

a pair of positioning parts that are located on opposite sides of said liquid holding part in said movement direction, spaced
from said liquid holding part, and protrude above said base part, and are for maintaining said gap while in contact with said
guide lower surface,

wherein said pair of positioning parts are each in the shape of a wall extending in said arrangement direction,
a space between said liquid holding part and each of said pair of positioning parts is in the shape of a groove extending
in said arrangement direction, and

said groove forms a flow path on said base part for guiding said liquid to sides of said base part.

US Pat. No. 9,165,798

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SCREEN Holdings Co., Ltd....

1. A substrate processing apparatus for processing a substrate, comprising:
a substrate holding part for holding a substrate;
a processing liquid supply part for supplying a processing liquid onto a first main surface of the substrate on which a device
has been formed in advance, said first main surface being one main surface of said substrate;

an anti-static liquid contacting part for bringing said first main surface of said substrate and a second main surface which
is the other main surface thereof into contact with an anti-static liquid having electrical resistivity higher than that of
said processing liquid;

a liquid removing part for removing liquid from said substrate by at least one of: drying said substrate, rotating said substrate,
and providing another liquid to said substrate; and

a control part configured to control said processing liquid supply part, said anti-static liquid contacting part and said
liquid removing part to bring entire said first main surface and said second main surface of said substrate into contact with
said anti-static liquid to thereby maintain a wetted state, to then remove said anti-static liquid from said substrate, and
subsequently, to supply said processing liquid onto said first main surface of said substrate to thereby perform a process,
wherein

said anti-static liquid contacting part configured to said first main surface and said second main surface of said substrate
into contact with said anti-static liquid, after said substrate has been subjected to a drying process and thereby electrically
charged in advance before being loaded into said substrate processing apparatus.

US Pat. No. 9,385,020

SUBSTRATE HOLDING AND ROTATING DEVICE, SUBSTRATE TREATMENT APPARATUS INCLUDING THE DEVICE, AND SUBSTRATE TREATMENT METHOD

SCREEN Holdings Co., Ltd....

1. A substrate treatment apparatus comprising:
a substrate holding and rotating device; and
a treatment liquid supply unit which supplies a treatment liquid to an upper surface of a substrate held by the substrate
holding and rotating device;

the substrate holding and rotating device comprising:
a turntable rotatable about a vertical rotation axis;
a rotative drive unit which rotates the turntable;
a holding member which is provided on the turntable and horizontally holds the substrate in upwardly spaced relation to the
turntable;

a protection disk disposed between the turntable and a substrate holding position at which the substrate is held by the holding
member, and attached to the turntable so as to be vertically movable relative to the turntable between a lower position and
an adjacent position closer than the lower position to a lower surface of the substrate held by the holding member above the
lower position, the protection disk having a notch provided in a peripheral portion thereof at a position corresponding to
a position of the holding member to border the holding member;

a lateral side covering member which is attached to the protection disk and covers a space defined between the substrate held
by the holding member and the turntable from a lateral side of the turntable;

wherein the lateral side covering member includes a skirt portion having a first portion extending radially outwardly from
a peripheral edge of the protection disk and a second portion extending downwardly from the first portion outside of the turntable;

a magnetic levitation mechanism including a first magnet attached to the protection disk, a second magnet which has an annular
shape coaxial about the vertical rotation axis and generates a repulsive force with respect to the first magnet, a first support
member which non-rotatably supports the second magnet, and a first relative movement mechanism which moves the first support
member relative to the turntable so as to change a distance between the first magnet and the second magnet, the magnetic levitation
mechanism being configured to levitate the protection disk from the turntable by the repulsive force generated between the
first magnet and the second magnet; and

an inert gas supply unit which supplies an inert gas, which does not undergo chemical reactions under operating conditions
of the substrate treatment apparatus, to a space defined between the substrate held and rotated by the substrate holding and
rotating device and the protection disk located at the adjacent position;

wherein the protection disk has a restriction portion provided on an upper surface thereof, the restriction portion defines
an orifice between the restriction portion and a peripheral edge of the lower surface of the substrate held by the holding
member, and the orifice restricts an inert gas flow passage defined between the substrate held by the holding member and the
protection disk.

US Pat. No. 9,437,448

SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATING APPARATUS

SCREEN Holdings Co., Ltd....

1. A substrate treatment method for forming a dopant-containing thin film on a surface of a substrate, the method comprising:
providing a substrate that is without an oxide film; and
supplying a dopant solution to the surface of said substrate that is without an oxide film to form a dopant-containing thin
film thereon; and

performing said supplying step without performing hydrogen-termination to the surface of said substrate.

US Pat. No. 9,085,182

DATA PROCESSING METHOD OF PRINTING APPARATUS AND THE PRINTING APPARATUS

SCREEN Holdings Co., Ltd....

1. A data processing method of a printing apparatus for printing a multi-color image on a printing medium by a first printing
head and a second printing head while transporting the printing medium relative to the first printing head and the second
printing head in a printing medium-feed direction, the first printing head being disposed upstream of the printing medium-feed
direction and the second printing head being spaced away from the first printing head and being disposed downstream of the
paper-feed direction, the method comprising:
a skew detecting step of detecting a degree of skew of the printing medium;
a correction printing-data generating step of shifting print data for performing multi-color image printing for every printing
color in a locatable area in a direction orthogonal with respect to the medium-feed direction in accordance with the degree
of skew to generate correction printing-data, the locatable area being set for locating the print data for the every printing
color; and

a printing step of performing printing on the printing medium with the first printing head and the second printing head in
accordance with the correction printing-data,

wherein in the correction printing-data generating step, the locatable area being set wider than a locatable area with no
skew, and a shift amount of the first printing head being larger than a shift amount of the second printing head in the printing
medium-feed direction and the direction orthogonal with respect to the printing medium-feed direction.

US Pat. No. 9,324,602

SUBSTRATE INVERTING APPARATUS AND SUBSTRATE PROCESSING APPARATUS

SCREEN Holdings Co., Ltd....

1. A substrate inverting apparatus for inverting a substrate, the substrate inverting apparatus comprising:
a support mechanism which supports a plurality of substrates in a state where the substrates are stacked vertically in a spaced-apart
manner in a horizontal posture; and a clamping and inverting mechanism which clamps said plurality of substrates supported
by said support mechanism respectively and inverts said plurality of substrates at a time, wherein

said clamping and inverting mechanism comprises:
a pair of clamping members which clamps each one of said plurality of substrates from both edge portions;
a clamping member drive part which moves said pair of respective clamping members between a near position where a part of
the clamping members is arranged close to or is brought into contact with a side surface of the substrate, and a remote position
where said clamping members are away from said side surface; and an elastic member which elastically biases said clamping
members arranged at said near position toward the side surface of said substrate,

said support mechanism comprises:
a plurality of support members which support said plurality of respective substrates from a lower surface side thereof; and
a support member drive part which moves said plurality of respective support members between a support position where a part
of the support member is brought into contact with a lower surface of the substrate, and a standby position where said support
member is away from said lower surface, and

said support member drive part moves the support member to said standby position from said support position by moving said
plurality of respective support members downward while moving said support members away from the center of said substrate
as viewed in the vertical direction.

US Pat. No. 9,064,922

SUBSTRATE INSPECTION APPARATUS AND SUBSTRATE INSPECTION METHOD

SCREEN Holdings Co., Ltd....

1. A substrate inspection apparatus, comprising:
a rotator that holds and rotates a substrate having a coating film formed on a surface;
a light irradiator that irradiates light to the surface of the substrate;
photoelectric converter that receives specularly reflected light from the surface of the substrate and captures an image of
a scanning line having at least a length of the radius of the substrate in a main scanning direction parallel to a radial
direction of the substrate from a center of rotation of the substrate; and

an image processor that generates a two-dimensional image by arranging images captured by the photoelectric converter during
one turn of the substrate in a sub scanning direction perpendicular to the main scanning direction and judges whether an edge
line of the coating film is good or bad using a judgment band set in parallel to the sub scanning direction for the two-dimensional
image,

wherein the image processor includes:
an edge detector that divides an image included in the judgment band out of the two-dimensional image into a plurality of
block images in the sub scanning direction and detects whether or not each block image includes the edge of the coating film;
and

a good and bad judgment unit that judges whether the edge line of the coating film is good or bad based on the number of the
edge-detected block images by the edge detector.

US Pat. No. 9,122,961

PRINTED IMAGE INSPECTING APPARATUS AND PRINTED IMAGE INSPECTING METHOD

SCREEN HOLDINGS CO., LTD....

1. A printed image inspecting apparatus for reading out an image printed on a printing sheet in accordance with printed image
data and inspecting a printing result on the printing sheet, the printed image inspecting apparatus comprising:
a reader configured to read front and back faces of the printing sheet to obtain front inspecting image data and back inspecting
image data, respectively;

a mask generating unit configured to generate a show-through area mask, representing an area where show-through possibly exists,
in accordance with inverted front printed image data of the printed image data and the back printed image data of the printed
image data, the inverted front printed image data being obtained by inverting the front printed image data in a horizontal
direction; and

a determining unit configured to inspect the back printed image data and the back inspecting image data of a show-through
area corresponding to the show-through area mask with a show-through inspection threshold, and to inspect the front printed
image data and the front inspecting image data as well as the back printed image data and the back inspecting image data of
an area other than the show-through area with a normal inspection threshold.

US Pat. No. 9,370,937

INSPECTING CHART AND PRINTING APPARATUS

SCREEN Holdings Co., Ltd....

1. An inspecting chart for determining a correction value for correcting a skew or serpentine transportation of a print medium,
the inspecting chart comprising:
a reference pattern containing a first line segment group and a second line segment group, the first line segment group being
formed by a plurality of first line segments printed by a reference printing head on the print medium at a first given interval,
the first line segments each having a first line width parallel to a transportation direction of the print medium, the second
line segment being formed by second line segments printed by a printing head on a center between two adjacent first line segments
or a center of each of the first line segments, the printing head being spaced away from the reference printing head in the
transportation direction of the print medium, and the second line segments each having a second line width and being parallel
to the first line segments;

a first-side deviation pattern spaced away from the reference pattern in a direction orthogonal to the transportation direction
of the print medium, and including the first line segment group and a second line segment group, the second line segment group
being formed by the second line segments printed by a given deviation from the center between the two adjacent first line
segments or the center of each of the first line segments toward a first side of the direction orthogonal to the transportation
direction of the print medium; and

a second-side deviation pattern spaced away from the reference pattern in the direction orthogonal to the transportation direction
of the print medium opposite to the first-side deviation pattern across the reference pattern, and including the first line
segment group and a second line segment group, the second line segment group being formed by the second line segments printed
by a given deviation from the center between the two adjacent first line segments or the center of each of the first line
segments toward a second side of the direction orthogonal to the transportation direction of the print medium,

the first-side deviation pattern and the second-side deviation pattern being printed with various deviations.

US Pat. No. 9,541,508

INSPECTING DEVICE AND INSPECTING METHOD

SCREEN HOLDINGS CO., LTD....

1. An inspecting device comprising:
an irradiation part for irradiating an inspecting target with each of pump light and probe light having the same pulse period;
a detection part for detecting an electromagnetic wave generated from said inspecting target by irradiating said inspecting
target with said probe light;

a measurement delay part for delaying the time of arrival of said probe light at said inspecting target relatively to said
pump light; and

a reverse bias voltage applying part for applying a reverse bias voltage to said inspecting target, wherein
said irradiation part includes a scanning mechanism to scan with said probe light a scanned and observed area which is larger
than an irradiated area being irradiated with said pump light in said inspecting target, an area which is not irradiated with
said pump light being also observed in addition to the irradiated area, and

a diameter of a spot of said probe light is smaller than a diameter of a spot of said pump light, and
the reverse bias voltage applied by said reverse bias voltage applying part is variable.

US Pat. No. 9,207,162

IMAGING APPARATUS

SCREEN Holdings Co., Ltd....

1. An imaging apparatus, comprising:
a holder that holds a specimen container carrying a biological specimen;
an imager that images the biological specimen in the specimen container;
a sterilizer that supplies a drug or electromagnetic waves having a sterilization effect to the holder; and
a controller that performs a sterilization process of supplying the drug or the electromagnetic waves to the holder by controlling
the sterilizer at least either before or after imaging the biological specimen by the imager;

a chamber that forms a specimen housing space capable of housing the specimen container, wherein the holder is provided in
the specimen housing space and the sterilizer supplies the drug or the electromagnetic waves to the specimen housing space;
and

a positive pressure application unit that applies a positive pressure relative to outside atmosphere into the specimen housing
space.

US Pat. No. 9,575,389

LIGHT MODULATOR AND EXPOSURE HEAD

Screen Holdings Co., Ltd....

1. A light modulator which modulates light propagating in a propagation direction, comprising:
a first electro-optic crystal substrate having a first periodic polarization reversal structure including a plurality of first
and second polarization sections alternately arranged in a first period along a first arrangement direction orthogonal to
the propagation direction to allow the light to propagate through the first periodic polarization reversal structure, directions
of polarization developed in each first polarization section and each second polarization section in response to electric
fields being opposite to each other;

a second electro-optic crystal substrate having a second periodic polarization reversal structure including a plurality of
third and fourth polarization sections alternately arranged in a second period along a second arrangement direction orthogonal
to the propagation direction to allow outgoing light from the first electro-optic crystal substrate to propagate through the
second periodic polarization reversal structure, directions of polarization developed in each third polarization section and
each fourth polarization section in response to electric fields being opposite to each other; and

a driver that applies a voltage upon the first electro-optic crystal substrate and the second electro-optic crystal substrate
to create diffraction gratings inside the first periodic polarization reversal structure and the second periodic polarization
reversal structure, thereby modulating the light,

wherein the first period and the second period are different from each other.

US Pat. No. 9,651,607

PHOTO DEVICE INSPECTION APPARATUS AND PHOTO DEVICE INSPECTION METHOD

SCREEN HOLDINGS CO., LTD....

1. A photo device inspection apparatus for inspecting a photo device, comprising:
an irradiation part configured to irradiate said photo device with light from a light source;
an electromagnetic wave detection part configured to detect an electromagnetic wave radiated from said photo device in response
to irradiation with said light, wherein

said irradiation part comprises a scanning mechanism configured to scan an inspection target area of said photo device with
said light;

a current detection part configured to detect a current generated by said photo device in response to irradiation with said
light;

a current intensity distribution image generation part coupled to the current detection part and configured to generate a
current intensity distribution image that indicates an intensity distribution of said current generated in said inspection
target area,

said current intensity distribution image is an image generated based on a current value detected by said current detection
part:

an electromagnetic wave intensity distribution image generation part configured to generate an electromagnetic wave intensity
distribution image that indicates an intensity distribution of said electromagnetic wave generated in said inspection target
area; and

an image composition part configured to composite said current intensity distribution image and said electromagnetic wave
intensity distribution image.

US Pat. No. 9,483,215

PRINTING SYSTEM FOR ENABLING OPTIMIZATION OF PRINTER OPERATION RATE, PRINTING CONTROL DEVICE, AND RECORDING MEDIUM FOR RECORDING PRINTING CONTROL PROGRAM

SCREEN HOLDINGS CO., LTD....

1. A printing system comprising:
a printer, configured to receive raster data and execute printing;
a controller, connected to the printer and configured to receive print data from a client computer, comprising:
a memory;
a hard drive;
a processor, configured to:
estimate a time necessary for a conversion process of the print data to raster data;
acquire a printing speed at which the printer executes printing;
determine whether to, on a basis of the estimated time and the printing speed, store raster data prepared by the conversion
process in the memory or in the hard drive, wherein the memory is selected to store the raster data if a print time to print
the print data at the print speed is shorter than the estimated time, and the hard drive is selected to store the raster data
if the print time is longer than the estimated time;

based on the determination, cause the memory or the hard drive to store the raster data prepared by the conversion process;
and

cause the stored raster data to be transferred to the printer.

US Pat. No. 9,330,949

HEAT TREATMENT APPARATUS FOR HEATING SUBSTRATE BY IRRADIATING SUBSTRATE WITH FLASH OF LIGHT

SCREEN Holdings Co., Ltd....

1. A heat treatment apparatus for heating a substrate by irradiating the substrate with a flash of light, comprising:
a chamber for receiving a substrate therein;
a flash lamp for irradiating a first surface of the substrate held in said chamber with a flash of light;
a halogen lamp for irradiating a second surface of the substrate with light; and
a temperature equalizing ring abutting against an edge portion of the substrate to surround the edge portion, said temperature
equalizing ring including an annular portion, a collar, and a reinforcing portion, said annular portion being parallel to
a main surface of the substrate, said collar being provided at the inner peripheral edge of said annular portion and supports
the lower surface of the edge portion of the substrate, said reinforcing portion being provided in continuation to an outer
peripheral edge of said annular portion, said reinforcing portion forming an angle greater than 0 degrees and less than 180
degrees with said annular portion.

US Pat. No. 9,421,803

IMAGE PROCESSOR AND IMAGE PROCESSING METHOD

Screen Holdings Co., Ltd....

1. An image processor for generating dotted image data by performing screening processing for forming dots to continuous tone
image data, the image processor comprising:
a screening data storage device storing a plurality of types of dotted pattern data for use in the screening processing to
each of a plurality of images represented by the continuous tone image data;

a screening output density correcting device performing output density correction to the plurality of types of dotted pattern
data when the continuous tone image data is processed for printing; and

a dotted image data generating device generating dotted image data with a corrected output density from the continuous tone
image data by performing the screening processing to each of the plurality of images represented by the continuous tone image
data using the plurality of types of dotted pattern data subjected to the output density correction.

US Pat. No. 9,539,607

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SCREEN Holdings Co., Ltd....

1. A substrate processing apparatus that performs processing on a substrate, comprising:
a processing unit that has a supporter supporting the substrate and is configured to perform the processing on the substrate
held by the supporter;

a transport device that has a first holder configured to hold the substrate and to be capable of linearly advancing and retreating,
and is configured to transport the substrate by moving the first holder;

a storage that stores first control information for controlling the transport device such that the first holder of the transport
device places the substrate at a predetermined position on the supporter of the processing unit;

a controller that controls the transport device based on the first control information stored by the storage; and
a plurality of not less than three detectors provided to detect a plurality of not less than three portions at an outer periphery
of the substrate being moved by the first holder before the first holder places the substrate on the supporter, so as to detect
a shift between a position of the substrate on the supporter and the predetermined position, wherein

the plurality of detectors are arranged along a circular arc that corresponds to the outer periphery of the substrate on a
first path on which the first holder advances and retreats, and configured to emit light to the first path and receive reflection
light or transmitting light from the first path as returning light to generate output signals indicating presence/absence
of receipt of the returning light as detection results, and

the controller is configured to detect time points at which the plurality of portions at the outer periphery of the substrate
are detected by the plurality of detectors based on the output signals of the plurality of detectors when the first holder
advances or retreats on the first path, to correct the first control information based on the detected respective time points
before the first holder places the substrate on the supporter, in order to correct such shift between the position of the
substrate on the supporter and the predetermined position, and to control the transport device based on the corrected first
control information, to reposition the substrate at the predetermined position on the supporter.

US Pat. No. 9,343,313

HEAT TREATMENT METHOD AND HEAT TREATMENT APPARATUS FOR HEATING SUBSTRATE BY IRRADIATING SUBSTRATE WITH LIGHT

SCREEN Holdings Co., Ltd....

1. A method of heating a substrate by irradiating the substrate with light, to thereby activate impurities, the method comprising
the steps of:
(a) heating a substrate to a predetermined preheating temperature;
(b) irradiating said substrate with light, for a time period in the range of 1 to 20 milliseconds, in a manner so that the
temperature of a front surface of said substrate keeps increasing from said preheating temperature until it reaches a maximum
target temperature; and

(c) irradiating said substrate with light to maintain the temperature of the front surface of said substrate within a ±25°
C. range around said maximum target temperature for a time period in the range of 3 to 50 milliseconds, said step (c) being
performed after said step (b), wherein said maximum target temperature is the highest temperature reached by said substrate
throughout said heating method, except that it may exceed same during said irradiating step (c) but not more than by 25° C.;

wherein said substrate is irradiated with a flash of light using a switching element to intermittently supply electrical charges
from a capacitor to a flash lamp to control an emission output from said flash lamp in said step (b) and in said step (c);

a plurality of pulses which are longer in pulse width than pulse intervals are applied to a gate of said switching element
in said step (b); and

a plurality of pulses which are shorter in pulse width than pulse intervals are applied to the gate of said switching element
in said step (c).

US Pat. No. 9,396,974

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SCREEN Holdings Co., Ltd....

1. A substrate processing method comprising:
a holding step of holding a substrate horizontally in non-contact with a major surface of the substrate by bringing a plurality
of gripping members into contact with a peripheral surface of the substrate;

a processing liquid supply step of, in parallel to the holding step, supplying a processing liquid to the major surface of
the substrate; and

a hydrophilic surface placing step of placing a plurality of annular hydrophilic surfaces at respective spaces between the
plurality of gripping members along a peripheral portion of the major surface of the substrate such that the plurality of
hydrophilic surfaces come into contact with a liquid film of the processing liquid held on the major surface of the substrate
in parallel with the processing liquid supply step.

US Pat. No. 9,085,169

INKJET PRINTING APPARATUS AND METHOD OF CORRECTING STEP SHIFT THEREOF

SCREEN Holdings Co., Ltd....

1. An inkjet printing apparatus configured to perform printing by discharging ink droplets onto a print medium, the apparatus
comprising:
a printing head having a plurality of inkjet heads and configured to perform printing by discharging the ink droplets from
the plurality of inkjet heads onto the print medium;

a chart printing device configured to print a step-shift correcting chart with the printing head, the step-shift correcting
chart having a plurality of lines orthogonal to the transportation direction and a blank area separating the plurality of
lines and being used for correcting step shift as printing shift of the plurality of inkjet heads in a transportation direction;

a reading device configured to read the step-shift correcting chart printed on the print medium;
a print medium-processed portion detecting device configured to detect a processed portion of the print medium formed in a
direction orthogonal to the transportation direction of the print medium in accordance with the blank area;

an uninfluenced step-shift correcting-chart generating device configured to eliminate an influence of the processed portion
of the print medium detected by the print medium-processed portion detecting device from the step-shift correcting chart read
by the reading device, thereby generating an uninfluenced step-shift correcting chart; and

a shift-amount calculating device configured to calculate a shift amount for correcting the step shift in accordance with
the uninfluenced step-shift correcting chart.

US Pat. No. 9,443,175

COLOR CONVERTING APPARATUS AND A COLOR CONVERTING METHOD

SCREEN HOLDINGS CO., LTD....

1. A color converting apparatus for converting a device-independent color space into a printing color space dependent on colors
of color material loaded in a printing machine, comprising:
an input port for receiving manuscript data for printing in the printing machine, including data calling for a spot color;
one or more processors to execute color conversion for printing in which the spot color is reproduced in the printing machine
not loaded with the spot color as a color material by using a plurality of other color materials loaded in the printing machine,
the one or more processors configured to:

calculate halftone color values of the spot color in the device-independent color space by connecting with a line, in the
device-independent color space, maximum color values of a time when a dot percentage of the spot color is at a maximum, and
minimum color values of a time when the dot percentage of the spot color is at a minimum; and

calculate printing color values in the printing color space from the calculated halftone color values of the spot color in
the device-independent color space; and

an output port for transmitting the printing color values to the printing machine for printing with the color material loaded
in the printing machine.

US Pat. No. 9,437,464

SUBSTRATE TREATING METHOD FOR TREATING SUBSTRATES WITH TREATING LIQUIDS

SCREEN Holdings Co., Ltd....

1. A substrate treating method for treating substrates with treating liquids, comprising the steps of:
storing the treating liquids in a treating tank;
holding the substrates in a treating position inside said treating tank;
supplying a first treating liquid into said treating tank;
supplying a second treating liquid of lower surface tension than the first treating liquid and higher boiling point than the
first treating liquid, into said treating tank;

controlling a temperature of the second treating liquid in said treating tank to be in a temperature range above the boiling
point of the first treating liquid and below the boiling point of the second treating liquid;

controlling said second treating liquid supplying step so as to replace the first treating liquid supplied from said first
treating liquid supply device and stored in said treating tank with the second treating liquid; and controlling said temperature
controlling step so as to maintain the second treating liquid in said temperature range.

US Pat. No. 9,390,904

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SCREEN Holdings Co., Ltd....

1. A substrate processing apparatus for processing a substrate, comprising:
a chamber having a chamber body and a chamber cover and forming an internal space which is sealed by closing an upper opening
of said chamber body by said chamber cover;

a substrate holding part disposed in said internal space of said chamber, for holding a substrate horizontally;
a substrate rotating mechanism for rotating said substrate together with said substrate holding part about a central axis
oriented in a vertical direction;

a processing liquid discharge part for discharging a processing liquid supplied onto said substrate to the outside of said
chamber,

a plurality of lift pins arranged in a circumferential direction about said central axis and protruding downward from said
chamber cover; and

a lift pin moving mechanism for moving said plurality of lift pins in said vertical direction relative to said chamber cover,
wherein said substrate rotating mechanism comprises:
an annular rotor part disposed in said internal space of said chamber, to which said substrate holding part is attached; and
a stator part disposed around said rotor part outside said chamber, for generating a rotating force between itself and said
rotor part,

wherein respective tip portions of said plurality of lift pins are moved down from an escape position to a transfer position
by said lift pin moving mechanism, and said substrate is transferred between said plurality of lift pins and said substrate
holding part at said transfer position.

US Pat. No. 9,340,761

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SCREEN Holdings Co., Ltd....

1. A substrate processing method comprising:
a chemical liquid supplying step of supplying a chemical liquid having a first temperature to a major surface of a substrate;
a rinse liquid supplying step of supplying, after the chemical liquid supplying step, a rinse liquid having a second temperature
lower than the first temperature to the major surface of the substrate to rinse off the liquid remaining on the substrate;

a reaction liquid supplying step of discharging, after the chemical liquid supplying step and before the rinse liquid supplying
step, a reaction-liquid-containing liquid, which contains, at least at a start of discharge of itself, a reaction liquid,
causing an exothermic reaction upon mixing with the chemical liquid supplied to the substrate in the chemical liquid supplying
step, and a heat generating liquid, generating heat upon mixing with the reaction liquid, and has a liquid temperature not
more than the first temperature and not less than the second temperature, toward the major surface of the substrate in a state
where the chemical liquid supplied to the substrate in the chemical liquid supplying step remains on the substrate; and

a reaction liquid concentration changing step of reducing, in parallel to the reaction liquid supplying step, a proportion
of the heat generating liquid contained in the reaction-liquid-containing liquid discharged toward the substrate such that
a liquid temperature of the reaction-liquid-containing liquid discharged toward the substrate decreases to a temperature lower
than a liquid temperature of the reaction-liquid-containing liquid at the start of discharge of the reaction-liquid-containing
liquid.

US Pat. No. 9,165,806

SUBSTRATE TREATMENT APPARATUS

SCREEN Holdings Co., Ltd....

1. A substrate treatment apparatus comprising:
a treatment chamber in which a substrate is treated;
a substrate holder which horizontally holds the substrate with a surface thereof facing upward in the treatment chamber, and
rotates the substrate about a rotation axis passing through a center of the substrate;

a tubular treatment cup which is disposed in the treatment chamber, and surrounds the substrate holder and accommodates the
substrate holder in the treatment chamber;

a shield member disposed above the substrate holder in the treatment chamber and having an opposing surface configured to
be brought into opposed relation to the substrate holder;

a gas supply unit which has a downward gas supply port having an annular shape to surround the shield member when viewed in
a direction along the rotation axis and is disposed in an upper portion of the treatment chamber for supplying a gas into
the treatment chamber from outside of the treatment chamber, the gas supply port being spaced radially from and not overlapping
the shield member when viewed in the direction along the rotation axis;

a shield member lifter that moves the shield member up and down along the rotation axis between a treatment position close
to the substrate at a lower portion of the treatment chamber and a spaced-apart position spaced away from the substrate, wherein
the gas supply port is kept fixed to the upper portion of the treatment chamber while the shield member lifter moves the shield
member, and

a vent container which surrounds the treatment cup in the treatment chamber and has a gas outlet port for introducing an internal
atmosphere of the treatment chamber into a gas outlet pipe connected to the treatment chamber,

wherein the gas supply unit supplies the gas downwardly from the gas supply port toward the gas outlet port, outside the treatment
cup, thereby forming a downward gas current in the treatment chamber from an upper area to a lower area thereof.

US Pat. No. 9,102,165

IMAGE RECORDING APPARATUS AND IMAGE RECORDING METHOD

SCREEN HOLDINGS CO., LTD....

1. An image recording apparatus for recording an image on a recording medium, comprising:
an ejection part that ejects fine droplets of ink toward a recording medium;
a movement mechanism that moves said recording medium relative to said ejection part; and
a control part that controls said ejection part and said movement mechanism so that an image is recorded on said recording
medium,

wherein a size of fine droplets of ink ejected from said ejection part is switchable,
a width of a dot that is formed on said recording medium by a fine droplet of ink having a minimum size is greater than a
width of a recording pixel that is set on said recording medium,

said control part stores a first tone value and a second tone value, said first tone value being greater than a minimum tone
value that is expressible on said recording medium and being less than or equal to a 50% tone value that is a median value
between said minimum tone value and a maximum tone value, and said second tone value being greater than said minimum tone
value and being smaller than said first tone value, and

as a result of said control part controlling said ejection part,
in a range of tone values that are greater than or equal to said first tone value, only a first droplet that is a fine droplet
of ink having a maximum size is ejected toward said recording medium, and

in a range of tone values that are greater than or equal to said second tone value and less than said first tone value, said
first droplet and a second droplet that is a fine droplet of a size smaller than said first droplet are ejected toward said
recording medium, and a total ejection rate and a first droplet rate increase gradually with increasing tone value, said total
ejection rate being a total of ejection rates of fine droplets of ink of all sizes, and said first droplet rate being a proportion
of an ejection rate of said first droplet to said total ejection rate.

US Pat. No. 9,327,488

ALIGNMENT METHOD, TRANSFER METHOD AND TRANSFER APPARATUS

SCREEN Holdings Co., Ltd....

1. An alignment method for arranging a first substrate and a second substrate opposite to each other and adjusting a mutual
positional relationship, comprising:
a holding step of proximately holding the first substrate formed with a first alignment mark on a surface and the second substrate
formed with a second alignment mark on a surface with the respective alignment mark formed surfaces facing each other;

an imaging step of imaging both the first alignment mark and the second alignment mark collectively within a same field of
view of a same imager via the second substrate from a side opposite to the alignment mark formed surface of the second substrate;

a position detecting step of detecting positions of both the first alignment mark and the second alignment mark based on an
image containing both the first alignment mark and the second alignment mark obtained by imaging; and

an aligning step of adjusting relative positions of the first substrate and the second substrate based on a detection result
in the position detecting step, wherein:

the first alignment mark includes more low spatial frequency components than the second alignment mark;
the imaging step is performed in a state where a distance in an optical axis direction of the imager between the alignment
mark formed surface of the first substrate and that of the second substrate is longer than the depth of field of the imager
and the imager is focused on the alignment mark formed surface of the second substrate; and

in the position detecting step, a filtering process of removing high spatial frequency components from the image is performed
and a center of gravity position of the first alignment mark is detected from the image after filtering.

US Pat. No. 9,293,352

SUBSTRATE PROCESSING METHOD

SCREEN Holdings Co., Ltd....

1. A substrate processing method for processing a silicon substrate, comprising the steps of:
a) removing a silicon oxide film from a main surface of a silicon substrate;
b) applying a silylation material to said main surface to thereby perform a silylation process thereon so that the silylated
main surface is in a state where growth of a natural oxide film is suppressed, and

c) performing a process for forming a silicon germanium film, on said main surface, wherein
said step b) is performed without moving said silicon substrate after said step a),
said step a) comprises the steps of
a1) applying a removal liquid used for removing said silicon oxide film, onto said main surface; and
a2) applying a rinse liquid onto said main surface,
wherein oxygen concentration in at least one of said removal liquid and said rinse liquid which includes dissolved inert gas,
is reduced to 20 ppb or less.

US Pat. No. 9,389,601

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, CONTROL METHOD FOR SUBSTRATE PROCESSING APPARATUS AND STORAGE MEDIUM

SCREEN HOLDINGS CO., LTD....

1. A substrate processing apparatus, comprising:
a plurality of functional sections each of which is selectively set in an operating state where an assigned processing thereof
is executable on a substrate and a standby state where an energy consumption amount is less than in the operating state;

a controller which controls a state of each functional section between the operating state and the standby state and causes
the functional section in charge of the assigned processing corresponding to a recipe to be set in the operating state and
perform the assigned processing in executing the recipe specifying a processing procedure on the substrate; and

a resource consumption amount acquisition section which performs a specifying operation of specifying the functional section
capable of being in charge of the assigned processing corresponding to an execution planned recipe out of the plurality of
functional sections and obtains a resource consumption amount necessary to recover the specified functional section specified
by the specifying operation to the operating state if the execution planned recipe, which is the recipe planned to be executed
later, is given.

US Pat. No. 9,449,861

SUBSTRATE PROCESSING APPARATUS

SCREEN Holdings Co., Ltd....

1. A substrate processing apparatus that processes a substrate, comprising:
multiple processing parts that process a substrate;
a transport device with a movable table and a hand that makes rectilinear motion along one rectilinear axis or each of more
rectilinear axes and rotative motion about a vertical axis to transport a substrate to each of said processing parts;

a transport chamber defined as operating space for said transport device; and
a transport controller that controls operation of said transport device, wherein
a first partial area defined in said transport chamber has a width smaller than a rotative diameter of said transport device,
said width extending along a horizontal axis perpendicular to said one rectilinear axis or said more rectilinear axes, and

said transport controller prohibits said rotative motion of said transport device in said first partial area;
wherein each of said processing parts includes:
a housing; and
an opening for entry of the hand of said transport device into said housing, said opening being formed in said housing,
multiple second partial areas are defined in said transport chamber, said second partial areas being spaced at an interval
along said one rectilinear axis or any of said more rectilinear axes, said second partial areas being connected via said first
partial area,

said processing parts are arranged such that said openings of said processing parts surround said second partial areas, and
said transport controller permits said rotative motion of said transport device in said second partial areas,
wherein said movable table travels between said second partial areas.

US Pat. No. 9,460,944

SUBSTRATE TREATING APPARATUS AND METHOD OF TREATING SUBSTRATE

SCREEN Holdings Co., Ltd....

1. A substrate treating apparatus, comprising:
a rotating and holding unit that rotates a substrate while horizontally holding the substrate;
a first supply source that supplies first pure water having a first temperature;
a second supply source that supplies second pure water having a second temperature higher than the first temperature;
a pipe system that guides said first pure water by dividing said first pure water into one first pure water and the other
first pure water;

a treatment solution supply unit that is supplied with said one first pure water from said pipe system and supplies a treatment
solution to a central section of an upper surface of said substrate, said treatment solution containing said one first pure
water and a chemical solution mixed so as to mainly contain said one first pure water;

a first supply unit that is supplied with said other first pure water from said pipe system and supplies a first liquid mainly
containing said other first pure water to a central section of a lower surface of said substrate;

a second supply unit that supplies a second liquid mainly containing said second pure water supplied from said second supply
source to a peripheral section of the lower surface of said substrate and to an intermediate section of the lower surface
between said peripheral section and said central section; and

a heat amount control unit that independently controls an amount of heat to be supplied to said substrate by said first supply
unit and an amount of heat to be supplied to said substrate by said second supply unit such that a temperature distribution
in a radial direction of said substrate is changeable.

US Pat. No. 9,099,504

SUBSTRATE TREATMENT APPARATUS, AND SUBSTRATE TREATMENT METHOD

SCREEN Holdings Co., Ltd....

1. A substrate treatment apparatus comprising:
a substrate holding mechanism which holds a substrate;
a nozzle body having a spout which spouts an etching liquid toward a major surface of the substrate held by the substrate
holding mechanism;

a nozzle body movement mechanism which moves the nozzle body in a predetermined movement direction so as to move an etching
liquid application position at which the etching liquid spouted by the nozzle body reaches the major surface;

a first single unitary flexible sheet made of a flexible material and attached to the nozzle body, said first flexible sheet
being disposed to be brought into contact with a portion of the major surface of the substrate located on one of opposite
sides of said nozzle body with respect to the movement direction, the first flexible sheet being extended from the nozzle
body so as to be bowed convexly forward with respect to the movement direction with a distal edge thereof being in contact
with the major surface; and

a second single unitary flexible sheet made of said flexible material and attached to the nozzle body, said second flexible
sheet being disposed to be brought into contact with a portion of the major surface of the substrate located on the other
of said opposite sides of said nozzle body with respect to the movement direction, the second flexible sheet being extended
from the nozzle body so as to be bowed convexly forward with respect to the movement direction with a distal edge thereof
being in contact with the major surface.

US Pat. No. 9,463,651

INKJET PRINTER, METHOD OF CONTROLLING INKJET PRINTER AND COMPUTER PROGRAM

Screen Holdings Co., Ltd....

1. An inkjet printer comprising:
a head for recording an image on a recording medium, based on print data;
a transport mechanism for moving said recording medium in a transport direction relative to said head;
a controller for controlling said head and said transport mechanism; and
a computer comprising a computation part for determining the upper limit of a transport speed of said recording medium moved
by said transport mechanism, based on said print data, said head including a plurality of blocks arranged in a width direction
perpendicular to said transport direction, a plurality of nozzles arranged in said blocks, and a pressurizing mechanism for
causing said nozzles to eject droplets, said computation part performing the steps of

a) calculating a load factor indicative of a load on said pressurizing mechanism for each of said blocks, based on said print
data, and

b) factoring in said load factor for each of said blocks to determine the upper limit of said transport speed so that the
upper limit becomes slower as said load factor increases and becomes slower as a printing distance in said transport direction
corresponding to said print data increases, said controller controlling said transport mechanism at a transport speed not
greater than said upper limit, wherein

said step b) includes:
b11) calculating the maximum value of the sum total of said load factors of n blocks selected from among m blocks while changing
the value of n in the range of 1?n?m to provide m maximum values, where m and n are integers not less than 1;

b12) determining transport speeds corresponding respectively to the m maximum values; and
b13) determining said upper limit, based on the minimum value of said m transport speeds wherein said transport mechanism
moves said recording medium relative to said head at a transport speed not greater than said upper limit.

US Pat. No. 9,401,283

SUBSTRATE TREATMENT METHOD

SCREEN Holdings Co., Ltd....

1. A substrate treatment method comprising the steps of:
supporting a substrate with a support member;
arranging an extension surface such that the extension surface laterally surrounds one major surface of the substrate supported
by the support member and extends continuously to the major surface of the substrate supported by the support member, the
extension surface being provided with higher affinity for the etching liquid than the major surface of the substrate supported
by the support member;

rotating the substrate supported by the support member; and
etching the substrate by supplying an etching liquid onto the major surface of the substrate supported by the support member.

US Pat. No. 9,390,947

THERMAL PROCESSING METHOD AND THERMAL PROCESSING APPARATUS FOR HEATING SUBSTRATE, AND SUSCEPTOR

SCREEN Holdings Co., Ltd....

1. A thermal processing method that heats a substrate of a circular plate shape by irradiating the substrate with a flash,
comprising the steps of:
(a) placing a substrate on a susceptor on which a plurality of support pins are provided in upright position and supporting
a lower surface of said substrate with the support pins; and

(b) heating said substrate by irradiating an upper surface of said substrate on said susceptor with a flash from a flash lamp,
wherein said substrate is a monocrystalline silicon semiconductor wafer with (100) plane orientation, and
said substrate is placed on said susceptor in said step (a) such that said support pins support two radii of said substrate
at an angle of 45 degrees with respect to a cleavage direction of said substrate, said cleavage direction being a direction
of a line where a cleavage surface of a monocrystalline silicon ingot from which said substrate is cut out and said substrate
cross each other.

US Pat. No. 9,196,031

APPEARANCE INSPECTION APPARATUS AND METHOD

SCREEN Holdings Co., Ltd....

1. An appearance inspection apparatus for detecting a defect of a pattern on the basis of an image of a surface of a substrate
on which said pattern is formed, which is captured by an imaging part, comprising:
an image transfer part for transferring an image data, which is obtained by imaging a region to be inspected on said substrate
and which is stored in an image storing memory by said imaging part, wherein said image data includes data corresponding to
a plurality of divided regions which are obtained by dividing said regions, said image data being transferred in its totality
to each of a plurality of image processing memories;

a plurality of image processing parts for performing inspection processes for defect detection on a respective part of said
plurality of divided regions corresponding to respective regions to be processed thereby, out of said plurality of divided
regions included in transferred image data which are transferred to said image processing memories by said image transfer
part; and

a plurality of image processing control parts for acquiring inspection tasks each prescribing inspection details, and associating
said image processing part and said part of said plurality of divided regions to be inspected and controlling said plurality
of image processing parts in accordance with said inspection tasks, respectively, independently of image transfer by said
image transfer part;

wherein said image processing control parts examine a same contents data comprising said image data to determine whether or
not said part of said plurality of divided regions to be inspected by said image processing parts are included in said transferred
image data which are transferred to said image processing memories, and

when no image data to be inspected is included, said image processing control parts cause the image processing parts to wait
until said image data including said plurality of divided regions to be inspected by said image processing arts are transferred
to said image processing memories.

US Pat. No. 10,002,770

SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD FOR CARRYING OUT CHEMICAL TREATMENT FOR SUBSTRATE

SCREEN Holdings Co., Ltd....

1. A substrate processing device for carrying out a chemical treatment for a substrate by using a processing liquid having a chemical activity varied depending on a temperature, the device comprising:a substrate holding portion for holding a substrate in a substantially horizontal posture;
a rotating portion for rotating said substrate held in said substrate holding portion in a substantially horizontal plane;
a steam supply source;
at least one steam injection nozzle connected to said steam supply source for injecting heating steam to a peripheral edge part of the surface of said substrate so as to partially apply said heating steam to said peripheral edge part thereby spatially exposing said peripheral edge part to a part of said heating steam to heat said peripheral edge part; and
a peripheral edge processing portion positioned above said peripheral edge part heated by said heating steam for supplying a processing liquid for a chemical treatment from above to said peripheral edge part of the surface of said substrate heated by said heating steam, while said at least one steam injection nozzle is injecting said heating steam, thereby carrying out a chemical treatment for said peripheral edge part;
wherein said at least one steam injection nozzle injects said heating steam from above toward a target region in a rotating track of said peripheral edge part of said substrate.

US Pat. No. 9,463,619

INKJET PRINTER AND IMAGE RECORDING METHOD

SCREEN HOLDINGS CO., LTD....

1. An inkjet printer, comprising:
a head part for ejecting droplets of ink from a plurality of outlets toward an object and including piezoelectric elements
provided for respective outlets of the plurality of outlets;

a scanning mechanism for moving said object in a predetermined scanning direction relative to said head part; and
a controller for repeatedly inputting an output value and a driving signal to said head part to form a solid area having an
edge on said object, said output value and said driving signal being input in parallel with relative movement of said object
to said head part, said output value indicating whether to form a dot or not, and said driving signal being applied for ejection
of droplet; wherein

the driving signal includes a plurality of ejection pulses each operative to make a respective one of the piezoelectric elements
perform a series of operations,

a leading droplet and a following droplet are ejected from an outlet by inputting said output value indicating to form a dot
and said driving signal, wherein said leading droplet is a main droplet ejected by an ejection pulse included in said driving
signal and said following droplet is a main droplet ejected by the next ejection pulse in said driving signal, and said leading
droplet and said following droplet land onto said object,

an average distance from the center of a leading dot element formed on said object by said leading droplet to the farthest
point in a group of dot elements formed on said object by said leading droplet and said following droplet to form the solid
area is equal to or more than 1.1 times an average radius of said leading dot element and equal to or less than 3.0 times
said average radius, said leading dot element and a dot element formed by said following droplet partially overlap with each
other, and said leading dot element and said dot element formed by said following droplet are included in a dot corresponding
to a pixel,

another type of driving signal having a waveform different from said driving signal can be selectively inputted to said head
part, said another type of driving signal including a plurality of ejection pulses, and

in the case where said another type of driving signal is inputted to said head part:
said leading droplet and said following droplet are ejected from said outlet so that an average distance from the center of
said leading dot element by said leading droplet to the farthest point in said group of dot elements by said leading droplet
and said following droplet is less than 1.1 times an average radius of said leading dot element, or

said average distance in the case of said another type of driving signal is different from said average distance in the case
of said driving signal, while staying within a range which is equal to or more than 1.1 times an average radius of said leading
dot element and equal to or less than 3.0 times said average radius.

US Pat. No. 9,378,988

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USING PROCESSING SOLUTION

SCREEN Holdings Co., Ltd....

1. A substrate processing method that supplies a processing solution to a substrate, comprising the steps of
(a) causing a plurality of nozzle arms to pivot such that a discharge head arranged at the tip end thereof moves between a
processing position and a standby position, the discharge head discharging a processing solution to a substrate held on a
substrate holding element in a substantially horizontal position while being caused to rotate by the substrate holding element,
the processing position being above a substrate held on said substrate holding element, the standby position being outside
a cup surrounding said substrate holding element, said plurality of nozzle arms being arranged in parallel to each other in
a horizontal direction, and

(b) cleaning at least part of said plurality of nozzle arms that are to face a substrate held on said substrate holding element
when said discharge head has moved to said processing position, wherein

in said step (b), while a cleaning solution is ejected obliquely downward from a shower nozzle when said discharge head is
at said standby position, said plurality of nozzle arms are caused to move up and down such that said plurality of nozzle
arms cut across a jet of the cleaning solution discharged from said shower nozzle, and thereby, the cleaning solution is sprayed
on all of said plurality of nozzle arms in order.

US Pat. No. 9,349,625

SUBSTRATE CONVEYANCE METHOD AND SUBSTRATE PROCESSING APPARATUS

SCREEN Holdings Co., Ltd....

1. A substrate conveyance method, for a system including a segment capable of simultaneously holding M substrates, where M
is an integer equal or greater than, and a substrate conveyance part capable of simultaneously conveying from the segment
or toward the segment, N of said substrates, where N is an integer equal or greater than 2 and N is not a divisor of said
integer M, wherein the substrate conveyance method comprises:
repeatedly performing the step of:
simultaneously conveying, when N pieces of variables ik defined by integers k of 1 to N are arbitrary integers of 0 or more
and not more than (M/N) and satisfy a following formula 1,


(N?k?1) of said substrates ik times, where the number of times of said conveying steps is defined by each variable which is
a natural number out of said N of said variables ik.

US Pat. No. 9,142,837

LITHIUM ION SECONDARY BATTERY AND PREPARATION PROCESS OF SAME

SCREEN Holdings Co., Ltd....

1. A lithium ion secondary battery, comprising
a first electrode comprising a first current collector and a first active material layer formed by a plural of convex first
active material parts which is provided on the first current collector,

a second electrode comprising a second current collector and a second active material layer formed by a plural of convex second
active material parts which is provided on the second current collector, and

a separator provided between the first electrode and the second electrode,wherein the first electrode and the second electrode are integrated so that the convex first active material part is faced
between the adjacent convex second active material parts,
a size of the convex first active material part is larger than a space between the convex second active material parts, and
the convex first active material part does not enter between the convex second active material parts, and

an electrolytic layer formed by charging a space between the first electrode and the second electrode with an electrolytic
solution or gel;

wherein widths Wa1 and Wa2 between the two adjacent sides of the top surface of the convex first active material part, and distances Wb1 and Wb2 between the top surfaces (spaces) of the convex second active material parts corresponding to the above two adjacent sides
satisfies

Wa1>Wb1,  the relational inequality (1): and

Wa2>Wb2.  the relational inequality (2):

US Pat. No. 9,409,405

METHOD OF CONTROLLING LIQUID EJECTING APPARATUS AND LIQUID EJECTING APPARATUS

SCREEN HOLDINGS CO., LTD....

1. A method of controlling a liquid ejecting apparatus for a recovery operation of a head unit, said liquid ejecting apparatus
including said head unit having a plurality of heads each including a plurality of nozzles for ejecting a liquid, a liquid
reservoir for temporarily storing the liquid for supply to said head unit, a plurality of supply passages for supplying the
liquid from said liquid reservoir therethrough to said respective heads, and a plurality of open/close parts provided in said
respective supply passages, said open/close parts being switchable between an open position independently ensuring the communication
between said liquid reservoir and said heads and a closed position independently closing off the communication between said
liquid reservoir and said heads, said method comprising the steps of:
a) pressurizing the liquid inside said liquid reservoir to a state of positive pressure higher than atmospheric pressure,
while maintaining all of said open/close parts in said closed position, to thereby performing pre-pressurization;

b) bringing a first one of said open/close parts into said open position and bringing all other ones of said open/close parts
into said closed position to perform a first purge, said step b) being performed after said step a);

d) bringing a second one of the open/close parts except said first open/close part brought into said open position in said
step b) into said open position and bringing all other ones of said open/close parts into said closed position to perform
a second purge, said step d) being performed after said step b); and

c) making said liquid reservoir open to the atmosphere, said step c) being performed after said step b) and step d),
said step b) being the step of bringing said first open/close part into said open position, and then bringing said first open/close
part into said closed position after a predetermined time period has elapsed since said first open/close part was brought
into said open position,

said step c) being the step of maintaining said open position of said first and second open/close parts brought into said
open position in said steps b) and d) when already in said open position, and bringing said first and second open/close parts
into said open position when in said closed position, to make said liquid reservoir open to the atmosphere.

US Pat. No. 9,291,551

IMAGING APPARATUS AND IMAGING METHOD

SCREEN Holdings Co., Ltd....

1. An imaging apparatus for imaging a two-dimensional image of an imaging object, comprising:
a holder which holds a sample container carrying a biological sample as the imaging object on a carrying surface;
an illuminator which emits light from a light emitting part facing the carrying surface of the sample container held by the
holder toward the carrying surface;

an imager which includes a strip-like light receiving part provided at a side of the carrying surface opposite to the light
emitting part and along a first direction parallel to the carrying surface, receives the light incident on the light receiving
part and images an image of a strip-like region along the first direction out of the carrying surface;

a strip-like light shield which extends in a direction parallel to the first direction between the light emitting part and
the carrying surface and shields a part of light emitted from the light emitting part toward the strip-like region; and

a mover which integrally and relatively moves the light emitting part, the light receiving part and the light shield in a
second direction parallel to the carrying surface and intersecting with the first direction with respect to the sample container
held by the holder.

US Pat. No. 9,082,728

HEAT TREATMENT METHOD AND HEAT TREATMENT APPARATUS FOR HEATING SUBSTRATE BY EMITTING FLASHING LIGHT

SCREEN Holdings Co., Ltd....

1. A heat treatment method for heating a substrate by emitting light to the substrate, said heat treatment method comprising:
(a) performing a first flash heating step, to effect said heat treatment, including emitting from a flash lamp a flashing
light to the substrate that has been heated to a first preheating temperature equal to or lower than 650 degrees C. by a light
emission from a halogen lamp, so that the flashing light causes the temperature of a surface of the substrate to reach 1000
degrees C. or higher; and

(b) performing a second flash heating step, further effective to obtain said heat treatment of said substrate, performed after
said first flash heating step, including emitting from the flash lamp a second flashing light to the substrate after said
substrate has been heated to a second preheating temperature higher than said first preheating temperature by a light emission
from said halogen lamp, further comprising, after said second flash heating step, a step of emitting a light from said halogen
lamp to thereby heat the substrate to a temperature equal to or higher than 1000 degrees C. that exceeds said second preheating
temperature.

US Pat. No. 9,649,660

SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS

SCREEN HOLDINGS CO., LTD....

1. A substrate treatment method comprising:
a water rinsing step of supplying a rinse liquid, which is a deionized water, to a front surface of a substrate held by a
substrate holding unit while rotating the substrate at a first rotation speed such that the rinse liquid spreads over the
entire front surface of the substrate;

a liquid mixture film forming step of forming a liquid film of a liquid mixture of water and an isopropyl alcohol having a
smaller surface tension than the water on the entire front surface of the substrate held by the substrate holding unit after
the water rinsing step by supplying the water and the isopropyl alcohol to the entire front surface of the substrate while
reducing the rotation speed of the substrate from the first rotation speed to a second rotation speed that is lower than the
first rotation speed, wherein a mixing ratio of the isopropyl alcohol to the water ranges, by weight, from 5% to 10%; and

an isopropyl alcohol replacing step of replacing the liquid mixture supplied to the front surface of the substrate held by
the substrate holding unit in the liquid mixture film forming step with the isopropyl alcohol after the liquid mixture film
forming step by supplying the isopropyl alcohol to the front surface of the substrate.

US Pat. No. 9,640,382

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SCREEN HOLDINGS CO., LTD....

1. A substrate processing method of processing a substrate, comprising the steps of:
a) holding a substrate with a main surface thereof directed upward in an internal space of a chamber and forming a pattern
on said main surface of said substrate;

b) bringing said internal space of said chamber into a reduced pressure atmosphere and supplying a processing liquid onto
a center portion of said main surface of said substrate while rotating said substrate in said reduced pressure atmosphere,
to thereby coat said main surface of said substrate with said processing liquid; and

c) increasing pressure in said internal space of said chamber and continuously supplying said processing liquid onto said
main surface of said substrate coated with said processing liquid while rotating said substrate, to thereby perform a predetermined
processing after said step b),

wherein the number of revolutions of said substrate in said step c) is smaller than that of said substrate in said step b).

US Pat. No. 9,409,416

RECORDING MEDIUM HEATING APPARATUS AND SYSTEM INCLUDING THE RECORDING MEDIUM HEATING APPARATUS

RICOH COMPANY, LTD., Tok...

1. A recording medium heating apparatus, comprising:
a plurality of heat roller sets disposed in a feeding path of a recording medium, wherein each of the heat roller sets includes
a first heat roller having a heating unit and a second heat roller having a heating unit; and

a control circuit configured to control temperatures of the heating units so that an average temperature of a first heat roller
set is lower than an average temperature of a second heat roller set, and the first heat roller and the second heat roller
of each of the first and second heat roller sets have different temperatures, wherein the first and the second heat roller
sets are included in the plurality of heat roller sets, and the first heat roller set is disposed on an upstream side of the
second heat roller set in the feeding path.

US Pat. No. 9,108,401

IMAGE RECORDING APPARATUS WITH RECORDING DENSITY AND EJECTION TIMING CORRECTION

SCREEN HOLDINGS CO., LTD....

1. An image recording apparatus for recording an image onto a recording medium, comprising:
a plurality of heads arranged in a width direction of a recording medium or arranged in a direction crossing a direction perpendicular
to said width direction, for ejecting droplets of ink;

a moving mechanism for moving said recording medium relatively with respect to said plurality of heads in said direction perpendicular
to said width direction; and

a control part for controlling said plurality of heads and said moving mechanism to record an image onto said recording medium
by one relative movement of said recording medium with respect to said plurality of heads,

wherein each of said plurality of heads is individually changeable to a new head, and
said control part comprises:
a storage part for storing a plurality of pieces of conversion information corresponding to a plurality of types of recording
media and said plurality of heads, respectively, each piece of conversion information corresponding to one type of recording
media and one head, each piece of conversion information indicating a relation between input pixel values indicated by input
image data and values used for generation of signals to be inputted to a corresponding head;

a conversion part for converting pixel values of input image data by using pieces of conversion information associated with
said plurality of heads and one type of recording medium out of said plurality of types of recording media;

a reference image recording control part for recording a plurality of reference images corresponding to a plurality of input
pixel values, respectively, onto a representative recording medium by at least one changed head out of said plurality of heads;

a changed head information receiving part for receiving changed head information indicating said changed head among said plurality
of heads; and

a conversion information updating part to which correction amounts on pieces of conversion information corresponding to said
changed head are inputted, said correction amounts being determined in accordance with said plurality of reference images
which are recorded, said conversion information updating part updating said pieces of conversion information on said representative
recording medium and another type of recording medium on the basis of said changed head information and said correction amounts.

US Pat. No. 9,508,568

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD FOR PERFORMING CLEANING TREATMENT ON SUBSTRATE

SCREEN Holdings Co., Ltd....

1. A method of processing a plurality of substrates belonging to the same lot in succession by using a processing apparatus
body and a controller for controlling said processing apparatus body, said processing apparatus body including a substrate
holding part for holding a substrate, a rotary drive part for rotating said substrate holding part, a liquid chemical supply
part for supplying a liquid chemical to said substrate held by said substrate holding part, a rinsing liquid supply part for
supplying a rinsing liquid to said substrate held by said substrate holding part, and a cup surrounding said substrate holding
part, said method comprising the steps of:
(a) previously setting a plurality of substrate processing modes in said controller;
(b) selecting one of said substrate processing modes set in said controller for each of said plurality of substrates to cause
the selected substrate processing mode to be executed; and

(c) detecting an occurrence of trouble in said processing execution step, said substrate processing modes including:
(A) a normal mode applying to a first substrate which is a substrate belonging to said lot to be executed in the case where
the occurrence of said trouble is not detected in said detecting step,

wherein said normal mode having a first liquid chemical process which supplies the liquid chemical to said first substrate
while rotating said first substrate held by said substrate holding part to perform liquid chemical treatment on said first
substrate, and a first rinsing process which supplies the rinsing liquid to said first substrate while rotating said first
substrate held by said substrate holding part to rinse away the liquid chemical from said first substrate; and

(B) a special mode applying to a second substrate which is a substrate belonging to said lot and to be processed after the
time point of detecting the occurrence of said trouble in the case where the occurrence of said trouble is detected in said
detecting step,

wherein said special mode having a second liquid chemical process which corresponds to said first liquid chemical process
in said normal mode and a second rinsing process which supplies the rinsing liquid to said second substrate while rotating
said second substrate held by said substrate holding part under an operating condition different from that in said first rinsing
process to clean said cup with the rinsing liquid flown off from the rotating second substrate while rinsing away said liquid
chemical from said second substrate, executing at least one of the processes of a positional adjustment sub-process which
adjusts a portion where the rinsing liquid flowing off from said second substrate makes contact with said cup by vertically
moving said cup, a speed adjustment sub-process which adjusts a rotation speed of said second substrate variable, and a supply
quantity adjustment sub-process which adjusts a supply quantity of said rinsing liquid to said second substrate.

US Pat. No. 9,601,357

SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD

SCREEN Holdings Co., Ltd....

1. A substrate processing apparatus comprising:
a substrate holding unit that holds a substrate in a horizontal posture;
a plate that has a size equal to or larger than a principal face of the substrate held by the substrate holding unit, and
has a horizontal and flat liquid holding face opposing the principal face of the substrate from below the principal face;

a processing liquid supply unit that supplies a processing liquid to the liquid holding face;
a movement unit that relatively moves the substrate holding unit and the plate to bring or separate the principal face of
the substrate and the liquid holding face close to or from each other; and

a control unit that controls the processing liquid supply unit and the movement unit to execute a processing liquid film forming
step of supplying the processing liquid to the liquid holding face by the processing liquid supply unit to form a processing
liquid film on the liquid holding face, a contact step of bringing the principal face of the substrate and the liquid holding
face close to each other by the movement unit to bring the principal face of the substrate into contact with the processing
liquid film, and a liquid contact maintenance step of maintaining a state where the processing liquid is in contact with the
principal face of the substrate after the contact step.

US Pat. No. 9,505,243

PRINT MEDIUM DEFORMATION DETECTING METHOD

SCREEN HOLDINGS CO., LTD....

1. A printing apparatus having a printing unit with plurality of recording elements arranged in a width direction of a print
medium, the printing apparatus comprising:
a printer printing a correcting chart for correcting recording densities for the recording elements to the print medium;
a correcting-chart density information obtaining device obtaining density information on the correcting chart printed to the
print medium; and

a print-medium deformation determining device, the print-medium deformation determining device setting at least two different
numbers of successive recording elements among the recording elements as moving average widths in accordance with the density
information on the correcting chart, calculating moving average values of the density information of the recording elements
for the moving average widths, calculating a standard deviation using one of the moving average values for a first small moving
average width of the moving average widths as actual measurement data and using another one of the moving averages value for
a second large moving average width of the moving average widths as an average value of the actual measurement data, and determining
that deformation occurs in the print medium when the standard deviation used as a determination value exceeds a threshold.

US Pat. No. 9,431,277

SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS

SCREEN Holdings Co., Ltd....

1. A substrate treatment method for treating a substrate including a first silicon nitride film provided on a front surface
thereof and an upper silicon oxide film provided on the first silicon nitride film, to remove the first silicon nitride film
and the upper silicon oxide film from the substrate, the method comprising:
a substrate holding step of holding a substrate horizontally by a substrate holding unit provided in a chamber;
a substrate rotating step of rotating the substrate held by the substrate holding unit about a predetermined vertically extending
rotation axis;

a concentration adjusting step of mixing phosphoric acid and water at a predetermined mixing ratio to set a first concentration
of a phosphoric acid aqueous solution;

a first phosphoric acid treatment step of causing the substrate holding unit to hold the substrate and discharging the phosphoric
acid aqueous solution having the first concentration from a nozzle to the substrate held by the substrate holding unit in
the chamber to etch the front surface of the substrate with the first concentration phosphoric acid aqueous solution while
rotating the substrate;

a concentration changing step of changing the mixing ratio of the phosphoric acid and water to change the concentration of
the phosphoric acid aqueous solution discharged from the nozzle to a second concentration which is lower than the first concentration;
and

continuously following the first phosphoric acid treatment step, a second phosphoric acid treatment step of supplying the
phosphoric acid aqueous solution having the second concentration to the substrate held by the substrate holding unit in the
chamber, to etch the front surface of the substrate with the second concentration phosphoric acid aqueous solution while continuing
to rotate the substrate.

US Pat. No. 9,403,373

COLOR CHART CREATING METHOD AND A COLOR CORRECTING METHOD

Screen Holdings Co., Ltd....

1. A color chart creating method for creating a color chart having a plurality of color patches arranged thereon for color
correction of an inkjet printer, the method comprising:
an ink amount acquiring step for obtaining actual measurements of ink amounts with respect to colorimetric values in a device-dependent
color space of each color patch based on the amounts of ink consumption when printing is done beforehand with the inkjet printer,
and determining an upper limit of ink amount per unit area that can be supplied to a printing medium based on differences
in drying performance when inks are superimposed;

an ink amount setting step for setting an upper limit to ink amount per unit area obtained in the ink amount acquiring step
that can be supplied to a printing medium, based on amounts of ink consumption when printing is done beforehand with the inkjet
printer; and

a printing step for printing with the inkjet printer the color chart having the plurality of color patches arranged thereon
and formed of different colors on the printing medium using ink amounts smaller than the upper limit set in the ink amount
setting step.

US Pat. No. 9,385,012

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SCREEN Holdings Co., Ltd....

1. A substrate processing method for processing a substrate comprising:
a scan step of rotating the substrate about a rotational axis passing through a principal face of the substrate and moving
a nozzle while discharging an etching liquid therefrom such that a liquid application position of the discharged etching liquid
on the substrate is moved from an edge portion of the principal face of the substrate to a center portion of the principal
face of the substrate, wherein etching amounts of the substrate are higher at the edge portion than at the center portion
of the substrate; and

a center discharging step of rotating the substrate about the rotational axis while continuing the discharge of the etching
liquid toward the principal face of the substrate, under the state that the liquid application position has reached the center
portion of the principal face of the substrate and the nozzle has stopped moving, such that etching amounts of the substrate
are higher at the center portion than at the edge portion of the substrate; and

a scan velocity determining step of determining a moving velocity for the scan step, for moving the liquid application position
from the edge portion to the center portion, according to a supply condition of the etching liquid under the state that the
liquid application position is fixed at the center portion of the principal face of the substrate,

wherein the supply condition of the etching liquid includes at least one of: etching liquid density, etching liquid temperature,
supply time for etching liquid, and etching liquid type.

US Pat. No. 9,609,231

IMAGING SYSTEM AND IMAGING METHOD

SCREEN Holdings Co. Ltd.,...

1. An imaging system for imaging a sample in a medium carried in a container as an imaging object, comprising:
an imager which obtains an original image by imaging the imaging object;
a data processor which generates multi-gradation image data by performing a gradation correction on the original image,
wherein the data processor associates a luminance value prepared in advance corresponding to the medium with a maximum gradation
value in the gradation correction; and

a reference table associating medium information including a type of the medium and a pouring amount into the container and
the luminance of the medium specified by the medium information,

wherein the luminance of the medium is obtained based on the medium information given by a user and the reference table.

US Pat. No. 9,527,288

LIQUID DISCHARGING APPARATUS

SCREEN Holdings Co., Ltd....

1. A liquid discharging apparatus for discharging a liquid, the liquid discharging apparatus comprising;
droplet dischargers each arranged for discharging droplets onto a substrate;
a cap unit provided with recesses arranged for covering outlets of the droplet dischargers, and movable between a retracting
position away from the outlets of the droplet dischargers and a capping position in which the outlets of the droplet dischargers
are closed;

a cleaner provided with absorbers arranged for contacting edges of the recesses of the cap unit when the cap unit is disposed
in the retracting position; and

a cap unit moving device arranged for synchronizing the movement of the cap unit to the retracting position, and the closing
of the recesses by the absorbers when the cap unit is disposed at the retracting position.

US Pat. No. 9,431,276

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SCREEN Holdings Co., Ltd....

7. A substrate processing method, comprising the steps of:
arranging a blocking member including a plate member spaced away from a substrate surface while facing the substrate surface
to define a clearance space with the substrate surface,

the blocking member including:
a rotary spindle which is hollow and supports the plate member, and an inner shaft inserted in said hollow rotary spindle;
a processing liquid discharge port which is disposed at an end of the inner shaft, and receives and discharges water or a
liquid whose principal component is water as a processing liquid to a central part of the substrate surface through the clearance
space, the substrate being held in a substantially horizontal posture; and

a solvent discharge port which discharges a low surface-tension solvent having a lower surface tension than the processing
liquid to the central part of the substrate surface through the clearance space, the solvent discharge port being disposed
at said end of the inner shaft;

discharging the processing liquid from the processing liquid discharge port to the substrate surface while the substrate is
rotated to perform predetermined wet processing to the substrate surface;

discharging the low surface-tension solvent from the solvent discharge port to the substrate surface wet with the processing
liquid while the substrate is rotated to replace the processing liquid adhering to the substrate surface with the low surface-tension
solvent; and

removing the low surface-tension solvent from the substrate surface after the replacing step to dry the substrate surface,
wherein

the blocking-member arranging step further includes the steps of:
providing a gas discharge port disposed at the end of the inner shaft near the solvent discharge port and the processing liquid
discharge port which receives and discharges an inert gas to the central part of the substrate surface; and

an outer gas discharge port which is an aperture defined between an inner wall surface of the rotary spindle and an outer
wall surface of the inner shaft, and which receives and discharges an inert gas to the surface of the substrate, the outer
gas discharge port being located radially outward of and surrounding the processing liquid discharge port, the solvent discharge
port and the gas discharge port,

wherein the end of the inner shaft, including the processing liquid discharge port, the solvent discharge port and the gas
discharge port is recessed upward from a plane including a lower surface of the plate member of the blocking member, within
the outer gas discharge port, thereby decreasing a flow velocity of the gas discharge port; and

the inert gas is supplied from the gas discharge port and the outer gas discharge port, in the wet processing step and the
replacing step, into said clearance space defined between the blocking member arranged in the blocking-member arranging step
and the substrate surface.

US Pat. No. 9,365,047

INKJET PRINTING APPARATUS AND PRINTING METHOD OF INSPECTING CHART THEREWITH

SCREEN Holdings Co., Ltd....

1. An inkjet printing apparatus for discharging ink droplets and an overcoating agent, the apparatus comprising:
a printing head discharging the ink droplets;
an overcoating head discharging the overcoating agent; and
a controller operating the printing head and the overcoating head to perform printing to a print medium,
the controller operating in an inspecting discharge mode forming an inspecting region at a printing rate in the print medium
relative to a given area higher than the maximum of a printing rate of a normal discharge mode for confirming a discharge
state of the overcoating agent, the maximum of the printing rate of the normal discharge mode in the print medium relative
to a given area being less than 100% for the printing to the print medium, and

in the inspecting discharge mode, the controller operating the printing head to form the inspecting region on the print medium,
and operating the overcoating head to discharge the overcoating agent onto the inspecting region so as to produce shift linearly
in a direction orthogonal to a transportation direction of the print medium and in the transportation direction, whereby an
overcoating inspecting chart is formed.

US Pat. No. 9,358,587

SUBSTRATE TREATING APPARATUS

SCREEN Holdings Co., Ltd....

1. A substrate treating apparatus for simultaneously treating both surfaces of a flexible rectangular substrate by horizontally
transporting the substrate and supplying a treating solution to both the surfaces of the substrate, comprising:
a pair of endless belts for supporting a pair of side edges parallel to a transport direction of the substrate; and
a fixing device for fixing the pair of side edges of the substrate parallel to the transport direction to the pair of endless
belts;

wherein the fixing device comprises a pair of magnets for pinching the endless belts and the side edges parallel to the transport
direction of the substrate; and

wherein said pair of magnets comprises a plurality of pairs of magnets at positions along said side edges parallel to the
transport direction;

wherein the fixing device further comprises a pair of feeders for supplying said pairs of magnets to said positions for pinching
the endless belt members and the side edges of the substrate parallel to the transport direction; and

contact members for contacting and removing the pairs of magnets pinching the endless belt members and the side edges of the
substrate parallel to the transport direction from said positions.

US Pat. No. 9,639,736

APPARATUS FOR AND METHOD OF PROCESSING IMAGE AND STORAGE MEDIUM

SCREEN Holdings Co., Ltd....

1. An image processing apparatus for classifying an object included in an image corresponding to a cell as adopted or as not
adopted, comprising:
a storage part implemented by a programmed computer which stores therein allowable ranges of parameters for use in an adoption/non-adoption
process for classifying an object corresponding to a cell included in an image as adopted or as not adopted;

an object extraction part implemented by a programmed computer which extracts a plurality of objects from said image;
an adoption/non-adoption processing part implemented by a programmed computer which determines that an object having said
parameters within said allowable ranges is adopted and that an object having at least one of said parameters outside a corresponding
one of said allowable ranges is not adopted among said plurality of objects;

a display output part implemented by a programmed computer which displays the object adopted and the object not adopted by
said adoption/non-adoption processing part in a distinguishable manner;

an input designation part implemented by a programmed computer which accepts the designation of an object whose adoption/non-adoption
result is desired to be reversed among the objects displayed by said display output part; and

a parameter changing part implemented by a programmed computer which changes one of said allowable ranges stored in said storage
part so that the adoption/non-adoption result of the object designated by said input designation part is reversed; wherein

said parameter changing part automatically selects a parameter from a plurality of different parameters with an allowable
range to be changed, to change the allowable range of the parameter by reference to the values of said parameters of the object
designated by said input designation part,

when the input designation part designates an object the adoption/non-adoption result of which is desired to be reversed from
“not adopted” to “adopted”, the parameter changing part automatically selects the parameter that is outside the allowable
range from a plurality of different parameters, and changes the allowable range of the selected parameter so that the selected
parameter falls within the allowable range, and stores the changed allowable range in the storage part, and

when the input designation part designates an object the adoption/non-adoption result of which is desired to be reversed from
“adopted” to “not adopted”, the parameter changing part automatically selects the parameter that is closest to the upper limit
or the lower limit of its allowable range from a plurality of different parameters, and changes the upper or lower limit of
the allowable range of the selected parameter so that the parameter value falls outside the allowable range, and stores the
changed allowable range in the storage part.

US Pat. No. 9,623,685

INSPECTING CHART AND PRINTING APPARATUS

SCREEN Holdings Co., Ltd....

1. An inspecting chart for determining a correction value for correcting a skew or serpentine transportation of a print medium,
the inspecting chart comprising:
a reference pattern containing a first line segment group and a second line segment group, the first line segment group is
formed by a plurality of first line segments printed by a reference printing head on the print medium at a first given interval,
the first line segments each having a first line width orthogonal to a transportation direction of the print medium, the second
line segment being formed by second line segments printed by a printing head on a center between two adjacent first line segments
or a center of each of the first line segments, the printing head being spaced away from the reference printing head in the
transportation direction of the print medium, and the second line segments each having a second line width and being parallel
to the first line segments;

a first-side deviation pattern spaced away from the reference pattern in the transportation direction of the print medium,
and including the first line segment group and a second line segment group, the second line segment group being formed by
the second line segments printed by a given deviation from the center between two adjacent first line segments or the center
of the first line segment toward the transportation direction of the print medium; and

a second-side deviation pattern spaced away from the reference pattern in the transportation direction of the print medium
opposite to the first-side deviation pattern across the reference pattern, and including the first line segment group and
a second line segment group, the second line segment group being formed by the second line segments printed by a given deviation
from the center between the two adjacent first line segments or the center of the first line segment toward a second side
of the transportation direction of the print medium,

the first-side deviation pattern and the second-side deviation pattern being printed with various deviations.

US Pat. No. 9,555,436

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATMENT METHOD FOR DISCHARGING TREATMENT SOLUTION FROM NOZZLE TO SUBSTRATE

SCREEN Holdings Co., Ltd....

1. A substrate treatment method for discharging a treatment solution to a substrate, said method comprising the steps of:
(a) holding a to-be-newly-treated substrate on a substrate holder;
(b) moving, after the to-be-newly-treated substrate is held on said substrate holder, a nozzle that discharges a treatment
solution from a standby position outside a cup surrounding said substrate holder toward a treatment position above the substrate
held on said substrate holder;

(c) imaging, after said nozzle receives an instruction to start discharging the treatment solution, an imaging area including
an area in which a liquid flow is to be formed when said nozzle discharges the treatment solution at said treatment position;

(d) cutting out, from an image acquired in said step (c), a test image and a first reference image, said test image being
an image including the area of the surface of the substrate held on the substrate holder in which said liquid flow is to be
formed, said first reference image being an image of the surface of the substrate except for said area; and

(e) comparing said first reference image and said test image to determine a discharge of the treatment solution from said
nozzle.

US Pat. No. 9,557,110

METHOD AND APPARATUS FOR HEAT-TREATING HIGH DIELECTRIC CONSTANT FILM

SCREEN Holdings Co., Ltd....

1. A heat treatment method for heating a substrate in which a high dielectric constant film is deposited on a base material
with an interface layer film sandwiched in between, the method comprising the steps of:
(a) housing said substrate in a chamber;
(b) supplying ammonia to said chamber to form an ammonia atmosphere, while pressure in said chamber is reduced to less than
atmospheric pressure; and

(c) applying flash light to a surface of said substrate housed in said chamber to heat said high dielectric constant film.

US Pat. No. 9,550,357

IMAGE PROCESSOR OF PRINTING APPARATUS AND IMAGE PROCESSING METHOD THEREOF

SCREEN Holdings Co., Ltd....

1. An image processor of a printing apparatus, processor comprising:
a first printing head having a plurality of recording units individually spaced away at a given interval in a direction orthogonal
to a transportation direction of a print medium and individually spaced away along the transportation direction of the print
medium;

a second printing head disposed downstream of the first printing head and having a plurality of recording units arranged individually
at a given interval in the direction orthogonal to the transportation direction of the print medium;

a print unit formed by at least the two printing heads, i.e., the first printing head and the second printing head, and performing
printing onto the print medium;

a recording position obtaining device obtaining recording positions of a first image printed with the first printing head
and a second image printed with the second printing head;

a positional shift amount calculating device calculating a positional shift amount between the recording positions of the
first image and the second image calculated by the recording position obtaining device, the positional shift amount being
caused by skew of the print medium; and

a positional shift interpolating image converter performing weighting, if a remainder is generated through division of the
positional shift amount by the given interval, to the first image or the second image depending on the remainder to convert
the first image or the second image into a positional shift interpolating image having been shifted in accordance with the
skew of the print medium.

US Pat. No. 9,539,836

IMAGE FORMING APPARATUS, IMAGE FORMING METHOD, AND IMAGE-FORMED MATTER

SCREEN HOLDINGS CO., LTD....

1. An image forming apparatus comprising:
a head unit that ejects a droplet of ink toward a base member; and
a movement mechanism for moving said base member relative to said head unit,
wherein said head unit includes:
a first ink ejection part that ejects a first ink, a droplet of which when deposited on said base member has a dynamic surface
tension that decreases with time; and

a second ink ejection part that ejects a second ink, a droplet of which when deposited on said base member has a dynamic surface
tension that decreases with time, said second ink ejection part being provided downstream of said first ink ejection part
in a conveyance direction in which said base member is conveyed relative to said head unit, said first ink and said second
ink having different colors,

wherein an absolute value of a difference between a dynamic surface tension of a droplet of said second ink when deposited
on said base member and a dynamic surface tension of a droplet of said first ink that has been deposited on a position adjacent
to said droplet of said second ink when said droplet of said second ink is deposited on said base member is smaller than an
absolute value of a difference between the dynamic surface tension of the droplet of said first ink that has been deposited
on the position adjacent to said droplet of said second ink when said droplet of said second ink is deposited on said base
member and the dynamic surface tension of the droplet of said first ink when deposited on said base member,

the droplet of said first ink that has been deposited on the position adjacent to said droplet of said second ink when said
droplet of said second ink is deposited on said base member remains in the form of a liquid, and

said first ink and said second ink have approximately a same static surface tension.

US Pat. No. 9,493,000

LIQUID EJECTING DEVICE, HEAD UNIT, AND LIQUID EJECTING METHOD

Seiko Epson Corporation, ...

1. A liquid ejecting device comprising:
a piezoelectric element that is deformed by applying at least one drive waveform among a plurality of drive waveforms to the
piezoelectric element, the plurality of drive waveforms including a first drive waveform and a second drive waveform that
differs from the first drive waveform;

a cavity that is filled with a liquid and is increased or decreased in internal pressure due to deformation of the piezoelectric
element;

a nozzle that communicates with the cavity and ejects the liquid as a liquid droplet through increase and decrease in the
internal pressure of the cavity; and

a selection section that selects at least one drive waveform from the plurality of drive waveforms, and applies a selected
drive waveform to the piezoelectric element,

the liquid droplet ejected from the nozzle including a first liquid droplet ejected when the first drive waveform has been
selected by the selection section and applied to the piezoelectric element, and a second liquid droplet ejected when the second
drive waveform has been selected by the selection section and applied to the piezoelectric element, an ejection volume of
the first liquid droplet being substantially equal to an ejection volume of the second liquid droplet,

the second liquid droplet being the next droplet ejected from the nozzle subsequently to the first liquid droplet being ejected
from the nozzle, and

the first drive waveform and the second drive waveform differing in slope.

US Pat. No. 9,343,287

SUBSTRATE PROCESSING APPARATUS INCLUDING SPIN CHUCK

SCREEN Holdings Co., Ltd....

1. A substrate processing apparatus comprising:
a spin chuck including a plurality of chuck pins disposed around a substrate, chuck opening/closing mechanisms that press
the plurality of chuck pins onto a peripheral edge portion of the substrate to cause the plurality of chuck pins to grip the
substrate in a horizontal posture, and a spin motor that rotates the substrate gripped by the plurality of chuck pins;

a processing liquid supply device that supplies a processing liquid to the substrate held by the spin chuck; and
a heat source disposed above the substrate which is held by the spin chuck, wherein
the plurality of chuck pins includes a plurality of conductive members and a plurality of pin covers corresponding to the
plurality of conductive members respectively and spaced in a circumferential directions, and

each of the plurality of conductive members includes a gripping portion comprising a different material than the substrate
for being pressable onto the peripheral edge portion of the substrate, and each of the plurality of conductive members is
made of a material containing carbon, and each of the plurality of conductive members protrudes outward from an outer peripheral
edge of the substrate in a plan view in a state where the gripping portion is pressed onto the peripheral edge portion of
the substrate, and

each of the plurality of the pin covers is a separate member from the plurality of conductive members, includes a pin covering
portion that covers at least an upper surface of the gripping portion in a plan view, and covers, in a plan view, an entire
region of a part of the conductive member protruding outward from the outer peripheral edge of the substrate in a plan view
in a state where the gripping portion is pressed onto the peripheral edge portion of the substrate, and

the chuck opening/closing mechanisms move each conductive member together with corresponding pin cover between a closed position
where the gripping portion is pressed onto the peripheral edge portion of the substrate and an open position where the gripping
portion is separated from the peripheral edge portion of the substrate.

US Pat. No. 9,638,603

INSPECTING DEVICE, DRAWING DEVICE AND INSPECTING METHOD

SCREEN Holdings Co., Ltd....

1. An inspecting device for inspecting a spatial light modulator to modulate a light amount while reflecting an incident laser
beam for every plurality of modulating units being arranged in a predetermined direction, the plurality of modulating units
each including at least one light modulating element including a fixed ribbon having a fixed reflecting surface with a constant
height from a base surface and a movable ribbon having a movable reflecting surface with a variable height from said base
surface, the inspecting device comprising:
a modulator driving portion for applying a voltage corresponding to a driving value to each of said plurality of modulating
units to drive said movable ribbon, to control a light amount of a laser beam output by said modulating unit;

a light amount detector for detecting the light amount of said laser beam reflected by each of said plurality of modulating
units;

a storing portion for storing information indicative of a first driving value corresponding to a first light amount for one
of said plurality of modulating units or for every two or more of said modulating units; and

a shift amount acquiring portion for acquiring a second driving value corresponding to an output of said first light amount
again, to acquire a differential value between said first driving value and said second driving value as a shift amount for
one of said plurality of modulating units or for every two or more of said modulating units.

US Pat. No. 9,604,481

MEDIUM TRANSPORT DEVICE AND PRINTING APPARATUS PROVIDED THEREWITH

SCREEN Holdings Co., Ltd....

1. A medium transport device transporting a medium, the medium transport device comprising:
a skew correcting mechanism disposed on a transport path for transporting a long medium, the skew correcting mechanism having
a first position regulation roller upstream in a transportation direction of the medium and a downstream second position regulation
roller being attached thereto in a freely rotatable manner;

the skew correcting mechanism also including a first transport roller transporting the medium and disposed on the transport
path such that the medium is wound at an angle of approximately 90 degrees on the first position regulation roller of the
skew correcting mechanism, and such that a winding angle of the medium on the first transport roller is 90 degrees or more;
and

a second transport roller disposed upstream of the first transport roller and transporting the medium to the first transport
roller with a winding angle of the medium of 90 degrees or more on the second transport roller,

the first transport roller being disposed upstream of the first position regulation roller,
the second transport roller being disposed upstream of and next to the first transport roller at a pitch between rotation
centers of the first and second transport rollers of more than a diameter of the first transport roller to 1.5 times the diameter
of the first transport roller, and

the second transport roller contacting one surface of the medium, and the first transport roller contacting the other surface
of the medium.

US Pat. No. 9,607,844

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SCREEN Holdings Co., Ltd....

1. A substrate processing method of performing processing using processing liquid on a substrate to be processed, the method
comprising:
a substrate holding step of holding the substrate in a horizontal position with a substrate holding and rotating mechanism;
a processing liquid discharge step of introducing processing liquid from a fluid introduction portion of, in a processing
liquid pipe in which a processing liquid nozzle having a discharge port at a tip end is provided at one end, the other end
of the processing liquid pipe into the processing liquid pipe so as to discharge the processing liquid from the discharge
port toward the substrate;

a gas extrusion step of introducing, after stop of the processing liquid discharge step, a gas from the fluid introduction
portion into the processing liquid pipe so as to extrude the processing liquid within the processing liquid pipe and within
the processing liquid nozzle outwardly; and

a gas introduction stop step of stopping, after the start of the introduction of the gas, the introduction of the gas into
the processing liquid pipe in a state where the processing liquid is left within the processing liquid pipe and/or the processing
liquid nozzle.

US Pat. No. 9,607,870

HEAT TREATMENT APPARATUS AND HEAT TREATMENT METHOD FOR HEATING SUBSTRATE BY IRRADIATING SUBSTRATE WITH FLASH OF LIGHT

SCREEN Holdings Co., Ltd....

1. A heat treatment apparatus for heating a substrate by irradiating the substrate with a flash of light, comprising:
a chamber for receiving a substrate therein;
a holder for holding the substrate in said chamber;
a plurality of flash lamps for irradiating the substrate held by said holder with a flash of light;
a plurality of switching elements provided in a one-to-one correspondence with said flash lamps and each defining the waveform
of current flowing through a corresponding one of said flash lamps; and

a light emission controller for individually controlling the operations of said switching elements to individually define
the light emission patterns of said flash lamps;

further comprising a plurality of illuminance sensors for measuring the illuminances of different regions, respectively, of
the arrangement of said flash lamps, wherein

said light emission controller controls the operations of said switching elements, based on results of measurement with said
illuminance sensors.

US Pat. No. 9,595,433

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SCREEN Holdings Co., Ltd....

1. A substrate processing method comprising:
a hydrofluoric acid supplying step of supplying a hydrofluoric acid to a surface of a silicon substrate to apply a hydrophobizing
process using the hydrofluoric acid to the silicon substrate surface;

a rinsing step, executed after the hydrofluoric acid supplying step, of supplying water at room temperature to the silicon
substrate surface to apply a rinsing process using the water to the silicon substrate surface;

a second temperature water supplying step of supplying water at a second temperature lower than room temperature and in a
range of 5° C. to 10° C., wherein the water at the second temperature is supplied to the silicon substrate surface in the
second temperature water supplying step;

a substrate rotating step of rotating the silicon substrate that is executed in parallel to the rinsing step and the second
temperature water supplying step; and

a drying step of rotating the silicon substrate after the second temperature water supplying step to spin off water on the
silicon substrate surface to a periphery of the silicon substrate and thereby to dry the silicon substrate.

US Pat. No. 9,576,831

SUBSTRATE CONTAINER, A LOAD PORT APPARATUS, AND A SUBSTRATE TREATING APPARATUS

SCREEN Holdings Co., Ltd....

1. A substrate container comprising:
a housing capable of accommodating substrates therein, and having an opening in a front plane thereof;
rack members arranged inside the housing for contacting lower surfaces of the substrates and supporting the substrates in
a substantially horizontal position;

housing-side support members arranged inside the housing for supporting ends of the substrates;
a moving mechanism mounted inside the housing for moving the substrates;
a lid detachable from and attachable to the housing to open and close the opening; and
lid-side support members attached to a rear surface of the lid for supporting ends of the substrates;
wherein:
the housing-side support members have binding portions for supporting the ends of the substrates to be immovable upward;
in a state where the lid is attached to the housing, the housing-side support members and the lid-side support members clamp
the ends of the substrates in between, with the lower surfaces of the substrates out of contact with the rack members, and
the housing-side support members support the ends of the substrates in the binding portions; and

when the lid detaches from the housing, the moving mechanism moves the substrates supported in the binding portions to disengage
the ends of the substrates from the binding portions, and places the substrates in the substantially horizontal position on
the rack members.

US Pat. No. 9,502,273

HEAT TREATMENT APPARATUS AND HEAT TREATMENT METHOD FOR MEASURING PARTICLE CONCENTRATION

SCREEN Holdings Co., Ltd....

1. A heat treatment apparatus for heating a substrate, comprising:
a process chamber for receiving a substrate therein; and
a measurement part for introducing a gas in a processing space provided in said process chamber and measuring an air particle
concentration in the gas;

a first exhaust part for exhausting said measurement part; and
a second exhaust part for exhausting said process chamber via a path different from said measurement part and said first exhaust
part;

wherein, the inside diameter of said first exhaust part is smaller than the inside diameter of said second exhaust part.

US Pat. No. 9,493,012

APPARATUS FOR AND METHOD OF EJECTING DROPLETS

SCREEN HOLDINGS CO., LTD....

1. A droplet ejecting apparatus comprising:
a liquid filling chamber filled with a liquid;
pressure chambers in communication with said liquid filling chamber and filled with said liquid; and
a recovery controller for controlling ejection of said liquid from said pressure chambers during a recovery operation for
diffusing accumulation of precipitable ingredients in said pressure chambers,

each of said pressure chambers including:
a communication port in communication with said liquid filling chamber;
a pressure generating element for exerting pressure on the liquid which fills an interior of each of said pressure chambers;
and

a nozzle for ejecting the liquid in each of said pressure chambers therefrom in a form of droplets,
said liquid filling chamber including a plurality of partial regions within a certain range in a designated direction, the
plurality of partial regions including a first partial region within a first range in the designated direction and a second
partial region within a second range in said designated direction, each of the plurality of partial regions respectively corresponding
to plural ones of said pressure chambers,

said first partial region is located within a first half range while said liquid filling chamber is divided into half in said
designated direction,

said second partial region is located within a second half range while said liquid filling chamber is divided into half in
said designated direction,

said recovery controller bringing said pressure generating element corresponding to said communication port included in said
first partial region of said liquid filling chamber into operation to cause said nozzle corresponding to said first partial
region to eject said droplets, and

said recovery controller causes said nozzle corresponding to said communication port included in said second partial region
of said liquid filling chamber to eject said droplets just after said nozzle corresponding to said communication port included
in said first partial region ejects said droplets.

US Pat. No. 9,633,868

HEAT TREATMENT METHOD AND HEAT TREATMENT APPARATUS

SCREEN Holdings Co., Ltd....

1. A heat treatment method for heating a substrate by irradiating the substrate with light, the heat treatment method comprising:
a preheating step for heating a substrate at a predetermined preheating temperature; and
a flash heating step for irradiating a first surface of said substrate with a flash of light from a flash lamp to heat said
first surface to a target temperature,

wherein a flash irradiation time period in said flash heating step is longer than a heat conduction time period required for
heat conduction from said first surface to a second surface which is a surface opposite from said first surface, and

wherein a difference in temperature between said first and second surfaces in the entire flash heating step is not more than
one-half of an increased temperature from said preheating temperature to said target temperature.

US Pat. No. 9,601,358

SUBSTRATE TREATMENT APPARATUS, AND SUBSTRATE TREATMENT METHOD

SCREEN Holdings Co., Ltd....

1. A substrate treatment apparatus comprising:
a treatment chamber;
a substrate holding and rotating mechanism provided in the treatment chamber and including a spin base rotatable about a predetermined
rotation axis for holding the substrate and rotating the substrate about the rotation axis;

an annular cup provided around the substrate holding and rotating mechanism for retaining a treatment liquid expelled from
the substrate rotated by the substrate holding and rotating mechanism;

a first chemical liquid supplying unit which supplies a first chemical liquid to the substrate held by the substrate holding
and rotating mechanism;

a second chemical liquid supplying unit which supplies a second chemical liquid different from the first chemical liquid to
the substrate held by the substrate holding and rotating mechanism;

a cleaning liquid nozzle having a cleaning liquid outlet port for spouting a cleaning liquid toward a cup inner wall which
is an inner wall of the cup and/or a base wall surface which is a wall surface of an outer periphery of the spin base;

a cleaning liquid supplying unit which supplies the cleaning liquid to the cleaning liquid nozzle;
a rotative treatment control unit which controls the first chemical liquid supplying unit and the second chemical liquid supplying
unit to perform a first chemical liquid supplying step of supplying the first chemical liquid to the substrate rotated by
the substrate holding and rotating mechanism and a second chemical liquid supplying step of supplying the second chemical
liquid different from the first chemical liquid to the substrate rotated by the substrate holding and rotating mechanism after
the first chemical liquid supplying step; and

a cleaning control unit which controls the cleaning liquid supplying unit to spout the cleaning liquid from the cleaning liquid
outlet port to supply the cleaning liquid to the cup inner wall and/or the base wall surface before start of the second chemical
liquid supplying step after end of the first chemical liquid supplying step, and/or during and/or after the second chemical
liquid supplying step.

US Pat. No. 9,576,808

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SCREEN HOLDINGS CO., LTD....

1. A substrate processing apparatus for processing a substrate, comprising:
a substrate holding part for holding a substrate with a main surface thereof directed upward;
a processing liquid supply part for supplying a processing liquid onto a center portion of said main surface of said substrate;
a substrate rotating mechanism for rotating said substrate together with said substrate holding part;
a chamber for containing said substrate holding part in an internal space thereof, said internal space being a sealed space;
a pressure changing part for changing pressure in said internal space of said chamber; and
a control part configured to control said processing liquid supply part, said substrate rotating mechanism, and said pressure
changing part to continuously supply said processing liquid onto said center portion of said main surface of said substrate
while rotating said substrate at a first rotational speed, to thereby coat said main surface of said substrate with said processing
liquid, and after that to bring said internal space of said chamber into a pressurized atmosphere being higher than the atmospheric
pressure, and in a space above said substrate in said pressurized atmosphere to continuously supply said processing liquid
onto said center portion of said main surface of said substrate while rotating said substrate at a second rotational speed
lower than the first rotational speed, to thereby perform a predetermined processing, wherein

said chamber includes:
a chamber bottom,
a cylindrical chamber sidewall fixed to a periphery of said chamber bottom and having an upper opening, and
a chamber cover closing said upper opening of said chamber sidewall to form said internal space of said chamber, and
said pressure changing part includes:
a suction part for sucking gas in said internal space of said chamber, and
a gas supply part for supplying gas into said internal space of said chamber, and
by supplying gas into said internal space from said gas supply part, pressure in said internal space of said chamber increases
to be higher than the atmospheric pressure and said internal space is brought into said pressurized atmosphere.

US Pat. No. 9,555,437

SUBSTRATE PROCESSING APPARATUS

SCREEN Holdings Co., Ltd....

1. A substrate processing apparatus for processing a substrate, comprising:
a chamber including an upper portion and a lower portion which forms therein a sealed internal space by bringing said upper
portion into contact with said lower portion;

a chamber opening and closing mechanism for moving up and down said upper portion of said chamber relative to said lower portion
of said chamber;

a substrate holding part disposed in said chamber, for holding a substrate horizontally;
a substrate rotating mechanism for rotating said substrate together with said substrate holding part about a central axis
oriented in a vertical direction;

a processing liquid supply part for supplying a processing liquid onto an upper surface or a lower surface of said substrate;
a cup part positioned on an outer side in a radial direction relative to an annular opening formed around said substrate by
moving up said upper portion to be apart from said lower portion of said chamber, for receiving said processing liquid spattering
from said substrate being rotated and passing through said annular opening between said upper portion and said lower portion
of said chamber;

a cup discharge path for discharging said processing liquid received by said cup part while said upper portion is apart from
said lower portion and said annular opening is formed;

a chamber discharge path for discharging said processing liquid received by said chamber while said upper portion comes into
contact with said lower portion and said chamber is sealed; and

a control part for controlling said chamber opening and closing mechanism to switch a state of said chamber between a state
that said upper portion is apart from said lower portion of said chamber and a state that said upper portion comes into contact
with said lower portion of said chamber and to thereby switch a discharge path of said processing liquid between said cup
discharge path and said chamber discharge path.

US Pat. No. 9,555,452

SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS

SCREEN Holdings Co., Ltd....

1. A substrate treatment method comprising:
a liquid film retaining step of retaining a liquid film of a treatment liquid on an upper surface of a substrate;
a locating step of locating a heater having a smaller diameter than the upper surface of the substrate in opposed relation
to the upper surface of the substrate;

a first heater heating step of setting an output of the heater at a first non-zero output level to heat the treatment liquid
film on the upper surface of the substrate;

a heater moving step of moving the heater along the upper surface of the substrate in the first heater heating step; and
a second heater heating step of changing the output of the heater to a second non-zero output level which is lower than the
first output level to heat the treatment liquid film on the upper surface of the substrate after the first heater heating
step;

wherein the heater is stationary in the second heater heating step; and
wherein the heater moving step includes a step of moving the heater from an edge position in which the heater is opposed to
a peripheral edge portion of the upper surface of the substrate, to a middle position in which the heater is not opposed to
either the peripheral edge portion or a center portion of the upper surface of the substrate, but is opposed only to a portion
which is intermediate between the center portion of the upper surface of the substrate and the peripheral edge portion of
the upper surface of the substrate.

US Pat. No. 9,543,162

SUBSTRATE PROCESSING METHOD

SCREEN Holdings Co., Ltd....

1. A substrate processing method comprising:
a phosphoric acid processing step that includes a step of supplying a phosphoric acid aqueous solution, which contains silicon,
to a front surface of a substrate and processes the front surface of the substrate while forming a liquid film of the phosphoric
acid aqueous solution having a silicon concentration lower than a saturation concentration of silicon;

a liquid volume reducing step of reducing a volume of the phosphoric acid aqueous solution on the substrate, after the phosphoric
acid processing step;

a rinse step of supplying the front surface of the substrate with a rinse liquid having a temperature lower than that of the
liquid film of the phosphoric acid aqueous solution supplied to the front surface of the substrate in the phosphoric acid
processing step, and replacing the phosphoric acid aqueous solution on the front surface of the substrate with the rinse liquid,
after the liquid volume reducing step;

a first concentration maintaining step of maintaining a concentration of silicon contained in the liquid film of the phosphoric
acid aqueous solution on the substrate at a concentration lower than the saturation concentration, until the liquid volume
reducing step ends; and

a second concentration maintaining step of maintaining a concentration of silicon contained in a liquid on the substrate at
a concentration lower than the saturation concentration, until supplying of the rinse liquid ends in the rinse step.

US Pat. No. 9,539,589

SUBSTRATE PROCESSING APPARATUS, AND NOZZLE

SCREEN Holdings Co., Ltd....

1. A substrate processing apparatus comprising:
a spin chuck that holds and rotates a substrate;
a nozzle for making droplets injected from a plurality of injection ports collide with the substrate covered by a liquid film
of a protective liquid discharged from a discharge port, the nozzle including an injection portion and a discharge portion;

a processing liquid supply pipe that supplies a processing liquid to the injection portion; and
a protective liquid supply pipe that supplies the protective liquid to the discharge portion;
a controller configured and programmed to perform a processing liquid supply control and a protective liquid supply control;
the nozzle including
the injection portion in which the plurality of injection ports are formed so that the droplets injected from the plurality
of injection ports collide respectively with a plurality of collision positions on the substrate;

the discharge portion in which the discharge port is formed so that the protective liquid contacts a liquid contact position
on the substrate that is equal in distance from the respective collision positions;

a supplying portion in which a processing liquid flow passageway supplying the processing liquid to the plurality of injection
ports is formed; and

a vibrator that is configured to sever the processing liquid supplied to the plurality of injection ports by applying vibration
to the processing liquid flowing through the processing liquid flow passageway, thereby causing each of the injection ports
to inject the droplets formed by the severed processing liquid;

the controller being configured and programmed to perform the processing liquid supply control to supply the processing liquid
through the processing liquid supply pipe so as to inject the droplets from the plurality of injection ports, and to perform
the protective liquid supply control to supply the protective liquid through the protective liquid supply pipe so as to discharge
the protective liquid from the discharge port simultaneously with the droplet injection from the injection ports.

US Pat. No. 9,810,532

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHODS

SCREEN Holdings Co., Ltd....

1. A substrate treating apparatus comprising:
a receiver for receiving a carrier placed thereon, the carrier being constructed to contain a plurality of substrates;
a substrate detecting sensor facing a horizontal direction crossing a fore-and-aft direction in which the substrates are moved
into and out of the carrier, to detect presence or absence of each substrate;

a height sensor for detecting heights of the substrate detecting sensor;
an up-and-down mechanism for moving the substrate detecting sensor up and down;
an advance/withdraw mechanism for moving the substrate detecting sensor in the fore-and-aft direction;
a controller for causing the substrate detecting sensor to detect presence or absence of each substrate and causing the height
sensor to detect heights of the substrate detecting sensor for detecting heights of each substrate in at least two different
locations in the fore-and-aft direction by operating the up-and-down mechanism to move the substrate detecting sensor up and
down, and operating the advance/withdraw mechanism to move the substrate detecting sensor in the fore-and-aft direction; and

a substrate condition acquiring unit for acquiring a tilt of each substrate relative to a horizontal plane in the fore-and-aft
direction based on a difference in heights of each substrate detected in the at least two different locations.

US Pat. No. 9,673,068

APPARATUS AND METHOD FOR PROCESSING SUBSTRATE WITH FILM HAVING POROUS STRUCTURE (POROUS FILM) FORMED ON SURFACE LAYER THEREOF

SCREEN Holdings Co., Ltd,...

1. A method for processing a substrate with a porous film having a porous structure formed on a surface layer thereof comprising:
a) mixing a first processing solution containing water with gas to generate droplets of said first processing solution and
injecting the droplets of said first processing solution to said porous film; and

b) after said a) step, mixing a second processing solution which is an organic solvent having higher volatility than said
first processing solution with the gas to generate droplets of said second processing solution, injecting the droplets of
said second processing solution to said porous film, and substituting said first processing solution which has entered into
porous portions exposed from a surface of said porous film by said second processing solution.

US Pat. No. 9,600,874

METHOD FOR EVALUATING CULTURE QUALITY

SCREEN Holdings Co., Ltd....

1. A culture quality evaluation method, comprising: a first step of culturing a pluripotent stem cell under a predetermined
culture condition and thereby creating a sample; a second step of imaging a proliferated cell colony in the sample and accordingly
capturing an original image; a third step of dividing the original image into smaller images of a predetermined size and calculating
standard deviations of pixel values of pixels contained in each one of the smaller images; and a fourth step of judging that
the sample is an acceptable sample when a ratio of a number of the smaller images whose values of the standard deviations
are within a predetermined range to a total number of the smaller images is equal to or smaller than a predetermined threshold
value and judging that the sample is an unacceptable sample when the ratio is beyond the threshold value, wherein prior to
the third step, an image of a pluripotent stem cell, an image of a feeder cell and an image of a differentiated cell differentiated
from the pluripotent stem cell are acquired, a first sub step of calculating first standard deviations which are defined as
the standard deviations of pixel values contained in each one of smaller images which are obtained by dividing the images,
a second sub step of calculating an average value of the first standard deviations calculated on a plurality of smaller images
and calculating a second standard deviation which is defined as a standard deviation of the first standard deviations, and
a third sub step of identifying a central range which is defined as a range of first standard deviations within which the
values of the first standard deviations are equal to or smaller than twice the second standard deviation about the average
value are executed on the images while changing the size of the smaller images over multiple levels, and the size of the smaller
images to use at the third step is determined as such a size with which the central range in the image of the differentiated
cell does not overlap the central range in the image of the pluripotent cell or the central range in the image of the feeder
cell under the condition that the smaller images have the same size wherein the steps are executed by one or more processors.

US Pat. No. 9,570,333

SUBSTRATE TREATING APPARATUS

SCREEN Holdings Co., Ltd....

1. A substrate treating apparatus comprising:
a substrate treating unit for treating substrates;
a pod storage unit disposed adjacent the substrate treating unit for storing pods which are configured for containing the
substrates;

a pod storage and transport unit disposed adjacent the pod storage unit for storing and transporting the pods; and
a first receiver disposed adjacent the pod storage and transport unit for receiving pods loaded from outside the substrate
treating apparatus and containing the substrates to be treated, and for unloading pods to outside the substrate treating apparatus;

wherein the pod storage unit includes a plurality of first racks for holding the pods; and
the pod storage and transport unit includes:
a plurality of second racks for holding the pods;
a second receiver disposed between the substrate treating unit and the second racks for receiving the pods, and for fetching
and depositing the substrates from/into the pods;

a first transport device for transporting the pods between the first receiver and the second racks; and
a second transport device for transporting the pods between the first racks, the second racks and the second receiver,
wherein the second transport device is arranged to transport an empty pod to one of the first racks after the substrates are
taken out of the pod on the second receiver and transported to the substrate treating unit.

US Pat. No. 9,466,513

TREATMENT LIQUID SUPPLY APPARATUS AND SUBSTRATE TREATMENT APPARATUS INCLUDING THE SAME

SCREEN Holdings Co., Ltd....

1. A substrate treatment apparatus comprising:
a treatment section for treatment of a substrate disposed therein, and
a treatment liquid supply apparatus which supplies a treatment liquid to the treatment section for treatment of the substrate
with the treatment liquid, and recovers the supplied treatment liquid for reuse,

the treatment liquid supply apparatus comprising:
a first tank in which the treatment liquid to be supplied to the treatment section is stored;
a second tank in which the treatment liquid recovered from the treatment section is stored;
a treatment liquid supply pipe connected between the first tank and the treatment section;
a first pump disposed in the treatment liquid supply pipe and configured to supply the treatment liquid from the first tank
to the treatment section through the treatment liquid supply pipe,

a treatment liquid transfer pipe connected between the first tank and the second tank,
a second pump disposed in the treatment liquid transfer pipe and configured to transfer the treatment liquid from the second
tank to the first tank through the treatment liquid transfer pipe;

a first temperature regulating unit configured to regulate a temperature of the treatment liquid to be supplied from the first
tank to the treatment section through the treatment liquid supply pipe;

a second temperature regulating unit configured to regulate a temperature of the treatment liquid to be transferred from the
second tank to the first tank through the treatment liquid transfer pipe;

a recovery pipe connected between the treatment section and the second tank so as to recover the treatment liquid that has
been used for a treatment of the substrate in the treatment section; and

a fresh liquid replenishment pipe configured to replenish the second tank with a fresh treatment liquid, without said fresh
treatment liquid going through the first tank, wherein said replenishment pipe receives said fresh treatment liquid from a
central pipe which extends externally of said substrate treatment apparatus for being connected to an external fresh treatment
liquid supply source.

US Pat. No. 9,452,603

PRINTING APPARATUS

SCREEN HOLDINGS CO., LTD....

1. A printing apparatus for performing printing onto a print medium, the printing apparatus comprising:
a transporting device;
a plurality of printing heads;
a photographing unit;
a shift detecting chart forming device; and
a correcting device,
the transporting device transporting a print medium,
the printing heads being spaced away from one another in a transportation direction of the print medium and printing an image
onto the print medium,

the photographing unit photographing the print medium onto which the printing is performed with the printing heads,
the shift detecting chart forming device forming a shift detecting chart having a first line segment group and a second line
segment group, the first line segment group consisting of first line segments printed onto the print medium at given intervals
in an orthogonal direction with respect to the transportation direction with a reference printing head of the printing heads
for a reference printing position in the transportation direction, the second line segment group being formed along the first
line segment group, and consisting of second line segments printed with a subsequent printing head of the printing heads spaced
away from the reference printing head in the transportation direction in such a way that distances to the first line segments
become small sequentially and then distances becomes large sequentially in a direction from one of the first line segments
to another one of the first line segments, or in such a way that distances to the first line segments become large sequentially
and then distances becomes small sequentially in a direction from one of the first line segments to another one of the first
line segments, and

the correcting device correcting a printing timing with the subsequent printing head relative to the reference printing head
in accordance with a density variation of the shift detecting chart photographed with the photographing unit.

US Pat. No. 9,852,931

SUBSTRATE PROCESSING APPARATUS

SCREEN Holdings Co., Ltd....

1. A substrate processing apparatus for processing a substrate by applying processing liquid onto said substrate, comprising:
a holding part for holding a substrate;
a processing liquid applying part for applying pure water, which is one type of processing liquid, onto said substrate; and
a cup part having a main body formed of electrical insulation material or semiconductor material, said cup part having an
annular sidewall disposed radially surrounding a plane defined by a substrate held by said holding part to receive processing
liquid splashed radially from said substrate, said annular sidewall having an internal annular space containing a material
with a resistivity which is smaller than that of said electrical insulation material or said semiconductor material forming
said main body.

US Pat. No. 9,805,932

HEAT TREATMENT METHOD AND HEAT TREATMENT APPARATUS FOR HEATING SUBSTRATE BY IRRADIATING SUBSTRATE WITH LIGHT

SCREEN Holdings Co., Ltd....

1. A method of heating a substrate by irradiating the substrate with light, the method comprising the steps of:
(a) heating a substrate to a predetermined preheating temperature;
(b) irradiating a first surface of said substrate with a flash of light from a flash lamp to keep increasing the temperature
of said first surface of said substrate from said preheating temperature to a maximum target temperature over a time period
longer than the time required for heat conduction from said first surface to a second surface of said substrate which is a
surface opposite from said first surface, wherein an emission output of said flash lamp keeps increasing until a temperature
of said first surface reaches said maximum target temperature in said step (b); and

(c) irradiating said first surface of said substrate with a flash of light from said flash lamp to maintain the temperature
of said first surface of said substrate within a ±25° C. range around said maximum target temperature for not less than 5
milliseconds, said step (c) being performed after said step (b), wherein said maximum target temperature is the highest temperature
reached by said substrate throughout said heating method, except that it may exceed same during said irradiating step (c)
but not more than by 25° C.

US Pat. No. 9,786,522

SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS

SCREEN Holdings Co., Ltd....

1. A substrate treatment method to be performed by a substrate treatment apparatus including a substrate holding unit which
holds a substrate, and a hot plate which heats the substrate from below, the substrate treatment method comprising:
a treatment liquid supplying step of locating the hot plate at a retracted position at which the hot plate is retracted below
the substrate holding unit and, in this state, supplying a treatment liquid to an upper surface of the substrate held by the
substrate holding unit;

a protection liquid film forming step of forming a liquid film of a protection liquid on an upper surface of the hot plate
to cover the upper surface of the hot plate during the treatment liquid supplying step;

a substrate heating step of heating the substrate by the hot plate with the hot plate being located adjacent to a lower surface
of the substrate or in contact with the lower surface of the substrate,

wherein the treatment liquid is a liquid containing at least one of sulfuric acid, acetic acid, nitric acid, hydrochloric
acid, hydrofluoric acid, ammonia water, hydrogen peroxide water, organic acids, organic alkalis, a surfactant and an anti-corrosion
agent, and

wherein the protection liquid is one of pure water, carbonated water, electrolytic ion water, hydrogen water, ozone water,
and a hydrochloric acid aqueous solution.

US Pat. No. 9,728,443

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SCREEN Holdings Co., Ltd....

1. A substrate processing apparatus comprising:
a processing liquid supplying unit arranged to supply processing liquid onto an upper surface of a substrate to form a liquid
film of the processing liquid;

a substrate heating unit arranged to heat the substrate from below the substrate to heat the liquid film on the substrate
and arranged to be in contact with a lower surface of the substrate to support the substrate thereon; and

an attitude changing unit arranged to cause the substrate and the substrate heating unit to undergo an attitude change between
a horizontal attitude in which the upper surface of the substrate is horizontal so that the liquid film of the processing
liquid is held on the substrate, and a tilted attitude in which the upper surface of the substrate is tilted so that the liquid
film of the processing liquid heated by the substrate heating unit is removed from the substrate, while keeping constant a
relative attitude between the substrate and the substrate heating unit, wherein

the attitude changing unit is arranged to cause the substrate heating unit, which is supporting the substrate thereon, to
undergo the attitude change between the horizontal attitude and the tilted attitude, and

the substrate processing apparatus further comprises a sliding preventing member arranged to come into contact with a lower
portion of a peripheral portion of the substrate tilted at the tilted attitude to prevent the substrate from sliding off the
substrate heating unit.

US Pat. No. 9,624,046

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE CONVEYING APPARATUS FOR USE IN THE SAME

SCREEN Holdings Co., Ltd....

1. A substrate conveying apparatus, comprising:
a substrate processing section which defines a horizontal direction;
a batch hand that holds a plurality of substrates assuming a horizontal posture piled together in a batch manner;
a batch-hand advancing-retreating mechanism that horizontally advances and retreats the batch hand;
a one-by-one hand that holds a single substrate assuming a horizontal posture;
a one-by-one-hand advancing-retreating mechanism that horizontally advances and retreats the one-by-one hand, independently
of movement of the batch hand;

a holding base that holds the batch-hand advancing-retreating mechanism and the one-by-one-hand advancing-retreating mechanism;
wherein the batch-hand advancing-retreating mechanism includes a pair of batch-hand linear guides supported on the holding
base and extending in parallel with each other, and a batch-hand advancing-retreating bracket coupled to the pair of batch-hand
linear guides and configured to advance and retreat while holding the batch hand; and

wherein the one-by-one-hand advancing-retreating mechanism includes a single one-by-one-hand linear guide supported on the
holding base between the pair of batch-hand linear guides and extending in parallel with the pair of batch-hand linear guides,
and a one-by-one-hand advancing-retreating bracket coupled to the single one-by-one-hand linear guide and configured to advance
and retreat while holding the one-by-one-hand;

an elevation mechanism that moves the holding base upwardly and downwardly; and
a rotation mechanism that rotates the holding base around a rotation axis line extending in a vertical direction while at
least one of said batch hand and said one-by-one hand is holding a corresponding plurality of substrates or a single substrate,
said substrates or substrate assuming a horizontal posture.

US Pat. No. 9,576,787

SUBSTRATE TREATMENT METHOD

SCREEN Holdings Co., Ltd....

1. A substrate treatment method of treating a peripheral portion of a substrate with a treatment liquid spouted from a first
nozzle having an opposing face to be brought into opposed spaced relation to a lower surface of the substrate, the opposing
face being smaller than the substrate in plan view, the method comprising:
a. a rotating step of rotating the substrate about a vertical axis;
b. a liquid filling step of supplying the treatment liquid to a space defined between the lower surface of the substrate and
the opposing face from a treatment liquid spout provided in the opposing face to keep the space in a liquid filled state,
the liquid filling step being performed simultaneously with the rotating step, wherein the liquid spout is supplied with the
treatment liquid from a treatment liquid supply pipe which is connected to the first nozzle from underneath, and the opposing
face is larger than the treatment liquid supply pipe in plan view;

c. a treatment liquid spreading step of allowing the treatment liquid in the space to be spread outward radially about the
vertical axis over a region of the lower surface of the substrate not opposed to the opposing face, wherein the treatment
liquid starts spreading from the space in the liquid filled state along the region of the lower surface of the substrate not
opposed to the opposing face with the space in the liquid filled state, after said liquid filling step;

d. a step of allowing the treatment liquid to flow around from the lower surface to a peripheral portion of an upper surface
of the substrate; and

e. a step of controlling a width of the peripheral portion of the upper surface of the substrate by controlling the substrate
rotation in conjunction with the supply of treatment liquid to the first nozzle, so as to control an amount of the treatment
liquid flowing around from the lower surface to the upper surface of the substrate to be generally uniform around the peripheral
portion of the substrate.

US Pat. No. 10,043,301

VECTOR DATA PROCESSOR, IMAGE RECORDING SYSTEM, VECTOR DATA PROCESSING METHOD, AND COMPUTER-READABLE MEDIUM

SCREEN HOLDINGS CO., LTD....

1. A vector data processor for processing vector data before the vector data is converted into raster data for image recording, comprising:a thinning part that processes target vector data indicating an outline of a target figure that includes a linear figure having a thickness, to acquire thinned data that is vector data indicating a thinned figure obtained by moving line segments of said target figure to thin said target figure by an amount of thinning, said thinned figure being a closed figure formed by line segments;
a central line acquiring part that processes said target vector data to acquire central line data that is vector data indicating at least part of a central line of said target figure; and
a superimposing part that generates data that includes an instruction to record a combined figure obtained by superimposing said thinned figure and said central line one on the other.

US Pat. No. 9,815,093

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SCREEN Holdings Co., Ltd....

1. A substrate processing method comprising:
a cleaning liquid supplying step of supplying a cleaning liquid to a substrate, the cleaning liquid containing a foaming agent
that foams due to application of foaming energy; and

a foaming energy supplying step of applying the foaming energy to the cleaning liquid in contact with the substrate;
wherein the cleaning liquid supplied to the substrate in the cleaning liquid supplying step contains the foaming agent that
foams due to application of the foaming energy, a solvent that evaporates due to application of the foaming energy, and a
solute that solidifies due to evaporation of the solvent.

US Pat. No. 9,805,938

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SCREEN Holdings Co., Ltd....

1. A substrate processing apparatus comprising:
a rotating holder that rotates a substrate while holding the substrate horizontally;
a first nozzle that is used to mix a processing solution and pressurized gas to generate a jet flow of droplets of said processing
solution, and to eject said jet flow of droplets onto an upper surface of said substrate in an approximately vertical direction;

a second nozzle that is used to discharge a continuous flow of said processing solution onto the upper surface of said substrate;
and

a nozzle moving unit that integrally moves said first nozzle and said second nozzle above said substrate while maintaining
a positional relationship between said first nozzle and said second nozzle, wherein

said nozzle moving unit moves said first nozzle and said second nozzle along respective arcuate paths, and moves said first
nozzle so that a landing position, on said substrate, of said jet flow of droplets passes through a rotation center of said
substrate, the arcuate paths having a common rotation axis and different lengths in a radial direction,

movement paths of the landing position of said jet flow of droplets and the landing position of said continuous flow on a
rotation track of said substrate are different from each other, and

when said first nozzle is located above the peripheral portion of said substrate, a landing position, on said substrate, of
said continuous flow is located closer to the rotation center of said substrate than the landing position of said jet flow
of droplets and is also located downstream of the movement path of the landing position of said jet flow of droplets in a
rotation direction of said substrate.

US Pat. No. 9,744,778

IMAGE RECORDING APPARATUS AND IMAGE RECORDING METHOD

SCREEN HOLDINGS CO., LTD....

1. An image recording apparatus comprising:
a transport mechanism for transporting a recording medium in a transport direction along the longitudinal direction of the
recording medium;

at least one recording head including fixedly disposed nozzles, the at least one recording head ejecting a photo-curable ink
from the nozzles onto a surface of said recording medium;

a single viscosity increasing light irradiator downstream from said at least one recording head in said transport direction,
the viscosity increasing light irradiator irradiating said recording medium with a first type of irradiation light that increases
the viscosity of said ink; and

a fixing light irradiator downstream from said viscosity increasing light irradiator in said transport direction, the fixing
light irradiator irradiating said recording medium with a second type of irradiation light that fixes said ink on said recording
medium,

said first type of irradiation light being smaller in amount of light than said second type of irradiation light,
said transport mechanism including
a first switching part between said viscosity increasing light irradiator and said fixing light irradiator, the first switching
part changing the transport orientation of said recording medium so that the transport orientation becomes the vertical or
approaches the vertical, and

a second switching part downstream from said fixing light irradiator in said transport direction, the second switching part
changing the transport orientation of said recording medium so that the transport orientation approaches the horizontal,

said recording medium being transported in such a manner as to cross a line segment connecting said at least one recording
head and said fixing light irradiator,

said fixing light irradiator emitting said second type of irradiation light toward said recording medium transported in the
orientation changed by said first switching part, wherein

said at least one recording head includes a plurality of recording heads, and
said single viscosity increasing light irradiator is disposed at a location downstream from the most downstream one of said
recording heads in said transport direction.

US Pat. No. 9,728,396

SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING APPARATUS

SCREEN Holdings Co., Ltd....

1. A substrate cleaning method of cleaning a substrate that has one principal surface on which pattern elements are formed
and another principal surface to be cleaned, the method comprising:
a substrate holding process of holding the substrate horizontally with the other principal surface faced vertically downward,
wherein the other principal surface is opposite the one principal surface;

a liquid film forming process of forming a liquid film by supplying a first liquid to the other principal surface;
an ultrasonic wave cleaning process of ultrasonically cleaning the other principal surface by supplying an ultrasonic wave
applying liquid to the one principal surface while the liquid film is on the other principal surface and transmitting ultrasonic
vibration from the one principal surface to the other principal surface and the liquid film of the first liquid formed on
the other principal surface via the substrate, the ultrasonic wave applying liquid being obtained by applying ultrasonic waves
to a second liquid;

wherein the first liquid has a higher cavitation intensity, which is a stress per unit area acting on the substrate by cavitation,
than the second liquid;

further comprising a substrate rotating process of rotating the substrate held by the substrate holding process about a center
of rotation, wherein:

the liquid film is formed by supplying the first liquid to the other principal surface while the substrate is being rotated
by the substrate rotating process during the liquid film forming process;

the ultrasonic wave applying liquid is supplied to the one principal surface while the substrate is being rotated by the substrate
rotating process during the ultrasonic cleaning process;

wherein, during the ultrasonic cleaning process, the ultrasonic wave applying liquid is supplied to the one principal surface
and an ultrasonic wave applying first liquid obtained by applying ultrasonic waves to the first liquid is supplied to the
other principal surface while the substrate is being rotated by the substrate rotating process,

and wherein the ultrasonic wave applying first liquid is applied to the other principal surface by a nozzle that is located
outside the diameter of the substrate and that ejects the ultrasonic wave applying first liquid towards a peripheral edge
of the other principal surface.

US Pat. No. 9,701,123

INKJET PRINTING APPARATUS

SCREEN HOLDINGS CO., LTD....

1. An inkjet printing apparatus that discharges ink droplets to a print medium for printing, the inkjet printing apparatus
comprising:
a printing head that has a plurality of inkjet heads disposed in a direction orthogonal to a transportation direction in which
the printing head is moved relatively to the print medium, and discharges the ink droplets from discharge surfaces of the
inkjet heads to the print medium individually for the printing;

a cap unit movable in the transportation direction between a capping position for closing a discharge surface of the printing
head and a standby position for opening the discharge surface of the printing head;

a wiper unit that has wiper blades in a direction orthogonal to a direction in which the inkjet heads are disposed, and moves
from the standby position, spaced away from the printing head, in the direction in which the inkjet heads are disposed for
wiping off the discharge surfaces of the inkjet heads with the wiper blades; and

a wiper cleaner unit that is coupled to the cap unit and is provided with a wiper-off part that wipes off the wiper blades
in the standby position to the transportation direction by moving to the transportation direction in synchronization with
movement of the cap unit to the capping position in the transportation direction.

US Pat. No. 9,630,200

SUBSTRATE TREATMENT APPARATUS WITH ELONGATING TREATMENT LIQUID SUPPLY PIPE

SCREEN Holdings Co., Ltd....

1. A substrate treatment apparatus comprising:
a substrate holding unit that is configured to hold a substrate horizontally;
a substrate rotating unit that is configured to rotate the substrate held by the substrate holding unit about a vertical axis;
a treatment liquid pipe including an outlet pipe portion having an outlet port to be opposed to a lower surface of the substrate
held by the substrate holding unit so as to spout a treatment liquid to form a liquid film of the treatment liquid on the
lower surface of the substrate, the treatment liquid pipe extending downward along the vertical axis from the outlet port,
and having an inside space through which the treatment liquid to be supplied to the outlet port flows;

an opposing member fixed to an upper end part of the outlet pipe portion and having an opposing surface configured to oppose
to the lower surface of the substrate held by the substrate holding unit;

a pipe elongating mechanism that is configured to elongate the treatment liquid pipe so as to move the outlet pipe portion
upward by a pressure of the treatment liquid to cause the treatment liquid pipe to have a greater pipe length when the treatment
liquid flows through the treatment liquid pipe than when the treatment liquid does not flow through the treatment liquid pipe
such that in response to such pressure, the opposing member moves up to an adjacent position where the opposing surface is
close to the lower surface of the substrate held by the substrate holding unit and contacts the liquid film of the treatment
liquid formed on the lower surface of the substrate so as to maintain the liquid film between the opposing surface and the
lower surface of the substrate; and

a guide cylinder that guides an outer peripheral surface of the outlet pipe portion which is moved up and down by the pipe
elongating mechanism.

US Pat. No. 9,865,054

EVALUATION METHOD OF SPHEROID AND SPHEROID EVALUATION APPARATUS

SCREEN HOLDINGS CO., LTD....

1. An evaluation method of a spheroid for evaluating a collapse degree of the spheroid from an image obtained by imaging the
spheroid, the evaluation method comprising:
specifying a spheroid region taken up by the spheroid out of the image including the spheroid and a surrounding region thereof;
obtaining an average value of an optical density of the spheroid and a magnitude of a variation of the optical density in
the spheroid from an image density of the spheroid region;

obtaining a circularity of the spheroid from a contour of the spheroid region;
obtaining a sharpness of the spheroid from the image densities of the spheroid and the surrounding region thereof; and
obtaining the collapse degree of the spheroid by substituting the average value of the optical density, the magnitude of the
variation of the optical density, the circularity and the sharpness into a predetermined operational expression.

US Pat. No. 9,802,227

METHOD OF CLEANING SUBSTRATE PROCESSING APPARATUS

SCREEN Holdings Co., Ltd....

1. A method of cleaning a substrate processing apparatus that performs substrate processing with a processing solution, the
method comprising the step of:
(a) causing a substrate holding element to rotate at a first number of revolutions, said substrate holding element having
a holding surface facing the lower surface of a substrate to be held on said substrate holding element, and at the same time,
supplying a cleaning solution from a cleaning solution supply nozzle onto said holding surface while placing the upper end
of a cup surrounding said substrate holding element below said substrate holding element, thereby cleaning an outer upper
surface of said cup with said cleaning solution scattered from said holding surface while said holding surface is rotating,

wherein in said step (a), said cleaning solution supply nozzle for supplying said cleaning solution is caused to move over
said holding surface, so that said cleaning solution scattered from said holding surface falls on different positions of said
outer upper surface of said cup.

US Pat. No. 9,804,541

HEATING DEVICE

SCREEN HOLDINGS CO., LTD....

1. A heating device comprising:
a heating member rotatable about a rotary shaft supported by a bearing, the heating member having an opening formed at an
end thereof along a direction of the rotary shaft;

a heating element disposed inside the heating member for heating the heating member;
a tubular heating element support member having a heating element support portion at one end thereof for supporting an end
of the heating element, and a tube opening at the other end, the tubular heating element support member being inserted into
the heating member through the opening; and

a coolant supplier for supplying a coolant from the tube opening for cooling the heating element support portion;
wherein the heating element support member includes coolant blowout holes formed between a portion thereof corresponding to
the bearing supporting the rotary shaft and the heating element support portion for blowing the coolant supplied from the
coolant supplier out into the rotary shaft.

US Pat. No. 9,786,527

SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD FOR CARRYING OUT CHEMICAL TREATMENT FOR SUBSTRATE

SCREEN Holdings Co., Ltd....

1. A substrate processing method for carrying out a chemical treatment for a substrate by using a processing liquid having
a reaction rate increased with a rise in temperature, the method comprising:
a rotating step of holding a substrate in a substantially horizontal posture and rotating said substrate in a substantially
horizontal plane;

a heating step of injecting heating steam into a central part of a lower surface of said substrate to heat said substrate
entirely, in parallel with said rotating step; and

a peripheral edge processing step of supplying a processing liquid to a peripheral edge part of said substrate from above
said peripheral edge part, thereby carrying out a chemical treatment for said peripheral edge part, in parallel with said
heating step.

US Pat. No. 9,741,576

LIGHT IRRADIATION TYPE HEAT TREATMENT METHOD AND HEAT TREATMENT APPARATUS

SCREEN Holdings Co., Ltd....

1. A method of irradiating a substrate with a flash of light to form a silicide or a germanide, comprising the steps of:
(a) transporting a substrate with a metal film deposited thereon into a chamber;
(b) reducing the pressure in said chamber to a first pressure lower than atmospheric pressure;
(c) returning the pressure in said chamber from the first pressure to a second pressure higher than the first pressure; and
(d) irradiating a front surface of said substrate with a flash of light from a flash lamp while maintaining the pressure in
said chamber at the second pressure.

US Pat. No. 9,731,510

INKJET PRINTING APPARATUS

Screen Holdings Co., Ltd....

1. An inkjet printing apparatus with a plurality of inkjet heads having a plurality of inkjet nozzles being arranged in a
row; a plurality of caps for the plurality of inkjet heads respectively; a plurality of lines in communication with the plurality
of caps respectively; and a suction device sucking ink from the plurality of inkjet nozzles via the plurality of caps and
the plurality of lines, the inkjet printing apparatus comprising:
a housing having a plurality of external suction ports, an internal suction port and an ink-draw-off port, the plurality of
external suction ports being connected to the plurality of caps via the plurality of lines;

a switching section disposed in the housing and having an internal communication path in communication with the suction device;
a connection switching device for selectively connecting the switching section to any port of the plurality of external suction
ports or the internal suction port by moving the switching section to a position where the communication path is brought into
communication with any port of the plurality of external suction ports or the internal suction port; and

a suction path disposed out of the housing for connecting the internal suction port to the ink-draw-off port for sucking an
interior of the housing,

wherein the ink in the housing is discharged from the ink draw off port to a suction line through the suction path and the
internal suction port.

US Pat. No. 9,721,814

SUBSTRATE PROCESSING APPARATUS

SCREEN HOLDINGS CO., LTD....

1. A substrate processing apparatus for processing a substrate, comprising:
a substrate holding part for holding a substrate;
a cup part surrounding said substrate holding part;
an ejection head disposed above said substrate holding part inside said cup part and for ejecting a processing liquid toward
said substrate;

a standby pod disposed outside said cup part and in which a lower end portion of said ejection head is housed when said ejection
head is on standby;

a supply part movement mechanism for moving said ejection head from a position above said substrate holding part to an inspection
position above said standby pod;

a light emitting part for emitting light along a predetermined light existing plane to irradiate said processing liquid that
is ejected from said ejection head toward said standby pod with light when said projection liquid passes through said light
existing plane, said ejection head being located at said inspection position;

an imaging part for capturing an image of said processing liquid passing through said light existing plane to acquire an inspection
image that includes a bright dot appearing on said processing liquid; and

a determination part for determining quality of an ejection operation of said ejection head on the basis of said inspection
image.

US Pat. No. 9,698,031

SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS

SCREEN Holdings Co., Ltd....

1. A substrate treatment method comprising:
an organic solvent replacing step of supplying, to an upper surface of a horizontally held substrate, an organic solvent having
a lower surface tension than a rinse liquid adhering to the upper surface of the substrate, whereby a liquid film of the organic
solvent is formed on the substrate as covering the upper surface of the substrate to replace the rinse liquid with the organic
solvent;

a substrate temperature increasing step of allowing a temperature of the upper surface of the substrate to reach a predetermined
first temperature level higher than a boiling point of the organic solvent after the formation of the organic solvent liquid
film, whereby a vapor film of the organic solvent is formed below the entire organic solvent liquid film between the organic
solvent liquid film and the upper surface of the substrate, to levitate the organic solvent liquid film without disintegration,
as a liquid mass, above the organic solvent vapor film; and

an organic solvent removing step of removing the undisintegrated levitated organic solvent liquid film from above the upper
surface of the substrate;

wherein the organic solvent removing step includes a first step of removing the undisintegrated levitated organic solvent
liquid film in the form of said liquid mass from above the upper surface of the substrate; and

wherein the first step includes a step of contacting a guide surface of a guide member to a peripheral portion of the undisintegrated
levitated organic solvent liquid film so that the organic solvent liquid film is guided to move laterally off the substrate.

US Pat. No. 9,620,393

SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD

SCREEN Holdings Co., Ltd....

1. A substrate treatment method comprising:
an opposing surface positioning step of positioning a round opposing surface of a nozzle formed with an outlet port in opposed
spaced relation to a first region of a front surface of a substrate horizontally held, wherein said round opposing surface
has a diameter smaller than the diameter of the substrate, and said first region of the front surface of the substrate is
defined within a peripheral edge of the substrate and containing a rotation center of the substrate;

a rotating step of relative rotating between the substrate and the opposing surface of the nozzle about a vertical axis defined
through said first region;

a liquid filling step of supplying a liquid between the front surface of the substrate and the opposing surface of the nozzle
to form a liquid film which covers a second region which includes all of the first region and is wider than the first region,
wherein the liquid film fills a space defined between the opposing surface of the nozzle and the first region of the front
surface of the substrate opposed to the opposing surface of the nozzle to place said space in a liquid filled state, in parallel
to the rotating step;

a supply stopping step of stopping the supplying of the liquid while rotating the substrate after the liquid film fills the
space to place the space in said liquid filled state, the supply stopping step spinning off an outside portion present outside
the space of the liquid film by centrifugal force caused by the rotation of the substrate, whereby a liquid puddle which is
in contact with the front surface of the substrate and the opposing surface of the nozzle only inside the space is formed;

a liquid puddle keeping step of maintaining the supplying of the liquid stopped in parallel to the rotating step after the
supply stopping step, whereby the liquid puddle is kept in contact with the front surface of the substrate and the opposing
surface of the nozzle; and

a treatment liquid spouting step of spouting a treatment liquid from the outlet port again, the treatment liquid spouting
step being performed in parallel to the rotating step, and subsequent to the liquid puddle keeping step.

US Pat. No. 9,862,207

DRYING DEVICE, PRINTING APPARATUS, AND DRYING METHOD

SCREEN HOLDINGS CO., LTD....

1. A drying device installed on a printing apparatus that records an image on an elongated strip-shaped printing medium by
an inkjet system, the drying device being for drying ink adhering to the printing medium, the drying device comprising:
a drying chamber provided in said printing apparatus;
a heat roller that rotates about a rotation axis extending parallel to a width direction of the printing medium while supporting
the printing medium on an outer peripheral surface of the heat roller in said drying chamber;

a heat source provided in said heat roller;
a cooling unit that feeds cooling wind from a place lateral to said heat roller toward a part near said heat source;
a gas outward guide unit that guides gas outwardly from the part near said heat source to the outside of said drying chamber;
a gas inward guide unit that guides gas inwardly into space external to said heat roller and inside said drying chamber, the
inwardly-guided gas being the gas guided outwardly by said gas outward guide unit;

a gas supply unit that supplies gas to a neighborhood of the outer peripheral surface of said heat roller, the supplied gas
being the gas guided inwardly by said gas inward guide unit; and

a gas exhaust unit that releases gas from a surrounding of said heat roller to the outside of said printing apparatus.

US Pat. No. 9,697,631

VECTOR DATA PROCESSOR, IMAGE RECORDING SYSTEM, VECTOR DATA PROCESSING METHOD, AND COMPUTER-READABLE MEDIUM

SCREEN HOLDINGS CO., LTD....

1. An image recording system comprising:
a vector data processor;
a RIP part that converts data output from said vector data processor into variable raster data;
a raster data composition part that combines fixed raster data that is raster data prepared in advance and said variable raster
data to generate composite raster data; and

an image recording apparatus that records an image to a recording medium in accordance with said composite raster data, wherein
said vector data processor comprises;
a thinning part that processes target vector data indicating an outline of a target figure that includes a linear figure having
a thickness, to acquire thinned data that is vector data indicating a thinned figure obtained by thinning said target figure
by an amount of thinning;

a central line acquiring part that processes said target vector data to acquire central line data that is vector data indicating
at least part of a central line of said target figure; and

a superimposing part that generates data to be input to said RIP part, said data including an instruction to record a combined
figure obtained by superimposing said thinned figure and said central line one on the other.