US Pat. No. 9,239,268

CALIBRATION OF PHOTOELECTROMAGNETIC SENSOR IN A LASER SOURCE

ASML Netherlands B.V., V...

1. A system comprising:
an energy monitor within a laser source of a laser-produced plasma (LPP) extreme ultraviolet (EUV) system, the energy monitor
configured to measure laser pulses having a same wavelength and occurring in a burst, the energy monitor comprising:

a power meter configured to measure an average power of the laser pulses over a defined period of time, and
a photoelectromagentic (PEM) detector configured to provide a first voltage signal indicative of a temporal profile of the
burst of the laser pulses over at least a portion of the defined period of time;

a calibration module configured to determine a calibration coefficient based on the average power and the first voltage signal,
the calibration coefficient being a ratio of an energy of the burst of the laser pulses determined from the average power
and an integral of the first voltage signal; and

a single pulse energy calculation (SPEC) module configured to determine an energy of a subsequent pulse of the series of the
laser pulses based on the calibration coefficient and a pulse integral of a second voltage signal provided by the PEM detector
indicating a temporal profile of the subsequent pulse.

US Pat. No. 9,241,395

SYSTEM AND METHOD FOR CONTROLLING DROPLET TIMING IN AN LPP EUV LIGHT SOURCE

ASML Netherlands B.V., V...

1. A system for timing firing of a source laser in an EUV LPP light source having a droplet generator which releases a droplet
at a predetermined speed, the source laser firing pulses at an irradiation site, comprising:
a droplet illumination module comprising a first line laser for generating a first laser curtain between the droplet generator
and the irradiation site;

a droplet detection module comprising a first sensor for detecting a flash from the first laser curtain when a droplet passes
through the first laser curtain; and

a first controller for determining, based upon the flash from the first laser curtain, the distance from the first curtain
to the irradiation site, and the speed of the droplet, when the source laser should fire a pulse so as to irradiate the droplet
when the droplet reaches the irradiation site, and generating a timing signal instructing the source laser to fire at such
time.

US Pat. No. 9,255,892

SUBSTRATE, A METHOD OF MEASURING A PROPERTY, AN INSPECTION APPARATUS AND A LITHOGRAPHIC APPARATUS

ASML Netherlands B.V., V...

1. A substrate comprising:
a first plurality of superimposed patterns and a second plurality of superimposed patterns,
said second plurality of patterns being in turn superimposed on said first plurality of patterns,
wherein said first plurality of patterns are periodic patterns, said patterns having a period of d, said second plurality
of patterns also being periodic patterns and having a period which is different to d such that within an image of respective
diffraction patterns produced by radiation reflected by each of the first plurality of superimposed patterns and the second
plurality of superimposed patterns, the diffraction patterns of at least one order corresponding to each of the first and
second pluralities of superimposed patterns are spatially distinguishable from each other within said image.

US Pat. No. 9,426,872

SYSTEM AND METHOD FOR CONTROLLING SOURCE LASER FIRING IN AN LPP EUV LIGHT SOURCE

ASML Netherlands B.V., V...

1. A method for modifying timing of firing a source laser in an extreme ultraviolet (EUV) laser produced plasma (LPP) light
source having a droplet generator which releases a sequence of droplets, the source laser firing pulses at an irradiation
site, the method comprising:
obtaining a first amount of EUV energy generated from a first pulse of the pulses that impacted a first droplet of the sequence
of droplets;

determining, from the detected first amount of EUV energy, an anticipated delay of a second droplet of the sequence of droplets
reaching the irradiation site; and

modifying timing of firing the source laser for a second pulse of the pulses based on the anticipated delay of the second
droplet so as to irradiate the second droplet when the second droplet reaches the irradiation site.

US Pat. No. 9,152,058

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD INVOLVING A MEMBER AND A FLUID OPENING

ASML NETHERLANDS B.V., V...

1. An exposure apparatus comprising:
a movable table comprising a top surface having an object support surface portion to support an object;
a member, movably separate from the table and located on a member support surface portion of the top surface of the table,
to provide a surface substantially co-planar with a top surface of the object in or on the table, wherein the object and member
support surface portions are substantially co-planar;

a projection system configured to project a radiation beam onto a radiation-sensitive target portion of a substrate; and
a liquid supply system configured to provide a liquid to a space between the projection system and the object, the liquid
supply system comprising an inlet to supply the liquid,

wherein the table further comprises a recess recessed into the top surface of the table and extending below the object and
member support surface portions and a fluid opening, below a gap opening between the object when supported on the table and
the member, to remove the liquid entering the gap opening, the fluid opening being separate from the inlet and in an upwardly
facing surface of the recess below the object and member support surface portions, the upwardly facing surface extending on
opposite sides of the fluid opening.

US Pat. No. 9,097,993

OPTICAL ELEMENT AND LITHOGRAPHIC APPARATUS

ASML NETHERLANDS B.V., V...

1. An optical element, comprising:
a surface comprising a tilted profile having height differences, thereby providing cavities and elevations having a predetermined
maximum height difference; and

a transmissive layer that covers the cavities and the elevations of the optical element, wherein a first height of the transmissive
layer in the cavities is substantially equal or larger than the predetermined maximum height difference and the transmissive
layer has a second height on the elevations and the second height is about 10-500 nm,

wherein the transmissive layer is enabled to optically filter incident radiation, and
wherein the optical element is a grating.

US Pat. No. 9,256,136

FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD INVOLVING GAS SUPPLY

ASML NETHERLANDS B.V., V...

1. A fluid handling structure for a lithographic apparatus, the fluid handling structure configured to confine immersion liquid
to a space, the fluid handling structure comprising:
an elongate opening or a plurality of openings arranged in a first line that, in use, is directed towards a facing surface
of a substrate, of a substrate table configured to support the substrate, or of both the substrate and substrate table, the
elongate opening or plurality of openings being an outlet configured to remove at least liquid from the space, the outlet
being the nearest outlet, on any surface facing towards the facing surface, to the space that contains immersion fluid;

a gas knife device having an elongate aperture in a second line, the elongate aperture being outward relative to the space
of the elongate opening or plurality of openings of the first line;

a surface without an opening between the first line of the elongate opening or plurality of openings and the second line of
the elongate aperture;

an opening, adjacent the gas knife device, comprising an elongate opening or a plurality of openings, configured to remove
gas, liquid, or both liquid and gas, the opening adjacent the gas knife device being outward relative to the space of the
elongate aperture in the second line; and

a control system connected or connectable to an under pressure source and/or valve for the elongate opening or plurality of
openings in the first line, to an under pressure source and/or for the opening adjacent the gas knife, or to both the under
pressure source and/or valve for the elongate opening or plurality of openings in the first line and the under pressure source
and/or valve for the opening adjacent the gas knife and configured to control the at least one under pressure source and/or
valve such that, during a time where both at least liquid is removed through the elongate opening or plurality of openings
in the first line and gas, liquid, or both liquid and gas, is removed through the opening adjacent the gas knife device, a
non-zero gas flow rate through the opening adjacent the gas knife device is greater than a non-zero gas flow rate through
the elongate opening or plurality of openings in the first line.

US Pat. No. 9,261,784

LITHOGRAPHIC PATTERNING PROCESS AND RESISTS TO USE THEREIN

ASML NETHERLANDS B.V., V...

1. A method of irradiating a resist film of a resist material with a patterned beam of EUV light having a wavelength of less
than 11 nm, the resist material comprising a silicon-containing polymer and/or a compound comprising at least one element
selected from the group consisting of: Ta, W, Re, Os, Ir, Ni, Cu and Zn, wherein said silicon-containing polymer comprises
a monomer having the following formula:

wherein R is a C1 to C20 alkylsilyl group or a group having the formula:


wherein R1, R2 and R3 group are each a C1 to C20 alkylsilyl group.

US Pat. No. 9,268,211

LITHOGRAPHIC APPARATUS, AND PATTERNING DEVICE FOR USE IN A LITHOGRAPHIC PROCESS

ASML NETHERLANDS B.V., V...

1. A reticle comprising:
a pattern to form in a scanning-type lithographic apparatus a patterned radiation beam; and
a grating configured to cooperate with a measurement system of the lithographic apparatus, the grating extending in a scanning
direction over a complete length of the reticle from a first outer side of the reticle to a second outer side, opposite the
first outer side, of the reticle.

US Pat. No. 9,250,536

LITHOGRAPHIC APPARATUS AND METHOD

ASML NETHERLANDS B.V., V...

1. A method comprising:
providing a beam of radiation using an illumination system;
using a patterning device to impart the radiation beam with a pattern in its cross-section; and
projecting the patterned radiation beam onto a target portion of a substrate;
wherein the illumination system comprises an array of individually controllable elements and associated optical components
arranged to convert the radiation beam into a desired illumination mode; and

wherein an allocation scheme is used to allocate different individually controllable elements to different parts of the illumination
mode, and the allocation scheme includes selecting a number of individually controllable elements which direct radiation to
a given location in the illumination mode, the selection being dependent upon a measured parameter characterizing intensity
of radiation provided from one or more individually controllable elements of the number of individually controllable elements.

US Pat. No. 9,374,882

FINAL FOCUS ASSEMBLY FOR EXTREME ULTRAVIOLET LIGHT SOURCE

ASML Netherlands B.V., V...

1. An extreme ultraviolet light system comprising:
a target material delivery system configured to produce a target material; and
a beam delivery system that is configured to receive an amplified light beam and to direct the amplified light beam toward
a target location that receives the target material, the beam delivery system including a final focus assembly that focuses
the amplified light beam at a focal location that enables interaction between the amplified light beam and the target material
to cause the target material to be converted into a plasma that emits extreme ultraviolet light, the final focus assembly
comprising:

at least one transmissive optical element having at least one curved surface through which the amplified light beam travels,
wherein the amplified light beam that exits the at least one transmissive optical element is converging;

a convex reflective optical element that receives the amplified light beam transmitted through the at least one transmissive
optical element, wherein the amplified light beam reflected from the convex reflective optical element is diverging; and

a concave reflective optical element that receives the diverging amplified light beam reflected from the convex reflective
optical element, and reflects amplified light beam on a path toward the target location, wherein the amplified light beam
reflected from the concave reflective optical element is converging and focused at the target location.

US Pat. No. 9,261,402

LITHOGRAPHIC METHOD AND APPARATUS

ASML Netherlands B.V., V...

1. A method of determining apodization properties of an optical system comprising an illumination system and a projection
system, the method comprising:
allowing light from a given point in an illumination field to pass through the projection system along at least a first optical
path, a second optical path and a third optical path;

determining a first difference in intensity of light received in a projection field from the first optical path and the second
optical path;

determining a second difference in intensity of light received in the projection field from the first optical path and the
third optical path; and

calculating apodization properties of the projection system from the first difference in intensity of light and the second
difference in intensity of light.

US Pat. No. 9,107,279

TARGET FOR LASER PRODUCED PLASMA EXTREME ULTRAVIOLET LIGHT SOURCE

ASML Netherlands B.V., V...

1. An extreme ultraviolet light source comprising:
an optical source configured to produce a first pulse of radiation, a second pulse of radiation, and an amplified light beam;
a vacuum chamber that receives a target material droplet at a first location in an interior of the vacuum chamber, the target
material droplet comprising a target material that emits extreme ultraviolet (EUV) light when converted to plasma;

a control system comprising machine-executable instructions on a computer-readable medium, the control system configured to
control a timing circuit of the optical source to cause the optical source to:

emit the first pulse of radiation, the first pulse of radiation comprising an energy sufficient to transform the target material
droplet into a geometric distribution of target material that occupies a larger volume than a volume occupied by the target
material droplet,

emit the second pulse of radiation, the second pulse of radiation comprising an energy sufficient to change an absorption
characteristic of the geometric distribution to form a modified target that absorbs a greater portion of incident radiation
than the target material droplet or the geometric distribution, and

emit the amplified light beam, the amplified light beam comprising an energy sufficient to convert at least some of the modified
target into plasma that emits EUV light; and

an optical element between the source and the vacuum chamber, the optical element configured to:
receive the first pulse of radiation, the second pulse of radiation, and the amplified light beam, and
direct the first pulse of radiation, the second pulse of radiation, and the amplified light beam to, respectively, the first
location in the interior of the vacuum chamber, a second location in the interior of the vacuum chamber, and a third location
in the interior of the vacuum chamber, the first, second, and third locations being different locations along a direction
that is different than a direction of propagation of the first pulse, the second pulse, and the amplified light beam in the
vacuum chamber.

US Pat. No. 9,232,624

TARGET FOR LASER PRODUCED PLASMA EXTREME ULTRAVIOLET LIGHT SOURCE

ASML Netherlands B.V., V...

1. An extreme ultraviolet light source comprising:
a solid state laser configured to produce pulses of radiation, the pulses of radiation comprising at least a first pulse of
radiation and a second pulse of radiation;

a second optical source configured to produce a third pulse of radiation, the third pulse of radiation having a different
wavelength than the first pulse of radiation and the second pulse of radiation;

a vacuum chamber configured to receive target material in an interior of the vacuum chamber, the target material comprising
a material that emits extreme ultraviolet (EUV) light when converted to plasma; and

an optical element configured to:
receive the first pulse of radiation, the second pulse of radiation, and the third pulse of radiation, and
direct the first pulse of radiation, the second pulse of radiation, and the third pulse of radiation to, respectively, a first
location in the interior of the vacuum chamber, a second location in the interior of the vacuum chamber, and a third location
in the interior of the vacuum chamber, the first, second, and third locations being different locations in the vacuum chamber
and being along a direction that is different than the directions of propagation of the first pulse, the second pulse, and
the third pulse of radiation in the vacuum chamber.

US Pat. No. 9,510,432

RADIATION SOURCE AND LITHOGRAPHIC APPARATUS

ASML Netherlands B.V., V...

1. A method of monitoring operation of a radiation source fuel droplet stream generator comprising a capillary and a piezo-electric
actuator that are coupled to each other, the method comprising:
using the capillary to contain a fuel; and
analyzing a resonance frequency spectrum of the coupled capillary and piezo-electric actuator during the operation of the
radiation source fuel droplet stream generator using the coupled capillary and piezo-electric actuator.

US Pat. No. 9,462,667

RADIATION SOURCE AND LITHOGRAPHIC APPARATUS

ASML Netherlands B.V., V...

1. A radiation source fuel droplet stream generator comprising:
a fuel droplet emitter configured to generate a stream of fuel droplets; and
a droplet visualization system configured to examine the stream of fuel droplets,
wherein the radiation source fuel droplet stream generator is configured to move said fuel droplet emitter from a first position
to a second position based on a determination from the droplet visualization system that the stream of fuel droplets has assumed
a steady state when the fuel droplet emitter is in the first position.

US Pat. No. 9,357,626

PHOTON SOURCE, METROLOGY APPARATUS, LITHOGRAPHIC SYSTEM AND DEVICE MANUFACTURING METHOD

ASML Netherlands B.V., V...

1. A plasma-based photon source apparatus comprising:
a container configured to contain a gaseous atmosphere;
a driving system configured to form a driving radiation beam focused on a plasma forming zone within the container and maintain,
by the driving radiation beam, a plasma;

a collecting optical system configured to collect photons emitted from the plasma along a longitudinal axis and to form the
collected photons into at least one beam of output radiation; and

a reflector configured to reflect photons emitted in at least one of a direction reverse to the longitudinal axis and a direction
transverse to the longitudinal axis back into the plasma.

US Pat. No. 9,338,870

EXTREME ULTRAVIOLET LIGHT SOURCE

ASML Netherlands B.V., V...

1. A method comprising:
forming a first remaining plasma that at least partially coincides with a target region, the first remaining plasma being
formed from a previous extreme ultraviolet (EUV)-light producing interaction between target material and an amplified light
beam;

providing a target comprising target material in a first spatial distribution to the target region, the target material comprising
material that emits EUV light when converted to plasma;

allowing the first remaining plasma and the initial target to interact, the interaction rearranging the target material from
the first spatial distribution to a shaped target distribution to form a shaped target in the target region, the shaped target
comprising the target material arranged in the shaped target distribution, the shaped target distribution comprising sides
that define a concave region;

directing the amplified light beam toward the concave region of the shaped target in the target region, an interaction between
the amplified light beam and the target material of the shaped target converting at least some of the target material in the
shaped target to a plasma that emits EUV light, and the sides of the concave region confining at least some of the plasma
that emits EUV light; and

allowing a second remaining plasma to form in the target region.

US Pat. No. 9,268,236

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD HAVING HEAT PIPE WITH FLUID TO COOL SUBSTRATE AND/OR SUBSTRATE HOLDER

ASML NETHERLANDS B.V., V...

1. A lithographic apparatus configured to project a patterned radiation beam onto a target portion of a substrate held in
an indent on a substrate table, the apparatus comprising:
a liquid supply system configured to at least partly fill a space between a projection system and the substrate with liquid;
a barrier structure configured to substantially contain the liquid within the space; and
a heat pipe having, in use, therein vapor and configured to enable phase change of the vapor to bring about thermal conditioning
of the substrate and/or the substrate table at locations where a thermal load is likely to occur.

US Pat. No. 9,148,941

THERMAL MONITOR FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE

ASML Netherlands B.V., V...

1. A method for adjusting a position of an amplified light beam relative to a first optical element in an extreme ultraviolet
(EUV) light source, the method comprising:
accessing a first temperature distribution of a monitored element that is adjacent to and distinct from the first optical
element, the first temperature distribution comprising a plurality temperature distributions, each of the plurality of temperature
distributions comprising at least one numerical value that represents a temperature of one of a plurality of distinct spatial
locations on the monitored element, the first optical element being positioned to receive the amplified light beam, and the
temperature of each of the plurality of distinct spatial locations on the monitored element being an indirect measurement
of a temperature of one of a plurality of portions of the first optical element;

determining a temperature metric from each of the plurality of temperature distributions, each temperature metric being associated
with one of the distinct spatial locations on the monitored element;

comparing the plurality of determined temperature metrics to each other;
determining whether the amplified light beam is at a center of the first optical element, the amplified light beam being at
the center of the optical element when the plurality of determined temperature metrics are substantially the same and the
amplified light beam being off-center relative to the first optical element when the plurality of determined temperature metrics
are not substantially the same; and

if the amplified light beam is off-center relative to the optical element, adjusting the position of the amplified light beam
relative to the first optical element until the amplified light beam is closer to the center of the first optical element.

US Pat. No. 9,116,439

ILLUMINATION SYSTEM AND LITHOGRAPHIC APPARATUS

ASML NETHERLANDS B.V., V...

1. An illumination system, comprising:
a polarization member comprising first and second polarization modifiers each connected to an actuator configured to move
the first polarization modifier relative to the second polarization modifier and to move the first and second polarization
modifiers into at least partial intersection with a radiation beam at respectively different locations along the path of the
radiation beam such that the first and second polarization modifiers respectively apply a modified polarization to at least
part of the radiation beam;

an array of individually controllable reflective elements positioned to receive the radiation beam after it has passed the
polarization member; and

a controller configured to control the actuators such that the first and second polarization modifiers intersect with different
portions of the radiation beam, part of the array of individually controllable reflective elements receiving part of the radiation
beam which has had its polarization modified by the first polarization modifier and then subsequently by the second polarization
modifier, and part of the array of individually controllable reflective elements receiving part of the radiation beam which
has had its polarization modified by the first polarization modifier and not by the second polarization modifier.

US Pat. No. 9,544,982

NOZZLE

ASML NETHERLANDS B.V., V...

1. A nozzle comprising an inlet and an outlet in fluid communication with the inlet, the outlet being formed of an orifice
through a substrate and a structure defining a plurality of trenches positioned around the orifice, each of the trenches being
formed on the substrate, and having a length extending generally radially with respect to a central portion of the orifice,
wherein the nozzle is a multilayer structure having a first layer and a second layer on the first layer, where at least part
of the inlet is formed in the first layer and at least part of the outlet is formed in the second layer.

US Pat. No. 9,516,731

POWER SUPPLY FOR A DISCHARGE PRODUCED PLASMA EUV SOURCE

ASML NETHERLANDS B.V., V...

1. A power supply for providing power to a lithography illumination source, the power supply comprising:
a voltage source configured to provide the power;
a transmission line configured to transmit the power from the voltage source; and
a RF termination provided on an input end of the transmission line or an output end of the transmission line, the RF termination
being configured to terminate the transmission line to reduce reflection of RF energy at the end of the transmission line.

US Pat. No. 9,250,528

METHODS AND COMPOSITIONS FOR PROVIDING SPACED LITHOGRAPHY FEATURES ON A SUBSTRATE BY SELF-ASSEMBLY OF BLOCK COPOLYMERS

ASML NETHERLANDS B.V., V...

19. A self-assemblable block copolymer composition adapted to form an ordered layer on a substrate, the ordered layer comprising
discontinuous first elongate elliptical domains, defining long axes substantially parallel to their greatest widths, self-assembled
side-by-side alternating with a second domain therebetween, wherein the long axes of the elongate domains lie substantially
parallel to each other, and substantially parallel to the substrate, wherein the self-assemblable block copolymer composition
comprises:
a first di-block copolymer having a first block of first monomer and a second block of second monomer, and
a second di-block copolymer having a first block of the first monomer and a second block of the second monomer,
wherein the first di-block copolymer is configured to self-assemble with lamellar packing geometry with the first block assembled
in bodies of the discontinuous first elongate elliptical domains and the second block assembled in the second domain, and

wherein the second di-block copolymer is configured to self-assemble with circular packing geometry with the first block assembled
in ends of the discontinuous first elongate elliptical domains and the second block assembled in the second domain.

US Pat. No. 9,304,411

LITHOGRAPHIC METHOD AND APPARATUS

ASML Netherlands B.V., V...

1. A method of patterning substrates using a lithographic apparatus, the method comprising:
projecting a patterned radiation beam onto target portions of respective substrates in a lot of substrates; and
determining whether a feed-forward correction based on a lens heating model for adjusting the projection system during exposure
of the lot of substrates is required,

wherein the determining is also based on a number of subsequent lots of substrates that are to be exposed.

US Pat. No. 9,261,799

MOVABLE SUPPORT, POSITION CONTROL SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD OF CONTROLLING A POSITION OF AN EXCHANGEABLE OBJECT

ASML NETHERLANDS B.V., V...

1. A movable support configured to hold an exchangeable object, the support comprising:
a movable structure movably arranged with respect to a reference object;
an object holder arranged over, and movable with respect to, the movable structure, the object holder including an upper surface
to receive a lower surface of the exchangeable object and configured to hold and bear a weight of the exchangeable object
from the lower surface of the exchangeable object, the object holder being supported by the movable structure;

an actuator configured to move the movable structure with respect to the reference object; and
an ultra short stroke actuator configured to move the object holder with respect to the movable structure,
wherein a stiffness of the ultra short stroke actuator is substantially larger than a stiffness of the actuator, and
wherein the ultra short stroke actuator is configured to move the object holder with respect to the movable structure to compensate
for an error between a measured position of the movable structure and a desired position of the movable structure.

US Pat. No. 9,261,772

LITHOGRAPHIC APPARATUS, SUBSTRATE AND DEVICE MANUFACTURING METHOD

ASML Netherlands B.V., V...

1. A method comprising:
illuminating a target structure using a spot size that is larger than the target structure, wherein the target structure includes
a progressive optical contrast transition at peripheral edges of the target structure; and

measuring a diffraction pattern of the target structure, wherein a diffraction effect at the peripheral edges of the target
structure is substantially reduced by the progressive optical contrast transition.

US Pat. No. 9,238,243

SYSTEM AND METHOD TO ADAPTIVELY PRE-COMPENSATE FOR TARGET MATERIAL PUSH-OUT TO OPTIMIZE EXTREME ULTRAVIOLET LIGHT PRODUCTION

ASML Netherlands B.V., V...

1. A method of pre-compensating for push-out from a primary focal spot at which sequential target material droplets from a
droplet generator are to be lased during burst-firing of an extreme ultraviolet laser light source, the laser light source
containing a feedback mechanism for correcting for droplet-to-droplet changes in axial position, comprising:
sensing a plurality of droplets during a burst, the droplets directed toward an initial target position;
calculating an axial position for each of the sensed droplets;
estimating for each sensed droplet an uncorrected droplet position by subtracting from the calculated axial position for each
of the droplets any correction in axial position made by the feedback mechanism;

calculating, after the burst has ended, a pre-compensation correction based on the uncorrected droplet positions;
calculating an updated target position based upon the pre-compensation correction; and
commanding one or more actuators to reposition the droplet generator to deliver, during a succeeding burst, droplets of target
material to the updated target position.

US Pat. No. 9,261,798

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

ASML Netherlands B.V., V...

1. A substrate stage for use in a lithographic apparatus, the substrate stage comprising:
a substrate table configured to hold a substrate;
a positioner device for in use positioning the substrate table relative to a projection system of the lithographic apparatus,
the positioning device comprising:

a first positioning member mounted to the substrate table; and
a second positioning member co-operating with the first positioning member to position the substrate table, the second positioning
member being mounted to a support structure; and

an actuator configured to exert a vertical force on a bottom surface of the rate table at a substantially fixed horizontal
position relative to the support structure.

US Pat. No. 9,271,381

METHODS AND APPARATUS FOR LASER PRODUCED PLASMA EUV LIGHT SOURCE

ASML Netherlands B.V., V...

1. A system for producing EUV light, comprising:
a material delivery system for producing a stream of material droplets;
a laser system for producing a drive laser beam, the drive laser beam is configured to irradiate the material droplets at
an irradiation point, wherein the laser system operates in the No Master Oscillator (NOMO) mode that is configured to cause
the drive laser beam to pulse on every droplet in the stream of material droplets;

a monitoring system for monitoring at least one of drive laser beam reflection from the drive laser beam and EUV radiation
pulses, the monitoring system producing a detector signal responsive to the monitoring of the drive laser beam reflection
if the reflection from the drive laser beam is monitored or responsive to the monitoring of the EUV radiation pulses if the
EUV radiation pulses are monitored, the detector signal being a pulse train wherein the stream of material droplets comprise
of main droplets having a first droplet size and satellite droplets having a second droplet size smaller than the first droplet
size, and wherein the material delivery system comprises arrangement to modulate a disturbance signal configured to produce
the stream of material droplets at a predefined rate and wherein the main droplets represent droplets formed at the predefined
rate and the satellite droplets represent droplets formed at a rate different from the predefined rate; and

arrangement for analyzing the detector signal to ascertain whether there exists at least one of extra pulses outside of the
envelope of pulses that correspond with the irradiation of the main droplets and extra signal peaks outside of the envelope
of signal peaks that correspond with the irradiation of the main droplets.

US Pat. No. 9,239,269

CALIBRATION OF PHOTOELECTROMAGNETIC SENSOR IN A LASER SOURCE

ASML Netherlands B.V., V...

1. A system comprising:
an energy monitor within a laser-produced plasma (LPP) extreme ultraviolet (EUV) system, the energy monitor configured to
measure a laser beam comprising pre-pulses and main pulses separated by a length of time, the energy monitor comprising:

a power meter configured to sense an average power of the series of laser pulses over a defined period of time, and
a photoelectromagnetic (PEM) detector configured to provide a voltage signal depicting a temporal profile of the first pre-pulse
separated from the first main pulse by the length of time during a portion of the defined period of time;

a calibration module configured to determine a power of the first main pulse based on a main pulse calibration coefficient
and a pulse integral of a portion of the voltage signal corresponding to the first main pulse, to determine a power of the
first pre-pulse based on the average power and the power of the first main pulse, and to determine a pre-pulse calibration
coefficient based on the power of the first pre-pulse and an integral of a portion of the voltage signal corresponding to
the first pre-pulse; and

a single pulse energy calculation (SPEC) module configured to determine an energy of a second pre-pulse based on the pre-pulse
calibration coefficient and a pulse integral of a portion of a second voltage signal provided by the PEM detector corresponding
to the second pre-pulse, and to determine an energy of a second main pulse based on the main pulse calibration coefficient
and a pulse integral of a portion of the second voltage signal to the second main pulse.

US Pat. No. 9,280,057

ALIGNMENT MEASUREMENT SYSTEM, LITHOGRAPHIC APPARATUS, AND A METHOD TO DETERMINE ALIGNMENT OF IN A LITHOGRAPHIC APPARATUS

ASML Netherlands B.V., V...

1. An alignment measurement system for measuring an alignment target on an object, comprising:
an illumination source configured to provide towards the object a measurement beam pulse including light of multiple wavelengths;
a detector system configured to receive a reflected measurement beam pulse after reflection from the object, the detector
system comprising a first detector and a dispersive fiber arranged to guide at least a part of the reflected measurement beam
pulse towards the first detector so that different wavelengths of the part of the reflected measurement beam pulse are dispersed
in the dispersive fiber and reach the first detector at different moments in time; and

a processing unit configured to determine alignment based on the reflected measurement beam pulse received by the detector
system.

US Pat. No. 9,182,682

INSPECTION METHOD AND APPARATUS, LITHOGRAPHIC APPARATUS, LITHOGRAPHIC PROCESSING CELL AND DEVICE MANUFACTURING METHOD

ASML Netherlands B.V., V...

1. A method comprising:
printing a pattern on a substrate surface using an exposure apparatus and a patterning device including a pattern for creating
the printed pattern, the patterning device pattern configured to generate the printed pattern that includes a structure that
includes an asymmetry that varies with a variation in a focus focus-related property of the exposure apparatus;

projecting a radiation beam onto the printed pattern on the substrate surface;
detecting radiation reflected from the printed pattern on the substrate surface;
measuring an asymmetry in the detected radiation reflected from the printed pattern; and
determining, from the measured asymmetry, the focus-related property of the exposure apparatus.

US Pat. No. 9,360,600

SYSTEM AND METHOD FOR CORRECTING THE FOCUS OF A LASER BEAM

ASML Netherlands B.V., V...

1. A system comprising:
a variable radius mirror having a deformable reflective surface and configured to receive and reflect a laser beam at the
reflective surface, the variable radius mirror having:

a cooling cavity configured to pass a cooling material to cool the variable radius mirror; and
a focusing cavity configured to receive a focusing material and deform the reflective surface as a function of a deformation
pressure of the received focusing material;

a cooling controller configured to provide the cooling material to the cooling cavity;
and
a pressure controller configured to provide to the focusing cavity the focusing material with the deformation pressure where
the pressure controller is configured to adjust the deformation pressure of the focusing material to minimize a laser focus
error by being further configured to adjust the deformation pressure of the focusing material to maximize a measured EUV power
from an EUV-emitting target droplet provided to a focal point.

US Pat. No. 9,268,242

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD INVOLVING A HEATER AND A TEMPERATURE SENSOR

ASML NETHERLANDS B.V., V...

1. A lithographic apparatus, comprising:
a substrate table constructed to hold a substrate;
a projection system configured to project a patterned radiation beam onto a target portion of the substrate;
a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid;
a substrate temperature conditioning system configured to provide heat transfer to or from at least a portion of the substrate;
a temperature sensor configured to determine a temperature;
a substrate temperature control system configured to provide a control signal to control the substrate temperature conditioning
system based on the determined temperature; and

a parameter control system configured to adjust a lithographic apparatus parameter, that is other than, or in addition to,
the control signal and a temperature of the liquid as being supplied to the space by the liquid supply system, based on temperature
information of the substrate and/or substrate table or on a measure derived from the temperature information.

US Pat. No. 9,377,700

DETERMINING POSITION AND CURVATURE INFORMATION DIRECTLY FROM A SURFACE OF A PATTERNING DEVICE

ASML HOLDING N.V., Veldh...

1. A lithographic apparatus, comprising:
a projection system configured to project a pattern imparted to a radiation beam onto a substrate;
a substrate table constructed to hold the substrate;
a support plate configured to bond with a surface of a patterning device, wherein the patterning device has a patterned side
having the pattern; and

a chuck constructed to removably support the support plate and to position the support plate,
wherein the support plate is arranged to couple the patterning device to the chuck, and the support plate is transparent to
the radiation beam.

US Pat. No. 9,268,238

SUBSTRATE TABLE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. A table for a lithographic apparatus, the table comprising:
a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table
with a drain opening in a surface of the table other than the upper surface;

a first porous structure in a flow path between the catchment opening and the drain opening, wherein at least part of the
flow path is wider than the catchment opening; and

a second, further porous structure in the flow path between the catchment opening and the drain opening, wherein the second
porous structure is configured to stop liquid flow and accumulate liquid above the second porous structure.

US Pat. No. 9,544,983

APPARATUS FOR AND METHOD OF SUPPLYING TARGET MATERIAL

ASML NETHERLANDS B.V., V...

1. Apparatus for supplying target material to a system for generating EUV radiation by creating a plasma from molten target
material at a plasma site, the apparatus comprising:
a target material repository comprising
a chamber for receiving target material in solid form, and
an induction heater in electromagnetic communication with an interior of the chamber and arranged to heat target material
in the chamber by electromagnetic induction and convert target material in the chamber in solid form to target material in
liquid form; and

a target material dispenser releasably connected to the target material repository and arranged to receive target material
in liquid form from the target material repository and to dispense the target material in liquid form to the plasma site.

US Pat. No. 9,069,240

CALIBRATION OF LITHOGRAPHIC APPARATUS BY EXPOSING PATTERNS ON SUBSTRATE POSITIONED AT DIFFERENT ORIENTATIONS

ASML Netherlands B.V., V...

4. A method comprising:
performing a plurality of exposures to form a plurality of patterns on a substrate, the substrate being positioned at a different
orientation during each exposure of the plurality of exposures to form a corresponding pattern of the plurality of patterns;

measuring an overlay error between a first pattern and a second pattern of the plurality of patterns, the first pattern being
exposed at a first substrate orientation and the second pattern being exposed at a second substrate orientation, the first
and second substrate orientations being different from each other;

determining, based on the measured overlay error, a model representative of a relationship between the overlay error and a
system parameter error, wherein the model comprises a polynomial function; and

deriving a calibration correction factor from the model.

US Pat. No. 9,274,441

INSPECTION METHOD FOR IMPRINT LITHOGRAPHY AND APPARATUS THEREFOR

ASML NETHERLANDS B.V., V...

1. A method of inspecting a patterned surface of an imprint template for use in imprint lithography of an imprintable medium
on a substrate, wherein the imprintable medium or the imprint template comprises an anti-adhesion compound, the method comprising:
illuminating the patterned surface with radiation of a first wavelength such that fluorescence of defect particles of imprintable
medium present on the patterned surface is induced to yield radiation of a second wavelength, and

using the radiation of the second wavelength as an indication of the presence of defect particles of imprintable medium on
the patterned surface,

wherein the radiation of the first wavelength induces fluorescence of the radiation of the second wavelength from the imprintable
medium and does not substantially induce fluorescence of radiation of the second wavelength from the anti-adhesion compound.

US Pat. No. 9,629,231

ELECTRON BEAM CONTROL FOR BARELY SEPARATED BEAMS

JEFFERSON SCIENCE ASSOCIA...

1. A method of independently controlling multiple, barely separated beams in a common transport pipe, comprising:
providing a magnet arrangement including at least two multipole magnets spaced closely together and having a multipole distribution
including at least one odd multipole and one even multipole;

placing the closely spaced multipole magnets in the path of the barely separated beams; and
tuning the magnetic fields to cancel out a first of the barely separated beams to enable independent control of the second
beam with common magnets.

US Pat. No. 9,274,436

LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. A lithographic apparatus comprising:
a substrate table constructed to hold a substrate;
a projection system configured to project a patterned radiation beam onto a target portion of the substrate;
a fluid handling structure configured to confine liquid to a space between a final element of the projection system and a
facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate;

a substrate surface actuator comprising a fluid opening for fluid flow therethrough from/onto the facing surface to generate
a force between the substrate surface actuator and the facing surface, wherein the fluid opening extends around a corner;
and

a position controller to control the position and/or orientation of a part of the facing surface toward a desired position
and/or orientation of the part, by varying fluid flow through the fluid opening to displace the part of the facing surface
relative to the projection system.

US Pat. No. 9,192,039

RADIATION SOURCE

ASML Netherlands B.V., V...

1. A radiation source comprising:
a nozzle configured to direct a stream of fuel droplets along a trajectory towards a plasma formation location; and
a laser configured to direct laser radiation at the fuel droplets at the plasma formation location to generate, in use, a
radiation generating plasma,

wherein the nozzle has an internal surface that is configured to prevent contamination present in fuel used to form the fuel
droplets from being deposited on that internal surface, the internal surface comprising a coating and wherein the coating
comprises polytetrafluoroethylene, or a material derived from a sol-gel coating process.

US Pat. No. 9,392,678

TARGET MATERIAL SUPPLY APPARATUS FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE

ASML Netherlands B.V., V...

1. A target material supply apparatus for an extreme ultraviolet (EUV) light source, the apparatus comprising:
a tube comprising a first end, a second end, and a sidewall defined between the first and second ends, wherein at least a
portion of an outer surface of the tube comprises an electrically insulating material, the first end receives a pressurized
target material, and the second end defines an orifice through which the pressurized target material passes to produce a stream
of target material droplets; and

an electrically conductive coating on the second end of the tube that defines the orifice, the coating being configured to
electrically connect the outer surface of the tube to ground to thereby reduce surface charge on the outer surface.

US Pat. No. 9,285,685

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. A lithographic apparatus, comprising:
a substrate table configured to hold a substrate;
a projection system configured to project a beam of radiation to be incident on an incident surface of a target portion of
the substrate;

a liquid supply system configured to provide a liquid to a space between the projection system and the substrate, wherein
the beam in the space has an optical axis along which the beam is focused; and

a controller configured to actively provide the optical axis of the beam tilted away from orthogonal to the incident surface
and/or actively provide the incident surface tilted away from orthogonal to the optical axis of the beam, for during projection
of the beam, through the liquid, onto the target portion of the substrate.

US Pat. No. 9,235,140

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. An apparatus comprising:
an optical column capable of projecting a beam on a target portion of a substrate, the optical column comprising a projection
system configured to project the beam onto the target portion;

a scanning movement actuator to move the substrate with a scanning speed in a scanning direction with respect to the optical
column; and

a rotating movement actuator to rotate the optical column or a part thereof with a rotating frequency resulting in a tangential
rotation speed of the beam on the target portion,

wherein the target portion has a height in the scanning direction and a tangential width mainly perpendicular to the scanning
direction, wherein the scanning speed divided by the height substantially corresponds with the tangential rotation speed of
the beam divided by the tangential width.

US Pat. No. 9,182,679

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. A lithographic apparatus, comprising:
a movable table;
a projection system configured to project the patterned beam onto a target portion of a substrate;
a liquid supply system configured to at least partly fill a space between the projection system and the movable table with
a liquid;

a member that is located above the movable table and that extends along at least a part of the boundary of the space between
the projection system and the movable table, the member configured to at least partly confine the liquid in the space; and

a gas outflow port separate from the body of the member and configured to exhaust a flow of gas that at least partly confines
humid gas in a volume around and in contact with the liquid in the space.

US Pat. No. 9,195,144

SPECTRAL PURITY FILTER, RADIATION SOURCE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD

ASML Netherlands B.V., V...

1. A spectral purity filter comprising:
a body; and
an aperture in the body, wherein the aperture has a cross-dimension larger than a wavelength of an extreme ultraviolet (EUV)
radiation but smaller than a wavelength of a non-EUV secondary radiation,

wherein the spectral purity filter is configured to allow transmission therethrough of the EUV radiation and to refract and
transmit therethrough the non-EUV secondary radiation.

US Pat. No. 9,256,139

SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER

ASML NETHERLANDS B.V., V...

1. A substrate holder for use in a lithographic apparatus, the substrate holder comprising:
a main body having a surface;
a plurality of burls projecting from the surface and having end surfaces to support a substrate;
a planarization layer provided on at least part of the surface of the main body; and
a thin film stack formed or attached on top of the planarization layer and forming an electric or electronic component, the
thin film stack horizontally spaced by a gap from an adjacent burl.

US Pat. No. 9,182,222

SUBSTRATE PLACEMENT IN IMMERSION LITHOGRAPHY

ASML NETHERLANDS B.V., V...

1. A lithographic projection apparatus comprising:
a substrate table configured to hold a substrate, the substrate table having a depression configured to receive the substrate;
a projection system configured to project a patterned beam onto a target portion of the substrate;
a liquid supply system configured to provide a liquid, through which the patterned beam is to be projected, in a space between
the projection system and the substrate;

a sensor system configured to measure a position of the substrate or of another substrate, a sensor system configured to measure
a gap between an edge of the substrate, or of another substrate, disposed inside the depression and an edge of the depression,
or a sensor system configured to measure both the position and the gap; and

a substrate handling system configured to position, using the measurement by the sensor system or a parameter derived from
the measurement, the substrate inside the depression such that the gap between the edge of the substrate and the edge of the
depression is substantially uniform inside the depression.

US Pat. No. 9,390,827

EUV LIGHT SOURCE WITH SUBSYSTEM(S) FOR MAINTAINING LPP DRIVE LASER OUTPUT DURING EUV NON-OUTPUT PERIODS

ASML Netherlands B.V., V...

1. A device comprising:
a droplet generator producing droplets of target material;
a laser source producing laser pulses, wherein the droplet generator produces the droplets and the laser source produces the
laser pulses during at least each of two burst periods, an intervening period being in between the two burst periods and wherein
during the intervening period, at least one of a first condition and a second condition exists, the first condition characterized
by at least the laser source producing the laser pulses during the intervening period, the second condition characterized
by at least the droplet generator producing the droplets during the intervening period; and

a system that varies, using air flow along the direction of droplet travel, position of the droplets to create a burst period
operating regime that executes during the burst period and an intervening period operating regime that executes during the
intervening period, wherein when the system executes the intervening period operating regime during the intervening period,
a position along the direction of droplet travel of at least one droplet of said droplets of material is altered, using said
air flow, from a position that said at least one droplet would have occupied had the system operates in the burst period operating
regime, thereby resulting in fewer droplets being impinged by the laser pulses during the intervening period than if the system
had executed the burst period operating regime during the intervening period.

US Pat. No. 9,279,445

DROPLET GENERATOR STEERING SYSTEM

ASML NETHERLANDS B.V., V...

1. Apparatus comprising:
a first member adapted to be coupled to a frame;
a second member;
an EUV target material dispenser mechanically coupled to the second member and adapted to dispense an EUV target material;
and

a coupling system mechanically coupling the first member to the second member, wherein the coupling system comprises a first
coupling subsystem configured to constrain translational movement of the second member with respect to the first member while
permitting tilting movement of the second member with respect to the first member, and a second coupling subsystem adapted
to control an amount of tilting of the second member with respect to the first member and so to affect a position of a release
point of EUV target material from the EUV target material dispenser, the first coupling subsystem comprising a plurality of
first coupling subsystem elements mechanically coupling said first member to said second member, each of said first coupling
subsystem elements comprising at least one flexure.

US Pat. No. 9,175,951

METHOD AND APPARATUS FOR DETERMINING STRUCTURE PARAMETERS OF MICROSTRUCTURES

ASML Netherlands B.V., V...

1. A method comprising:
illuminating a first region of a target with a first beam of coherent radiation using a projection system;
measuring a diffraction intensity pattern arising from the illumination of the first region;
illuminating a second region of the target, offset from and overlapping with the first region, with a second beam of coherent
radiation using the projection system;

measuring a second diffraction intensity pattern arising from the illumination of the second region;
retrieving phase information from the measured first and second diffraction intensity patterns;
modeling the target using an estimated structure parameter to calculate a modeled diffraction intensity pattern;
modeling the target using the estimated structure parameter to calculate modeled phase information; and
determining the structure parameter of the target corresponding to the estimated structure parameter by comparing at least
one of the first and second measured diffraction intensity patterns and the retrieved phase to the calculated modeled diffraction
intensity pattern and the modeled phase information.

US Pat. No. 9,360,774

LITHOGRAPHIC APPARATUS WITH A DEFORMATION SENSOR

ASML Netherlands B.V., V...

1. A lithographic apparatus comprising:
a member susceptible to deformation; and
a deformation sensor comprising:
a birefringence sensing element subjected to stress dependent on the deformation of said member;
a light system, arranged to transmit polarized light having an initial polarization state through the birefringence sensing
element;

a detector, arranged to detect an altered polarization state of the polarized light after being transmitted through the birefringence
sensing element; and

a calculation unit to determine the deformation of said member based on the initial and the altered polarization states.

US Pat. No. 9,274,418

IMPRINT LITHOGRAPHY APPARATUS AND METHOD

ASML NETHERLANDS B.V., V...

1. A method of imprint lithography comprising using a first imprint template to imprint first features of a pattern into imprintable
medium on a substrate, then using a second imprint template to imprint other second features of the pattern into imprintable
medium on the substrate, such that the imprinted first and second features interconnect laterally and at most partially overlap,
wherein the features formed by the first imprint template or the second imprint template have a critical dimension which is
three or more times greater than a critical dimension of the features formed by the other of the first or second imprint template.

US Pat. No. 9,110,377

LITHOGRAPHIC APPARATUS, EUV RADIATION GENERATION APPARATUS AND DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. An EUV radiation generation apparatus comprising:
a laser configured to generate pulses of laser radiation; and
an optical isolation apparatus comprising a rotatably mounted reflector rotatable about an optical axis of the EUV radiation
generation apparatus or an axis substantially parallel to the optical axis between a first orientation and a second orientation,
and a radially positioned reflector separated radially from the rotatably mounted reflector relative to the optical axis,

the rotatably mounted reflector and the laser being synchronized such that when the rotatably mounted reflector is in the
first orientation, a reflective surface of the rotatably mounted reflector is in optical communication with the radially positioned
reflector when the optical isolation apparatus receives a pulse of laser radiation to allow the pulse of laser radiation to
pass to a plasma formation location and cause a radiation emitting plasma to be generated via vaporization of a droplet of
fuel material, and

the rotatably mounted reflector and the laser being further synchronized such that when the rotatably mounted reflector is
in the second orientation, the reflective surface of the rotatably mounted reflector is at least partially optically isolated
from the radially positioned reflector when the optical isolation apparatus receives radiation reflected from the plasma formation
location.

US Pat. No. 9,629,230

RF KICKER CAVITY TO INCREASE CONTROL IN COMMON TRANSPORT LINES

JEFFERSON SCIENCE ASSOCIA...

1. A method of controlling electron bunch types having various specific energies in an energy recovered linac (ERL) having
a common transport pipe with an upstream end and a downstream end, comprising:
providing a radio frequency (RF) kicker cavity at the upstream end of the common transport pipe;
providing RF energy to the kicker cavity;
selecting electron bunches at a first specific energy to be kicked in energy by the kicker cavity;
setting an operational RF frequency of the kicker cavity at a multiple of the frequency at which the selected electron bunches
pass through the common transport pipe; and

applying RF energy to the kicker cavity to provide a kick in the energy of the selected electron bunches to separate the selected
bunches in phase space from any bunches not at the specific energy of the selected electron bunches.

US Pat. No. 9,599,510

ESTIMATION OF SPECTRAL FEATURE OF PULSED LIGHT BEAM

Cymer, LLC, San Diego, C...

1. A method of estimating a spectral feature of a pulsed light beam produced by an optical source and directed toward a wafer
of a lithography apparatus, the method comprising:
receiving a set of N optical spectra of pulses of the light beam;
saving the received N optical spectra to a saved set;
transforming the optical spectra in the saved set to form a set of transformed optical spectra;
averaging at least two optical spectra of the set with each other to form an averaged spectrum; and
estimating a spectral feature of the pulsed light beam based on the averaged spectrum.

US Pat. No. 9,497,840

SYSTEM AND METHOD FOR CREATING AND UTILIZING DUAL LASER CURTAINS FROM A SINGLE LASER IN AN LPP EUV LIGHT SOURCE

ASML Netherlands B.V., V...

1. A system for timing the firing of a source laser in an extreme ultraviolet laser produced plasma (EUV LPP) light source
having a droplet generator which releases a droplet at an estimated speed, the source laser firing pulses at an irradiation
site, comprising:
a droplet illumination module comprising a single line laser configured to generate a first laser curtain and a second laser
curtain, the first and second laser curtains being of orthogonal polarizations and each located between the droplet generator
and the irradiation site;

a droplet detection module comprising a first sensor configured to detect a first curtain flash when the droplet passes through
the first laser curtain;

a first controller configured to:
determine, based upon the first curtain flash as detected by the first sensor, a known distance from the first curtain to
the irradiation site, and the estimated speed of the droplet, a time when the source laser should fire a pulse so as to irradiate
the droplet when the droplet reaches the irradiation site; and

generate a timing signal instructing the source laser to fire at the determined time;
a second sensor configured to detect a second curtain flash when the droplet passes through the second laser curtain; and
a second controller configured to determine, based upon the second curtain flash as detected by the second sensor, that the
droplet is not on a desired trajectory leading to the irradiation site and providing a signal indicating an adjustment to
a direction in which the droplet generator releases a subsequent droplet which will place the subsequent droplet on the desired
trajectory.

US Pat. No. 9,280,065

INSPECTION APPARATUS TO DETECT A TARGET LOCATED WITHIN A PATTERN FOR LITHOGRAPHY

ASML Netherlands B.V., V...

1. A method of measuring a target on a substrate, wherein the target is located within a surrounding pattern on the substrate,
the method comprising:
illuminating the target and the surrounding pattern with radiation;
detecting the radiation reflected by the target and the surrounding pattern and forming a first set of data based on the detected
radiation;

removing portions of the first set of data which correspond to the target to form reduced data;
interpolating the remaining portions of the reduced data over the removed portions to form product data; and
subtracting the product data from the first set of data to form target data.

US Pat. No. 9,279,657

LEVEL SENSOR ARRANGEMENT IN A LITHOGRAPHIC APPARATUS FOR MEASURING MULTI-LAYER SURFACES

ASML Netherlands B.V., V...

1. A method of measuring a position of at least one substantially reflective layer surface on a substrate in a lithographic
apparatus, the method comprising performing:
separating a broadband source beam of radiation into a reference beam and a measurement beam by respectively reflecting part
of the broadband source beam off a first partly transparent optical element and passing part of the broadband source beam
through the first partly transparent optical element;

reflecting the measurement beam off the substrate to obtain a first reflected measurement beam;
reflecting the measurement beam off of a surface of a second partly transparent optical element to obtain a second reflected
measurement beam;

passing the reference beam through the second partly transparent optical element and reflecting the reference beam off a reflective
surface to obtain a reflected reference beam;

combining the second reflected measurement beam and the reflected reference beam; and
detecting at least two different interference patterns of the combined beams,
wherein the different interference patterns are based on combined beams having at least one of different component wavelengths
and intensity levels over a subset of the component wavelengths.

US Pat. No. 9,213,247

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. A lithographic projection apparatus arranged to project, using a projection system, a pattern from a patterning device
onto a substrate, the apparatus comprising:
a movable table;
a liquid supply system configured to provide a liquid to a space between the projection system and a surface facing the projection
system; and

a sensor in or on the table, the sensor configured to be exposed to electromagnetic radiation, the sensor located or locatable
under the projection system and the sensor comprising a detector having a detection surface above which the liquid from the
liquid supply system is to be provided, and a liquid impermeable layer through which the electromagnetic radiation passes,
spaced apart from the detection surface, to be in contact with the liquid and to at least in part isolate the detection surface
from the liquid.

US Pat. No. 9,304,401

MEASUREMENT OF THE POSITION OF A RADIATION BEAM SPOT IN LITHOGRAPHY

ASML NETHERLANDS B.V., V...

1. A lithographic apparatus, comprising:
a programmable patterning device, configured to provide a plurality of radiation beams;
a projection system, configured to project the plurality of radiation beams onto a substrate to form respective spots of radiation;
and

a radiation spot measurement system, comprising:
a target, onto which the spots of radiation may be projected for a spot measurement process, the target comprising a plurality
of measurement targets;

a radiation detector, configured to detect radiation from one of the spots of radiation that has been projected onto the measurement
target;

an actuator system configured to control the position of the radiation detector relative to the plurality of measurement targets
such that, at different respective positions, it can detect radiation that has been projected onto a different measurement
target of the plurality of measurement targets; and

a controller, configured to receive information from the radiation detector and, based on the information, to determine at
least the position of the spot of radiation relative to an intended position of the spot of radiation on the target in a plane
substantially parallel to a surface of the target.

US Pat. No. 9,280,064

LITHOGRAPHIC METHOD AND APPARATUS

ASML NETHERLANDS B.V., V...

1. A method of projecting a pattern from a patterning device onto a substrate using a projection system, the method comprising
using an optical phase adjustment apparatus in the projection system to apply a phase modification to radiation which has
been diffracted from an assist feature of the pattern, the phase modification acting to reduce the size of an assist feature
image exposed in resist on the substrate or prevent printing of the assist feature image in the resist on the substrate, while
maintaining a contribution of the assist feature image to an image enhancement of a functional feature of the pattern.

US Pat. No. 9,293,951

LITHOGRAPHIC APPARATUS AND LORENTZ ACTUATOR

ASML NETHERLANDS B.V., V...

1. A lithographic apparatus comprising:
an actuator configured to produce a force in a first direction between a first and a second part of the lithographic apparatus,
the actuator comprising

a first magnet assembly and a second magnet assembly each attached opposite to each other to the first part of the lithographic
apparatus, the first magnet assembly comprising a first main magnet system and a first outer subsidiary magnet system, and
the second magnet assembly comprising a second main magnet system and a second outer subsidiary magnet system, the first and
second main magnet system defining a space between them in a second direction substantially perpendicular to the first direction,
wherein the first and second magnet assembly are arranged in Halbach configuration to provide a magnetic field of which at
least a part is directed in the second direction,

an electrically conductive element attached to the second part of the lithographic apparatus and arranged at least partially
in the space between the first and second main magnet system, so as to produce the force by interaction of an electric current
carried by the electrically conductive element and the magnetic field,

wherein the distance between the first outer subsidiary magnet system and the second outer subsidiary magnet system in the
second direction is substantially zero.

US Pat. No. 9,280,063

SUBSTRATE TABLE ASSEMBLY, AN IMMERSION LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. A substrate table assembly for an immersion lithography apparatus, the substrate table assembly comprising:
a substrate table to support a substrate; and
a gas handling system to provide a gas to a region between the substrate table and a substrate mounted on the substrate table,
wherein the gas provided by the gas handling system has a thermal conductivity greater than or equal to 100 mW/(m·K) at 298
K,

wherein the substrate table comprises a supply port to supply the gas from the gas handling system to the region between the
substrate and the substrate table, and an extraction port to extract fluid from the region, the extraction port comprising
a peripheral extraction port configured to provide a laterally inward flow of ambient gas, immersion fluid, or both, from
a region adjacent to the periphery of the substrate and configured to extract at least some of the gas at a same time as providing
the inward flow, wherein the substrate table is configured to provide an open flowpath underneath the substrate when provided
on the substrate table, that connects the supply port and the peripheral extraction port and configured to allow the gas from
the supply port to cover a majority of the bottom surface of the substrate when provided on the substrate table.

US Pat. No. 9,268,241

RAPID EXCHANGE DEVICE FOR LITHOGRAPHY RETICLES

ASML Holding N.V., Veldh...

1. A system comprising:
a rotary support device having an axis of rotation;
a first baseplate support connected to the rotary support device and configured to support a first baseplate, the first baseplate
being configured to hold a first reticle; and

a second baseplate support connected to the rotary support device and configured to support a second baseplate, the second
baseplate being configured to hold a second reticle,

a reticle loading and unloading position configured to transfer the first reticle between a reticle storage device and the
first baseplate and to transfer the second reticle between the reticle storage device and the second baseplate; and

a reticle stage loading position configured to transfer the first reticle between the first baseplate and a reticle stage
and to transfer the second reticle between the second baseplate and the reticle stage, the reticle stage loading position
being positioned at an angle of substantially 180 degrees about the axis of rotation from the reticle loading and unloading
position;

wherein the system is configured to rotate the first baseplate and the second baseplate to the reticle loading and unloading
position and to the reticle stage loading position,

wherein the first and second baseplate supports are configured to position the first baseplate and the second baseplate at
substantially equal and fixed distances from the axis of rotation, and the first and second baseplate supports are fixed relative
to each other such that the first and second baseplate supports rotate in unison,

wherein the first baseplate support is positioned at an angle less than substantially 180 degrees about the axis of rotation
from the second baseplate support such that while the first baseplate support is at the reticle loading and unloading position
the second baseplate support is at a position between the reticle loading and unloading position and the reticle stage loading
position,

wherein the system is configured such that, while either the first baseplate support or the second baseplate support is at
the reticle loading and unloading position, the reticle stage loading position is unoccupied by any baseplate support connected
to the rotary support device and configured to support a baseplate of the system, and

wherein the system is configured to transfer the first reticle between the reticle storage device and the first baseplate
when the second baseplate support is at the position between the reticle loading and unloading position and the reticle stage
loading position.

US Pat. No. 9,261,796

LITHOGRAPHIC APPARATUS AND SURFACE CLEANING METHOD

ASML NETHERLANDS B.V., V...

1. A fluid handling system for an immersion lithographic apparatus configured to project a patterned beam through immersion
liquid onto a target portion of a substrate, the immersion liquid confined within a space between a projection system and
a movable table of the immersion lithographic apparatus, the fluid handling system comprising:
a fluid handling structure, comprising:
a surface extending along a boundary of the space,
a flow plate configured to extend into the space between the projection system and the movable table,
a supply opening configured to supply immersion liquid to the space above the flow plate,
a recovery opening configured to recover immersion liquid from below the flow plate, the recovery opening comprising a porous
member through which immersion liquid is recovered, and

a cleaning fluid opening separate from the supply opening, the cleaning fluid opening configured to supply cleaning fluid
of different composition than the immersion liquid to the recovery opening such that the recovery opening supplies the cleaning
fluid to the space during a cleaning operation; and

a fluid opening outward, relative to the path of the patterned beam through the space, of any porous member on a bottom surface
of the fluid handling structure, the fluid opening configured to recover fluid at least during the cleaning operation.

US Pat. No. 9,229,339

POSITIONING SYSTEM, A LITHOGRAPHIC APPARATUS AND A METHOD FOR POSITIONAL CONTROL

ASML NETHERLANDS B.V., V...

1. A positioning system for controlling a relative position between a first component and a second component of a lithographic
apparatus, wherein a position of each component is defined by a set of orthogonal coordinates, the positioning system comprising:
a measuring device configured to determine an error in the momentary position of one of the components with respect to a setpoint
position in a measurement coordinate; and

a controller configured to control movement of the other component in a control coordinate based on the determined error;
wherein the measurement coordinate is different from the control coordinate, and
wherein the measurement coordinate is associated with a first direction or a first rotational direction and the control coordinate
is associated with a second direction or a second rotational direction that is different from the first direction or the first
rotational direction.

US Pat. No. 9,213,246

FLUID EXTRACTION SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. A fluid extraction system to extract a two-phase fluid in a lithographic apparatus, the fluid extraction system comprising:
an extraction channel for two-phase fluid flow therethrough; and
a separation tank fluidly connected to the extraction channel, and configured to receive the two-phase fluid flow from the
extraction channel,

wherein at least a portion of a wall of the extraction channel and/or at least a portion of a wall of the separation tank
comprises a flexible boundary portion configured to deform in response to a change in the pressure differential across it
so as to reduce a fluctuation in pressure of the two-phase fluid in the fluid extraction system and wherein a side of the
flexible boundary portion facing away from the two-phase fluid is at about atmosphere or lower.

US Pat. No. 9,655,222

RADIATION SOURCE

ASML Netherlands B.V., V...

1. A radiation source comprising:
a reservoir configured to retain a volume of a fuel;
a nozzle, in fluid connection with the reservoir, configured to direct a stream of the fuel along a trajectory towards a plasma
formation location; and

a contamination filter assembly, located in a fuel flow path between the reservoir and the nozzle, configured to:
be expanded to a first volume at a first temperature, and
be reduced to a second volume at a second temperature, the first and second volumes being different from each other, and the
first and second temperatures being different from each other,

wherein the contamination filter assembly comprises a filter medium configured to:
be held in place within the contamination filter assembly by a force provided by an inlet or an outlet of the contamination
filter assembly that at least partially surrounds the filter medium in response to the contamination filter assembly being
reduced to the second volume; and

be removed from the contamination filter assembly in response to the contamination filter assembly being expanded to the first
volume.

US Pat. No. 9,285,686

LITHOGRAPHIC APPARATUS INVOLVING AN IMMERSION LIQUID SUPPLY SYSTEM WITH AN APERTURE

ASML NETHERLANDS B.V., V...

1. A lithographic projection apparatus, comprising:
a movable table;
a projection system arranged to project a beam of onto a substrate, the projection system comprising an optical element nearest
the table;

a liquid supply system configured to provide a liquid to a space between the table and the optical element and to provide
the liquid so as to contact a surface, nearest the table, of the optical element, the liquid supply system comprising:

a liquid confinement structure extending along at least a part of a boundary of the space between the table and the optical
element surface, at least part of the liquid confinement structure positioned between the optical element surface and the
table and having an open aperture, the aperture having a cross-sectional width smaller than that of the substrate and the
table being movable with respect to the at least part of the liquid confinement structure,

an inlet to supply the liquid to the space above the aperture, the aperture allowing the beam of radiation and liquid from
the inlet to pass to the substrate, and

an outlet in or on the liquid confinement structure, the outlet configured to remove liquid, supplied by the inlet, from the
space;

a degasser unit configured to separate gas from the liquid; and
a filter configured to remove particles from the liquid.

US Pat. No. 9,354,529

ARRANGEMENT FOR USE IN A PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY HAVING A REFLECTIVE OPTICAL ELEMENT

Carl Zeiss SMT GmbH, Obe...

1. An arrangement for use in a projection exposure tool for microlithography, the arrangement comprising:
a reflective optical element including a carrier for imparting mechanical strength to said optical element;
said reflective optical element further including a reflective coating disposed on said carrier for reflecting use radiation
having a first wavelength;

more than 50% by volume of said carrier comprising a material which, upon interaction with said use radiation, emits a secondary
radiation having a second wavelength different from said first wavelength; and,

a radiation detector configured to detect said secondary radiation.

US Pat. No. 9,383,655

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. A lithographic apparatus comprising:
a movable table;
a projection system configured to project a radiation beam onto a radiation-sensitive target portion of a substrate;
an adjustable element arranged in the projection system;
a liquid supply system configured to at least partly fill a space between (i) the projection system and (ii) the substrate
or movable table, with a liquid, the liquid supply system comprising an outlet to direct a flow of the liquid into the space
or a localized area of an object;

a temperature sensor configured to measure temperature information of the liquid-exposed substrate or of the movable table;
and

a projection system control system configured to adjust, based on the temperature information or a parameter derived from
the temperature information, an optical property of the projection system using the adjustable element.

US Pat. No. 9,291,914

FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary thereof, from
a space configured to contain immersion fluid toward a region external to the fluid handling structure:
a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space;
a fluid supply opening outward, relative to the space, of the meniscus pinning feature, the fluid supply opening configured
to supply a soluble fluid soluble in the immersion fluid which soluble fluid on dissolution into the immersion fluid lowers
the surface tension of the immersion fluid;

a gas recovery opening outward, relative to the space, of the meniscus pinning feature; and
a gas supply opening outward, relative to the space, of the gas recovery opening and the fluid supply opening.

US Pat. No. 9,298,104

SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. A substrate holder for use in a lithographic apparatus, the substrate holder comprising:
a main body having a surface;
a plurality of burls projecting from the surface and having end surfaces to support a substrate; and
a heater and/or a temperature sensor, on the surface of the main body,
wherein an open gap is located between the heater and/or temperature sensor and the surface of the main body.

US Pat. No. 9,383,659

POSITIONING SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. A positioning system for positioning an object in a lithographic apparatus, the positioning system comprising:
a support constructed to hold the object;
a position measurement device configured to measure a position of the support, the position measurement device comprising
at least one position sensor target and a plurality of position sensors to cooperate with the at least one position sensor
target to provide a redundant set of position signals representing the position of the support;

a deformation sensor arranged to provide a deformation signal representing a deformation of one of the support and the position
measurement device, and

a processor configured to calibrate one of the position measurement device and the deformation sensor based on the deformation
signal and the redundant set of position signals.

US Pat. No. 9,304,404

ARRANGEMENT FOR ACTUATING AN ELEMENT IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

Carl Zeiss SMT GmbH, Obe...

1. An arrangement for actuating an element in a microlithographic projection exposure apparatus, the arrangement comprising:
first and second actuators;
first and second mechanical couplings;
said first and second actuators being coupled to said element via corresponding ones of said first and second mechanical couplings
for applying respective forces to said element regulatable in at least one degree of freedom;

said first and second actuators having first and second actuator masses, respectively;
said first actuator mass and said first mechanical coupling conjointly defining a first mass-spring system operating as a
first low-pass filter;

said second actuator mass and said second mechanical coupling conjointly defining a second mass-spring system operating as
a second low-pass filter; and,

said first and second mass-spring systems having first and second natural frequencies deviating from each other by a maximum
deviation equal to 10% of the largest of said first and second natural frequencies.

US Pat. No. 9,134,632

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

ASML Netherlands B.V., V...

1. A lithography apparatus comprising:
a projection system configured to project a patterned radiation beam onto a target portion of a substrate, the projection
system comprising a first element and a second element;

a first vibration isolation system comprising a resilient portion, wherein the resilient portion comprises a first resilient
member, a first internal mass, and a second resilient member, arranged respectively to act in series;

a second vibration isolation system;
a first projection system frame configured to support a first portion of the projection system, wherein the first element
is connected to the first portion of the projection system;

a second projection system frame configured to support a second portion of the projection system, wherein the second element
is connected to the second portion of the projection system; and

an isolation system configured to support the first and second projection system frames,
wherein the first vibration isolation system is configured to inhibit propagation of vibrations between the first projection
system frame and the isolation system, and

wherein the second vibration isolation system is configured to inhibit propagation of vibrations between the second projection
system frame and the isolation system.

US Pat. No. 9,285,676

SELF-ASSEMBLABLE POLYMER AND METHOD FOR USE IN LITHOGRAPHY

ASML NETHERLANDS B.V., V...

1. A block copolymer comprising a first block of first monomer and a second block of second monomer, the copolymer adapted
to undergo a transition from a disordered state to an ordered state at a temperature less than TOD, the copolymer further comprising a bridging moiety comprising a functional group arranged to provide hydrogen bonding between
bridging moieties of adjacent first and second block copolymer molecules when in the ordered state and at a temperature in
excess of a glass transition temperature Tg for the copolymer.

US Pat. No. 9,278,466

IMPRINT LITHOGRAPHY METHOD AND APPARATUS

ASML NETHERLANDS B.V., V...

1. An imprint lithography apparatus, comprising:
an imprintable medium dispenser;
a control system, the control system configured to control the imprintable medium dispenser in order to:
provide a first amount of imprintable medium for nanoimprint lithography on a first area of a substrate onto which a pattern
is to be imprinted, the first amount of imprintable medium, when fixed, having a first etch rate as a physical characteristic
thereof, and

provide a second amount of imprintable medium for nanoimprint lithography on a second area of the substrate different from
the first area of the substrate, the second amount of imprintable medium, when fixed, having a second etch rate as a physical
characteristic thereof, wherein the second etch rate is different from the first etch rate; and

the control system configured to control imprinting at least part of an imprint template into both the first amount of imprintable
medium and the second amount of imprintable medium when both the first and second amounts are on the substrate substantially
at a same time.

US Pat. No. 9,316,929

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFLUENCE OF TEMPERATURE VARIATION

Carl Zeiss SMT GmbH, Obe...

1. A projection lens of an EUV-lithographic projection exposure system including a reticle and an illumination system for
illuminating the reticle, the projection lens comprising:
at least first and second reflective optical elements (Mm, Mn);

said reflective optical elements (Mm, Mn) having respective bodies (MBm, MBn) defining respective reflective surfaces (MSm, MSn) for projecting an object field on said reticle onto an image field on a substrate when said projection lens is exposed with
the exposure power of the EUV light reflected from said reticle when illuminated by said illumination system;

said bodies (MBm, MBn) including a material having a temperature dependent coefficient of thermal expansion which is zero at respective zero cross
temperatures (T0m, T0n);

said zero cross temperatures (T0m, T0n) having a difference between each other of which the absolute value is greater than 6K, expressed as abs(T0m?T0n)>6K; and,

said projection lens being configured to be exposed with an exposure power of more than 8 W of EUV light at a wavelength lying
in a wavelength range of less than 50 nm.

US Pat. No. 9,261,797

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD INVOLVING A LIQUID CONFINEMENT STRUCTURE

ASML NETHERLANDS B.V., V...

1. A lithographic projection apparatus arranged to project a beam of radiation onto a substrate through a liquid, the apparatus
comprising:
a movable table;
a liquid confinement structure configured to at least partly confine the liquid to a space adjacent the table such that the
liquid extends between a lower surface of the liquid confinement structure and the table; and

an outlet configured to remove liquid from between the lower surface of the liquid confinement structure and the table, the
outlet arranged in a substantially polygonal shape in the horizontal, wherein the shape extends around a path of the radiation
beam through the liquid and corners of the polygonal shape are arranged such that a distance between a first pair of non-adjacent
corners of the polygonal shape is larger than a distance between a second pair of non-adjacent corners of the polygonal shape,

wherein the lower surface has an aperture, the aperture substantially conforming in shape to an image field of the beam of
radiation and configured to allow the beam of radiation to pass therethough to the substrate, the outlet being outward, relative
to the path of the beam, of the aperture.

US Pat. No. 9,111,062

FAST FREEFORM SOURCE AND MASK CO-OPTIMIZATION METHOD

ASML NETHERLANDS B.V., V...

1. A computer-implemented method for optimizing a lithographic process in a simulation domain, the simulated lithographic
process having data representing an illumination source and a mask, the method comprising:
performing, by the computer, a free-form optimization process;
placing, by the computer, sub-resolution assist feature (SRAF) seeds in a description of the mask based on a result of the
free-form optimization process; and

performing, by the computer, a constrained optimization process, including growing the SRAF seeds while taking into account
manufacturability constraints for both the illumination source and the mask.

US Pat. No. 9,357,625

EXTREME ULTRAVIOLET LIGHT SOURCE

ASML Netherlands B.V., V...

1. A method comprising:
generating an initial pulse of radiation comprising a first profile over a first time period, the first profile representing
an energy of the initial pulse of radiation over the first time period;

extracting a section of the initial pulse of radiation, the extracted section of the initial pulse of radiation comprising
a second profile over a second time period, the second profile representing an energy of the extracted section over the second
time period, the second time period being within the first time period, the first profile being substantially the same as
the second profile over the second time period and different from the second profile otherwise;

forming a modified pulse of radiation based on the extracted section of the initial pulse of radiation, the modified pulse
of radiation comprising a first portion and a second portion, the first portion being temporally connected to the second portion,
and the first portion having a maximum energy that is less than a maximum energy of the second portion;

interacting the first portion of the modified pulse of radiation with a target material to form a modified target; and
interacting the second portion of the modified pulse of radiation with the modified target to generate plasma that emits extreme
ultraviolet (EUV) light.

US Pat. No. 9,298,107

LITHOGRAPHIC APPARATUS AND METHOD

ASML NETHERLANDS B.V., V...

21. A lithographic apparatus comprising:
a substrate table having a substrate supporting area, the substrate table comprising:
a grating near a periphery of the table, the grating supported on a protrusion located on the top of the substrate table,
a releasable plate, separate from the grating, on a top surface of the substrate table, the plate located between the substrate
supporting area and the grating and supported on a protrusion located on the top of the substrate table,

an outlet configured to apply a low pressure between the grating and a portion of the substrate table,
an outlet configured to apply a low pressure between the releasable plate and a portion of the substrate table, and
an extractor configured to drain liquid from a gap between the plate and the grating; and
a sensor configured to detect radiation diffracted and/or reflected by the grating so as to measure a relative position between
the table and the sensor.

US Pat. No. 9,986,628

METHOD AND APPARATUS FOR GENERATING RADIATION

ASML Netherlands B.V., V...

5. A radiation source, comprising:a fuel target generator arranged to provide a fuel target at a target location; and
an excitation beam source arranged to split a received seed beam into a plurality of excitation beams and to direct the plurality of excitation beams at the target location to form a first merged excitation beam at the target location, such that, in use, fuel within the fuel target is excited by the first merged excitation beam to generate a radiation generating plasma,
wherein the excitation beam source comprises at least one phase adjuster for adjusting a phase of at least one of the plurality of excitation beams with respect to at least one other of the plurality of excitation beams, and wherein each of the plurality of excitation beams has a same wavelength.

US Pat. No. 9,820,368

TARGET EXPANSION RATE CONTROL IN AN EXTREME ULTRAVIOLET LIGHT SOURCE

ASML Netherlands B.V., V...

1. A method comprising:
providing a target material that comprises a component that emits extreme ultraviolet (EUV) light when converted to plasma;
directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric
distribution of the target material to form a modified target;

directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of
the modified target to plasma that emits EUV light;

measuring one or more characteristics associated with one or more of the target material and the modified target relative
to the first beam of radiation;

analyzing the measured one or more characteristics associated with one or more of the target material and the modified target
relative to the first beam of radiation; and

controlling an amount of radiant exposure delivered to the target material from the first beam of radiation based on the analysis
of the one or more measured characteristics to within a predetermined range of radiant exposures.

US Pat. No. 9,913,357

RADIATION SOURCE, METROLOGY APPARATUS, LITHOGRAPHIC SYSTEM AND DEVICE MANUFACTURING METHOD

ASML Netherlands B.V., V...

1. A radiation source apparatus comprising:
a container comprising a first wall portion and a second wall portion that define a space configured to contain a gaseous
medium in which radiation emitting plasma is generated following excitation of the gaseous medium by a driving radiation;
and

a thermal load applicator configured to apply a thermal load to the first wall portion to reduce a thermal gradient between
the first wall portion and the second wall portion, thereby reducing stresses in the first and second wall portions.

US Pat. No. 9,235,141

INSPECTION APPARATUS AND METHOD FOR MEASURING A PROPERTY OF A SUBSTRATE

ASML Netherlands B.V., V...

8. The inspection apparatus according to claim 1, wherein the cross-shaped illuminated area comprises:
a first illuminated area; and
a second illuminated area perpendicular to the first illuminated area.

US Pat. No. 9,301,382

APPARATUS FOR AND METHOD OF SOURCE MATERIAL DELIVERY IN A LASER PRODUCED PLASMA EUV LIGHT SOURCE

ASML NETHERLANDS B.V., V...

1. A device comprising:
a chamber;
an EUV source material delivery system having a source material release point and adapted to deliver a stream of source material
to a plasma bubble in an irradiation region within the chamber along a path between the source material release point and
the irradiation region, the source material delivery system including a solid shroud extending from the source material release
point and parallel to the path to a solid shroud end to protect at least a portion of the stream; and

a gap defined between the solid shroud end and the plasma bubble, the gap being maintained at a predetermined width by gas
from a first gas delivery system adapted to cause the gas to flow in the chamber along at least a portion of the path between
the solid shroud end and the irradiation region.

US Pat. No. 9,304,077

INSPECTION APPARATUS AND METHOD

ASML Netherlands B.V., V...

1. An inspection apparatus for inspecting a substrate, comprising:
an illumination system configured to provide a beam of electromagnetic radiation by illuminating a first area in an illumination
pupil plane of an objective,

the objective being configured to illuminate the substrate with the beam of electromagnetic radiation; and
a detector configured to measure an angle resolved spectrum arising from the illumination of the substrate, in a measurement
area of a measurement pupil plane of the objective excluding an area corresponding to the first area.

US Pat. No. 9,291,916

METHOD OF APPLYING A PATTERN TO A SUBSTRATE, DEVICE MANUFACTURING METHOD AND LITHOGRAPHIC APPARATUS FOR USE IN SUCH METHODS

ASML Netherlands B.V., V...

1. A method of transferring a pattern from a patterning device onto a substrate, the method comprising:
loading a substrate on a substrate support within a lithographic apparatus;
measuring locations of a first set of alignment marks on the substrate;
generating a first correction information based on the locations of the first set of alignment marks measured after loading
the substrate on the substrate support;

retrieving from a data storage device a second correction information based on locations of a second set of alignment marks
that is measured prior to loading the substrate on the substrate support;

positioning the pattern at a desired location on the substrate based on the first and second correction information; and
operating the lithographic apparatus to apply the pattern at the desired location on the substrate.

US Pat. No. 9,223,227

INSPECTION APPARATUS AND METHOD, LITHOGRAPHIC APPARATUS, LITHOGRAPHIC PROCESSING CELL AND DEVICE MANUFACTURING METHOD

ASML Netherlands B.V., V...

1. An inspection apparatus for determining, asymmetry properties of a target on a substrate, the target being periodic in
a plane of the substrate, the inspection apparatus comprising:
an illumination system configured to provide a plurality of wavelengths of radiation;
an optical system comprising an objective and configured to illuminate the target via the objective with the radiation from
a first direction and a second direction reflected with respect to the plane of the substrate;

an optical device configured to separately redirect diffraction orders of radiation scattered from the substrate;
one or more detectors configured to measure properties of the separately redirected diffraction orders at the plurality of
wavelengths; and

a processor configured determine the asymmetry properties of the target using the properties measured at the plurality of
wavelengths.

US Pat. No. 9,591,734

REDUCTION OF PERIODIC OSCILLATIONS IN A SOURCE PLASMA CHAMBER

ASML Netherlands B.V., V...

1. A laser-produced plasma (LPP) extreme ultraviolet (EUV) system comprising:
a laser source configured to fire laser pulses at a primary focus point within an LPP EUV source plasma chamber of the LPP
EUV system, during a first burst when the LPP EUV system is operating;

a droplet generator configured to generate and convey droplets towards the primary focus point within the LPP EUV source plasma
chamber; and

a system controller comprising:
a data module configured to obtain data about the first burst of the LPP EUV system, the data comprising a first control signal
vector and a first error vector, wherein the first error vector is a difference between a first desired output vector and
a first actual output vector due at least in part to a periodic disturbance or presence of periodic system orbits in the LPP
EUV system,

an iterative learning controller (ILC) configured to generate a second control signal vector based on the first control signal
vector and the first error vector, and

a communication module configured to communicate the second control signal vector to the laser source or the droplet generator
for a second burst.

US Pat. No. 9,924,585

RADIATION SOURCE, METROLOGY APPARATUS, LITHOGRAPHIC SYSTEM AND DEVICE MANUFACTURING METHOD

ASML Netherlands B.V., V...

1. A radiation source apparatus comprising:
a container arranged to be pressurized with a gaseous medium in which plasma which emits plasma emitted radiation is generated
following excitation of the gaseous medium by a driving radiation,

wherein said container is configured to remove all radiation with a wavelength of 10-400 nm from said plasma emitted radiation
before said plasma emitted radiation exits said container as output radiation.

US Pat. No. 9,888,554

SYSTEM, METHOD AND APPARATUS FOR TARGET MATERIAL DEBRIS CLEANING OF EUV VESSEL AND EUV COLLECTOR

ASML Netherlands B.V., V...

1. An EUV light source comprising:
an EUV vessel including an EUV vessel purge gas inlet coupled to a purge gas source capable of dispensing a quantity of purge
gas into the EUV vessel;

an EUV collector disposed in the EUV vessel, the EUV collector including a reflective surface;
a target material source capable of dispensing a quantity of target material into the EUV vessel, a first portion of the quantity
of target material being disposed on at least a portion of the reflective surface of the EUV collector as a first target material
debris deposit;

a first hydrogen radical source disposed within the EUV vessel, the first hydrogen radical source including a capacitively
coupled hydrogen plasma chamber, the capacitively coupled hydrogen plasma chamber including:

a first hydrogen radical source outlet disposed proximate to the reflective surface of the EUV collector;
a first hydrogen source inlet coupled to a hydrogen source;
a first hydrogen source electrode coupled to a first signal source; and
a second hydrogen source electrode coupled to a second signal source, the first hydrogen radical source being capable of producing
a first quantity of hydrogen radicals and dispensing the first quantity of hydrogen radicals from the first hydrogen radical
source outlet, the first quantity of hydrogen radicals capable of combining with the first target material debris deposit
to form a first quantity of a volatile compound containing at least a portion of the first target material debris deposit;
and

an EUV vessel purge outlet capable of passing the first quantity of the volatile compound out of the EUV vessel.

US Pat. No. 9,329,502

LITHOGRAPHIC APPARATUSES AND METHODS FOR COMPENSATING FOR EIGENMODE COUPLING

ASML Holding N.V., Veldh...

1. A lithographic apparatus comprising:
a component; and
a positioning system operatively coupled to the component and comprising:
a first positioning module configured to generate a first force to move the component along a first axis;
a sensor configured to measure a position of the component along a second axis;
a second positioning module configured to generate a second force to move the component along the second axis based on a measured
position of the component along the second axis; and

a modeling unit configured to predict, based on the first force, an effect of eigenmode coupling between movement of the component
along the first axis and the measured position of the component along the second axis, wherein an input of the modeling unit
is a control force signal from the first positioning module,

wherein the second positioning module is configured to adjust a magnitude and direction of the second force based on a predicted
effect of eigenmode coupling on the measured position of the component along the second axis to compensate for the effect
of eigenmode coupling between the movement of the component along the first axis and the measured position of the component
along the second axis, and

wherein the eigenmode coupling between the movement of the component along the first axis and the measured position of the
component along the second axis is dynamically decoupled.

US Pat. No. 9,134,630

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. A lithographic apparatus comprising:
an optical column capable of projecting a beam on a target portion of a substrate, the optical column having:
a self emissive contrast device configured to emit the beam, and
a projection system configured to project the beam onto the target portion,
the projection system comprising an optical element;
an actuator to move at least part of the optical column including the optical element with respect to the substrate;
a surface facing a radiation receiving or transmitting surface of the optical element and with respect to which the radiation
receiving or transmitting surface of the optical element is movable, the surface being within about 2 cm from the radiation
receiving or transmitting surface of the optical element; and

a control system configured to cause the self emissive contrast device to modulate emission of the beam during projection
and to cause the actuator to move the optical element during projection with respect to the surface.

US Pat. No. 9,081,309

DETECTOR MODULE, COOLING ARRANGEMENT AND LITHOGRAPHIC APPARATUS COMPRISING A DETECTOR MODULE

ASML Netherlands B.V., V...

1. A detector module comprising:
a first body comprising a first bottom part and a first side part extending from the first bottom part to a second body;
the second body comprising a second bottom part and a second side part extending from the second bottom part to the first
body, the first side part being thermally coupled with the second side part,

wherein the thermally coupled first and second side parts define sides of a housing and the first and second bottom parts
define respective ends of the housing, the housing having inner and outer surfaces;

a detector configured to sense photon radiation;
a wall structure extending from an inner surface of the first bottom part toward the second bottom part, having inner and
outer surfaces, and defining a space within the inner surface; and

an electronic circuit coupled to the detector and located within the housing between the outer surface of the wall structure
and the inner surface of the housing.

US Pat. No. 9,330,912

LITHOGRAPHIC APPARATUS, FLUID COMBINING UNIT AND DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. A lithographic apparatus comprising:
a projection system configured to project a patterned radiation beam onto a target portion of a substrate;
a movable table, located below the projection system, comprising a sensor having a detector in or on the movable table;
a first liquid supply system configured to provide a first liquid with a first refractive index;
a second liquid supply system configured to provide a second liquid with a second refractive index which is lower than the
first refractive index;

a combining unit configured to combine the first and second liquids to achieve a combined liquid with a refractive index closer
to a desired refractive index than the first refractive index or the second refractive index;

a refractive index measuring unit, separate from the sensor, to measure refractive index of (i) the first liquid, or (ii)
the second liquid, or (iii) the combined liquid, or (iv) any combination selected from (i)-(iii); and

a fluid recycling system configured to separate the first and second liquids from the combined liquid after use and to return
first liquid to the first liquid supply system,

wherein the combining unit is configured to combine the first and second liquids based on a measurement by the sensor of the
movable table and a measurement by the refractive index measuring unit.

US Pat. No. 9,229,338

SUBSTRATE, A METHOD OF MEASURING A PROPERTY, AN INSPECTION APPARATUS AND A LITHOGRAPHIC APPARATUS

ASML Netherlands B.V., V...

1. A substrate comprising:
a first set of superimposed gratings and a second set of superimposed gratings, said second set of superimposed gratings in
turn being superimposed over said first set of superimposed gratings, said first set of superimposed gratings having a periodicity
in a first direction and said second set of superimposed gratings having a periodicity in a second direction,

wherein said first and second directions are at an angle of between 30° and 60° to each other such that within an image of
respective diffraction patterns produced by radiation reflected by each of the first set of superimposed gratings and the
second set of superimposed gratings, the diffraction patterns of at least one order corresponding to each of the first and
second sets of superimposed gratings are spatially distinguishable from each other within said image.

US Pat. No. 9,207,548

RADIATION SOURCE WITH A DEBRIS MITIGATION SYSTEM, LITHOGRAPHIC APPARATUS WITH A DEBRIS MITIGATION SYSTEM, METHOD FOR PREVENTING DEBRIS FROM DEPOSITING ON COLLECTOR MIRROR, AND DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. A lithographic apparatus comprising:
a radiation source configured to produce extreme ultraviolet radiation, the radiation source including
a chamber in which a plasma is generated;
a collector mirror having a surface configured to reflect radiation emitted by the plasma towards a focal point; and
a debris mitigation system including
a gas supply system configured to supply a first gas flow toward the plasma in a direction substantially perpendicular to
a direction of propagation of the radiation reflected by the collector mirror towards the focal point to form a gas curtain
around the plasma, the first gas flow being selected to thermalize debris generated by the plasma, and

a plurality of gas manifolds arranged at a location between the plasma and the surface of the collector mirror and proximate
the surface of the collector mirror and extending substantially along a length of the collector mirror, each gas manifold
having a diameter and a plurality of gas outlets configured to supply a second gas flow in the chamber, the second gas flow
being directed toward the plasma to prevent thermalized debris from depositing on the collector mirror.

US Pat. No. 9,195,147

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD INVOLVING A SEAL BETWEEN A TABLE AND A COMPONENT

ASML NETHERLANDS B.V., V...

1. A lithographic apparatus comprising:
a table;
a component moveable relative to the table;
a first seal to bridge a gap between the component and the table when the component is in a position relative to the table;
a second seal positioned to bridge the gap, the second seal located above the first seal and in contact with or integral to
a top surface of the table and/or the component; and

an opening of the table configured to exhaust fluid from a space between the first and second seals when the first and second
seals bridge the gap.

US Pat. No. 9,082,521

EUV MULTILAYER MIRROR WITH INTERLAYER AND LITHOGRAPHIC APPARATUS USING THE MIRROR

ASML NETHERLANDS B.V., V...

1. A multilayer mirror constructed and arranged to reflect radiation having a wavelength in a range of about 6.4 nm-about
7.2 nm, the multilayer mirror having alternating layers, the alternating layers comprising a first layer and a second layer,
the first and second layers being selected from the group consisting of: U and B4C layers, Th and B4C layers, U and B9C layers, Th and B9C layers, U and B layers, Th and B layers, U compound and B4C layers, Th compound and B4C layers, U compound and B9C layers, Th compound and B9C layers, U compound and B layers, and Th compound and B layers, wherein at least one of the first layers is separated from
a second layer by an interlayer disposed between the at least one of the first layers and the second layer.

US Pat. No. 9,052,605

ILLUMINATION SYSTEM FOR LITHOGRAPHIC APPARATUS WITH CONTROL SYSTEM TO EFFECT AN ADJUSTMENT OF AN IMAGING PARAMETER

ASML NETHERLANDS B.V., V...

1. An illumination system for a lithographic apparatus arranged to project a pattern from a patterning device onto a substrate,
the illumination system configured to condition a radiation beam and direct the radiation beam onto the patterning device,
the illumination system comprising:
a first reflective component and a second reflective component, the first reflective component being arranged to direct radiation
of the radiation beam onto the second reflective component, the first reflective component comprising a plurality of movable
reflective elements, each movable reflective element being moveable between at least a first position and a second position
so as to change an illumination mode, and the second reflective component being associated with a pupil plane of the patterning
device; and

a control system arranged to set the plurality of moveable reflective elements to respective desired positions in order to
effect a desired illumination mode selected from a set of predetermined illumination modes and further arranged to set at
least one of the moveable reflective elements to a corrective position, different than its desired position, to effect a correction
of a proximity effect in the pattern.

US Pat. No. 9,366,972

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. A lithographic apparatus comprising:
a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation
according to a desired pattern;

a projection system configured to project the patterned beam onto a target portion of a substrate;
a substrate table configured to hold the substrate;
an edge seal member configured to at least partly surround an edge of at least one of said substrate and an object positioned
on said substrate table, and

a liquid supply system configured to provide a liquid in a space between a final element of said projection system and said
at least one of said substrate and said object,

wherein said substrate table comprises a hydrophobic layer adjacent an edge portion of said edge seal member and adjacent
said at least one of said substrate and said object, said hydrophobic layer arranged to face an opposite side of said edge
seal member to said projection system and to face an opposite side of said at least one of said substrate and said object
to said projection system.

US Pat. No. 9,207,547

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. A lithographic apparatus comprising:
a substrate table constructed to hold a substrate;
a projection system configured to project a patterned radiation beam onto a target portion of the substrate, and
a measurement system comprising
a measurement radiation system configured to provide a measurement beam of radiation;
at least two reflectors configured to reflect a portion of the measurement beam of radiation between the reflectors;
a detector configured to detect a wavelength of at least a portion of the measurement beam of radiation transmitted through
one of the reflectors, and

a controller in communication with the detector and configured to determine a distance between the two reflectors from said
portion of the measurement beam of radiation transmitted through said one of the reflectors.

US Pat. No. 9,826,616

EXTREME ULTRAVIOLET LIGHT SOURCE UTILIZING A TARGET OF FINITE EXTENT

ASML Netherlands B.V., V...

1. A method of generating extreme ultraviolet (EUV) light, the method comprising:
providing a target to a target location, the target comprising target material that emits EUV light when in a plasma state,
the target having an extent in a first direction of 200 nanometers (nm) or less and an extent in a second direction of 300
micrometers (?m) or more;

forming a main pulse of radiation from an initial pulse of radiation, the main pulse being a single pulse of radiation having
a first portion and a second portion, the second portion having a temporal energy profile based on a temporal energy profile
of the initial pulse of radiation and the first portion having a temporal energy profile that is different from the temporal
energy profile of the initial pulse of radiation; and

directing the formed main pulse of radiation toward the target location to interact the radiation with the target, the second
portion reaching the target location after the first portion, the formed main pulse of radiation propagating in a direction
that is parallel to the first direction at the target location, wherein

interacting the first portion of the formed main pulse of radiation with the target forms a modified target, the modified
target having a lower density than the target, and

interacting the second portion of the formed main pulse of radiation with the modified target converts at least some of the
target material in the modified target to the plasma that emits EUV light.

US Pat. No. 9,298,110

RADIATION SOURCE APPARATUS, LITHOGRAPHIC APPARATUS, METHOD OF GENERATING AND DELIVERING RADIATION AND METHOD FOR MANUFACTURING A DEVICE

ASML NETHERLANDS B.V., V...

1. An EUV radiation source apparatus configured to generate an EUV radiation beam and focus the EUV radiation beam through
a low pressure gaseous atmosphere into a virtual source point, the EUV radiation beam in operation creating a plasma in the
atmosphere, the apparatus comprising:
a contaminant trap including a first electrode and a second electrode, the first electrode located around the path of the
radiation beam, and the second electrode positioned substantially in an obscurated region at an optical axis of the radiation
beam; and

a biasing source connected to the first electrode and the second electrode and configured to create an electric field across
the path of the radiation beam as the radiation beam approaches the virtual source point, the electric field being oriented
to deflect contaminant particles that have been electrically charged by the plasma out of the beam path.

US Pat. No. 9,201,311

METHODS AND PATTERNING DEVICES FOR MEASURING PHASE ABERRATION

ASML Netherlands B.V., V...

1. A method comprising:
producing, using a lithographic apparatus, a first reference structure on a substrate;
producing, using the lithographic apparatus, a first grating on the substrate by illuminating a reticle with radiation, the
reticle comprising an area with a phase-shift grating periodic in first and second directions and configured to produce:

in an exit pupil of the lithographic apparatus, a pair of diffracted orders of the radiation other than the zeroth order,
while forbidding other diffracted orders of the radiation in the exit pupil; and

interference fringes formed by interference between the pair of diffracted orders of the radiation, the interference fringes
contributing to the definition of the first grating on the substrate; and

measuring overlay error between the first grating and the first reference structure.

US Pat. No. 9,053,280

RULE OPTIMIZATION IN LITHOGRAPHIC IMAGING BASED ON CORRELATION OF FUNCTIONS REPRESENTING MASK AND PREDEFINED OPTICAL CONDITIONS

ASML NETHERLANDS B.V., V...

1. A method implemented by a computer of optimizing an initial design rule into an updated design rule for producing a mask
layout to be imaged by a lithographic apparatus, the method comprising:
selecting an initial design rule that specifies a minimum separation between features in the mask layout;
selecting an autocorrelation function associated with a predefined optical condition of the lithographic apparatus;
selecting respective mask transmittance functions for at least two features separated from each other by a distance in the
mask layout;

determining, using the computer, a change in illumination intensity at locations of a wafer plane associated with the at least
two features as a function of perturbation of the distance between the at least two features, wherein a mathematical function
for determining the change in illumination intensity per perturbation of the distance is derived using the mask transmittance
functions and the autocorrelation function; and

updating the initial design rule to generate the updated design rule specifying a new minimum separation between features
by optimizing the change in illumination intensity to identify an optimal perturbation of the distance between the at least
two features.

US Pat. No. 9,557,650

TRANSPORT SYSTEM FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE

ASML Netherlands B.V., V...

1. A system for an extreme ultraviolet (EUV) light source, the system comprising:
a radical transport system comprising:
one or more conduits, each of the one or more conduits comprising a sidewall, the sidewall comprising a linear portion and
a second portion, the linear portion of the sidewall comprising a first end that defines a first opening, and the second portion
of the sidewall comprising one or more openings from an interior of the conduit to an exterior of the conduit, wherein

the second portion of at least one of the one or more conduits is configured to be positioned relative to an outer perimeter
of a reflective surface of a collector that is inside of a vacuum chamber of the EUV light source with a gap between the collector
and the second portion;

a mount configured to hold the collector, the mount comprising a wall and a lip extending from the wall, the lip being angled
toward the reflective surface of the collector, the gap being between the lip and the outer perimeter of the reflective surface,
and

a control system comprising:
one or more electronic processors;
a non-transient computer-readable medium coupled to the one or more electronic processors, the computer-readable medium comprising
instructions that, when executed, cause the one or more electronic processors to:

control a flow of a gas through an aperture of the collector,
control a flow of the gas through the gap between the second portion of the at least one of the one or more conduits and the
collector, and

control a flow of free radicals through the one or more openings in the second portion of the one or more conduits.
US Pat. No. 9,323,164

COATINGS

ASML NETHERLANDS B.V., V...

1. An article of or for a lithographic apparatus selected from a group consisting of table, a shutter member, a sensor, a
projection system housing, and a confinement structure, wherein at least a portion of a surface of the article is coated with
a coating comprising a chemical compound comprising of the elements Si, O, and F.

US Pat. No. 9,229,335

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. A lithographic apparatus configured to project an image of a desired pattern through a liquid onto a substrate, there being
a groove in a surface of a movable table of the lithographic apparatus or a gap between the table and a component mounted
or mountable thereon, with which the liquid can come into contact, the component comprising the substrate and/or a fiducial
element, and the apparatus comprising an opening in the table, the opening configured to drain fluid from the gap or groove
and the opening being narrower than the gap or groove, a fluid permeable membrane inside the opening.

US Pat. No. 9,097,992

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. A fluid processing system for an immersion lithographic apparatus, the fluid processing system comprising a manifold configured
to process a two-phase flow of liquid and gas, the manifold comprising:
a chamber configured to receive the two-phase flow and in which the two-phase flow separates into liquid and gas;
a gas outlet in the chamber configured to remove gas from the chamber; and
a liquid outlet in the chamber configured to remove liquid from the chamber,
wherein the manifold is thermally isolated from its surroundings.

US Pat. No. 9,235,662

LITHOGRAPHY MODEL FOR 3D RESIST PROFILE SIMULATIONS

ASML NETHERLANDS B.V., V...

1. A method for simulating a three-dimensional spatial intensity distribution of radiation formed within a resist layer on
a substrate resulting from an incident radiation, the method comprising:
determining, using a computer system, an incoherent sum of forward propagating radiation in the resist layer and backward
propagating radiation in the resist layer;

determining, using the computer system, an interference of the forward propagating radiation in the resist layer and the backward
propagating radiation in the resist layer; and

determining, using the computer system, the three-dimensional spatial intensity distribution of radiation from the incoherent
sum and the interference.

US Pat. No. 9,207,543

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD INVOLVING A GROOVE TO COLLECT LIQUID

ASML NETHERLANDS B.V., V...

1. A lithographic apparatus comprising:
a table comprising:
a support surface configured to hold an object,
a sensor system element and/or a removable member, the element and/or member located on an upper side of the table and located
horizontally outward of the support surface, and

a groove configured to collect liquid, the groove located at an upper surface of the table, wherein (i) the groove surrounds
the support surface and (ii) the groove further surrounds the element and/or the member;

a projection system configured to project a patterned beam onto a target portion; and
a liquid supply system configured to supply the liquid to a localized area of the object, the table or both to at least partly
fill a space between the projection system and the object, the table or both.

US Pat. No. 9,122,178

OBJECT INSPECTION SYSTEMS AND METHODS

ASML Netherlands B.V., V...

1. A method for inspection of an object, comprising:
illuminating a surface of an object with a radiation beam;
analyzing secondary photon emissions from the surface of the object with time resolved spectroscopy, wherein the analyzing
comprises:

analyzing a first portion of the secondary photon emissions received through a first optical path,
analyzing a second portion of the secondary photon emissions received through a second optical path, wherein the first and
second portions of the secondary photon emissions comprise wavelengths that are the same, and

performing a correlation between the analysis of the first portion and the analysis of the second portion; and
determining that a particle disposed on the surface of the object is present if the correlation indicates secondary photon
emissions,

wherein said illuminating the object with a radiation beam comprises providing off-axis illumination from more than one direction.

US Pat. No. 9,860,966

RADIATION SOURCE

ASML NETHERLANDS B.V., V...

1. A method of generating EUV radiation in a radiation source for a lithographic apparatus, the method comprising:
supplying a stream of fuel droplets to a target area;
configuring a laser to emit pulses of laser radiation directed at said target area timed to strike and vaporize a fuel droplet
to generate EUV radiation; and

predicting a delay caused by the effect of vaporization of one fuel droplet on a subsequent fuel droplet in said stream; and
controlling the timing of said pulses to be dependent on the predicted delay caused by the effect of the vaporization.

US Pat. No. 9,762,023

ONLINE CALIBRATION FOR REPETITION RATE DEPENDENT PERFORMANCE VARIABLES

CYMER, LLC, San Diego, C...

1. A system comprising:
a laser capable of running at multiple repetition rates;
a laser control unit operatively connected to the laser for controlling a repetition rate at which the laser operates;
a measurement unit arranged to measure an output from the laser for measuring at least one operating parameter of the laser
at a repetition rate;

a comparison unit operatively connected to the measurement unit for providing an indication of whether a measured value for
the operating parameter is within a predetermined range of values for the operating parameter; and

a storage unit operatively connected to the comparison unit for storing a value based on the indication and associated with
the repetition rate;

the laser control unit being operatively connected to the storage unit and configured to permit operation of the laser at
the repetition rate only if the value stored in association with the repetition rate indicates that the operating parameter
was measured to be within the predetermined range.

US Pat. No. 9,229,334

LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. A system, comprising:
a movable table;
a projection system configured to project a beam of radiation onto a substrate, the projection system comprising an optical
element nearest the table;

a fluid handling system configured to confine immersion liquid to a localized liquid space between the element of the projection
system and the table, the fluid handling system comprising a liquid confinement structure arranged to define a first gap between
the liquid confinement structure and the projection system and define a second gap between the liquid confinement structure
and the table; and

a gas supply device configured to supply gas to a region adjacent the liquid space, the gas having a solubility in the immersion
liquid of greater than 5×10?3 mol/kg at 20° C. and 1 atm total pressure and the gas supply device comprising one or more openings arranged to supply the
gas to the first and second gaps, the one or more openings separate from the liquid confinement structure and the one or more
openings positioned to provide the gas such that the gas substantially surrounds the localized liquid space and substantially
separates the localized liquid space from a different ambient gas atmosphere that surrounds the localized liquid space and
comes into contact around the localized liquid space with the gas.

US Pat. No. 9,170,498

LITHOGRAPHIC APPARATUS AND A METHOD FOR DETERMINING A POLARIZATION PROPERTY OF A PROJECTION SYSTEM USING AN ADJUSTABLE POLARIZER AND INTERFEROMETRIC SENSOR

ASML Netherlands B.V., V...

1. A method for determining a polarization property of a lithographic apparatus, comprising:
measuring one or more wavefronts of a radiation beam from a source module using an interferometric sensor, wherein:
the source module is disposed at a level of a patterning device in the apparatus and comprises a lens and a polarizing component,
the source module does not include the patterning device,
the lens is configured to collimate the radiation beam before it passes through the polarizing component,
the interferometric sensor comprises a diffractive element disposed at a level of a substrate in the apparatus and a detector
spaced apart from the diffractive element, and

the diffractive element is arranged to provide shearing interferometry between at least two wavefronts mutually displaced
in a direction of shear; and

determining, from the wavefront measurements, information on polarization affecting properties of a projection system of the
lithographic apparatus.

US Pat. No. 9,110,387

LITHOGRAPHIC APPARATUS COMPRISING A SUBSTRATE TABLE AND A SURFACE SUBSTRATE ACTUATOR

ASML NETHERLANDS B.V., V...

1. A lithographic apparatus comprising:
a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with
a pattern in its cross-section to form a patterned radiation beam;

a substrate table constructed to hold a substrate;
a positioner constructed to position the substrate table;
a projection system configured to project the patterned radiation beam onto a target portion of the substrate,
a substrate surface actuator arranged to face a part of a surface of the substrate facing the projection system, the substrate
surface actuator configured to exert a force on the part of the surface of the substrate, the substrate surface actuator comprising
a Lorentz actuator, and

a position controller configured to control a position of the substrate table, the position controller being operably connected
to the positioner and the substrate surface actuator to drive the positioner and the substrate surface actuator, the substrate
surface actuator being driven, in use, by said controller to reduce, with said exerted force, an inaccuracy of positioning
of the substrate surface with respect to a plane of focus of the projection system, and

wherein the actuator is arranged to engage at least part of a zone of the surface of the substrate that surrounds a downstream
lens of the projection system, seen along a direction of an optical axis of the downstream lens of the projection system.

US Pat. No. 9,470,988

SUBSTRATE POSITIONING SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. A positioning system for positioning an object in a lithographic apparatus, the positioning system comprising:
a first object table moveable in an operating area;
a second object table moveable in the operating area;
a first position measurement system configured to provide an incremental position measurement of the second object table relative
to a reference when in the operating area, wherein the first position measurement system is configured to provide an absolute
position measurement of the first object table relative to the reference;

a second position measurement system configured to provide an absolute position measurement of the first object table relative
to the second object table, and wherein the first position measurement system is further configured to provide an absolute
position measurement of the second object table relative to the reference based on the absolute position measurement of the
first object table relative to the reference and on the absolute position measurement of the first object table relative to
the second object table.

US Pat. No. 9,418,194

METHOD AND APPARATUS FOR MODEL BASED FLEXIBLE MRC

ASML NETHERLANDS B.V., V...

1. A method of processing an exposure pattern layout for a lithographic process, the method comprising:
identifying a first feature from a plurality of features of the layout based, at least in part, on the first feature violating
a pattern layout requirement;

reconfiguring, by a computer system, a second feature from the plurality of features by performing operations including evaluating
a first cost function of a lithographic metric affected by a change to the second feature, until a termination condition is
satisfied; and

in response to determining that the first feature still violates the pattern layout requirement after the termination condition
is satisfied, relaxing the pattern layout requirement by performing operations including evaluating a second cost function
of a lithographic metric affected by a parameter characteristic of relaxation of the pattern layout requirement,

wherein the first feature no longer violates the pattern layout requirement after the second feature is reconfigured or the
pattern layout requirement is relaxed.

US Pat. No. 9,195,150

LITHOGRAPHIC APPARATUS COMPRISING A SUPPORT FOR HOLDING AN OBJECT, AND A SUPPORT FOR USE THEREIN

ASML Netherlands B.V., V...

1. A lithographic apparatus comprising a support for holding an object, wherein:
the support has a first part with a first upper main surface facing the object when the support is holding the object;
the support has a second part with a second upper main surface facing a first bottom main surface of the first part;
the second upper main surface and the first bottom main surface are spaced apart from each other by means of multiple discrete
support walls;

the support has a plurality of burls extending from the first upper main surface;
a first one of the plurality of burls has a first top surface operative to contact the object when the support is holding
the object;

a second one of the plurality of burls has a second top surface operative to contact the object when the support is holding
the object;

the first top surface has a first position relative to the second upper main surface and has a first orientation relative
to the second main surface;

the second top surface has a second position relative to the second upper main surface and has a second orientation relative
to the second upper main surface;

the lithographic apparatus comprises a controller that is configured to perform at least one of:
control the first position and the second position independently of one another when the support is holding the object; and
control the first orientation and the second orientation independently of one another when the support is holding the object.

US Pat. No. 9,177,219

METHOD OF CALIBRATING A LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND ASSOCIATED DATA PROCESSING APPARATUS AND COMPUTER PROGRAM PRODUCT

ASML Netherlands B.V., V...

1. A method of calibrating a lithographic apparatus, the lithographic apparatus, comprising a support for a substrate a patterning
subsystem for applying a pattern to the substrate, a measurement subsystem for measuring features on the substrate and a positioning
subsystem for controlling the support and the patterning subsystem so as to apply the pattern at a desired position on the
substrate, the accuracy of applying the pattern being dependent upon use of calibration data for correcting apparatus-specific
deviations in the performance of the lithographic apparatus across the substrate, the method comprising:
(a) providing a primary reference substrate having primary reference features positioned thereon, the positioning of the primary
reference features being adopted as an accurate reference for calibration of the lithographic apparatus;

(b) providing a secondary reference substrate having secondary reference features positioned thereon;
(c) obtaining and storing an apparatus-independent fingerprint of the secondary reference substrate relative to the primary
reference substrate;

(d) calibrating the lithographic apparatus using the secondary reference substrate and the stored apparatus-independent fingerprint
together as a reference; and

(e) using the secondary reference substrate and the stored apparatus-independent fingerprint together as the reference to
perform subsequent calibrations of the lithographic apparatus.

US Pat. No. 9,507,278

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. A lithographic projection apparatus configured to project a patterned beam onto a substrate using a projection system and
configured to supply liquid to a space between the projection system and the substrate using a liquid supply system, the apparatus
comprising:
a substrate table configured to hold a substrate, the substrate table comprising a recess configured to receive the substrate,
wherein the recess is larger than the substrate such that a trench is provided around an edge of the substrate when the substrate
is held by the substrate table, the trench configured to collect at least part of the liquid;

a liquid confinement member configured to at least partly confine the liquid in the space between the projection system and
a surface of the substrate, the substrate table or both; and

a removal opening comprising a porous member facing the substrate and vertically spaced apart from a bottom surface of the
substrate, when the substrate is located under the projection system and the removal opening configured to remove at least
part of the liquid through the porous member.

US Pat. No. 9,488,923

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate using a projection
system, the apparatus comprising:
a liquid supply system arranged to supply a liquid to a space between the projection system and a movable table;
a member to at least partly confine liquid in the space, the member comprising a recovery opening facing toward the movable
table, the recovery opening comprising a porous member configured to recover liquid and having a shape, comprising a plurality
of sides, around a path, in the space, along which the pattern is projected; and

an extraction outlet, outward relative to the space, of the recovery opening, the extraction outlet configured to exhaust
a fluid.

US Pat. No. 9,368,366

METHODS FOR PROVIDING SPACED LITHOGRAPHY FEATURES ON A SUBSTRATE BY SELF-ASSEMBLY OF BLOCK COPOLYMERS

ASML NETHERLANDS B.V., V...

1. A method of forming a plurality of regularly spaced lithography features, the method comprising:
providing a self-assemblable block copolymer having first and second blocks in a plurality of trenches on a substrate, each
trench comprising opposing side-walls and a base, with the side-walls having a width therebetween, wherein a first trench
has a greater width than a second trench;

causing the self-assemblable block copolymer to self-assemble into an ordered layer in each trench, the layer comprising a
first domain of the first block alternating with a second domain of the second block, wherein the first and second trenches
have the same number of each respective domain; and

selectively removing the first domain to form one or more regularly spaced rows of lithography features comprised of the second
domain along each trench, wherein the pitch of the features in the first trench is greater than the pitch of the features
in the second trench.

US Pat. No. 9,360,766

METHOD AND SYSTEM FOR LITHOGRAPHY PROCESS-WINDOW-MAXIMIXING OPTICAL PROXIMITY CORRECTION

ASML NETHERLANDS B.V., V...

1. A method for maximizing a process window of a photolithographic process comprising:
computing, using a computer, an analytical function of process condition parameters that approximates a resist image value
across a process window for each of a plurality of evaluation points in a target pattern;

determining a target value of the resist image value for each evaluation point based on the analytical function and a nominal
condition comprising nominal values of one or more of the process condition parameters, wherein determining the target values
for each evaluation point is performed such that the process window about the nominal values of the process condition parameters
is maximized; and

performing optical proximity correction on the target pattern using the target value as an optimizing target for each evaluation
point,

wherein determining the target value of the resist image value at nominal condition is by a bisection method.

US Pat. No. 9,195,152

SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A SPECTRAL PURITY FILTER

ASML NETHERLANDS B.V., V...

1. A method for manufacturing a transmissive spectral purity filter configured to transmit extreme ultraviolet radiation,
the method comprising:
providing a semiconductor substrate having a top Si layer, a bottom Si layer and an intermediate etch stop layer in between
the top Si layer and the bottom Si layer;

etching a plurality of apertures in the substrate using an anisotropic etching process, the anisotropic etching process comprising
applying a hard mask of an aperture pattern on the substrate,
deep reactive ion etching the aperture pattern vertically through the top Si layer to the intermediate etch layer,
removing the bottom Si layer, and
removing at least part of the etch stop layer to open up the plurality of apertures.

US Pat. No. 9,507,277

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. A lithographic apparatus comprising:
a patterning device being capable of forming a patterned radiation beam;
a substrate table constructed to hold a substrate;
a projection system configured to project the patterned radiation beam onto a target portion of the substrate;
a sensor array positioned and arranged to detect an acoustic wave from a movable part of the lithographic apparatus; and
a controller including a controller input connected to the sensor array to receive a sensor array output signal, and a controller
output connected to an actuator arranged to act on the movable part, the controller configured to:

calculate a movement of the movable part from the sensor array output signal, wherein the movement includes a vibration, or
a resonance or a deformation or any combination thereof of the movable part, and

drive via the controller output the actuator in response to the calculated movement,
wherein the movable part comprises a chuck, and
wherein the chuck comprises at least one of the substrate table and a support for holding the patterning device capable of
imparting a radiation beam with a pattern in its cross-section to form the patterned radiation beam.

US Pat. No. 9,411,238

SOURCE-COLLECTOR DEVICE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. A source-collector device constructed and arranged to generate a radiation beam, the device comprising:
a target unit constructed and arranged to present a target surface of plasma-forming material;
a laser unit constructed and arranged to generate a beam of radiation directed onto the target surface so as to form a plasma
from said plasma-forming material;

a contaminant trap constructed and arranged to reduce propagation of particulate contaminants generated by the plasma;
a radiation collector comprising a plurality of grazing-incidence reflectors arranged to collect radiation emitted by the
plasma and form a beam therefrom; and

a filter constructed and arranged to attenuate at least one wavelength range of the beam,
wherein the target unit is located within a resonant cavity of the laser unit.

US Pat. No. 9,213,783

SOURCE MASK OPTIMIZATION TO REDUCE STOCHASTIC EFFECTS

ASML NETHERLANDS B.V., V...

1. A computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate
using a lithographic projection apparatus, the method comprising:
determining a stochastic effect function of the lithographic process that produces as an output a value of a stochastic effect
as a function of a plurality of design variables associated with the lithographic process that are inputs to the function
and which cause quantifiable changes in the stochastic effect value, wherein the plurality of design variables include at
least an adjustable parameter of projection optics of the lithographic process;

defining a multi-variable cost function using the stochastic effect function of the lithographic process such that the multi-variable
cost function includes the adjustable parameter of projection optics that causes the quantifiable changes in the stochastic
effect value for a desired substrate throughput of the lithographic projection apparatus; and

reconfiguring, by the computer, one or more characteristics of the lithographic process by adjusting one or more of the design
variables until a certain termination condition of the cost function is satisfied, thereby achieving the desired substrate
throughput.

US Pat. No. 9,209,595

CATALYTIC CONVERSION OF AN OPTICAL AMPLIFIER GAS MEDIUM

ASML Netherlands B.V., V...

1. An extreme ultraviolet light system comprising:
an optical amplifier system comprising one or more optical amplifiers, each optical amplifier including a gain medium in the
form of a gas mixture that produces a pulsed amplified light beam when energy is supplied from an energy supply to pump the
gain medium according to a duty cycle, the optical amplifier system comprising a fluid input and a fluid output through which
the gas mixture flows;

a catalytic conversion system, fluidly connected to the fluid output of the optical amplifier system and to the fluid input
of the optical amplifier system, the catalytic conversion system comprising a catalytic converter comprising:

a housing;
a substrate within the housing including openings through which the gas mixture can flow; and
a catalyst applied as a coating to the interior surfaces of the openings of the substrate, the catalyst comprising nanoparticles
of metal; and

a heat exchanger separate from the catalytic converter, the heat exchanger comprising tubing through which the as mixture
flows the tubing of the heat exchanger being coated on its inner surface with a catalyst that facilitates oxidation of the
dissociated molecules within the gas mixture.

US Pat. No. 9,195,153

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. A lithographic apparatus comprising:
an exposure station including a projection system configured to project a patterned beam of radiation through liquid onto
a target portion of a substrate held on a first substrate table;

a measurement station configured to measure a substrate held on a second substrate table, wherein measurement of the substrate
at the measurement station is not performed through said liquid adjacent the substrate; and

a positioning system configured to move the second substrate table from the measurement station to the exposure station so
as to position the substrate held on the second substrate table into an optical path of the projection system.

US Pat. No. 9,128,390

MULTI-STAGE SYSTEM, A CONTROL METHOD THEREFOR, AND A LITHOGRAPHIC APPARATUS

ASML NETHERLANDS B.V., V...

1. A multi-stage system comprising:
a stator including a plurality of electric coils;
a first stage including a first magnet assembly, the first stage moveable relative to the stator;
a second stage including a second magnet assembly, the second stage moveable relative to the stator;
a controller configured to position the first and the second stage relative to the stator by activating, respectively, a first
subset of the plurality of electric coils to interact with the first magnet assembly and a second subset of the plurality
of electric coils to interact with the second magnet assembly, said controller adapted to prevent at least one electric coil,
to be simultaneously shared by the first and the second subset to position the first and the second stage on the stator, from
activating.

US Pat. No. 9,116,423

IMPRINT LITHOGRAPHY APPARATUS

ASML NETHERLANDS B.V., V...

1. An imprint lithography apparatus, comprising:
an imprint template arrangement for use in imprinting a pattern into imprintable medium;
a substrate holder configured to hold a substrate provided with imprintable medium to, in use, be patterned by the imprint
template arrangement;

a structure located away from the substrate holder and extending across the substrate holder, and such that the imprint template
arrangement is, in use, located between the structure and the substrate holder, wherein:

the substrate or substrate holder has a first part of a substrate or substrate holder configuration determination arrangement
and the structure has a second part of the substrate or substrate holder configuration determination arrangement, the first
part or second part of the substrate or substrate holder configuration determination arrangement comprising one or more arrays
of lines whose displacement is being measured, and the other of the first part or second part of the substrate or substrate
holder configuration determination arrangement comprising one or more encoders that faces towards, and arranged to measure
the displacement of, one or more of the one or more arrays of lines, and

the imprint template arrangement has a first part of an imprint template arrangement configuration determination arrangement
and the structure has a second part of the imprint template arrangement configuration determination arrangement, the first
part or second part of the imprint template arrangement configuration determination arrangement comprising one or more arrays
of lines whose displacement is being measured, and the other of the first part or second part of the imprint template arrangement
configuration determination comprising one or more encoders that faces towards one or more of the one or more arrays of lines
and arranged to measure the displacement of the one or more of the one or more arrays of lines separately from the displacement
measured by the substrate or substrate holder configuration determination arrangement of the one or more of the one or more
arrays of lines of the substrate or substrate holder configuration determination arrangement.

US Pat. No. 9,091,940

LITHOGRAPHIC APPARATUS AND METHOD INVOLVING A FLUID INLET AND A FLUID OUTLET

ASML NETHERLANDS B.V., V...

41. A lithographic projection apparatus comprising:
a substrate table configured to hold a substrate;
a projection system configured to project a beam having a pattern onto a target portion of the substrate;
a liquid supply system configured to at least partly fill a space between the projection system and the substrate, with a
liquid through which the beam is to be projected, the liquid supply system comprising:

a liquid confinement structure extending along at least a part of the boundary of the space between the projection system
and the substrate table, wherein, when the liquid is in the space, the cross-sectional area of the liquid in the space is
smaller than the area of the substrate and wherein the structure has an open aperture in a bottom surface of the structure,
the open aperture being in a part of the structure below a bottom surface of the projection system and above the substrate
table, the open aperture having a cross-sectional width smaller than a cross-sectional width of the substrate, the open aperture
configured to allow the liquid to flow therethrough between above the open aperture and below the open aperture, and the open
aperture configured to allow the beam to pass therethrough;

an outlet formed in a face of the structure that opposes the substrate to extract fluid from the space; and
a gas inlet to supply gas to push the liquid to substantially prevent the liquid from passing radially outward of the gas
inlet.

US Pat. No. 9,081,302

INSPECTION APPARATUS AND METHOD, LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC PROCESSING CELL

ASML Netherlands B.V., V...

1. An inspection apparatus comprising:
an illumination source configured to provide an illumination beam of broadband radiation;
an interferometer configured to use the illumination beam to illuminate a target on a substrate at an incidence angle and
to use radiation reflected from the substrate with a reference beam derived from the illumination beam to produce an output
beam;

an optical fiber configured to receive the output beam, wherein a core diameter of the optical fiber is arranged to select
a portion of the output beam;

a spectrometer configured to receive the selected portion of the output beam and to measure a spectrum of the received selected
portion of the output beam; and

a processor configured to determine reflectance properties of the target at the incidence angle from the measured spectrum.

US Pat. No. 9,516,729

VARIABLE RADIUS MIRROR DICHROIC BEAM SPLITTER MODULE FOR EXTREME ULTRAVIOLET SOURCE

ASML Netherlands B.V., V...

1. An extreme ultraviolet radiation source comprising:
a droplet generator to provide a droplet;
at least one laser source to provide a pre-pulse to irradiate the droplet so as to create a target droplet, the pre-pulse
associated a pre-pulse focal plane, and to provide a main pulse to irradiate the target droplet into a plasma state, the main
pulse associated with a main pulse focal plane;

a dichroic splitter module to focus the pre-pulse and the main pulse, the dichroic splitter module comprising, at least one
variable radius mirror; and

a controller coupled to the at least one variable radius mirror to adjust a radius of curvature of the at least one variable
radius mirror to adjust a distance between the pre pulse focal plane and the main pulse focal plane of the main pulse, the
controller further setting the radius of curvature of the at least one variable radius mirror to an initial value based upon
a desired value for a beam diameter of the main pulse at a specified distance from the pre-pulse focal plane, wherein setting
the radius of curvature of the at least one variable radius mirror includes setting a pressure of a fluid applied to the at
least one variable radius mirror.

US Pat. No. 9,372,399

IMPRINT LITHOGRAPHY METHOD AND IMPRINTABLE MEDIUM

ASML NETHERLANDS B.V., V...

1. An imprint lithography method for reducing a difference between an intended topography and an actual topography arising
from a part of a patterned layer of fixed imprintable medium, the method comprising:
imprinting an imprint lithography template into a layer of flowable imprintable medium to form a patterned layer in the imprintable
medium;

fixing the imprintable medium to form a patterned layer of fixed imprintable medium; and
separate from fixing the imprintable medium, applying local excitation to the part of the patterned layer having a topography
by contact from the imprint lithography template to adjust a chemical reaction in the part of the patterned layer to reduce
the difference between the intended topography and the actual topography arising from the part of the fixed patterned layer
of imprintable medium.

US Pat. No. 9,360,762

ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD

ASML Netherlands B.V., V...

14. A lithographic apparatus comprising:
an illumination system configured to provide a beam of radiation comprising:
an array of controllable mirrors configured to direct radiation towards a pupil plane and an array of lenses configured to
direct radiation sub-beams towards the array of controllable mirrors,

wherein a first lens of the array of lenses and a controllable mirror of the array of controllable mirrors forms a first optical
channel having a first optical power and a second lens of the array of lenses and a controllable mirror of the array of controllable
mirrors forms a second optical channel having a second optical power, and

wherein the first optical power is different from the second optical power;
a support structure for supporting a patterning device, the patterning device serving to impart the radiation beam with a
pattern in its cross-section;

a substrate table for holding a substrate; and
a projection system for projecting the patterned radiation beam onto a target portion of the substrate.

US Pat. No. 9,229,336

LITHOGRAPHIC APPARATUS AND METHODS FOR DETERMINING AN IMPROVED CONFIGURATION OF A LITHOGRAPHIC APPARATUS

ASML NETHERLANDS B.V., V...

1. A method for determining an improved configuration for a lithography apparatus, the method comprising:
analyzing a target device pattern to be imaged on a substrate by a lithography apparatus to identify a plurality of instances
of a candidate device feature in the target device pattern;

repeating the analyzing step for a different candidate device feature;
selecting the candidate device feature for which the plurality of instances identified in the analyzing step matches a selection
criterion or criteria;

measuring a device pattern produced using the lithography apparatus, or measuring a patterning device for use in the lithography
apparatus, in order to obtain a set of errors comprising differences between a measured value of a particular property of
each instance of the identified plurality of instances of the selected device feature and a target value for the property;
and

adapting the configuration of the lithographic apparatus to improve the set of errors.

US Pat. No. 9,170,502

METHOD OF OPTIMIZING A LITHOGRAPHIC PROCESS, DEVICE MANUFACTURING METHOD, LITHOGRAPHIC APPARATUS, COMPUTER PROGRAM PRODUCT AND SIMULATION APPARATUS

ASML NETHERLANDS B.V., V...

1. A method of optimizing a lithographic process for imaging a pattern comprising a plurality of features onto a substrate
using a lithographic apparatus, the lithographic apparatus having a controllable illumination system arranged to illuminate
a patterning device with radiation and a controllable projection system arranged to project an image of the patterning device
onto the substrate as a patterned beam of radiation, the method comprising:
selecting a feature from the plurality of features;
determining an illumination setting for the illumination system to optimize imaging of the selected feature;
determining a projection setting for the projection system to optimize imaging of the selected feature taking account of the
illumination setting; and

verifying the effect of the illumination setting and the projection setting on the image of at least a part of the pattern,
the at least part of the pattern including a feature not selected in the selecting step.

US Pat. No. 9,073,098

LIGHT COLLECTOR MIRROR CLEANING

ASML Netherlands B.V., (...

1. A method for cleaning a collector mirror of an extreme ultraviolet light source, the method comprising:
removing the collector mirror from a chamber of the extreme ultraviolet light source;
mounting the collector mirror to a carrier;
inserting the carrier with the collector mirror into a cleaning tank;
applying a cleaning agent to a reflective surface of the collector mirror by spraying the cleaning agent through a plurality
of nozzles directed toward the collector mirror reflective surface until the collector mirror reflective surface is clean;

rinsing the applied cleaning agent from the collector mirror reflective surface;
drying the collector mirror reflective surface;
removing the carrier from the cleaning tank;
removing the collector mirror from the carrier; and
re-installing the collector mirror in the chamber.

US Pat. No. 9,506,743

POSITION MEASURING APPARATUS, POSITION MEASURING METHOD, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. An apparatus to measure a position of a mark, the apparatus comprising:
an objective lens configured to direct radiation on a mark;
an optical arrangement configured to receive radiation that is diffracted and specularly reflected by the mark, wherein the
optical arrangement is configured to provide a first image and a second image, the first image formed by coherently adding
specularly reflected radiation and positive diffraction order radiation and the second image formed by coherently adding specularly
reflected radiation and negative diffraction order radiation, wherein intensities or amplitudes of the positive and negative
diffraction order radiation are substantially equal to each other; and

a detection arrangement configured to detect variation in an intensity of radiation of the first and second images and to
calculate from the detected variation a position of the mark in a direction of measurement, wherein the calculated position
is a function of the combination of the intensity of the radiation of the first and second images.

US Pat. No. 9,462,668

TARGET FOR EXTREME ULTRAVIOLET LIGHT SOURCE

ASML Netherlands B.V., V...

1. An extreme ultraviolet (EUV) light source comprising:
a solid state laser configured to produce pulses of radiation, the pulses of radiation produced by the solid state laser comprising
at least a first pulse of radiation;

a second optical source configured to produce pulses of radiation, the pulses of radiation produced by the second optical
source comprising at least a second pulse of radiation, the second pulse of radiation having a greater intensity than the
first pulse of radiation;

a vacuum chamber configured to receive a target material in an interior of the vacuum chamber, the target material comprising
a material that emits EUV light when converted to plasma; and

an optical element configured to direct the first pulse of radiation and the second pulse of radiation toward the interior
of the vacuum chamber to, respectively, a first location in the interior of the vacuum chamber and a second, different location
in the interior of the vacuum chamber, the first and second locations in the interior of the vacuum chamber being along a
direction that is different from a direction of propagation of the first pulse of radiation and the second pulse of radiation
in the interior of the vacuum chamber.

US Pat. No. 9,329,501

LITHOGRAPHIC APPARATUS, METHOD OF DEFORMING A SUBSTRATE TABLE AND DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. A lithographic apparatus, comprising:
a projection system configured to project a patterned beam of radiation onto a substrate;
a substrate table configured to support the substrate and to move relative to the projection system;
a plurality of sensors configured to measure a deformation of the substrate table;
an actuator configured to deform the substrate table; and
a controller configured to control the actuator to deform the substrate table based on measurements made by the sensors,
wherein the plurality of sensors is located on a first side of the substrate table opposite to a second side of the substrate
table facing the projection system,

wherein the plurality of sensors is substantially stationary relative to the projection system,
wherein at least one of the plurality of sensors is located at an optical axis of the projection system.

US Pat. No. 9,310,700

LITHOGRAPHY METHOD AND APPARATUS

ASML Netherlands B.V., V...

1. A lithography method comprising:
providing a first heat load to a first area of an object; and
providing a second heat load to a second area of the object, wherein the first and the second heat loads are provided simultaneously
and are configured to provide different intensities using at least one beam of radiation,

wherein the second heat load is configured to ensure a deformation of the first area of the object caused by providing both
the first heat load and the second heat load is smaller than a deformation of the first area of the object caused by providing
only the first heat load,

wherein the object is a substrate, an imprint template, or a reticle.

US Pat. No. 9,262,579

INTEGRATION OF LITHOGRAPHY APPARATUS AND MASK OPTIMIZATION PROCESS WITH MULTIPLE PATTERNING PROCESS

ASML NETHERLANDS B.V., V...

1. A method of splitting a pattern to be imaged onto a substrate via a lithographic process into a plurality of sub-patterns,
the method comprising:
identifying a plurality of possible split choices for splitting the pattern into the plurality of sub-patterns;
selecting one of the identified possible split choices based on a prediction of an image of at least one sub-pattern split
under each of the split choices, where the image is formed by the at least one sub-pattern after an optical setting of a lithography
apparatus used in the lithographic process and the at least one sub-pattern are co-optimized, and where the image is formed
by the at least one sub-pattern in a respective split choice and without regard to other sub-patterns in the same respective
split choice; and

splitting the pattern into the plurality of sub-patterns under the selected one of the possible split choices.

US Pat. No. 9,229,340

LITHOGRAPHIC APPARATUS

ASML NETHERLANDS B.V., V...

1. A lithographic apparatus, comprising:
a substrate table comprising a holding device to hold a substrate;
a substrate table position measurement system comprising a sensor head and a substrate table reference element; and
a further position measurement system,
wherein the substrate table reference element is arranged at a bottom side of the substrate table,
wherein the sensor head is configured to cooperate with the substrate table reference element to determine a position of the
substrate table, and

wherein the further position measurement system is configured to measure at a top side of the substrate the position of the
substrate table.

US Pat. No. 9,217,916

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

ASML Netherlands B.V., V...

1. A lithographic system, comprising:
a monitored lithographic projection apparatus arranged to project a patterned beam of radiation onto a substrate;
a metrology apparatus arranged to measure values representative of a plurality of features of a pattern transferred onto the
substrate including values of at least one CD-profile parameter and at least one further feature profile parameter which is
indicative of a machine setting of the monitored lithographic projection apparatus; and

a matching system comprising,
a storage system configured to store a reference CD-profile parameter value representative of the CD-profile parameter and
a reference feature profile value representative of the one further feature profile parameter,

a comparison system configured to compare the measured and reference values of the one further feature profile parameter,
and

a lithographic parameter determination system configured to determine a corrected set of machine settings for use by the monitored
lithographic apparatus dependent on the differences between the measured and reference values of the one further feature profile
parameter and between the measured and reference values of the CD-profile parameter.

US Pat. No. 9,141,005

TEMPERATURE SENSING PROBE, BURL PLATE, LITHOGRAPHIC APPARATUS AND METHOD

ASML NETHERLANDS B.V., V...

1. A burl plate for a lithographic apparatus, the burl plate comprising:
a main body comprising an object supporting surface; and
a temperature sensing probe comprising a temperature sensor in an elongate housing, wherein the elongate housing is elongate
in a first direction transverse to the object supporting surface, contacts the main body along at least part of its length,
and is comprised of a material with a thermal conductivity of at least 100 W/mK at 20° C. in at least one direction.

US Pat. No. 9,081,303

METHODS AND SCATTEROMETERS, LITHOGRAPHIC SYSTEMS, AND LITHOGRAPHIC PROCESSING CELLS

ASML Netherlands B.V., V...

1. A method of determining a focus of a lithographic apparatus used in a lithographic process on a substrate, the method comprising:
forming a periodic structure on the substrate, the periodic structure comprising at least one feature having a profile which
has an asymmetry, the asymmetry depending on the focus of the lithographic apparatus on the substrate;

stopping, using a stop arrangement and an illumination arrangement together, zero order diffracted radiation from contributing
to a first image and a second image of the periodic structure;

detecting a first image of the periodic structure while illuminating the periodic structure with a first beam of radiation
from the illumination arrangement to generate a first measurement, the first image being formed using a first part of non-zero
order diffracted radiation while excluding zero order diffracted radiation;

detecting a second image of the periodic structure while illuminating the periodic structure with a second beam of radiation
from the illumination arrangement to generate a second measurement; the second image being formed using a second part of the
non-zero order diffracted radiation which is symmetrically opposite to the first part in a diffraction spectrum;

determining the asymmetry in the profile of periodic the structure based on the first and second images detected in the first
and second measurements; and

providing an indication of the focus on the substrate based on the determined asymmetry and a relationship between the focus
and the determined asymmetry.

US Pat. No. 9,516,730

SYSTEMS AND METHODS FOR BUFFER GAS FLOW STABILIZATION IN A LASER PRODUCED PLASMA LIGHT SOURCE

ASML Netherlands B.V., V...

1. An extreme-ultraviolet (EUV) light source comprising;
an optic;
a target material;
an EUV mirror having an aperture;
a laser beam passing through said optic along a beam path to irradiate said target material, wherein said optic represents
focusing optic to define a focal spot of said laser beam along said beam path; and

a system generating a gas flow directed through said aperture toward said target material along said beam path, said as flow
being substantially turbulent-free, said system having a tapering member surrounding a volume and a plurality of gas lines,
said tapering member having a small end disposed toward said aperture and a large end disposed opposite said small end to
produce substantially turbulent-free flow in a portion of said volume toward said aperture, wherein at least said portion
of said volume is disposed between said EUV mirror and said optic, said optic is disposed along said beam path between said
large end and said small end within said volume and each gas line of said plurality of gas lines input a gas into said volume
from said large end of said tapering member.

US Pat. No. 9,516,732

RADIATION SOURCE

ASML Netherlands B.V., V...

1. A radiation source comprising:
a nozzle configured to direct a stream of fuel droplets along a trajectory towards a plasma formation location; and
a laser system configured to direct a laser beam at a fuel droplet at the plasma formation location to generate, in use, a
radiation generating plasma,

wherein the laser system comprises:
a seed laser configured to provide a seed laser beam;
a beam splitter configured to receive the seed laser beam from the seed laser;
an optical pre-amplifier configured to receive the seed laser beam from the beam splitter and provide an amplified seed laser
beam;

a first reflector configured to receive the amplified seed laser beam and to direct the amplified seed laser beam to the beam
splitter via the optical pre-amplifier to provide twice amplified seed laser beam; and

a further optical amplifier configured to receive the twice amplified seed laser beam via the beam splitter and to further
amplify the twice amplified seed laser beam in a single pass through the further optical amplifier to generate the laser beam.

US Pat. No. 9,465,306

SOURCE MODULE OF AN EUV LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A DEVICE

ASML NETHERLANDS B.V., V...

1. A source module for use in a lithographic apparatus, the source module being constructed to generate extreme ultra violet
(EUV) radiation and secondary radiation, the source module comprising a buffer gas configured to cooperate with a source of
the EUV radiation, said buffer gas having at least 50% transmission for the EUV radiation, and at least 70% absorption for
the secondary radiation.

US Pat. No. 9,380,691

ADAPTIVE LASER SYSTEM FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE

ASML Netherlands B.V., V...

1. An extreme ultraviolet light source comprising:
a source configured to produce an amplified light beam, the source comprising:
two or more optical amplifiers, each comprising a gain medium positioned on a beam path, and each optical amplifier configured
to receive an input light beam that travels along the beam path at an input and to emit an output light beam at an output
and onto the beam path;

one or more adaptive optical elements positioned on the beam path, the adaptive optical elements being adjustable in response
to a feedback signal; and

a feedback system coupled to the one or more adaptive optical elements, the feedback system comprising a sensor, the sensor
positioned at an output of one of the optical amplifiers, the feedback system being configured to: generate the feedback signal
based on a property measured by the sensor, and provide the feedback signal to a corresponding adaptive optical element, the
corresponding adaptive optical element being at least one of the adaptive optical elements, and the corresponding adaptive
optical element being positioned between the output of the one of the optical amplifiers and the input of another of the optical
amplifiers, wherein the sensor is between the corresponding adaptive optical element and the output of the one of the optical
amplifiers;

a vacuum chamber;
a target material delivery system that directs target material toward a target location that is inside of the vacuum chamber
and receives the amplified light beam, the target material comprising a material that emits extreme ultraviolet light when
converted to plasma; and

a collector inside the vacuum chamber, the collector positioned to receive and direct the emitted extreme ultraviolet light.

US Pat. No. 9,285,689

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. A lithographic apparatus, comprising:
a substrate table configured to hold a substrate during projection of a patterned beam onto a target portion of the substrate;
and

a conditioning system constructed to directly condition a non-target portion of the substrate with a conditioning fluid, the
conditioning fluid supplied, in use, by the conditioning system in a space between the substrate and the substrate table so
that the conditioning fluid comes into contact with the substrate being held by the substrate table,

wherein the conditioning system includes a plurality of inlets to supply the conditioning fluid to said space and a plurality
of outlets to remove the conditioning fluid from said space, said plurality of inlets and plurality of outlets being distributed
over an upper surface of the substrate table so that the inlets and outlets are alternately arranged along a length of the
substrate table.

US Pat. No. 9,285,690

MIRROR, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

ASML Netherlands B.V., V...

1. A mirror having a mirroring surface comprising:
a single profiled coating layer having an outer surface provided with two wedged elements formed with respect to the mirroring
surface,

wherein the two wedged elements have a wedge angle in a range of about 10-200 mrad and the two wedged elements are located
next to each other and are symmetric with respect to a symmetry axis between them, and

wherein extreme ultraviolet (EUV) radiation of a radiation beam is transmitted through the profiled coating layer, while other
wavelengths of the radiation beam are reflected at the outer surface of the two wedged elements.

US Pat. No. 9,222,834

INSPECTION APPARATUS AND METHOD

ASML Netherlands B.V., V...

1. An inspection apparatus, comprising:
a spectroscopic scatterometer comprising:
illumination optics configured to direct broadband radiation with an angle of incidence at a spot on a target structure, the
target structure in use comprising a periodic grating;

zero order detection optics configured to receive radiation reflected from the target and for forming and detecting a spectrum
of the reflected radiation; and

higher order detection optics configured to receive radiation diffracted at one or more higher orders by the periodic grating
in the target structure, and to form and detect a spectrum of the received diffracted radiation,

wherein the higher order detection optics comprise a diffraction grating that is symmetrical and configured to form a symmetrical
pair of spectra of the higher order diffracted radiation,

wherein a pair of spectrum detectors are configured to capture the pair of spectra, and
wherein the diffraction grating is a phase grating comprising lines oriented at an oblique angle relative to a selected polarization,
such that radiation of a different polarization will have its spectra formed by the phase grating at a location away from
the pair of spectrum detectors.

US Pat. No. 9,201,310

METHOD OF MEASURING OVERLAY ERROR AND A DEVICE MANUFACTURING METHOD

ASML Netherlands B.V., V...

1. A method of determining overlay error of a device feature, the method comprising:
forming the device feature and a target on a substrate using a lithographic apparatus;
measuring the overlay error of the target using an inspection apparatus; and
determining the overlay error of the device feature based on the overlay error of the target measured using the inspection
apparatus and a model that simulates a relative difference between the overlay error of the device feature and the overlay
error of the target measured using the inspection apparatus;

wherein the device feature is in a chip area of the substrate; and
wherein the target is outside the chip area.

US Pat. No. 9,195,128

ENHANCING ALIGNMENT IN LITHOGRAPHIC APPARATUS DEVICE MANUFACTURE

ASML Netherlands B.V., V...

1. A lithographic apparatus comprising:
an illumination system configured to condition a radiation beam and to provide the radiation beam in pulses;
a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam
with a pattern in its cross-section to form a patterned radiation beam;

a substrate table constructed to hold a substrate;
a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and
an oscillation device configured to impart a controlled oscillation perpendicular to an optical axis of the projection system
to at least one of the patterning device support and the substrate table to align the patterned radiation beam and the substrate,

wherein the controlled oscillation has a timing such that a period of the controlled oscillation is less than an exposure
time of the target portion of the substrate and is substantially equal to a nominal frequency of the pulses.

US Pat. No. 9,482,967

LITHOGRAPHIC APPARATUS, CONTROL SYSTEM AND DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. A lithographic apparatus arranged to project a pattern from a patterning device onto a substrate using a projection system,
the apparatus comprising:
a liquid supply system configured to provide a space between the projection system and the substrate with a liquid;
a measurement system configured to measure an effect associated with a temperature fluctuation of the liquid;
a prediction system configured to predict an effect associated with a temperature fluctuation of the liquid, the prediction
system comprising a model system configured to predict a variation in the temperature of the liquid; and

a control system configured to adjust a parameter of the lithographic apparatus to control the effect measured by the measurement
system and/or the effect predicted by the prediction system or another effect associated with the temperature of the liquid,
on the basis of a prediction obtained by the prediction system and a measurement obtained by the measurement system, wherein
the control system is configured to provide a feedforward control on the basis of the prediction obtained by the prediction
system and to trigger a feedback measurement when the feedforward control exceeds a limit.

US Pat. No. 9,229,324

METHODS OF PROVIDING PATTERNED TEMPLATES FOR SELF-ASSEMBLABLE BLOCK COPOLYMERS FOR USE IN DEVICE LITHOGRAPHY

ASML NETHERLANDS B.V., V...

1. A method of forming a patterned template, comprising a chemical epitaxy template, on a substrate, for orientation of a
self-assemblable block copolymer comprising first and second polymer blocks, the method comprising:
selectively exposing a first portion of a positive tone resist layer on the substrate with actinic radiation by a photolithographic
method, leaving an unexposed portion at an outer face of the resist layer having a width greater than or equal to a critical
dimension size of the photolithographic method, wherein the selective exposure is carried out with an intensity of actinic
radiation sufficient to expose a continuous region of the resist layer between exposed portions, leaving an interfacial unexposed
resist portion at an interface, opposed to the outer face, of the resist layer with the substrate, having a width less than
the critical dimension size of the photolithographic method; and

removing the exposed resist layer, the unexposed resist portion left as first remaining resist portions at the interface,
separated by a portion of bared substrate,

wherein the first remaining resist portions provide a basis for the chemical epitaxy template of the patterned template.

US Pat. No. 9,158,208

METHOD OF PERFORMING MODEL-BASED SCANNER TUNING

ASML NETHERLANDS B.V., V...

1. A computer-implemented method of tuning a scanner utilizing an imaging model, said scanner and said imaging model each
having tunable parameters for controlling imaging performance, said method comprising the steps of:
defining a test pattern;
imaging said test pattern utilizing said scanner and measuring the imaging results, said scanner having a first set of parameters
used for an actual lithographic exposure of said test pattern using said scanner;

tuning said imaging model utilizing said imaging results corresponding to said scanner, said tuned imaging model having a
second set of parameters used for a simulated lithographic exposure of said test pattern using said imaging model;

adjusting said first set of parameters of said scanner based on a difference between values of said first set of parameters
and said second set of parameters; and

after tuning said scanner using said imaging model, tuning a second scanner using said tuned scanner instead of using said
imaging model,

wherein one or more steps of the method are performed by a computer processor.

US Pat. No. 9,136,151

ACTUATOR

ASML Netherlands B.V., V...

14. A lithographic apparatus comprising:
an illumination system configured to condition a radiation beam;
a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam
with a pattern in its cross-section to form a patterned radiation beam;

a substrate table constructed to hold a substrate;
a substrate handling robot configured to position the substrate, the robot having a actuator with a first part and a second
part, the first part being configured to move relative to the second part, and a labyrinth seal provided between the first
part and the second part, the labyrinth seal being configured to restrict the flow of gas from a first side of the labyrinth
seal to a second side of the labyrinth seal, wherein one or more inlets and one or more outlets are provided within the labyrinth
seal, the one or more inlets being configured to provide gas to a location within the labyrinth seal and the one or more outlets
being configured to remove at least part of the gas from a location within the labyrinth seal;

wherein the one or more inlets are located between an innermost gap and a neighboring gap of the labyrinth seal, the one or
more inlets being located at one end of the gaps; and

a projection system configured to project the patterned radiation beam onto a target portion of the substrate.

US Pat. No. 9,482,962

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. A lithographic projection apparatus, comprising:
a substrate table configured to hold a substrate;
a projection system configured to project a patterned beam of radiation onto a target portion of the substrate, the projection
system comprising an optical element; and

a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid,
the liquid supply system comprising a liquid confinement structure extending along at least a part of the boundary of the
space, the liquid confinement structure comprising an inlet configured to provide liquid to the space, an opening of the inlet
being adjacent to an inner periphery of the liquid confinement structure, being below a bottom surface of the optical element,
and being arranged to simultaneously direct liquid in a generally horizontal direction to the space from opposite sides of
a path of the radiation through the space, the opening being one continuous aperture around the path or comprising a plurality
of apertures.

US Pat. No. 9,410,796

LITHOGRAPHIC APPARATUS AND METHOD

ASML Netherlands B.V., V...

1. A displacement measurement system, for measuring a displacement of a first beam of radiation, the displacement measurement
system comprising:
a two dimensional reflection grating configured to diffract the first beam of radiation a first time to form at least two
diffracted beams;

at least two retro reflectors configured to redirect the at least two diffracted beams to diffract a second time on the reflection
grating;

wherein the at least two retro reflectors are configured to redirect the at least two diffracted beams to diffract a third
time on the reflection grating before the at least two diffracted beams are being recombined to form the second beam;

wherein the at least two retro reflectors are arranged to redirect the at least two diffraction beams to diffract at least
a fourth time on the reflection grating before the at least two diffracted beams are recombined to form the second beam, and

a sensor configured to receive the second beam and determine the displacement from an intensity of the second beam,
wherein reflectors of the at least two retro reflectors are positioned only between the reflection grating and the sensor,
and

wherein the at least two diffracted beams comprise information about the displacement in a first and a second direction, and
wherein the first direction is different from the second direction.

US Pat. No. 9,395,633

LITHOGRAPHIC CLUSTER SYSTEM, METHOD FOR CALIBRATING A POSITIONING DEVICE OF A LITHOGRAPHIC APPARATUS

ASML NETHERLANDS B.V., V...

1. A method for calibrating a positioning device of a lithographic apparatus, wherein the positioning device is arranged to
position a substrate, the method comprising:
creating an exposed layer by exposing with the lithographic apparatus a pattern on a layer on the substrate, so as to create
an exposed pattern on the layer, wherein the substrate has a reference layer, wherein the exposed pattern corresponds to a
movement of the substrate by the positioning device;

measuring overlay data between the exposed layer and the reference layer on a plurality of positions on the substrate;
creating frequency domain data by transforming the overlay data from a spatial domain to a frequency domain by a discrete
cosine transformation;

creating a data subset by selecting a subset of the frequency domain data;
creating calibration data by transforming the data subset to the spatial domain by an inverse discrete cosine transformation;
calibrating the positioning device by using the calibration data.

US Pat. No. 9,377,699

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

ASML NETHERLANDS B.V., V...

1. A lithographic projection apparatus comprising:
a projection system configured to project a patterned beam onto a target portion of a substrate;
a substrate table configured to hold said substrate, said substrate table comprising:
an edge seal member configured to at least partly surround an edge of said substrate, an object positioned on said substrate
table, or both, and

a vacuum port to provide vacuum to a gap between said edge seal member and said substrate, said object, or both, the vacuum
port positioned on a side of the gap opposite said projection system; and

a liquid supply system configured to provide a liquid, through which said beam is to be projected, in a space between said
projection system and said substrate, said object, or both and to confine the liquid essentially to a localized area on the
substrate table smaller than an area of the substrate.

US Pat. No. 9,482,963

METHOD OF CONTROLLING A PATTERNING DEVICE IN A LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND LITHOGRAPHIC APPARATUS

ASML NETHERLANDS B.V., V...

1. A method comprising:
converting a representation of a pattern desired to be formed on a substrate into a plurality of area intensity signals, each
corresponding to a radiation intensity level to be set in a respective area of a patterning device in a lithographic apparatus
such that the effect at the substrate of the respective radiation intensity levels being set in each area of the patterning
device is the desired pattern, the patterning device comprising a plurality of individually controllable elements that each
may be set to either a first state, in which radiation is directed to a corresponding portion of the substrate, or a second
state, in which radiation is not directed to a corresponding portion of the substrate;

converting each of the area intensity signals into a plurality of control signals for a respective plurality of individually
controllable elements corresponding to the area of the patterning device such-that the individually controllable elements
are set to appropriate states in order that the combined effect of setting all of the individually controllable elements in
the area to the states in use is to provide the radiation intensity level for the area specified in the area intensity signal;
and

setting each of the individually controllable elements according to its associated control signal.